FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION

DYNAMIC POLYMER SURFACES FOR SCREENING, ENRICHMENT, AND HARVESTING OF CELLS AND OTHER SOFT COLLOIDAL PARTICLES

Cross-linked polymer for resist

Dielectric Film-Forming Composition

Substrate processing method of controlling discharge angle and discharge position of processing liquid supplied to peripheral portion of substrate

COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING COMPOUND

METHOD OF MANUFACTURING ANTIBACTERIAL COVER WINDOW, AND ANTIBACTERIAL COVER WINDOW MANUFACTURED THEREBY

Solution treatment apparatus and cleaning method

MANUFACTURING METHOD OF PATTERNED QUANTUM DOT LIGHT-EMITTING LAYER AND MANUFACTURING METHOD OF LIGHT-EMITTING DEVICE

Multi-morphology block co-polymer films and processes for their preparation

METHODS FOR MAKING FLOW CELLS

COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSITIVE COMPOSITION, METHOD FOR PRODUCING AMORPHOUS FILM, RESIST PATTERN FORMATION METHOD, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, AND CIRCUIT PATTERN FORMATION METHOD

Semiconductor manufacturing system, method of manufacturing a semiconductor device, and semiconductor device

Imprint method, imprint apparatus, and film formation apparatus

Coloring composition, color filter, pattern forming method, solid-stage imaging element, and image display device

Nanostamping method and nano-optical component

Composition for resist underlayer, and pattern forming method using same

SUBSTRATE TREATING COMPOSITION AND METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE USING THE SAME

Substrate transport apparatus, substrate processing apparatus, and substrate transport method

METASURFACE PRIMARY LENS AND METASURFACE SECONDARY LENS, MANUFACTURING METHOD THEREOF, AND OPTICAL SYSTEM

PERMANENT BONDING AND PATTERNING MATERIAL

Polymer material, composition, and method of manufacturing semiconductor device

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, COLOR FILTER, SOLID-STATE IMAGING ELEMENT AND IMAGE DISPLAY DEVICE

Photoresist structure, patterned deposition layer, semiconductor chip and manufacturing method thereof

Apparatuses for reducing metal residue in edge bead region from metal-containing resists

Dry development of resists

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND RESIN

DRY DEVELOP PROCESS OF PHOTORESIST

Photosensitive compositions, quantum dot polymer composite pattern prepared therefrom, and electronic devices including the same

Method of forming a patterned structure and device thereof

Silicon-containing underlayers

Preparation Method Of Miniature Solid Silicon Needle

Resist composition, method of forming resist pattern, compound, acid generator, and method of producing compound

Substrate processing apparatus, estimation method of substrate processing and recording medium

Photomask having recessed region

Method and apparatus for treating substrate

CHEMICAL LIQUID, RESIST PATTERN FORMING METHOD, SEMICONDUCTOR CHIP MANUFACTURING METHOD, CHEMICAL LIQUID STORAGE BODY, AND CHEMICAL LIQUID MANUFACTURING METHOD

Photolithography method and photolithography system

Coating method and coating system

Device and method for photoresist coating

Substrate transfer apparatus and substrate transfer method

Substrate processing apparatus and substrate processing method

Temperature controlling apparatus

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD

Compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component

Polymer, photosensitive resin composition, patterning method, method of forming cured film, interlayer insulating film, surface protective film, and electronic component

Predicting across wafer spin-on planarization over a patterned topography

Imprinting apparatus

Quantum dot-polymer composite film, method of manufacturing the same, and device including the same

Substrate processing apparatus and substrate processing method

Fluorine-containing polymer, purification method, and radiation-sensitive resin composition

PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN

Ambient controlled two-step thermal treatment for spin-on coating layer planarization

RESIST UNDERLYING FILM-FORMING COMPOSITION COMPRISING A REACTION PRODUCT WITH A GLYCIDYL ESTER COMPOUND

Artificial nerve conduit construction using tissue engineering methods

Film processing method

Contamination handling for semiconductor apparatus

Rapid large-scale fabrication of metasurfaces with complex unit cells

Substrate processing apparatus and substrate processing method

Dispensing nozzle design and dispensing method thereof

POLYMERS AND PHOTORESIST COMPOSITIONS

Material for forming organic film, method for forming organic film, patterning process, and compound

Substrate treating method

Phase-change memory with no drift

Liquid treatment apparatus and method of adjusting temperature of treatment liquid

Substrate support member, substrate treatment apparatus, and substrate transfer apparatus

Substrate defect inspection method, storage medium, and substrate defect inspection apparatus

Substrate processing method, substrate processing apparatus, and recipe selection method

Abnormality detection device of chemical solution, liquid processing device, substrate processing apparatus, abnormality detection method of chemical solution, liquid processing method, and substrate processing method

PHOTOSENSITIVE COMPOSITION AND METHOD OF MANUFACTURING GRAPHENE DEVICE

Composition, film, near infrared cut filter, laminate, pattern forming method, solid image pickup element, image display device, infrared sensor, and color filter

SUPPORTING UNIT, APPARATUS HAVING THE SAME AND METHOD FOR TREATING SUBSTRATE USING THE SAME

Apparatus and method for treating substrate

Apparatus and methods for beam processing of substrates

HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS

Systems and methods for monitoring one or more characteristics of a substrate

Coating and developing apparatus and coating and developing method

Coating and developing apparatus and coating and developing method

Metal-compound-removing solvent and method in lithography

Substrate processing apparatus, method of adjusting parameters of coating module, and storage medium

Adhesion layer for multi-layer photoresist

Substrate treating apparatus

Substrate processing method and substrate processing apparatus

Liquid processing apparatus and method of detecting liquid in liquid processing apparatus

COATING METHOD, COATING APPARATUS, AND STORAGE MEDIUM

Coater with automatic cleaning function and coater automatic cleaning method

Substrate treating apparatus and substrate treating method

Method of forming resist pattern

Method for fabricating spherical concave mirror in optical waveguide based on ultraviolet grayscale lithography

Imprinting method, semiconductor device manufacturing method and imprinting apparatus

COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD

Semiconductor device manufacturing system, semiconductor device inspection device, and semiconductor device manufacturing method

Apparatus for forming a photoresist layer, method for forming a masking layer, and method for forming a photoresist layer

Resist composition and patterning process

Lithography process method for defining sidewall morphology of lithography pattern

Method for coating parts in a dip centrifugation process

PROCESS CONTROL OF ELECTRIC FIELD GUIDED PHOTORESIST BAKING PROCESS

Bottom antireflective coating materials

Patterning process of a semiconductor structure with enhanced adhesion

Substrate processing apparatus and method

Resist composition and patterning process

Composition for forming silicon-containing resist underlayer film and patterning process

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

ORGANOMETALLIC METAL CHALCOGENIDE CLUSTERS AND APPLICATION TO LITHOGRAPHY

Substrate treating system and substrate transporting method

System and method of planarization control using a cross-linkable material

PHOTORESIST COMPOSITION FOR THICK FILM AND METHOD OF FORMING THICK FILM PHOTORESIST PATTERN

Method of operating drippage prevention system

Apparatus for treating substrate

Substrate treatment apparatus and method of performing treatment process on substrate

METHOD OF FORMING INSULATING LAYER

Acid-Labile, Crosslinked Polymers, Compositions and Methods of Their Use

Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and polymer

Positive resist composition and patterning process

Positive resist composition and patterning process

Nozzle apparatus, apparatus and method for treating substrate

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS

Directly photo-patternable, stretchable, electrically conductive polymer

Treatment condition setting method, storage medium, and substrate treatment system

Apparatus for treating substrate

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD

Positive resist composition and patterning process

Radiation-sensitive resin composition, resist pattern-forming method, compound, and method of controlling acid diffusion

Method for forming patterns

SALT, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Molecular resist composition and patterning process

Semiconductor device and method

Organotin oxide hydroxide patterning compositions, precursors, and patterning

Spin coater and semiconductor fabrication method for reducing regeneration of photoresist

Salt, quencher, resist composition and method for producing resist pattern

Spin-on inorganic oxide containing composition useful as hard masks and filling materials with improved thermal stability

METHOD AND APPARATUS FOR MULTIPLE RECIRCULATION AND FILTRATION CYCLES PER DISPENSE IN A PHOTORESIST DISPENSE SYSTEM

Optical control modules for integrated circuit device patterning and reticles and methods including the same

Processing apparatus and method thereof

Cup wash disk with shims

Substrate treatment method and substrate treatment apparatus

Underlayer material for photoresist

Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film

Negative type photosensitive siloxane composition and methods for producing cured film and electronic device using the same

RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION AND PRODUCTION METHOD THEREOF

Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film

ORGANOMETALLIC PHOTORESIST DEVELOPER COMPOSITIONS AND PROCESSING METHODS

Apparatus for dispensing liquid material and method for fabricating semiconductor device

A NEGATIVE TONE LIFT OFF RESIST COMPOSITION COMPRISING AN ALKALI SOLUBLE RESIN AND CROSS LINKERS AND A METHOD FOR MANUFACTURING METAL FILM PATTERNS ON A SUBSTRATE

Gap filling composition and pattern forming method using composition containing polymer

Method of forming patterned polyimide layer

PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT HAVING CURED FILM, ORGANIC EL DISPLAY, AND METHOD FOR MANUFACTURING ORGANIC EL DISPLAY

Method of forming an apparatus comprising perovskite

Compound, resin, resist composition and method for producing resist pattern

Pattern forming method, method for producing transistor, and member for pattern formation

Electroconductive film and method for manufacturing electroconductive pattern

Stepped substrate-coating composition containing polyether resin having photocrosslinkable group

Negative type photosensitive composition curable at low temperature

Resist composition and patterning process

SILSESQUIOXANE COMPOSITION WITH BOTH POSITIVE AND NEGATIVE PHOTO RESIST CHARACTERISTICS

Method for optical waveguide fabrication

Photolithography method and photolithography system

Polymer material, composition, and method of manufacturing semiconductor device

Pattern forming material, composition for pattern formation, pattern forming method and method of manufacturing semiconductor device

Positive resist composition and patterning process

Composition for resist underlayer film formation, resist underlayer film and forming method thereof, patterned substrate-producing method, and compound

Resist composition and patterning process

Optimal exposure of a bottom surface of a substrate material and/or edges thereof for cleaning in a spin coating device

Optimal exposure of a bottom surface of a substrate material and/or edges thereof for cleaning in a spin coating device

Temperature controlling apparatus

Semiconductor method of protecting wafer from bevel contamination

Substrate processing apparatus, method of adjusting parameters of coating module, and storage medium

Organotin oxide hydroxide patterning compositions, precursors, and patterning

COMPOUND, RESIN, COMPOSITION, PATTERN FORMATION METHOD, AND PURIFICATION METHOD

Backside metal patterning die singulation system and related methods

Resist composition and patterning process

Curable composition for imprinting, method of manufacturing cured product pattern, method of manufacturing circuit substrate, and cured product

Selective coating of a structure

Method of coating an object

Coating film forming method

Methods and apparatuses for coating photoresist

Resin, resist composition and method for producing resist pattern

Resin, resist composition and method for producing resist pattern

Crosslinkable compound-containing photocurable stepped substrate-coating composition

Alkaline developer soluable silicon-containing resist underlayer film-forming composition

CURABLE COMPOSITION, CURED FILM, SOLID-STATE IMAGING DEVICE, AND MANUFACTURING METHOD OF CURED FILM

PHOTORESIST DISPENSING MODULE AND PHOTORESIST COATING SYSTEM HAVING THE SAME

Apparatuses for reducing metal residue in edge bead region from metal-containing resists

Hardmask composition, hardmask layer and method of forming patterns

Resist underlying film forming composition

Photosensitive resin composition, laminate, and pattern forming process

PHOTOSENSITIVE RESIN COMPOSITION

METHOD OF PRODUCING MICROSTRUCTURE AND METHOD OF PRODUCING LIQUID EJECTION HEAD

METHOD FOR PREPARING MULTIPLAYER STRUCTURE

Hardmask composition, hardmask layer and method of forming patterns

Photosensitive resin composition, photosensitive dry film, and pattern forming process

Resist Composition and Resist Pattern Forming Method

Secondary electron generating composition

Composition, film, film-forming method and patterned substrate-producing method

Method and apparatus for multi-spray RRC process with dynamic control

RESIST UNDERLAYER FILM-FORMING COMPOSITION

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND

Positive resist composition and pattern forming process

Coating method

Enviromentally stable, thick film, chemically amplified resist

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND

Method of storing photoresist coated substrates and semiconductor substrate container arrangement

Resist pump buffer tank and method of resist defect reduction

Composition for forming resist underlayer film having improved flattening properties

Photosensitive resin composition and cured film

Radiation-sensitive composition and resist pattern-forming method

Resist composition and method of forming resist pattern

PHOTOCROSSLINKABLE FLUOROPOLYMER COATING COMPOSITION AND COATING LAYER FORMED THEREFROM

Siloxane polymer containing isocyanuric acid and polyether skeletons, photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device

Method and/or system for coating a substrate

METAL-CONTAINING FILM-FORMING COMPOSITION, METAL-CONTAINING FILM AND PATTERN-FORMING METHOD

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

Salt, quencher, resist composition and method for producing resist pattern

Salt compound, chemically amplified resist composition, and patterning process

FILM FORMING MATERIAL, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, MATERIAL FOR OPTICAL COMPONENT FORMATION, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, PERMANENT FILM FOR RESIST, RADIATION-SENSITIVE COMPOSITION, METHOD FOR PRODUCING AMORPHOUS FILM, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, AND CIRCUIT PATTERN FORMATION METHOD

Method for planarization of organic films

Method and apparatus for processing substrate

Composition for forming resist underlayer film, resist underlayer film, method for forming resist pattern and method for producing semiconductor device

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing solid-state imaging element

Resist composition and method of forming resist pattern

CURABLE COMPOSITION, CURED PRODUCT, COLOR FILTER, METHOD FOR PRODUCING COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE

Apparatus for dispensing liquid material and method for fabricating semiconductor device

Coating composition for forming resist underlayer film for EUV lithography process

Onium salt, negative resist composition, and resist pattern forming process

Composition for forming film protecting against aqueous hydrogen peroxide solution

Fluorine-containing polymer, purification method, and radiation-sensitive resin composition

Film forming apparatus, film forming method, and method of manufacturing article

Method for forming photoresist layer

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD

Coating and developing apparatus and coating and developing method

Coloring composition, cured film, pattern forming method, color filter, solid-state imaging element, and image display device

Method of patterning resist layer and method of forming semiconductor structure using patterned resist layer

Contamination handling for semiconductor apparatus

Adhesion layer for multi-layer photoresist

Portion of layer removal at substrate edge

PATTERNING PROCESS

POSITIVE PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNED POLYIMIDE LAYER

Photosensitive resin composition, polymer precursor, cured film, laminate, method for producing cured film, and semiconductor device

Resist composition and patterning process

Sulfonic acid derivative compounds as photoacid generators in resist applications

Composition of spin-on materials containing metal oxide nanoparticles and an organic polymer

CROSSLINKABLE COMPOSITIONS BASED ON ELECTROACTIVE FLUORINATED COPOLYMERS

Resist composition and method of forming resist pattern

Iodonium salt, resist composition, and pattern forming process

Semiconductor device and method

Method and system for prevention of metal contamination by using a self-assembled monolayer coating

Photosensitive middle layer

Polymer, positive resist composition, and method of forming resist pattern

Resist composition and patterning process

Substrate processing apparatus

Resin, resist composition and method for producing resist pattern

Modification of SNOsurface for EUV lithography

PROCESS FOR IMPROVING THE CRITICAL DIMENSION UNIFORMITY OF ORDERED FILMS OF BLOCK COPOLYMERS

Photomask having recessed region

Substrate processing method and recording medium capable of suppressing non-uniformity in degree of progression of processing depending on position on substrate

Resist solvents for photolithography applications

Priming material for organometallic resist

Resist composition and patterning process

Hard mask-forming composition and method for manufacturing electronic component

Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts

Photosensitive resin composition, cured pattern production method, cured product, interlayer insulating film, cover coat layer, surface protective layer, and electronic component

MICROREACTOR CHIP AND MANUFACTURING METHOD FOR SAME

Method and apparatus for manufacturing semiconductor structure

Chemically amplified positive-type photosensitive resin composition, method of manufacturing substrate with template, and method of manufacturing plated article

Semiconductor manufacturing apparatus and method thereof

Photosensitive resin composition and pattern forming process

RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Photosensitive resin composition, cured film, laminate, method for producing cured film, and semiconductor device

Priming material for substrate coating

Optimal exposure of a bottom surface of a substrate material and/or edges thereof for cleaning in a spin coating device

PHOTORESIST COMPOSITION FOR LINE DOUBLING

Colored film, manufacturing method of same, and solid-state imaging element

Fluidic leakage handling for semiconductor apparatus

Dispensing nozzle design and dispensing method thereof

Photoresist topcoat compositions and methods of processing photoresist compositions

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

Photolithography method and photolithography system

Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, carboxylic acid salt and carboxylic acid

Organic EL display device

Blocking layer material composition and methods thereof in semiconductor manufacturing

Resist composition, method of forming resist pattern, polymeric compound, and compound

Resist composition and method of forming resist pattern

Photoresist composition and method of forming photoresist pattern

Lithography composition, a method for forming resist patterns and a method for making semiconductor devices

Photosensitive resin composition, heterocyclic ring-containing polymer precursor, cured film, laminate, method for producing cured film, and semiconductor device

Resist composition and patterning process

Chemically amplified negative resist composition and resist pattern forming process

Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process

Resist composition, method of forming resist pattern, compound, and acid generator

Resist composition, method of forming resist pattern, compound, acid generator, and method of producing compound

Laminate, optical filter, solid image pickup element, image display device, infrared sensor, and kit

Resist underlayer film-forming composition containing amide solvent

Photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device

RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

Display panel manufacturing method and display panel

METHOD FOR PRODUCING NUCLEIC ACID ARRAY AND DEVICE FOR PRODUCING NUCLEIC ACID ARRAY

Permanent dielectric compositions containing photoacid generator and base