Patents-Review.com
ClassID:

176911 ⎘

G03F1/58 - CPC Classification

Classification description:

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof; Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers

Recent Application in this class:
#1
20260126716
2026-05-07

EXTREME ULTRAVIOLET MASK WITH ALLOY BASED ABSORBERS

 #2
20260104637
2026-04-16

PHOTOMASK BLANK, MANUFACTURING METHOD OF PHOTOMASK AND PHOTOMASK

 #3
20260044066
2026-02-12

REFLECTIVE MASK AND FABRICATING METHOD THEREOF

 #4
20250362584
2025-11-27

LITHOGRAPHY MASK HAVING HIGH EXTINCTION COEFFICIENT ABSORBER AND RELATED SYSTEMS AND METHODS

 #5
20250284189
2025-09-11

SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

 #6
20250199393
2025-06-19

REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK

 #7
20250147407
2025-05-08

REFLECTION-TYPE MASK BLANK, METHOD FOR PRODUCING REFLECTION-TYPE MASK BLANK, REFLECTION-TYPE MASK, AND METHOD FOR PRODUCING REFLECTION-TYPE MASK

 #8
20250123552
2025-04-17

LITHOGRAPHY MASK HAVING HIGH EXTINCTION COEFFICIENT ABSORBER AND RELATED SYSTEMS AND METHODS

 #9
20240427226
2024-12-26

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND MANUFACTURING METHOD THEREFOR

 #10
20240096601
2024-03-21

TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD

 #11
20240027891
2024-01-25

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

 #12
20230375921
2023-11-23

EXTREME ULTRAVIOLET MASK WITH ALLOY BASED ABSORBERS

 #13
20230367194
2023-11-16

Extreme ultraviolet mask with reduced wafer neighboring effect

 #14
20230341760
2023-10-26

EUV In-Situ Linearity Calibration for TDI Image Sensors Using Test Photomasks

 #15
20230229072
2023-07-20

Reflective mask and fabricating method thereof

 #16
20230185135
2023-06-15

Exposure mask and display device manufactured by using the same

 #17
20230148427
2023-05-11

PHOTOMASK BLANK, MANUFACTURING METHOD OF PHOTOMASK AND PHOTOMASK

 #18
20230143851
2023-05-11

REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK

 #19
20230135120
2023-05-04

METHOD AND APPARATUS FOR MANUFACTURING A PHOTOMASK FROM A BLANK MASK

 #20
20220342293
2022-10-27

SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

 #21
20220269161
2022-08-25

Substrate with multilayer reflective film, reflective mask blank, reflective mask, and method for manufacturing semiconductor device

 #22
20220234277
2022-07-28

Substrate

 #23
20220229358
2022-07-21

Photomask blank, method for producing photomask, and photomask

 #24
20220229357
2022-07-21

Reflective mask blank, reflective mask, and method for manufacturing reflective mask and semiconductor device

 #25
20220187699
2022-06-16

REFLECTIVE MASK BLANK FOR EUVL, REFLECTIVE MASK FOR EUVL, AND METHOD OF MANUFACTURING REFLECTIVE MASK FOR EUVL

 #26
20220163882
2022-05-26

Extreme Ultraviolet Mask Blank With Alloy Absorber And Method Of Manufacture

 #27
20220137500
2022-05-05

GLASS SUBSTRATE FOR EUVL, AND MASK BLANK FOR EUVL

 #28
20220121102
2022-04-21

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

 #29
20220082925
2022-03-17

Extreme ultraviolet mask blank with multilayer absorber and method of manufacture

 #30
20220066311
2022-03-03

Reflective type blankmask for EUV, and method for manufacturing the same

 #31
20210397076
2021-12-23

Reticle in an apparatus for extreme ultraviolet exposure

 #32
20210389662
2021-12-16

Phase shift mask for extreme ultraviolet lithography and a method of manufacturing a semiconductor device using the same

 #33
20210341828
2021-11-04

Extreme ultraviolet mask absorber materials

 #34
20210333702
2021-10-28

Substrate with Film for Reflective Mask Blank, and Reflective Mask Blank

 #35
20210302826
2021-09-30

Extreme ultraviolet mask absorber materials

 #36
20210278759
2021-09-09

Method of manufacturing reflective mask blank, and reflective mask blank

 #37
20210247688
2021-08-12

Substrate with multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor device

 #38
20210247687
2021-08-12

Method of manufacturing extreme ultraviolet mask with reduced wafer neighboring effect

 #39
20210208495
2021-07-08

Reflective type blankmask and photomask for EUV

 #40
20210173296
2021-06-10

Photomask blank, manufacturing method of photomask and photomask

 #41
20210157226
2021-05-27

EUV mask blank, photomask manufactured by using the EUV mask blank, lithography apparatus using the photomask and method of fabricating semiconductor device using the photomask

 #42
20210132487
2021-05-06

Blankmask and photomask for extreme ultraviolet lithography

 #43
20210124256
2021-04-29

Extreme Ultraviolet Mask Blank With Alloy Absorber And Method Of Manufacture

 #44
20210103209
2021-04-08

Substrate with conductive film, substrate with multilayer reflective film, reflective mask blank, reflective mask, and semiconductor device manufacturing method

 #45
20210096454
2021-04-01

PHOTOMASK HAVING MULTI-LAYERED TRANSFER PATTERNS

 #46
20210080822
2021-03-18

Method for forming photomask and photolithography method

 #47
20210072634
2021-03-11

Reflective mask

 #48
20210063869
2021-03-04

Photomask with enhanced contamination control and method of forming the same

 #49
20210048739
2021-02-18

Method for producing photomask, method for producing semiconductor device, method for forming pattern, and photomask

 #50
20210033959
2021-02-04

EXTREME ULTRAVIOLET PHOTOMASK MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE FABRICATION METHOD INCLUDING THE SAME

 #51
20210018828
2021-01-21

Mask and method for forming the same

 #52
20210018775
2021-01-21

Exposure mask and display device manufactured by using the same

 #53
20200401037
2020-12-24

EUV in-situ linearity calibration for TDI image sensors using test photomasks

 #54
20200314990
2020-10-01

Radiation source apparatus

 #55
20200292946
2020-09-17

Lithography system and method thereof

 #56
20200278603
2020-09-03

Extreme Ultraviolet Mask Blank With Multilayer Absorber And Method Of Manufacture

 #57
20200276750
2020-09-03

Substrate

 #58
20200272046
2020-08-27

Mask and manufacturing method thereof

 #59
20200264502
2020-08-20

Photomask blank and method for preparing photomask

 #60
20200249558
2020-08-06

Substrate with multilayer reflective film, reflective mask blank, reflective mask, and semiconductor device manufacturing method

 #61
20200218145
2020-07-09

Extreme ultraviolet mask blank with multilayer absorber and method of manufacture

 #62
20200218143
2020-07-09

Reflective photomask blank and reflective photomask

 #63
20200209444
2020-07-02

Mirror for extreme ultraviolet light and extreme ultraviolet light generating apparatus

 #64
20190317394
2019-10-17

Mask blank, transfer mask, method for manufacturing transfer mask, and method for manufacturing semiconductor device

 #65
20190278166
2019-09-12

PHOTOLITHOGRAPHY SYSTEM AND METHOD USING A RETICLE WITH MULTIPLE DIFFERENT SETS OF REDUNDANT FRAMED MASK PATTERNS

 #66
20190227427
2019-07-25

Extreme ultraviolet (EUV) mask absorber and method for forming the same

 #67
20190219917
2019-07-18

Mask, display substrate and display device

 #68
20190196321
2019-06-27

EUV mask blank, photomask manufactured by using the EUV mask blank, lithography apparatus using the photomask and method of fabricating semiconductor device using the photomask

 #69
20190187551
2019-06-20

Mask blank, phase shift mask, method of manufacturing phase shift mask, and method of manufacturing semiconductor device

 #70
20190187550
2019-06-20

Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device

 #71
20190163051
2019-05-30

Method for forming photomask and photolithography method

 #72
20190148146
2019-05-16

Method of forming semiconductor structure

 #73
20190146331
2019-05-16

Extreme ultraviolet mask with reduced mask shadowing effect and method of manufacturing the same

 #74
20190146329
2019-05-16

Photomask blank and method for producing photomask

 #75
20190146325
2019-05-16

Extreme ultraviolet mask with reduced wafer neighboring effect and method of manufacturing the same

 #76
20190113836
2019-04-18

Extreme ultraviolet (EUV) lithography mask

 #77
20190079387
2019-03-14

Reflection type exposure mask and pattern forming method

 #78
20190079384
2019-03-14

Reticles for lithography

 #79
20190064651
2019-02-28

Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device

 #80
20190004420
2019-01-03

Photomask blank and photomask

 #81
20180373139
2018-12-27

Mask assembly and lithography method using the same

 #82
20180341176
2018-11-29

Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby

 #83
20180329287
2018-11-15

Mask plates and manufacturing methods of array substrates

 #84
20180321581
2018-11-08

Photomask and fabrication method therefor

 #85
20180267398
2018-09-20

Photomask blank, method for manufacturing photomask, and mask pattern formation method

 #86
20180259843
2018-09-13

Photomask blank

 #87
20180259842
2018-09-13

Halftone phase shift photomask blank

 #88
20180252995
2018-09-06

Mask blank, phase shift mask and method for manufacturing semiconductor device

 #89
20180210331
2018-07-26

Mask blank, phase shift mask, phase shift mask manufacturing method, and semiconductor device manufacturing method

 #90
20180203344
2018-07-19

PHOTOMASK

 #91
20180180987
2018-06-28

Mask blank, phase-shift mask and method for manufacturing semiconductor device

 #92
20180033612
2018-02-01

Mask blank and phase shift mask using same

 #93
20180031965
2018-02-01

Extreme ultraviolet mask blank with alloy absorber and method of manufacture

 #94
20180031964
2018-02-01

Extreme ultraviolet mask blank with multilayer absorber and method of manufacture

 #95
20170285458
2017-10-05

Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device

 #96
20170269467
2017-09-21

Mask, manufacturing method thereof, patterning method employing mask, optical filter

 #97
20170255095
2017-09-07

Photomask blank and method for preparing photomask

 #98
20170219920
2017-08-03

Mask for EUV lithography, EUV lithography apparatus and method for determining a contrast proportion caused by DUV radiation

 #99
20170139316
2017-05-18

Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device

 #100
20170075210
2017-03-16

Mask blank, method of manufacturing phase shift mask, phase shift mask, and method of manufacturing semiconductor device

 #101
20170068155
2017-03-09

Mask blank, method of manufacturing phase shift mask, phase shift mask, and method of manufacturing semiconductor device

 #102
20170023854
2017-01-26

Blankmask and photomask using the same

 #103
20160377975
2016-12-29

Mask blank, phase-shift mask and method for manufacturing semiconductor device

 #104
20160291451
2016-10-06

Phase shift blankmask and photomask

 #105
20160209757
2016-07-21

Lithography method and structure for resolution enhancement with a two-state mask

 #106
20160202603
2016-07-14

Mask blank, transfer mask, and method for manufacturing transfer mask

 #107
20160139504
2016-05-19

Photo mask and method of manufacturing the same

 #108
20160018729
2016-01-21

Binary photomask blank, preparation thereof, and preparation of binary photomask

 #109
20150261083
2015-09-17

Reflective mask blank, reflective mask and method of manufacturing reflective mask

 #110
20150227039
2015-08-13

Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device

 #111
20150226891
2015-08-13

UV mask and fabrication method thereof

 #112
20150132685
2015-05-14

Lithography mask and method of forming a lithography mask

 #113
20150093689
2015-04-02

Blankmask and photomask

 #114
20150064611
2015-03-05

Extreme ultraviolet (EUV) mask and method of fabricating the EUV mask

 #115
20150056539
2015-02-26

Phase shift mask blank and phase shift mask

 #116
20150009482
2015-01-08

Extreme ultraviolet lithography mask

 #117
20140335446
2014-11-13

Systems and methods for lithography masks

 #118
20140322634
2014-10-30

Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device

 #119
20140268087
2014-09-18

Lithography and mask for resolution enhancement

 #120
20140248555
2014-09-04

Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof

 #121
20140205938
2014-07-24

EUV mask and method for forming the same

 #122
20140205937
2014-07-24

Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device

 #123
20140178804
2014-06-26

Stacked mask

 #124
20140030641
2014-01-30

Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device

 #125
20130323626
2013-12-05

Reflective mask

 #126
20130323625
2013-12-05

Systems and methods for lithography masks

 #127
20130316271
2013-11-28

Method of manufacturing a transfer mask and method of manufacturing a semiconductor device

 #128
20130280646
2013-10-24

Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device

 #129
20130260288
2013-10-03

Extreme ultraviolet lithography process and mask

 #130
20130157177
2013-06-20

EUV mask and method for forming the same

 #131
20130095414
2013-04-18

Lithography mask and method of forming a lithography mask

 #132
20130078554
2013-03-28

Reflective mask blank, reflective mask and method of manufacturing reflective mask

 #133
20130078553
2013-03-28

Mask blank, transfer mask, method of manufacturing transfer mask and method of manufacturing semiconductor device

 #134
20130065166
2013-03-14

PHASE SHIFT MASK BLANK AND PHASE SHIFT MASK

 #135
20130065165
2013-03-14

Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device

 #136
20120219889
2012-08-30

Photomask blank, photomask, and photomask manufacturing method

 #137
20120156596
2012-06-21

Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device

 #138
20120115075
2012-05-10

Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device

 #139
20120107731
2012-05-03

Photomask

 #140
20120100470
2012-04-26

Mask blank, transfer mask, and method of manufacturing a transfer mask

 #141
20120100466
2012-04-26

Mask blank and transfer mask

 #142
20120082924
2012-04-05

Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device

 #143
20120045712
2012-02-23

Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof

 #144
20120034553
2012-02-09

Photomask Blank, Photomask, and Pattern Transfer Method Using Photomask

 #145
20120034551
2012-02-09

Binary photomask blank and binary photomask making method

 #146
20120021344
2012-01-26

Reflective photomask and reflective photomask blank

 #147
20110244377
2011-10-06

Fluorine-passivated reticles for use in lithography and methods for fabricating the same

 #148
20110244375
2011-10-06

Mask blank, transfer mask, methods of manufacturing the same and method of manufacturing a semiconductor device

 #149
20110165506
2011-07-07

Photomask constructions having liners of specified compositions along sidewalls of multi-layered structures

 #150
20110159411
2011-06-30

Phase-shift photomask and patterning method

 #151
20110111332
2011-05-12

Phase shift mask blank and phase shift mask

 #152
20110111331
2011-05-12

Metal optical grayscale mask and manufacturing method thereof

 #153
20110053058
2011-03-03

SEMICONDUCTOR DEVICE FABRICATION MASK AND METHOD OF MANUFACTURING THE SAME

 #154
20110027699
2011-02-03

REDUCING ION MIGRATION OF ABSORBER MATERIALS OF LITHOGRAPHY MASKS BY CHROMIUM PASSIVATION

 #155
20100261101
2010-10-14

Photomask blank and photomask

 #156
20100261100
2010-10-14

Photomask blank and photomask

 #157
20100248493
2010-09-30

Photomask blank, processing method, and etching method

 #158
20100248090
2010-09-30

Photomask blank and photomask

 #159
20100173233
2010-07-08

Photomask blank, photomask, and methods of manufacturing the same

 #160
20100143831
2010-06-10

Photomask blank and photomask

 #161
20090239155
2009-09-24

Fluorine-passivated reticles for use in lithography and methods for fabricating the same

 #162
20090226826
2009-09-10

Photomask blank, photomask, and photomask manufacturing method

 #163
20090214961
2009-08-27

Photomask blank, photomask, and methods of manufacturing the same

 #164
20090186283
2009-07-23

Methods of forming photomasks

 #165
20090148781
2009-06-11

Reflective-type mask

 #166
20080311485
2008-12-18

Photomasks Used to Fabricate Integrated Circuitry, Finished-Construction Binary Photomasks Used to Fabricate Integrated Circuitry, Methods of Forming Photomasks, and Methods of Photolithographically Patterning Substrates

 #167
20080248409
2008-10-09

Reflective mask blank, reflective mask and methods of producing the mask blank and the mask

 #168
20080206655
2008-08-28

Mask blank, method of manufacturing an exposure mask, and method of manufacturing an imprint template

 #169
20080182183
2008-07-31

Reflective mask blank for EUV lithography

 #170
20080070127
2008-03-20

Photomask having self-masking layer and methods of etching same

 #171
20080063950
2008-03-13

Photomask blank and photomask

 #172
20080041716
2008-02-21

Methods for producing photomask blanks, cluster tool apparatus for producing photomask blanks and the resulting photomask blanks from such methods and apparatus

 #173
20070248897
2007-10-25

Photomask blank

 #174
20070212618
2007-09-13

Photomask blank and photomask

 #175
20070166630
2007-07-19

Photomasks including multi-layered light-shielding and methods of manufacturing the same

 #176
20070020534
2007-01-25

Photomask blank, photomask and fabrication method thereof

 #177
20060088774
2006-04-27

Photomask blank, photomask and fabrication method thereof

 #178
20060057469
2006-03-16

Photomask blank, photomask, and pattern transfer method using photomask

 #179
20050250018
2005-11-10

Lithography mask blank

 #180
20050208389
2005-09-22

Reflection type mask blank and reflection type mask and production methods for them

 #181
20050142463
2005-06-30

Photomask blank, photomask, methods of manufacturing the same and methods of forming micropattern

 #182
16257232
2020-06-02

Lithography system and method thereof