G03F7/3007 - CPC Classification Index

ClassID:

177096 ⎘

G03F7/3007 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Processing photosensitive materials; Apparatus therefor; Imagewise removal using liquid means combined with electrical means, e.g. force fields

Recent Application in this class:

20200356000

RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD

20190354010

RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD

20170326869

System for reducing ablation debris

20160222518

Anisotropic etching of metallic substrates

20160026089

MASK PLATE AND MANUFACTURING METHOD THEREOF

20150375170

Treatment solution supply method, treatment solution supply apparatus, and non-transitory computer-readable recording medium

20080220380

Enhancing photoresist performance using electric fields

20070298350

Method and apparatus for development of lithographic printing plate precursor

20050074706

Enhancing photoresist performance using electric fields