177068 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure; Apparatus therefor; Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction
Sub-classes:POLYMER MATERIAL-BASED METHOD FOR REMOVING METAL FILM LAYER FROM SURFACE OF SUBSTRATE AND PHOTOLITHOGRAPHY METHOD
#2MASK DATA PREPARATION METHOD, SEMICONDUCTOR CHIP MANUFACTURING METHOD USING THE SAME, AND COMPUTING DEVICE
#3LITHOGRAPHY SYSTEM AND METHODS
#4DEVELOPMENT FOR CHEMICALLY AMPLIFIED RESISTS
#5Method of Using and Fabricating a Nanoimprint Template with a Mesa Sidewall Coating
#6PHOTORESIST STRIPPER COMPOSITION AND METHOD FOR FORMING PATTERN USING THE SAME
#7FORMATION OF SUB-LITHOGRAPHIC MANDREL PATTERNS USING REVERSIBLE OVERCOAT
#8PHOTORESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SUBSTRATE PROCESSING DEVICE
#9PREFERENTIAL INFILTRATION IN LITHOGRAPHIC PROCESS FLOW FOR EUV CAR RESIST
#10LITHOGRAPHY SYSTEM AND METHODS
#11METHOD FOR ETCHING LITHIUM NIOBATE AND METHOD FOR FORMING LITHIUM NIOBATE PATTERN USING THE SAME
#12FLOW CELLS AND METHODS FOR MAKING THE SAME
#13Anisotropic Pattern Transfer Via Colloidal Lithography
#14METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD AND SYSTEM FOR EXPOSING SEMICONDUCTOR
#15EXTREME ULTRAVIOLET LITHOGRAPHY PATTERNING WITH ASSIST FEATURES
#16Lithography system and methods
#17Production of Three-Dimensional Structures by Means of Photoresists
#18Methods to reduce microbridge defects in EUV patterning for microelectronic workpieces
#19FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN
#20Method and process for stochastic driven detectivity healing
#21Bias correction for lithography
#22Exposure apparatus, method for controlling the same and article manufacturing method
#23Method of manufacturing semiconductor structure
#24WAFER DISTORTION MEASUREMENT AND OVERLAY CORRECTION
#25Bias correction for lithography
#26System and method for producing an optical mask for surface microtexturing, and surface microtexturing plant and method
#27Compact modeling for the negative tone development processes
#28Lithographic method and apparatus
#29Bias correction for lithography
#30Method for forming mask pattern, thin film transistor and method for forming the same, and display device
#31Lithographic method and apparatus
#32Multi-layer substrate, preparation method thereof and display device
#33Blade for Substrate Edge Protection During Photolithography
#34Double-mask photolithography method minimizing the impact of substrate defects
#35Reticles for use in forming implant masking layers and methods of forming implant masking layers
#36Method of forming pattern
#37Exposure method and exposure mask
#38Ink jet recording head and method of producing ink jet recording head
#39APPARATUS AND METHOD FOR EXPOSING EDGE OF SUBSTRATE
#40Processing method, manufacturing method of semiconductor device, and processing apparatus
#41Planarizing method
#42Processing method, manufacturing method of semiconductor device, and processing apparatus
#43Processing method, manufacturing method of semiconductor device, and processing apparatus
#44Apparatus and method for exposing edge of substrate
#45Edge exposure apparatus, coating and developing apparatus, and edge exposure method
#46Method for manipulating the topography of a film surface