177051 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Coating processes; Apparatus therefor Monolayers, e.g. Langmuir-Blodgett
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, PATTERNING PROCESS, DISPLAY, AND MICRO-LED DISPLAY
#2METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING METAL-ORGANIC FRAMEWORK
#3Composition for Forming Organic Film, Method for Forming Organic Film and Patterning Process
#4RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE
#5PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE CURED FILM USING SAME, AND POLYIMIDE CURED FILM
#6MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNABLE DIELECTRIC INCLUDING HIGH SILICON CONTENT POLYSILSESQUIOXANE
#7METHOD FOR PRODUCING STRUCTURE HAVING PHASE-SEPARATED STRUCTURE
#8METHOD FOR MANUFACTURING ETCHING MASK PATTERN, AND RESIN COMPOSITION FOR FORMING ETCHING MASK PATTERN
#9FLOW CELLS
#10FABRICATION OF EUV MASKS USING A COMBINATION OF MONOLAYER LITHOGRAPHY AND AREA SELECTIVE DEPOSITION
#11Methods and related systems for depositing EUV sensitive films
#12Flow cells
#13LITHOGRAPHY APPARATUS WITH IMPROVED STABILITY
#14Flow cells
#15SUBSTRATE, A SUBSTRATE HOLDER, A SUBSTRATE COATING APPARATUS, A METHOD FOR COATING THE SUBSTRATE AND A METHOD FOR REMOVING THE COATING
#16Flow cells
#17Flow cells
#18Substrate processing method and substrate processing apparatus
#19Bottom-up conformal coating and photopatterning on PAG-immobilized surfaces
#20Surface treatment of titanium containing hardmasks
#21Method and system for prevention of metal contamination by using a self-assembled monolayer coating
#22Method for manufacturing graphitic sheet
#23Photoactive polymer brush materials and EUV patterning using the same
#24Method for imparting water repellency to substrate, surface treatment agent, and method for suppressing collapse of organic pattern or inorganic pattern in cleaning substrate surface with cleaning liquid
#25OPTOELECTRONIC DEVICE AND PROCESS OF PRODUCING AN OPTOELECTRONIC DEVICE
#26Surface treatment of titanium containing hardmasks
#27Nitrogen heterocycle-containing monolayers on metal oxides for binding biopolymers
#28Method for the preparation of a coating comprising oligomeric alkynes
#29Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning
#30Electronic devices with components formed by late binding using self-assembled monolayers
#31Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning
#32Method of negative tone development using a copolymer multilayer electrolyte and articles made therefrom
#33Method of negative tone development using a copolymer multilayer electrolyte and articles made therefrom
#34Block copolymer
#35Methods and apparatuses for directed self-assembly
#36Block copolymer
#37Block copolymer
#38High-chi block copolymers for interconnect structures by directed self-assembly
#39Materials and deposition schemes using photoactive materials for interface chemical control and patterning of predefined structures
#40Block copolymer
#41Block copolymer
#42Block copolymer
#43Method of manufacturing patterned substrate
#44Light irradiation device and method for patterning self assembled monolayer
#45Methods of forming patterns of semiconductor devices
#46Method of forming pattern of semiconductor device
#47Block copolymers and pattern treatment compositions and methods
#48Pattern forming method
#49Self-organization material and pattern formation method
#50Atomic layer chemical patterns for block copolymer assembly
#51Method for manufacturing patterned object, patterned object, and light irradiation apparatus
#522-dimensional patterning employing tone inverted graphoepitaxy
#53Compositions and methods for pattern treatment
#54Compositions and methods for pattern treatment
#55Pattern treatment methods
#56Pattern treatment methods
#57Method for producing a fiber having a pattern on a surface thereof
#58METHOD FOR DIRECTED SELF-ASSEMBLY (DSA) OF A BLOCK COPOLYMER (BCP) USING A TOPOGRAPHIC PATTERN
#59Composition for pattern formation, pattern-forming method, and block copolymer
#60Pattern forming method
#61Pattern formation method
#62Spin-on layer for directed self assembly with tunable neutrality
#63Use of topography to direct assembly of block copolymers in grapho-epitaxial applications
#64Copolymer formulation for directed self-assembly, methods of manufacture thereof and articles comprising the same
#65Masked cation exchange lithography
#66Methods of forming patterns
#67Method of forming fine pattern and method of manufacturing integrated circuit device using the method
#68Methods of forming patterns
#69HOMOADAMANTANE DERIVATIVE, METHOD FOR PRODUCING THE SAME AND PHOTOSENSITIVE MATERIALS FOR PHOTORESIST
#70Lenticular print three dimensional image display device and method of fabricing the same
#71Method of forming pattern and laminate
#72Methods for performing patterned chemistry
#73Block copolymer self-assembly for pattern density multiplication and rectification
#74Methods of providing patterned templates for self-assemblable block copolymers for use in device lithography
#75Block copolymers and lithographic patterning using same
#76Process for preparing transparent conductive coatings
#77Underlayer composition and method of imaging underlayer composition
#78Underlayer composition and method of imaging underlayer
#79Semiconductor device structures comprising a polymer bonded to a base material and methods of fabrication
#80Photopatternable imaging layers for controlling block copolymer microdomain orientation
#81Patterned fine particle film structures
#82Methods and devices for forming nanostructure monolayers and devices including such monolayers
#83Monolayer or multilayer forming composition
#84Methods for adhering materials, for enhancing adhesion between materials, and for patterning materials, and related semiconductor device structures
#85Method of forming pattern and laminate
#86Method for forming pattern and mask pattern, and method for manufacturing semiconductor device
#87Photopatternable imaging layers for controlling block copolymer microdomain orientation
#88Block copolymer materials for directed assembly of thin films
#89HOMOADAMANTANE DERIVATIVE, METHOD FOR PRODUCING THE SAME AND PHOTOSENSITIVE MATERIALS FOR PHOTORESIST
#90RADIATION SENSITIVE SELF-ASSEMBLED MONOLAYERS AND USES THEREOF
#91METHODS UTILIZING SCANNING PROBE MICROSCOPE TIPS AND PRODUCTS THEREFOR OR PRODUCED THEREBY
#92Templated monolayer polymerization and replication
#93Method of forming pattern
#94Method of forming pattern
#95Solvent annealing block copolymers on patterned substrates
#96Modified surface for block copolymer self-assembly
#97IMPRINT TEMPLATE FABRICATION AND REPAIR BASED ON DIRECTED BLOCK COPOLYMER ASSEMBLY
#98METHOD AND DEVICE FOR FORMING PATTERN
#99METHOD OF MAKING TOUCH-SENSITIVE DEVICE WITH ELECTRODES HAVING LOCATION PATTERN INCLUDED THEREIN
#100Patternable polymer block brush layers
#101Underlayer composition and method of imaging underlayer
#102Underlayer composition and method of imaging underlayer composition
#103Block copolymer and method of forming patterns by using the same
#104METHOD FOR NANOPATTERNING BASED ON SELF ASSEMBLY OF A TRIBLOCK TERPOLYMER
#105Method of forming fine pattern
#106Pattern formation method
#107Methods of forming patterns on substrates
#108Nano patterning method and methods for fabricating surface plasmon color filter and liquid crystal display device using the same
#109Substrate treatment to reduce pattern roughness
#110Methods of Fabricating a Microarray
#111Method and apparatus for the formation of an electronic device
#112Methods and devices for forming nanostructure monolayers and devices including such monolayers
#113Photosensitive self-assembled monolayer for selective placement of hydrophilic structures
#114Methods of directed self-assembly and layered structures formed therefrom
#115Methods of directed self-assembly and layered structures formed therefrom
#116Use of block copolymers for preparing conductive nanostructures
#117WATER-SOLUBLE DEGRADABLE PHOTO-CROSSLINKER
#118Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device
#119Directed material assembly
#120PHOTOPATTERNABLE IMAGING LAYERS FOR CONTROLLING BLOCK COPOLYMER MICRODOMAIN ORIENTATION
#121Methods utilizing scanning probe microscope tips and products thereof or produced thereby
#122Method of making BIOMEMS devices
#123Methods and devices for forming nanostructure monolayers and devices including such monolayers
#124Photosensitive self-assembled monolayer for selective placement of hydrophilic structures
#125Patterned fine particle film structures
#126Photopatternable imaging layers for controlling block copolymer microdomain orientation
#127Method for producing a mould for nanostructured polymer objects
#128Methods utilizing scanning probe microscope tips and products therefor or produced thereby
#129Methods utilizing scanning probe microscope tips and products therefor or produced thereby
#130Photosensitive self-assembled monolayer for selective placement of hydrophilic structures
#131Templated monolayer polymerization and replication
#132Photochemical method for manufacturing nanometrically surface-decorated substrates
#133FABRICATION OF INORGANIC MATERIALS USING TEMPLATES WITH LABILE LINKAGE
#134Materials and methods for creating imaging layers
#135Photosensitive self-assembled monolayer for selective placement of hydrophilic structures
#136GRAFT PATTERN FORMING METHOD AND CONDUCTIVE PATTERN FORMING METHOD
#137Methods of etching articles via microcontact printing
#138Radiation sensitive self-assembled monolayers and uses thereof
#139Photosensitive metal nanoparticle and method of forming conductive pattern using the same
#140Method for exposing photo-sensitive SAM film and method for manufacturing semiconductor device
#141METHOD FOR PATTERNING CONDUCTIVE POLYMER
#142Templated monolayer polymerization and replication
#143Nanolithography methods and products therefor and produced thereby
#144Method for high resolution patterning using soft X-ray, process for preparing nano device using the method
#145Radiation sensitive self-assembled monolayers and uses thereof
#146Method for imaging a lithographic printing form
#147Photosensitive silane coupling agent, method of modifying surface, method of forming pattern, and method of fabricating device
#148Photosensitive silane coupling agent, method of forming pattern, and method of fabricating device
#149Method of selective removal of organophosphonic acid molecules from their self-assembled monolayer on Si substrates
#150Method of forming fine particle pattern, and method of producing a device
#151Branching self-assembling photoresist with decomposable backbone
#152Molecular bonding method and molecular bonding device
#153METHODS OF RELEASING PHOTORESIST FILM FROM SUBSTRATE AND BONDING PHOTORESIST FILM WITH SECOND SUBSTRATE
#154Methods for modifying surfaces
#155Materials and methods for creating imaging layers
#156Patterning and alteration of molecules
#157Method of fixing low-molecular compound to solid-phase support
#158Compound used to form a self-assembled monolayer, layer structure, semiconductor component having a layer structure, and method for producing a layer structure
#159Micropatterning of molecular surfaces via selective irradiation
#160Patterning and alteration of molecules
#161Selectively growing a polymeric material on a semiconductor substrate
#162Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device
#163Self-assembling peptide surfaces for cell patterning and interactions
#164UV decomposable molecules and a photopatternable monomolecular film formed therefrom
#165Method of observing monolayer ultraviolet decomposition process, method of controlling degree of surface decomposition, and patterning method
#166Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device
#167Pattern forming method, arranged fine particle pattern forming method, conductive pattern forming method, and conductive pattern material
#168Pattern forming method, graft pattern material, conductive pattern forming method and conductive pattern material
#169Method of forming a pattern, conductive patterned material, and method of forming a conductive pattern
#170Surface graft material, conductive pattern material, and production method thereof
#171Method for forming pattern, thin film transistor, display device and method for manufacturing the same, and television apparatus
#172Nanolithography methods and products therefor and produced thereby
#173Methods utilizing scanning probe microscope tips and products therefor or produced thereby
#174Methods utilizing scanning probe microscope tips and products thereof or produced thereby
#175UV-activated dielectric layer
#176Photosensitive material for immersion photolithography
#177Photosensitive material for immersion photolithography
#178Method for forming a micro pattern, micro pattern, method for fabricating a mold for forming the micro pattern through transcription, and mold for forming the micro pattern through transcription
#179Methods of patterning a monolayer
#180Method of patterning a film layer