176926 ⎘
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by photographic processes for production of originals simulating relief
Mask element precursor and relief image-forming system
#2Scanning exposure device
#3Semiconductor structure and method of generating masks for making integrated circuit
#4Method and apparatus for enhanced optical proximity correction
#5Pattern-dependent proximity matching/tuning including light manipulation by projection optics