Patents-Review.com
ClassID:

176905 ⎘

G03F1/46 - CPC Classification

Classification description:

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof; Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof Antireflective coatings

Recent Application in this class:
#1
20260010065
2026-01-08

BLANK MASK AND PHOTOMASK

 #2
20250164891
2025-05-22

LAYER STACK FOR EXTREME ULTRAVIOLET LITHOGRAPHY

 #3
20250093764
2025-03-20

EXTREME ULTRAVIOLET MASK

 #4
20240319609
2024-09-26

Optical Lithography System and Method of Using the Same

 #5
20240319578
2024-09-26

Reflective mask blank, reflective mask, and method for manufacturing semiconductor device

 #6
20240142870
2024-05-02

ALUMINUM OXIDE CARBON HYBRID HARDMASKS AND METHODS FOR MAKING THE SAME

 #7
20240142869
2024-05-02

ALUMINUM OXIDE CARBON HYBRID HARDMASKS AND METHODS FOR MAKING THE SAME

 #8
20240063060
2024-02-22

PATTERNING METHOD AND STRUCTURES RESULTING THEREFROM

 #9
20230367195
2023-11-16

Extreme ultraviolet mask and method of manufacturing the same

 #10
20230360914
2023-11-09

Reflection mode photomask

 #11
20230341761
2023-10-26

ANTI-REFLECTION WITH INTERCONNECTED STRUCTURES

 #12
20230314964
2023-10-05

FLUID PURGING SYSTEM

 #13
20230185184
2023-06-15

HARDMASK STRUCTURE FOR PREPARING SEMICONDUCTOR STRUCTURE

 #14
20230119980
2023-04-20

A METHOD OF MANUFACTURING SEGREGATED LAYERS ABOVE A SUBSTRATE, AND A METHOD FOR MANUFACTURING A DEVICE

 #15
20230110529
2023-04-13

BLANK MASK AND PHOTOMASK USING THE SAME

 #16
20230109913
2023-04-13

Optical lithography system and method of using the same

 #17
20230011701
2023-01-12

Optical lithography system and method of using the same

 #18
20220229357
2022-07-21

Reflective mask blank, reflective mask, and method for manufacturing reflective mask and semiconductor device

 #19
20220206379
2022-06-30

Reflective mask blank, reflective mask, and method for manufacturing reflective mask and semiconductor device

 #20
20220197127
2022-06-23

Extreme ultraviolet mask and method of manufacturing the same

 #21
20220165572
2022-05-26

Reflection mode photomask and method of making

 #22
20220013412
2022-01-13

Patterning method and structures resulting therefrom

 #23
20210216007
2021-07-15

Method of accelerated hazing of mask assembly

 #24
20210125829
2021-04-29

High-silicon-content wet-removable planarizing layer

 #25
20200379336
2020-12-03

Wave-Front Aberration Metrology of Extreme Ultraviolet Mask Inspection Systems

 #26
20200161132
2020-05-21

Reflection mode photomask

 #27
20200073225
2020-03-05

Extreme ultraviolet mask and method of manufacturing the same

 #28
20200057362
2020-02-20

Photomask laser etch

 #29
20200004134
2020-01-02

Lithography mask and method

 #30
20190278179
2019-09-12

Anti-reflection optical substrates and methods of manufacture

 #31
20190258155
2019-08-22

Mask assembly and haze acceleration method

 #32
20190155138
2019-05-23

Mask for extreme-ultraviolet (extreme-UV) lithography and method for manufacturing the same

 #33
20190139996
2019-05-09

Transparent substrate and process for producing it

 #34
20190067007
2019-02-28

Reflection mode photomask and fabrication method therefore

 #35
20190004416
2019-01-03

Lithography mask and method

 #36
20180356719
2018-12-13

Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor device

 #37
20180335692
2018-11-22

PHASE-SHIFT BLANKMASK AND PHASE-SHIFT PHOTOMASK

 #38
20180299765
2018-10-18

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) REFLECTIVE MASK

 #39
20180267398
2018-09-20

Photomask blank, method for manufacturing photomask, and mask pattern formation method

 #40
20180259843
2018-09-13

Photomask blank

 #41
20180240668
2018-08-23

Semiconductor mask blanks with a compatible stop layer

 #42
20180033986
2018-02-01

Transparent substrate and process for producing it

 #43
20170236707
2017-08-17

Photomask and method for manufacturing semiconductor device using the same

 #44
20170219920
2017-08-03

Mask for EUV lithography, EUV lithography apparatus and method for determining a contrast proportion caused by DUV radiation

 #45
20170168387
2017-06-15

Image mask film scheme and method

 #46
20170082917
2017-03-23

Photomask blank, making method, and photomask

 #47
20170075211
2017-03-16

MASK BLANK

 #48
20170023854
2017-01-26

Blankmask and photomask using the same

 #49
20160282713
2016-09-29

Efficient solution for removing EUV native defects

 #50
20160018729
2016-01-21

Binary photomask blank, preparation thereof, and preparation of binary photomask

 #51
20160013058
2016-01-14

Semiconductor mask blanks with a compatible stop layer

 #52
20150370158
2015-12-24

Image mask film scheme and method

 #53
20150309403
2015-10-29

ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF

 #54
20150309401
2015-10-29

Lithography system and method for patterning photoresist layer on EUV mask

 #55
20150286132
2015-10-08

Mask blank, method of manufacturing the same, transfer mask, and method of manufacturing the same

 #56
20150286129
2015-10-08

Photo-masks for lithography

 #57
20150160549
2015-06-11

Photomask blank

 #58
20150093689
2015-04-02

Blankmask and photomask

 #59
20140239516
2014-08-28

Carbosilane polymer compositions for anti-reflective coatings

 #60
20140205938
2014-07-24

EUV mask and method for forming the same

 #61
20140106262
2014-04-17

Image mask film scheme and method

 #62
20140057199
2014-02-27

Photomask blank, photomask, and method for manufacturing photomask blank

 #63
20130309599
2013-11-21

Photomask blank manufacturing method, photomask blank, photomask, and pattern transfer method

 #64
20130273738
2013-10-17

Mask blank, method of manufacturing the same, transfer mask, and method of manufacturing the same

 #65
20130230795
2013-09-05

Photomask blank, photomask, and methods of manufacturing the same

 #66
20130193565
2013-08-01

Semiconductor mask blanks with a compatible stop layer

 #67
20130157177
2013-06-20

EUV mask and method for forming the same

 #68
20130095415
2013-04-18

Blankmask and photomask using the same

 #69
20120322000
2012-12-20

Reflective mask blank for EUV lithography and process for producing the same

 #70
20120237861
2012-09-20

Photomask and photomask substrate with reduced light scattering properties

 #71
20120219889
2012-08-30

Photomask blank, photomask, and photomask manufacturing method

 #72
20120148944
2012-06-14

Photomasks and methods of manufacturing the same

 #73
20120100466
2012-04-26

Mask blank and transfer mask

 #74
20120034553
2012-02-09

Photomask Blank, Photomask, and Pattern Transfer Method Using Photomask

 #75
20110318674
2011-12-29

Photomask blank, photomask, and methods of manufacturing the same

 #76
20110305978
2011-12-15

Photomask blank, photomask, and method for manufacturing photomask blank

 #77
20110244378
2011-10-06

Device and method for providing wavelength reduction with a photomask

 #78
20110244377
2011-10-06

Fluorine-passivated reticles for use in lithography and methods for fabricating the same

 #79
20110217635
2011-09-08

Method of manufacturing transfer mask and method of manufacturing semiconductor device

 #80
20110212392
2011-09-01

Photomask blank, photomask, and methods of manufacturing the same

 #81
20110200920
2011-08-18

Reflective mask blank for EUV lithography

 #82
20110104592
2011-05-05

Photomask blank, photomask, and method for manufacturing photomask blank

 #83
20110070533
2011-03-24

Photomask blank, photomask, and method for manufacturing photomask blank

 #84
20110053057
2011-03-03

Mask blank, transfer mask, and methods of manufacturing the same

 #85
20110027699
2011-02-03

REDUCING ION MIGRATION OF ABSORBER MATERIALS OF LITHOGRAPHY MASKS BY CHROMIUM PASSIVATION

 #86
20100300623
2010-12-02

Plasma etching apparatus

 #87
20100261101
2010-10-14

Photomask blank and photomask

 #88
20100261100
2010-10-14

Photomask blank and photomask

 #89
20100261099
2010-10-14

Photomask blank and photomask making method

 #90
20100252917
2010-10-07

Carbosilane polymer compositions for anti-reflective coatings

 #91
20100173233
2010-07-08

Photomask blank, photomask, and methods of manufacturing the same

 #92
20100143831
2010-06-10

Photomask blank and photomask

 #93
20090279101
2009-11-12

Electrostatic chuck with anti-reflective coating, measuring method and use of said chuck

 #94
20090246647
2009-10-01

Photomask blank, photomask, and methods of manufacturing the same

 #95
20090239155
2009-09-24

Fluorine-passivated reticles for use in lithography and methods for fabricating the same

 #96
20090226826
2009-09-10

Photomask blank, photomask, and photomask manufacturing method

 #97
20090220867
2009-09-03

Gradated photomask and its fabrication process

 #98
20090214961
2009-08-27

Photomask blank, photomask, and methods of manufacturing the same

 #99
20080305406
2008-12-11

Photomask Blank, Photomask Manufacturing Method and Semiconductor Device Manufacturing Method

 #100
20080182183
2008-07-31

Reflective mask blank for EUV lithography

 #101
20080102379
2008-05-01

Method for forming a robust mask with reduced light scattering

 #102
20080096138
2008-04-24

Method of reducing critical dimension bias during fabrication of a semiconductor device

 #103
20080090156
2008-04-17

Photo mask having assist pattern and method of fabricating the same

 #104
20080063950
2008-03-13

Photomask blank and photomask

 #105
20070212619
2007-09-13

Photomask blank and photomask making method

 #106
20070212618
2007-09-13

Photomask blank and photomask

 #107
20070128528
2007-06-07

Mask blank and photomask having antireflective properties

 #108
20070020534
2007-01-25

Photomask blank, photomask and fabrication method thereof

 #109
20060057476
2006-03-16

Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARC

 #110
20060057472
2006-03-16

Method for making chrome photo mask

 #111
20060057469
2006-03-16

Photomask blank, photomask, and pattern transfer method using photomask

 #112
20050170655
2005-08-04

Reticle fabrication using a removable hard mask

 #113
20050142463
2005-06-30

Photomask blank, photomask, methods of manufacturing the same and methods of forming micropattern

 #114
20050100798
2005-05-12

Device and method for providing wavelength reduction with a photomask

 #115
20050053851
2005-03-10

Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticle

 #116
20050042525
2005-02-24

Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method

 #117
20050025279
2005-02-03

Non absorbing reticle and method of making same