ClassID:

177070

G03F7/203 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure; Apparatus therefor; Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation

Recent Application in this class:
#1
20260133482
2026-05-14

MASK, EXPOSURE METHOD AND TOUCH PANEL

#2
20260118776
2026-04-30

THERMAL CONTROL METHOD FOR PATTERNING DEVICE

#3
20260099096
2026-04-09

BATCH PROCESSING TOOL FOR DRY DEVELOP OF EXTREME ULTRA VIOLET (EUV) RESIST LAYER

#4
20260029708
2026-01-29

DIGITAL BIASING AND DIGITAL CELL PLACEMENT TECHNIQUE FOR SEMICONDUCTOR PACKAGING

#5
20250362614
2025-11-27

Lithography Using Spin Isolated Monochromatic Electromagnetic Radiation

#6
20250237962
2025-07-24

APPARATUS AND METHOD FOR DETERMINING AN ANGULAR REFLECTIVITY PROFILE

#7
20240369934
2024-11-07

METHOD AND APPARATUS FOR EXPOSURE OF FLEXOGRAPHIC PRINTING PLATES USING LIGHT EMITTING DIODE (LED) RADIATION SOURCES

#8
20240345470
2024-10-17

MASK, EXPOSURE METHOD AND TOUCH PANEL

#9
20240085798
2024-03-14

LENS ADJUSTMENT FOR AN EDGE EXPOSURE TOOL

#10
20240061340
2024-02-22

METHOD FOR EXPOSURE OF RELIEF PRECURSORS WITH MULTIPLE PROFILES

#11
20230333479
2023-10-19

LAMINATE FOR FORMING IMAGE AND MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE

#12
20230324805
2023-10-12

LITHOGRAPHY STITCHING

#13
20230290858
2023-09-14

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

#14
20230259035
2023-08-17

CHARACTERIZATION OF PHOTOSENSITIVE MATERIALS

#15
20230229089
2023-07-20

Film structure for electric field guided photoresist patterning process

#16
20220365437
2022-11-17

Method and apparatus of patterning a semiconductor device

#17
20220347450
2022-11-03

MICRONEEDLE, MICROCONE, AND PHOTOLITHOGRAPHY FABRICATION METHODS

#18
20220342318
2022-10-27

Lens adjustment for an edge exposure tool

#19
20220342295
2022-10-27

Mask, exposure method and touch panel

#20
20220326616
2022-10-13

Multi-tone scheme for maskless lithography

#21
20220269178
2022-08-25

Method and apparatus for exposure of flexographic printing plates using light emitting diode (LED) radiation sources

#22
20220244646
2022-08-04

Methods and apparatus for forming resist pattern using EUV light with electric field

#23
20220216065
2022-07-07

Two-stage bake photoresist with releasable quencher

#24
20220214621
2022-07-07

Lens adjustment for an edge exposure tool

#25
20220187711
2022-06-16

Underlayer material for photoresist

#26
20220085235
2022-03-17

Device source wafers with patterned dissociation interfaces

#27
20210333711
2021-10-28

PHOTORESIST-FREE PHOTOLITHOGRAPHY, PHOTOPROCESSING TOOLS, AND METHODS WITH VUV OR DEEP-UV LAMPS

#28
20210208505
2021-07-08

Lithography Method With Reduced Impacts of Mask Defects

#29
20210096467
2021-04-01

REDUCED FLOW RATE PROCESSING SYSTEM FOR FLEXOGRAPHIC PRINTING PLATE

#30
20210055659
2021-02-25

Critical dimension (CD) uniformity of photoresist island patterns using alternating phase shifting mask

#31
20210048749
2021-02-18

Method and process for stochastic driven detectivity healing

#32
20200341378
2020-10-29

Method and apparatus for exposure of flexographic printing plates using light emitting diode (LED) radiation sources

#33
20200333710
2020-10-22

Underlayer material for photoresist

#34
20200233307
2020-07-23

Film structure for electric field guided photoresist patterning process

#35
20200168760
2020-05-28

Device source wafers with patterned dissociation interfaces

#36
20200150536
2020-05-14

Photoresist and manufacturing method of photoresist patterns

#37
20200142313
2020-05-07

Critical dimension (CD) uniformity of photoresist island patterns using alternating phase shifting mask

#38
20200133124
2020-04-30

Extreme ultraviolet photoresist and method

#39
20200096870
2020-03-26

Performance improvement of EUV photoresist by ion implantation

#40
20200066526
2020-02-27

Multiple patterning scheme integration with planarized cut patterning

#41
20200066525
2020-02-27

Multiple patterning scheme integration with planarized cut patterning

#42
20200064740
2020-02-27

Method and apparatus of patterning a semiconductor device

#43
20200064738
2020-02-27

Method to achieve tilted patterning with a through resist thickness

#44
20190265590
2019-08-29

Underlayer material for photoresist

#45
20190229231
2019-07-25

Device source wafers with patterned dissociation interfaces

#46
20190204745
2019-07-04

REDUCED FLOW RATE PROCESSING SYSTEM FOR FLEXOGRAPHIC PRINTING PLATES

#47
20190187562
2019-06-20

Method for forming patterns

#48
20190155083
2019-05-23

Liquid crystal polymer composition, liquid crystal display and method for manufacturing the same

#49
20190056914
2019-02-21

Performance improvement of EUV photoresist by ion implantation

#50
20190043731
2019-02-07

Two-stage bake photoresist with releasable quencher

#51
20190033720
2019-01-31

Lithography method with reduced impacts of mask defects

#52
20180373153
2018-12-27

Method for making a grating

#53
20180315596
2018-11-01

Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists

#54
20180275532
2018-09-27

Movable body apparatus, exposure apparatus, manufacturing method of flat-panel display and device manufacturing method, and movement method of object

#55
20180267408
2018-09-20

Reticle and exposure method including projection of a reticle pattern into neighboring exposure fields

#56
20180231892
2018-08-16

Resist patterning method, latent resist image forming device, resist patterning device, and resist material

#57
20180210345
2018-07-26

Process and apparatus for controlled exposure of flexographic printing plates and adjusting the floor thereof

#58
20180203341
2018-07-19

Method and structures for personalizing lithography

#59
20180196348
2018-07-12

Phase shift mask

#60
20180188652
2018-07-05

Photolithography method and system based on high step slope

#61
20180149978
2018-05-31

Method for forming patterned structure

#62
20180143526
2018-05-24

Ebeam three beam aperture array

#63
20180107117
2018-04-19

Resist sensitivity and profile improvement via acid anion control during field-guided post exposure bake

#64
20180088471
2018-03-29

Pattern manufacturing apparatus, pattern manufacturing method, and pattern manufacturing program

#65
20180004093
2018-01-04

Method for producing a flexographic printing frame through multiple exposures using UV LEDS

#66
20170365684
2017-12-21

Method for forming mask pattern, thin film transistor and method for forming the same, and display device

#67
20170336710
2017-11-23

Method for fine line manufacturing

#68
20170261847
2017-09-14

Exposure method, method of fabricating periodic microstructure, method of fabricating grid polarizing element and exposure apparatus

#69
20170212423
2017-07-27

Method and apparatus for dynamic lithographic exposure

#70
20170090290
2017-03-30

Method for patterning a substrate using extreme ultraviolet lithography

#71
20170076905
2017-03-16

Ebeam three beam aperture array

#72
20170075224
2017-03-16

Resist pattern-forming method

#73
20170075221
2017-03-16

Chemically amplified resist material and resist pattern-forming method

#74
20170059992
2017-03-02

RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SENSITIVE RESIN COMPOSITION

#75
20170052449
2017-02-23

Chemically amplified resist material, pattern-forming method, compound, and production method of compound

#76
20170052448
2017-02-23

Resist-pattern-forming method and chemically amplified resist material

#77
20170032961
2017-02-02

Method and apparatus of patterning a semiconductor device

#78
20170023819
2017-01-26

Liquid crystal polymer composition, liquid crystal display and method for manufacturing the same

#79
20170023712
2017-01-26

Color filter pattern and manufacturing method thereof

#80
20160363865
2016-12-15

Method of patterning thin films

#81
20160345439
2016-11-24

Method for producing conductive member, and conductive member

#82
20160299433
2016-10-13

Illumination system and method of forming fin structure using the same

#83
20160202559
2016-07-14

Mask plate, photo-alignment method and liquid crystal display device

#84
20160195808
2016-07-07

REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES

#85
20160187773
2016-06-30

Reagent for enhancing generation of chemical species

#86
20160170295
2016-06-16

Photomask and method of forming fine pattern using the same

#87
20160147144
2016-05-26

REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES

#88
20160145274
2016-05-26

Reagent for enhancing generation of chemical species

#89
20160124308
2016-05-05

Alternating space decomposition in circuit structure fabrication

#90
20160109794
2016-04-21

Photomask and method of forming the same and methods of manufacturing electronic device and display device using the photomask

#91
20160085154
2016-03-24

Resist pattern forming method, coating and developing apparatus and storage medium

#92
20160033867
2016-02-04

Digital grey tone lithography for 3D pattern formation

#93
20160004160
2016-01-07

Resist patterning method, latent resist image forming device, resist patterning device, and resist material

#94
20150331324
2015-11-19

Methods for small trench patterning using chemical amplified photoresist compositions

#95
20150241782
2015-08-27

Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists

#96
20150241779
2015-08-27

REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES

#97
20150227048
2015-08-13

Photolithography method and system based on high step slope

#98
20150185617
2015-07-02

Apparatus and method of direct writing with photons beyond the diffraction limit using two-color resist

#99
20150162204
2015-06-11

Method for integrated circuit fabrication

#100
20150153648
2015-06-04

Optical wavelength dispersion device and method of manufacturing the same

#101
20150141687
2015-05-21

Reagent for enhancing generation of chemical species

#102
20150118625
2015-04-30

Block copolymer self-assembly for pattern density multiplication and rectification

#103
20150108087
2015-04-23

Use of grapho-epitaxial directed self-assembly to precisely cut lines

#104
20150099893
2015-04-09

Reagent for enhancing generation of chemical species

#105
20150079521
2015-03-19

Methods for making differentially pattern cured microstructured articles

#106
20150060266
2015-03-05

Two mask process for electroplating metal employing a negative electrophoretic photoresist

#107
20150002774
2015-01-01

Liquid crystal polymer composition, liquid crystal display and method for manufacturing the same

#108
20140242524
2014-08-28

Two mask process for electroplating metal employing a negative electrophoretic photoresist

#109
20140242518
2014-08-28

Patterning process and resist composition

#110
20140213066
2014-07-31

Layout decomposition method and method for manufacturing semiconductor device applying the same

#111
20140205955
2014-07-24

Method of forming tight-pitched pattern

#112
20140134543
2014-05-15

Layout decomposition method and method for manufacturing semiconductor device applying the same

#113
20140072916
2014-03-13

Hybrid photoresist composition and pattern forming method using thereof

#114
20140065552
2014-03-06

Methods for small trench patterning using chemical amplified photoresist compositions

#115
20140057211
2014-02-27

Method of forming tight-pitched pattern

#116
20130308111
2013-11-21

Exposure device

#117
20130298402
2013-11-14

Oleophobic ink jet orifice plate

#118
20130280645
2013-10-24

Mask set for double exposure process and method of using the mask set

#119
20130256844
2013-10-03

Semiconductor fabrication utilizing grating and trim masks

#120
20130244145
2013-09-19

Method of fabricating a polarized color filter

#121
20130215406
2013-08-22

Lithography method and apparatus

#122
20130196517
2013-08-01

Drawing method and method of manufacturing article

#123
20130155381
2013-06-20

Methods for small trench patterning using chemical amplified photoresist compositions

#124
20130129991
2013-05-23

Multiple exposure with image reversal in a single photoresist layer

#125
20130122421
2013-05-16

Hybrid photoresist composition and pattern forming method using thereof

#126
20130114928
2013-05-09

Optical wavelength dispersion device and method of manufacturing the same

#127
20130089986
2013-04-11

Method of forming patterns of semiconductor device

#128
20130084532
2013-04-04

Photolithographic method

#129
20130084530
2013-04-04

Method for fabricating patterned layer

#130
20130084526
2013-04-04

PHOTO-RESIST AND METHOD OF PHOTOLITHOGRAPHY

#131
20130083302
2013-04-04

Photolithographic apparatus

#132
20130071788
2013-03-21

Patterning process and resist composition

#133
20130059255
2013-03-07

Methods of lithographically patterning a substrate

#134
20130045362
2013-02-21

METHOD FOR MAKING A CONDUCTIVE LAMINATE

#135
20130033689
2013-02-07

Dynamic masking method for micro-truss foam fabrication

#136
20130017637
2013-01-17

Method for forming pattern and method for manufacturing display device by using the same

#137
20130017500
2013-01-17

Method of forming resist pattern

#138
20130004739
2013-01-03

Pattern forming method, method for producing electronic device using the same, and electronic device

#139
20120328987
2012-12-27

Patterning process and resist composition

#140
20120295186
2012-11-22

Double patterning mask set and method of forming thereof

#141
20120288479
2012-11-15

Cross-linked polymer based hydrogel material compositions, methods and applications

#142
20120287525
2012-11-15

Exposure method for color filter substrate

#143
20120270159
2012-10-25

Patterning process

#144
20120266767
2012-10-25

UV curing creating flattop and roundtop structures on a single printing plate

#145
20120258390
2012-10-11

Exposure method and exposure device

#146
20120208130
2012-08-16

METHOD FOR MANUFACTURING STRUCTURE

#147
20120183889
2012-07-19

Multiple lithographic system mask shape sleeving

#148
20120164587
2012-06-28

Hybrid lithographic method for fabricating complex multidimensional structures

#149
20120164389
2012-06-28

IMPRINT TEMPLATE FABRICATION AND REPAIR BASED ON DIRECTED BLOCK COPOLYMER ASSEMBLY

#150
20120114903
2012-05-10

Method for forming a microstructure

#151
20120092632
2012-04-19

Diffraction unlimited photolithography

#152
20110271238
2011-11-03

Decomposition with multiple exposures in a process window based OPC flow using tolerance bands

#153
20110244379
2011-10-06

Method for forming convex pattern, exposure apparatus and photomask

#154
20110159253
2011-06-30

Methods of forming photolithographic patterns

#155
20110136063
2011-06-09

Method to fabricate a redirecting mirror in optical waveguide devices

#156
20110090480
2011-04-21

Dynamic masking method for micro-truss foam fabrication

#157
20100316957
2010-12-16

Method of producing a relief image arrangement usable in particular in the field of flexography and arrangement produced according to this method

#158
20100308439
2010-12-09

Dual wavelength exposure method and system for semiconductor device manufacturing

#159
20100272967
2010-10-28

Method of forming a pattern of an array of shapes including a blocked region

#160
20100261118
2010-10-14

Intensity selective exposure method and apparatus

#161
20100255428
2010-10-07

Method to mitigate resist pattern critical dimension variation in a double-exposure process

#162
20100233437
2010-09-16

LITHOGRAPHIC MACHINE PLATFORM AND APPLICATIONS THEREOF

#163
20100055626
2010-03-04

METHOD FOR PATTERN FORMATION

#164
20100021827
2010-01-28

Method of designing sets of mask patterns, sets of mask patterns, and device manufacturing method

#165
20090219496
2009-09-03

Methods of Double Patterning, Photo Sensitive Layer Stack for Double Patterning and System for Double Patterning

#166
20090170030
2009-07-02

Method of making a pillar pattern using triple or quadruple exposure

#167
20090155546
2009-06-18

FILM-FORMING COMPOSITION, METHOD FOR PATTERN FORMATION, AND THREE-DIMENSIONAL MOLD

#168
20090136876
2009-05-28

System and method for photolithography in semiconductor manufacturing

#169
20090117491
2009-05-07

RESOLUTION ENHANCEMENT TECHNIQUES COMBINING INTERFERENCE-ASSISTED LITHOGRAPHY WITH OTHER PHOTOLITHOGRAPHY TECHNIQUES

#170
20090092933
2009-04-09

Methods of lithographically patterning a substrate

#171
20090087798
2009-04-02

System and method for absorbance modulation lithography

#172
20090068589
2009-03-12

Multi-tone resist compositions

#173
20090047605
2009-02-19

Method of manufacturing photosensitive epoxy structure using photolithography process and method of manufacturing inkjet printhead using the method of manufacturing photosensitive epoxy structure

#174
20090042137
2009-02-12

Method for translating a structured beam of energetic particles across a substrate in template mask lithography

#175
20090020499
2009-01-22

Method to fabricate a redirecting mirror in optical waveguide devices

#176
20090016173
2009-01-15

Spiral spring made of athermal glass for clockwork movement and method for making same

#177
20090011362
2009-01-08

PATTERN FORMING METHOD

#178
20080192253
2008-08-14

METHOD AND TEST-STRUCTURE FOR DETERMINING AN OFFSET BETWEEN LITHOGRAPHIC MASKS

#179
20080171293
2008-07-17

Method of double patterning a thin film using a developable anti-reflective coating and a developable organic planarization layer

#180
20080085598
2008-04-10

METHOD OF PATTERNING CONTACT HOLES

#181
20080081296
2008-04-03

Method for fabricating recess pattern in semiconductor device

#182
20080030569
2008-02-07

Beam illumination system and method for producing printing plates

#183
20070264595
2007-11-15

Method for multiple irradiation of a resist

#184
20070224548
2007-09-27

Method and apparatus for patterning micro and nano structures using a mask-less process

#185
20070134598
2007-06-14

Manufacturing method of semiconductor device, and wafer and manufacturing method thereof

#186
20070092844
2007-04-26

Method to form photo patterns

#187
20070087291
2007-04-19

Lithography process to reduce interference

#188
20070072133
2007-03-29

Substrate, method of exposing a substrate, machine readable medium

#189
20070072097
2007-03-29

Substrate, method of exposing a substrate, machine readable medium

#190
20070048678
2007-03-01

System and method for photolithography in semiconductor manufacturing

#191
20070003841
2007-01-04

Double exposure method and photomask for same

#192
20070000866
2007-01-04

Patterning and alteration of molecules

#193
20060269879
2006-11-30

Method and apparatus for a post exposure bake of a resist

#194
20060215143
2006-09-28

Exposure apparatus and exposing method and method of manufacturing a printed wiring board

#195
20060204863
2006-09-14

Mask for light exposure

#196
20060194156
2006-08-31

Method for forming patterned insulating elements and methods for making electron source and image display device

#197
20060183059
2006-08-17

System and method for absorbance modulation lithography

#198
20060141385
2006-06-29

Method for producing an exposed substrate

#199
20060141372
2006-06-29

Mask pattern and method for forming resist pattern using mask pattern thereof

#200
20060138083
2006-06-29

Patterning and alteration of molecules

#201
20060132592
2006-06-22

Beam illumination system and method for producing printing plates

#202
20060132590
2006-06-22

Scanner system

#203
20060110694
2006-05-25

Method and systems to print contact hole patterns

#204
20060099538
2006-05-11

Methods of performing a photolithography process for forming asymmetric patterns and methods of forming a semiconductor device using the same

#205
20060050255
2006-03-09

Multiple level photolithography

#206
20060024618
2006-02-02

Ozone-assisted lithography process with image enhancement for CPP head manufacturing

#207
20060019412
2006-01-26

Method to selectively correct critical dimension errors in the semiconductor industry

#208
20060019179
2006-01-26

Method of reducing the impact of stray light during optical lithography, devices obtained thereof and masks used therewith

#209
20060003240
2006-01-05

Methods for adjusting light intensity for photolithography and related systems

#210
20050215162
2005-09-29

Plasma display panel producing method, and plasma display panel

#211
20050215161
2005-09-29

Plasma display panel manufacturing method

#212
20050202352
2005-09-15

Systems and methods for sub-wavelength imaging

#213
20050202346
2005-09-15

Plating method

#214
20050196708
2005-09-08

Process for fabricating supersphere solid immersion lens

#215
20050196701
2005-09-08

Process for preparing a flexographic printing plate

#216
20050181313
2005-08-18

Method for forming openings in a substrate using a packing and unpacking process

#217
20050164129
2005-07-28

Photomask and manufacturing method of semiconductor device

#218
20050147921
2005-07-07

High resolution lithography system and method

#219
20050085085
2005-04-21

Composite patterning with trenches

#220
20050073671
2005-04-07

Composite optical lithography method for patterning lines of substantially equal width

#221
20050064343
2005-03-24

Method for fabricating complex three-dimensional structures on the submicrometric scale by combined lithography of two resists

#222
20050048410
2005-03-03

Method of manufacturing a semiconductor device

#223
20050045268
2005-03-03

Method for manufacturing ceramic green sheet and method for manufacturing electronic part using that ceramic green sheet

#224
20050019707
2005-01-27

Method for forming patterned insulating elements and methods for making electron source and image display device

#225
16133869
2019-12-31

Critical dimension (CD) uniformity of photoresist island patterns using alternating phase shifting mask