177070 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure; Apparatus therefor; Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation
MASK, EXPOSURE METHOD AND TOUCH PANEL
#2THERMAL CONTROL METHOD FOR PATTERNING DEVICE
#3BATCH PROCESSING TOOL FOR DRY DEVELOP OF EXTREME ULTRA VIOLET (EUV) RESIST LAYER
#4DIGITAL BIASING AND DIGITAL CELL PLACEMENT TECHNIQUE FOR SEMICONDUCTOR PACKAGING
#5Lithography Using Spin Isolated Monochromatic Electromagnetic Radiation
#6APPARATUS AND METHOD FOR DETERMINING AN ANGULAR REFLECTIVITY PROFILE
#7METHOD AND APPARATUS FOR EXPOSURE OF FLEXOGRAPHIC PRINTING PLATES USING LIGHT EMITTING DIODE (LED) RADIATION SOURCES
#8MASK, EXPOSURE METHOD AND TOUCH PANEL
#9LENS ADJUSTMENT FOR AN EDGE EXPOSURE TOOL
#10METHOD FOR EXPOSURE OF RELIEF PRECURSORS WITH MULTIPLE PROFILES
#11LAMINATE FOR FORMING IMAGE AND MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE
#12LITHOGRAPHY STITCHING
#13METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#14CHARACTERIZATION OF PHOTOSENSITIVE MATERIALS
#15Film structure for electric field guided photoresist patterning process
#16Method and apparatus of patterning a semiconductor device
#17MICRONEEDLE, MICROCONE, AND PHOTOLITHOGRAPHY FABRICATION METHODS
#18Lens adjustment for an edge exposure tool
#19Mask, exposure method and touch panel
#20Multi-tone scheme for maskless lithography
#21Method and apparatus for exposure of flexographic printing plates using light emitting diode (LED) radiation sources
#22Methods and apparatus for forming resist pattern using EUV light with electric field
#23Two-stage bake photoresist with releasable quencher
#24Lens adjustment for an edge exposure tool
#25Underlayer material for photoresist
#26Device source wafers with patterned dissociation interfaces
#27PHOTORESIST-FREE PHOTOLITHOGRAPHY, PHOTOPROCESSING TOOLS, AND METHODS WITH VUV OR DEEP-UV LAMPS
#28Lithography Method With Reduced Impacts of Mask Defects
#29REDUCED FLOW RATE PROCESSING SYSTEM FOR FLEXOGRAPHIC PRINTING PLATE
#30Critical dimension (CD) uniformity of photoresist island patterns using alternating phase shifting mask
#31Method and process for stochastic driven detectivity healing
#32Method and apparatus for exposure of flexographic printing plates using light emitting diode (LED) radiation sources
#33Underlayer material for photoresist
#34Film structure for electric field guided photoresist patterning process
#35Device source wafers with patterned dissociation interfaces
#36Photoresist and manufacturing method of photoresist patterns
#37Critical dimension (CD) uniformity of photoresist island patterns using alternating phase shifting mask
#38Extreme ultraviolet photoresist and method
#39Performance improvement of EUV photoresist by ion implantation
#40Multiple patterning scheme integration with planarized cut patterning
#41Multiple patterning scheme integration with planarized cut patterning
#42Method and apparatus of patterning a semiconductor device
#43Method to achieve tilted patterning with a through resist thickness
#44Underlayer material for photoresist
#45Device source wafers with patterned dissociation interfaces
#46REDUCED FLOW RATE PROCESSING SYSTEM FOR FLEXOGRAPHIC PRINTING PLATES
#47Method for forming patterns
#48Liquid crystal polymer composition, liquid crystal display and method for manufacturing the same
#49Performance improvement of EUV photoresist by ion implantation
#50Two-stage bake photoresist with releasable quencher
#51Lithography method with reduced impacts of mask defects
#52Method for making a grating
#53Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists
#54Movable body apparatus, exposure apparatus, manufacturing method of flat-panel display and device manufacturing method, and movement method of object
#55Reticle and exposure method including projection of a reticle pattern into neighboring exposure fields
#56Resist patterning method, latent resist image forming device, resist patterning device, and resist material
#57Process and apparatus for controlled exposure of flexographic printing plates and adjusting the floor thereof
#58Method and structures for personalizing lithography
#59Phase shift mask
#60Photolithography method and system based on high step slope
#61Method for forming patterned structure
#62Ebeam three beam aperture array
#63Resist sensitivity and profile improvement via acid anion control during field-guided post exposure bake
#64Pattern manufacturing apparatus, pattern manufacturing method, and pattern manufacturing program
#65Method for producing a flexographic printing frame through multiple exposures using UV LEDS
#66Method for forming mask pattern, thin film transistor and method for forming the same, and display device
#67Method for fine line manufacturing
#68Exposure method, method of fabricating periodic microstructure, method of fabricating grid polarizing element and exposure apparatus
#69Method and apparatus for dynamic lithographic exposure
#70Method for patterning a substrate using extreme ultraviolet lithography
#71Ebeam three beam aperture array
#72Resist pattern-forming method
#73Chemically amplified resist material and resist pattern-forming method
#74RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SENSITIVE RESIN COMPOSITION
#75Chemically amplified resist material, pattern-forming method, compound, and production method of compound
#76Resist-pattern-forming method and chemically amplified resist material
#77Method and apparatus of patterning a semiconductor device
#78Liquid crystal polymer composition, liquid crystal display and method for manufacturing the same
#79Color filter pattern and manufacturing method thereof
#80Method of patterning thin films
#81Method for producing conductive member, and conductive member
#82Illumination system and method of forming fin structure using the same
#83Mask plate, photo-alignment method and liquid crystal display device
#84REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES
#85Reagent for enhancing generation of chemical species
#86Photomask and method of forming fine pattern using the same
#87REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES
#88Reagent for enhancing generation of chemical species
#89Alternating space decomposition in circuit structure fabrication
#90Photomask and method of forming the same and methods of manufacturing electronic device and display device using the photomask
#91Resist pattern forming method, coating and developing apparatus and storage medium
#92Digital grey tone lithography for 3D pattern formation
#93Resist patterning method, latent resist image forming device, resist patterning device, and resist material
#94Methods for small trench patterning using chemical amplified photoresist compositions
#95Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists
#96REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES
#97Photolithography method and system based on high step slope
#98Apparatus and method of direct writing with photons beyond the diffraction limit using two-color resist
#99Method for integrated circuit fabrication
#100Optical wavelength dispersion device and method of manufacturing the same
#101Reagent for enhancing generation of chemical species
#102Block copolymer self-assembly for pattern density multiplication and rectification
#103Use of grapho-epitaxial directed self-assembly to precisely cut lines
#104Reagent for enhancing generation of chemical species
#105Methods for making differentially pattern cured microstructured articles
#106Two mask process for electroplating metal employing a negative electrophoretic photoresist
#107Liquid crystal polymer composition, liquid crystal display and method for manufacturing the same
#108Two mask process for electroplating metal employing a negative electrophoretic photoresist
#109Patterning process and resist composition
#110Layout decomposition method and method for manufacturing semiconductor device applying the same
#111Method of forming tight-pitched pattern
#112Layout decomposition method and method for manufacturing semiconductor device applying the same
#113Hybrid photoresist composition and pattern forming method using thereof
#114Methods for small trench patterning using chemical amplified photoresist compositions
#115Method of forming tight-pitched pattern
#116Exposure device
#117Oleophobic ink jet orifice plate
#118Mask set for double exposure process and method of using the mask set
#119Semiconductor fabrication utilizing grating and trim masks
#120Method of fabricating a polarized color filter
#121Lithography method and apparatus
#122Drawing method and method of manufacturing article
#123Methods for small trench patterning using chemical amplified photoresist compositions
#124Multiple exposure with image reversal in a single photoresist layer
#125Hybrid photoresist composition and pattern forming method using thereof
#126Optical wavelength dispersion device and method of manufacturing the same
#127Method of forming patterns of semiconductor device
#128Photolithographic method
#129Method for fabricating patterned layer
#130PHOTO-RESIST AND METHOD OF PHOTOLITHOGRAPHY
#131Photolithographic apparatus
#132Patterning process and resist composition
#133Methods of lithographically patterning a substrate
#134METHOD FOR MAKING A CONDUCTIVE LAMINATE
#135Dynamic masking method for micro-truss foam fabrication
#136Method for forming pattern and method for manufacturing display device by using the same
#137Method of forming resist pattern
#138Pattern forming method, method for producing electronic device using the same, and electronic device
#139Patterning process and resist composition
#140Double patterning mask set and method of forming thereof
#141Cross-linked polymer based hydrogel material compositions, methods and applications
#142Exposure method for color filter substrate
#143Patterning process
#144UV curing creating flattop and roundtop structures on a single printing plate
#145Exposure method and exposure device
#146METHOD FOR MANUFACTURING STRUCTURE
#147Multiple lithographic system mask shape sleeving
#148Hybrid lithographic method for fabricating complex multidimensional structures
#149IMPRINT TEMPLATE FABRICATION AND REPAIR BASED ON DIRECTED BLOCK COPOLYMER ASSEMBLY
#150Method for forming a microstructure
#151Diffraction unlimited photolithography
#152Decomposition with multiple exposures in a process window based OPC flow using tolerance bands
#153Method for forming convex pattern, exposure apparatus and photomask
#154Methods of forming photolithographic patterns
#155Method to fabricate a redirecting mirror in optical waveguide devices
#156Dynamic masking method for micro-truss foam fabrication
#157Method of producing a relief image arrangement usable in particular in the field of flexography and arrangement produced according to this method
#158Dual wavelength exposure method and system for semiconductor device manufacturing
#159Method of forming a pattern of an array of shapes including a blocked region
#160Intensity selective exposure method and apparatus
#161Method to mitigate resist pattern critical dimension variation in a double-exposure process
#162LITHOGRAPHIC MACHINE PLATFORM AND APPLICATIONS THEREOF
#163METHOD FOR PATTERN FORMATION
#164Method of designing sets of mask patterns, sets of mask patterns, and device manufacturing method
#165Methods of Double Patterning, Photo Sensitive Layer Stack for Double Patterning and System for Double Patterning
#166Method of making a pillar pattern using triple or quadruple exposure
#167FILM-FORMING COMPOSITION, METHOD FOR PATTERN FORMATION, AND THREE-DIMENSIONAL MOLD
#168System and method for photolithography in semiconductor manufacturing
#169RESOLUTION ENHANCEMENT TECHNIQUES COMBINING INTERFERENCE-ASSISTED LITHOGRAPHY WITH OTHER PHOTOLITHOGRAPHY TECHNIQUES
#170Methods of lithographically patterning a substrate
#171System and method for absorbance modulation lithography
#172Multi-tone resist compositions
#173Method of manufacturing photosensitive epoxy structure using photolithography process and method of manufacturing inkjet printhead using the method of manufacturing photosensitive epoxy structure
#174Method for translating a structured beam of energetic particles across a substrate in template mask lithography
#175Method to fabricate a redirecting mirror in optical waveguide devices
#176Spiral spring made of athermal glass for clockwork movement and method for making same
#177PATTERN FORMING METHOD
#178METHOD AND TEST-STRUCTURE FOR DETERMINING AN OFFSET BETWEEN LITHOGRAPHIC MASKS
#179Method of double patterning a thin film using a developable anti-reflective coating and a developable organic planarization layer
#180METHOD OF PATTERNING CONTACT HOLES
#181Method for fabricating recess pattern in semiconductor device
#182Beam illumination system and method for producing printing plates
#183Method for multiple irradiation of a resist
#184Method and apparatus for patterning micro and nano structures using a mask-less process
#185Manufacturing method of semiconductor device, and wafer and manufacturing method thereof
#186Method to form photo patterns
#187Lithography process to reduce interference
#188Substrate, method of exposing a substrate, machine readable medium
#189Substrate, method of exposing a substrate, machine readable medium
#190System and method for photolithography in semiconductor manufacturing
#191Double exposure method and photomask for same
#192Patterning and alteration of molecules
#193Method and apparatus for a post exposure bake of a resist
#194Exposure apparatus and exposing method and method of manufacturing a printed wiring board
#195Mask for light exposure
#196Method for forming patterned insulating elements and methods for making electron source and image display device
#197System and method for absorbance modulation lithography
#198Method for producing an exposed substrate
#199Mask pattern and method for forming resist pattern using mask pattern thereof
#200Patterning and alteration of molecules
#201Beam illumination system and method for producing printing plates
#202Scanner system
#203Method and systems to print contact hole patterns
#204Methods of performing a photolithography process for forming asymmetric patterns and methods of forming a semiconductor device using the same
#205Multiple level photolithography
#206Ozone-assisted lithography process with image enhancement for CPP head manufacturing
#207Method to selectively correct critical dimension errors in the semiconductor industry
#208Method of reducing the impact of stray light during optical lithography, devices obtained thereof and masks used therewith
#209Methods for adjusting light intensity for photolithography and related systems
#210Plasma display panel producing method, and plasma display panel
#211Plasma display panel manufacturing method
#212Systems and methods for sub-wavelength imaging
#213Plating method
#214Process for fabricating supersphere solid immersion lens
#215Process for preparing a flexographic printing plate
#216Method for forming openings in a substrate using a packing and unpacking process
#217Photomask and manufacturing method of semiconductor device
#218High resolution lithography system and method
#219Composite patterning with trenches
#220Composite optical lithography method for patterning lines of substantially equal width
#221Method for fabricating complex three-dimensional structures on the submicrometric scale by combined lithography of two resists
#222Method of manufacturing a semiconductor device
#223Method for manufacturing ceramic green sheet and method for manufacturing electronic part using that ceramic green sheet
#224Method for forming patterned insulating elements and methods for making electron source and image display device
#225Critical dimension (CD) uniformity of photoresist island patterns using alternating phase shifting mask