G03F1/92 - CPC Classification Index

ClassID:

176928 ⎘

G03F1/92 - CPC Classification

Classification description:

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared from printing surfaces

Recent Application in this class:

20230400810

2023-12-14

HOLOGRAM COLOR DESIGNATION SYSTEM AND HOLOGRAM COLOR DESIGNATION METHOD BASED ON DITHERING MASK

20230094719

2023-03-30

Random weight initialization of non-volatile memory array

20150004530

2015-01-01

Method of manufacturing a photomask with flexography

20130224636

2013-08-29

Mask for near-field lithography and fabrication the same

20090004419

2009-01-01

MULTI-LAYER MASKING FILM

20050196684

2005-09-08

Mask pattern data producing method, patterning method, reticle correcting method, reticle manufacturing method, and semiconductor apparatus manufacturing method