ClassID:

176903

G03F1/42 - page 2 - CPC Classification

Classification description:

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof; Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof Alignment or registration features, e.g. alignment marks on the mask substrates

Recent Application in this class:
#301
20120237857
2012-09-20

PHOTOMASK AND METHOD FOR FORMING OVERLAY MARK USING THE SAME

#302
20120225374
2012-09-06

Photomask and method for manufacturing the same

#303
20120202138
2012-08-09

Single field zero mask for increased alignment accuracy in field stitching

#304
20120183890
2012-07-19

Method for fabricating a mask

#305
20120160007
2012-06-28

Method and calibration mask for calibrating a position measuring apparatus

#306
20120147372
2012-06-14

Optical-component fabricating method and optical-component fabricating apparatus

#307
20120141926
2012-06-07

LCD panel photolithography process and mask

#308
20120133938
2012-05-31

Measuring method, apparatus and substrate

#309
20120127444
2012-05-24

Reflection Mask For EUV Lithography, System For EUV Lithography, And Method Of Fixing The Reflection Mask For EUV Lithography

#310
20120122022
2012-05-17

Reflective photomask and method of fabricating the same

#311
20120074400
2012-03-29

Multiple edge enabled patterning

#312
20120063666
2012-03-15

Method for determining the registration of a structure on a photomask and apparatus to perform the method

#313
20120057159
2012-03-08

Alignment mark, substrate, set of patterning devices, and device manufacturing method

#314
20120019916
2012-01-26

Multilayer reflective film coated substrate for a reflective mask, reflective mask blank, and methods of manufacturing the same

#315
20110250528
2011-10-13

METHOD FOR CORRECTING IMAGE PLACEMENT ERROR IN PHOTOMASK

#316
20110177435
2011-07-21

Photomasks having sub-lithographic features to prevent undesired wafer patterning

#317
20100233593
2010-09-16

Reflective photomask and method of fabricating the same

#318
20100190096
2010-07-29

Target and method for mask-to-wafer CD, pattern placement and overlay measurement and control

#319
20100167537
2010-07-01

Partitioning features of a single IC layer onto multiple photolithographic masks

#320
20100149555
2010-06-17

Method for generating alignment marks

#321
20090325088
2009-12-31

Method and apparatus for overlay compensation between subsequently patterned layers on workpiece

#322
20090325083
2009-12-31

Photomask manufacturing method

#323
20090286053
2009-11-19

Lithographic method

#324
20090246709
2009-10-01

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

#325
20090220866
2009-09-03

Pre-alignment marking and inspection to improve mask substrate defect tolerance

#326
20090135390
2009-05-28

LITHOGRAPHIC ALIGNMENT MARKS

#327
20090004880
2009-01-01

Mask reuse in semiconductor processing

#328
20080274568
2008-11-06

Method of fabricating semiconductor device

#329
20080268350
2008-10-30

SEMICONDUCTOR STRUCTURE

#330
20080225254
2008-09-18

Photomask, photomask superimposition correcting method, and manufacturing method of semiconductor device

#331
20080192253
2008-08-14

METHOD AND TEST-STRUCTURE FOR DETERMINING AN OFFSET BETWEEN LITHOGRAPHIC MASKS

#332
20080100819
2008-05-01

Lithographic apparatus and method

#333
20080100818
2008-05-01

Lithographic apparatus and method

#334
20080034344
2008-02-07

Overlay mark

#335
20070298329
2007-12-27

PHOTOMASK AND METHOD FOR USING THE SAME

#336
20070076843
2007-04-05

Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus

#337
20070065731
2007-03-22

Method for fabricating an attenuated phase shift photomask by separate patterning of negative and positive resist layers with corresponding etching steps for underlying light-shielding and phase shift layers on a transparent substrate

#338
20060193432
2006-08-31

Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus

#339
20060183026
2006-08-17

Masking for wafer fabrication

#340
20060152703
2006-07-13

Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the same

#341
20060126042
2006-06-15

Reticle-processing system

#342
20060115743
2006-06-01

Reticle and method of fabricating semiconductor device

#343
20060073397
2006-04-06

Masking arrangement and method for producing integrated circuit arrangements

#344
20050105068
2005-05-19

Reticle, exposure monitoring method, exposure method and manufacturing method for semiconductor device

#345
20050063030
2005-03-24

Method of hologram exposure, mask for hologram exposure, semiconductor device, and electronic equipment

#346
16504695
2023-09-05

Image-based overlay targets incorporating features for pattern recognition and moire fringe patterns for measurement

#347
16289492
2020-01-07

Pressurized tin collection bucket with in-line draining mechanism

#348
15719998
2019-01-15

Systems and methods for forming contact definitions

#349
15408834
2018-01-02

Methods of controlling distortion of exposure processes

#350
15084775
2017-10-31

Systems and methods for forming contact definitions

#351
14803380
2016-04-26

Systems and methods for forming contact definitions

#352
14057695
2015-09-01

Systems and methods for forming contact definitions