ClassID:

177072

G03F7/2035 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure; Apparatus therefor simultaneous coating and exposure; using a belt mask, e.g. endless

Recent Application in this class:
#1
20220004104
2022-01-06

Method and apparatus for post exposure processing of photoresist wafers

#2
20210399708
2021-12-23

Etching and thinning for the fabrication of lithographically patterned diamond nanostructures

#3
20190187563
2019-06-20

Method and apparatus for post exposure processing of photoresist wafers

#4
20180188652
2018-07-05

Photolithography method and system based on high step slope

#5
20180188645
2018-07-05

Photomask, laminate comprising photomask, photomask preparation method, pattern forming apparatus using photomask and pattern forming method using photomask

#6
20170363960
2017-12-21

Method and apparatus for post exposure processing of photoresist wafers

#7
20170306103
2017-10-26

Lock-Release Polymerization

#8
20170293226
2017-10-12

Exposure method, exposure equipment and 3-D structure

#9
20170154797
2017-06-01

Method and apparatus for post exposure processing of photoresist wafers

#10
20160313645
2016-10-27

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, method for manufacturing electronic device, and electronic device

#11
20160041469
2016-02-11

METHOD FOR PATTERNING PHOTOSENSITIVE RESIN LAYER

#12
20150227048
2015-08-13

Photolithography method and system based on high step slope

#13
20150077727
2015-03-19

Coating and developing apparatus, method of operating the same and storage medium

#14
20140240683
2014-08-28

Focus position adjusting apparatus, reticle, focus position adjusting program, and method of manufacturing semiconductor device

#15
20140152966
2014-06-05

Facility and method for treating substrate

#16
20130329209
2013-12-12

Mask, exposure apparatus and device manufacturing method

#17
20130316152
2013-11-28

Photoimaging

#18
20130209939
2013-08-15

Integrated membrane lamination and UV exposure system and method of the same

#19
20120274004
2012-11-01

Nanopatterning method and apparatus

#20
20120135235
2012-05-31

Lock-release polymerization

#21
20120099615
2012-04-26

Laser induced thermal imaging mask, laser irradiation apparatus including the same, and method of manufacturing organic light emitting device by using the same

#22
20110204175
2011-08-25

Transfer device

#23
20110151630
2011-06-23

Display element manufacturing method and manufacturing apparatus, thin film transistor manufacturing method and manufacturing apparatus, and circuit forming apparatus

#24
20110006464
2011-01-13

Fluidic channel system and method for fabricating fine structure

#25
20100229790
2010-09-16

TRANSFER METHOD AND TRANSFER APPARATUS

#26
20100172898
2010-07-08

MICROSTRUCTURE SYNTHESIS BY FLOW LITHOGRAPHY AND POLYMERIZATION

#27
20100155974
2010-06-24

Device for producing structured optical materials

#28
20100099048
2010-04-22

Stop flow interference lithography system

#29
20100035163
2010-02-11

Fabrication of nanostructured devices

#30
20100015409
2010-01-21

PHOTOIMAGING METHOD AND APPARATUS

#31
20090170014
2009-07-02

Mask, exposure apparatus and device manufacturing method

#32
20090162799
2009-06-25

Method and system for fabricating three-dimensional structures with sub-micron and micron features

#33
20090121065
2009-05-14

Transfer device

#34
20070205525
2007-09-06

Method for producing structures in optoelectronic components and device for this purpose

#35
20070105972
2007-05-10

Microstructure synthesis by flow lithography and polymerization

#36
20050196707
2005-09-08

Patterned conductive coatings

#37
20050170293
2005-08-04

Exposure apparatus

#38
20050151944
2005-07-14

Patterning apparatus and method for fabricating continuous pattern using the same