177076 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means with the production of a chemical active agent from a fluid, e.g. an etching agent; with meterial deposition from the fluid phase, e.g. contamination resists
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
#2DEVELOPING METHOD, DEVELOPING APPARATUS, AND STORAGE MEDIUM
#3CONDUCTIVE POST WITH FOOTING PROFILE
#4MULTIPATTERNING WITH CROSSLINKABLE OVERCOAT
#5SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION
#6METHOD TO REDUCE DEFECTS POST-SEQUENTIAL INFILTRATION SYNTHESIS
#7SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
#8DEPOSITION DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE USING THE SAME
#9PHOTOMASK PROCESSING APPARATUS AND METHOD OF PROCESSING PHOTOMASK
#10METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS
#11Optical device manufacturing method and manufacturing apparatus using local etching
#12METHOD FOR FORMING CONTINUOUS LINE-END TO LINE-END SPACES WITH SPACER ASSISTED LITHOGRAPHY-ETCH-LITHOGRAPHY ETCH PROCESSES
#13COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND
#14Task completion in a tracking device environment
#15Method for etching curved substrate
#16FILM-FORMING COMPOSITION
#17APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
#18NANOSTRUCTURE-BASED SUBSTRATE FOR SURFACE-ENHANCED RAMAN SPECTROSCOPY, AND MANUFACTURING METHOD THEREFOR
#19Fabricating method of reducing photoresist footing
#20Nanoimprint and etch fabrication of optical devices
#21PATTERN FORMING MATERIAL AND PATTERN FORMING METHOD
#22Task completion in a tracking device environment
#23Flow cells and methods for making the same
#24Nanoscale Etching of Light Absorbing Materials using Light and an Electron Donor Solvent
#25Apparatus and method for metrology
#26Method and apparatus for fabrication of very large scale integration pattern features via electroless deposition on extreme ultraviolet lithography photomasks
#27Task completion in a tracking device environment
#28Method for selective delamination and transfer of thin film using liquid platform
#29LIQUID EJECTION DEVICE WITH DAMPENING DEVICE
#30Methods of forming variable-depth device structures
#31Extreme ultraviolet light generation apparatus and electronic device manufacturing method
#32Inorganic-infiltrated polymer hybrid thin film resists for advanced lithography
#33SUBSTRATE FOR TOUCH SCREEN PANEL, TOUCH SCREEN PANEL HAVING SAME AND MANUFACTURING METHOD THEREOF
#34Apparatus and method for repairing a photolithographic mask
#35Method and apparatus for determining width-to-length ratio of channel region of thin film transistor
#36Salt compound, chemically amplified resist composition, and patterning process
#37Chemical supply structure and a developing apparatus having the same
#38Method and system to monitor a process apparatus
#39Cover glass of display panel and a manufacturing method thereof
#40SELF-SUPPORT ELECTROWETTING DISPLAY AND PREPARATION METHOD THEREFOR
#41Nanoscale etching of light absorbing materials using light and an electron donor solvent
#42Aqueous solution for resist pattern coating and pattern forming methods using the same
#43Pattern forming material and pattern forming method
#44Method and system to monitor a process apparatus
#45Lithography apparatus, a method of manufacturing a device and a control program
#46Apparatus and method for metrology
#47POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE TYPE PLANOGRAPHIC PRINTING PLATE PRECURSOR, AND METHOD OF PREPARING PLANOGRAPHIC PRINTING PLATE
#48PHOTORESIST AND ETCHING METHOD
#49Resist pattern forming method, semiconductor apparatus using said method, and exposure apparatus thereof
#50Display substrate
#51Lithography apparatus and method of manufacturing a device
#52Method of patterning a thin film
#53Particle-Beam Induced Processing Using Liquid Reactants
#54Resist pattern forming method, semiconductor apparatus using said method, and exposure apparatus thereof
#55Ultraviolet/Ozone Patterned Organosilane Surfaces
#56Coatings
#57Resist pattern forming method, semiconductor apparatus using said method, and exposure apparatus thereof
#58Pattern formation method
#59Method and device for fabricating nano-structure with patterned particle beam
#60Use of ion implantation in chemical etching
#61Lithographic apparatus, device manufacturing method and substrate
#62Optical apparatus, lithographic apparatus and device manufacturing method
#63Patterning of Substrates with Metal-Containing Particles
#64Methods and apparatus for selective, oxidative patterning of a surface
#65Maskless photolithography for etching and deposition
#66Maskless photolithography for using photoreactive agents
#67Pattern formation method
#68Resist pattern forming method, semiconductor apparatus using said method, and exposure apparatus thereof
#69Magnetic recording write head with spin-torque oscillator (STO) and extended seed layer