177074 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure; Apparatus therefor; Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation X-ray radiation
POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE RESIST COMPOSITION
#2ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN-FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
#3OPTICAL BEAM SENSOR WITH CENTER TRANSMISSIVE CUT-OUT
#4SEMICONDUCTOR DEVICE MANUFACTURING METHOD, X-RAY DIFFRACTION DEVICE AND SEMICONDUCTOR PATTERN TRANSFER SYSTEM
#5Quantum-limited extreme ultraviolet coherent diffraction imaging
#63D/flip/motion photo-substrate, imaging processes, and applications thereof
#7Sulfonium salt, photoacid generator, curable composition, and resist composition
#8RADIATION-SENSITIVE RESIN COMPOSITION, CURED FILM, PATTERN FORMING METHOD, SOLID-STATE IMAGING DEVICE, AND IMAGE DISPLAY DEVICE
#9Method for producing a scattered beam collimator, scattered beam collimator and x-ray device with scattered beam collimator
#10PHOTORESIST COMPOSITIONS AND METHODS OF FORMING RESIST PATTERNS WITH SUCH COMPOSITIONS
#11Method and apparatus for determining a radiation beam intensity profile
#123D/FLIP/MOTION PHOTO-SUBSTRATE, IMAGING PROCESSES, AND APPLICATIONS THEREOF
#13PHOTOSENSITIVE COMPOSITION, CURED FILM, OPTICAL FILTER, LAMINATE, PATTERN FORMING METHOD, SOLID IMAGE PICKUP ELEMENT, IMAGE DISPLAY DEVICE, AND INFRARED SENSOR
#14Silsesquioxane resin and oxaamine composition
#15Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compound
#16Optical systems, metrology apparatus and associated method
#17Lithography patterning with a gas phase resist
#18Female mold and method for manufacturing the same
#19Radiation-sensitive resin composition, cured film, pattern forming method, solid-state imaging device, and image display device
#20Curable composition, method of manufacturing curable composition, film, infrared cut filter, infrared transmitting filter, pattern forming method, and device
#21Resist composition, method for forming resist pattern, and polyphenol compound used therein
#22Resist composition and patterning process using the same
#23Reflection mask and pattern formation method
#24Conductive composition, antistatic film, laminate and production therefor, and production method for photomask
#25Multi-pass patterning using nonreflecting radiation lithography on an underlying grating
#26CONTROLLING DIMENSIONS OF NANOWIRES
#27Method for patterning a substrate using extreme ultraviolet lithography
#28Method for manufacturing patterned object, patterned object, and light irradiation apparatus
#29Patterning method, and template for nanoimprint and producing method thereof
#30Reagent and composition of resist
#31Positive resist composition and patterning process
#32Actinic ray-sensitive or radiation-sensitive resin composition, resist film, resist-coated mask blank, photomask and pattern forming method, and method for producing electronic device using them, and electronic device
#33Systems and methods for synchronous operation of debris-mitigation devices
#34Photo acid generator, chemically amplified resist composition, and patterning process
#35Projection patterning with exposure mask
#36Transport system for an extreme ultraviolet light source
#37Pre-patterned hard mask for ultrafast lithographic imaging
#38Method for lithography patterning
#39Optical wavelength dispersion device and method of manufacturing the same
#40Oxime Ester Photoinitiators
#41Actinic ray-sensitive or radiation-sensitive composition, and resist film, resist-coated mask blanks, resist pattern forming method and photomask each using the composition
#42Developer for photosensitive resist material and patterning process
#43Developer for photosensitive resist material and patterning process
#44Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method
#45Pre-patterned hard mask for ultrafast lithographic imaging
#46Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device
#47Actinic-ray- or radiation sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern
#48Positive resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition
#49Chemical amplification resist composition, resist film using the composition, resist-coated mask blanks, resist pattern forming method, photomask and polymer compound
#50Polymerizable fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern-forming method using same
#51Optical wavelength dispersion device and method of manufacturing the same
#52Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method
#53Resist composition, method of forming resist pattern and polymeric compound
#54Resist composition and patterning process
#55Nitrogen-containing monomer, polymer, resist composition, and patterning process
#56Polymer, method for producing the same, and resist composition containing the same
#57Method for improving electron-beam
#58Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith
#59Method for manufacturing micro structure using X-ray exposure
#60Self-powered lithography method and apparatus using radioactive thin films
#61Oxime ester photoinitiators
#62Method for high resolution patterning using soft X-ray, process for preparing nano device using the method
#63Methods for reducing spherical aberration effects in photolithography
#64Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the same
#65Methods for reducing spherical aberration effects in photolithography
#66X-ray multi-layer mirror and x-ray exposure apparatus
#67Exposure focus leveling method using region-differentiated focus scan patterns