177098 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Processing photosensitive materials; Apparatus therefor; Imagewise removal using liquid means from a wafer supported on a rotating chuck
Sub-classes:SUBSTRATE TREATING METHOD
#2SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD
#3LIQUID PROCESSING APPARATUS
#4DEVELOPING APPARATUS, DEVELOPING METHOD, AND COMPUTER PROGRAM
#5Lithography Process and Material for Negative Tone Development
#6Integrated Processing Equipment
#7METHOD OF OPERATING DRIPPAGE PREVENTION SYSTEM
#8SUBSTRATE PROCESSING APPARATUS
#9SUBSTRATE PROCESSING APPARATUS
#10APPARATUS AND METHOD FOR PROCESSING SUBSTRATE
#11SPIN COATER
#12Nozzle, substrate processing apparatus, and substrate processing method
#13SUBSTRATE ROTATING APPARATUS, SUBSTRATE PROCESSING SYSTEM INCLUDING THE SAME, AND SUBSTRATE PROCESSING METHOD USING THE SAME
#14APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE
#15SUBSTRATE TREATING APPARATUS
#16Spin dispenser module substrate surface protection system
#17Substrate processing method, micropattern forming method, and substrate processing apparatus
#18Developing method and apparatus
#19Method and apparatus to develop lithographically defined high aspect ratio interconnects
#20Wafer cleaning apparatus and wafer cleaning method using the same
#21Lithography process and material for negative tone development
#22METHOD FOR IMPROVING UNIFORMITY OF PHOTORESIST DEVELOPMENT
#23Film processing method
#24SUBSTRATE TREATMENT APPARATUS
#25Developing treatment method and developing treatment apparatus
#26Method of operating drippage prevention system
#27Nozzle apparatus, apparatus and method for treating substrate
#28Processing apparatus and method thereof
#29Apparatus for dispensing liquid material and method for fabricating semiconductor device
#30Developing method
#31Implanting method and apparatus
#32Chemical supply structure and a developing apparatus having the same
#33Apparatus for dispensing liquid material and method for fabricating semiconductor device
#34Developer critical dimension control with pulse development
#35Substrate processing apparatus
#36Substrate processing method and recording medium capable of suppressing non-uniformity in degree of progression of processing depending on position on substrate
#37Developing method, computer-readable storage medium and developing apparatus
#38Coating and developing method and coating and developing apparatus
#39Substrate processing method and substrate processing apparatus
#40Developing method
#41Treatment liquid and pattern forming method
#42Method and apparatus to develop lithographically defined high aspect ratio interconnects
#43Developer critical dimension control with pulse development
#44Developing method
#45Treatment solution supply apparatus and substrate treatment system
#46Developing method, developing apparatus, and computer-readable recording medium
#47Developing method
#48Liquid processing apparatus
#49Substrate processing apparatus and substrate processing method
#50Chemical liquid discharge mechanism, liquid processing apparatus, chemical liquid discharge method, and storage medium
#51Drippage prevention system and method of operating same
#52Film processing unit and substrate processing apparatus
#53Film processing unit, substrate processing apparatus and substrate processing method
#54Unit for supplying liquid, apparatus for treating a substrate, and method for treating a substrate
#55Substrate processing apparatus, substrate processing method and recording medium
#56Process recipe evaluation method, storage medium, assisting device for process recipe evaluation, and liquid processing apparatus
#57SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND RECORDING MEDIUM
#58Spin dispenser module substrate surface protection system
#59Coating and developing method and coating and developing apparatus
#60Treatment solution supply apparatus
#61Substrate treating method
#62Liquid processing apparatus and liquid processing method
#63Substrate processing apparatus and substrate processing method
#64Substrate treating apparatus
#65Liquid processing method, memory medium and liquid processing apparatus
#66Substrate processing apparatus
#67Developing method
#68Development method, development device, and non-transitory computer-readable storage medium
#69Photolithographic patterning of organic electronic devices
#70Methods for providing lithography features on a substrate by self-assembly of block copolymers
#71METHOD FOR FORMING NEGATIVE TONE PATTERN, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION
#72Substrate processing method, substrate processing apparatus, and non-transitory computer-readable medium
#73Developing treatment method, non-transitory computer storage medium and developing treatment apparatus
#74Developing method, developing apparatus and storage medium
#75Developing apparatus, developing method and storage medium
#76Coloring composition, film, color filter, pattern forming method, method of manufacturing color filter, solid image pickup element, and infrared sensor
#77Substrate processing apparatus and substrate processing method
#78Negative developing method and negative developing apparatus
#79Developing method
#80Liquid treatment apparatus and method and non-transitory storage medium
#81Developing method, computer-readable storage medium and developing apparatus
#82Developing method, developing apparatus and storage medium
#83Developing method, developing apparatus, and recording medium
#84Liquid processing method and storage medium
#85Developing method, developing apparatus, and computer-readable recording medium
#86Chemical liquid discharge mechanism, liquid processing apparatus, chemical liquid discharge method, and storage medium
#87Treatment solution supply method, treatment solution supply apparatus, and non-transitory computer-readable recording medium
#88Developing unit with multi-switch exhaust control for defect reduction
#89Substrate processing method, program, computer-readable storage medium, and substrate processing system
#90Tool and method of developing
#91Developing apparatus and developing method
#92Liquid treatment method, substrate processing apparatus and non-transitory storage medium
#93Spin dispenser module substrate surface protection system
#94Device for machining a substrate and a method for this purpose
#95Processing liquid supplying apparatus, processing liquid supplying method and storage medium
#96Developing apparatus
#97Spin treatment apparatus
#98Spin treatment apparatus
#99Developing apparatus, developing method and storage medium
#100Developing method, developing apparatus and storage medium
#101Method for manufacturing semiconductor device
#102Developing method for developing apparatus
#103Coating and developing apparatus and method, and storage medium
#104Substrate processing method, substrate processing apparatus and non-transitory storage medium
#105Substrate processing apparatus
#106Single motor-driven gravure cylinder chuck mechanism
#107Method and apparatus for drying a wafer
#108Treatment solution supply apparatus, treatment solution supply method, and computer storage medium
#109Facility and method for treating substrate
#110Developing treatment apparatus and developing treatment method
#111Processing cup and substrate processing apparatus
#112Substrate processing apparatus and substrate processing method
#113Apparatus and method for developing process
#114Liquid treatment apparatus and method and non-transitory storage medium
#115Arrangement for the production of structured substrates
#116Semiconductor development apparatus and method using same
#117Method and apparatus for drying a wafer
#118Substrate processing apparatus
#119MULTIPLE CHEMICAL TREATMENT PROCESS FOR REDUCING PATTERN DEFECT
#120Liquid processing method
#121Coating method
#122Substrate transport method, substrate transport apparatus, and coating and developing system
#123Substrate cleaning method and substrate cleaning apparatus
#124DEVELOPING METHOD AND APPARATUS USING ORGANIC-SOLVENT CONTAINING DEVELOPER
#125Developing treatment method
#126SUBSTRATE PROCESSING DEVICE AND METHOD
#127Developing method
#128Substrate treatment method, computer storage medium and substrate treatment apparatus
#129SUBSTRATE EDGE TREATMENT FOR COATER/DEVELOPER
#130Coating and developing apparatus, coating and developing method and non-transitory tangible medium
#131Coating and developing apparatus, coating and developing method and non-transitory tangible medium
#132Coating and developing apparatus and method, and storage medium
#133Liquid processing apparatus, liquid processing method and storage medium
#134Developer spraying device for reducing usage quantity of developer
#135Coating and developing apparatus and method, and storage medium
#136Non-transitory storage medium for rinsing or developing sequence
#137Developing apparatus, developing method and storage medium
#138Developing apparatus, developing method and storage medium
#139Coating and developing apparatus, developing method and non-transitory medium
#140Developing treatment method, program, computer storage medium and developing treatment system
#141Process Solutions Containing Surfactants
#142Developing apparatus and developing method
#143DEVELOPING TREATMENT METHOD AND COMPUTER-READABLE STORAGE MEDIUM
#144Developing device and developing method
#145Developing apparatus, developing method and storage medium
#146Coating and developing apparatus and coating and developing method
#147Substrate developing method, substrate processing method and developing solution supply nozzle
#148Developing apparatus, resist pattern forming method and storage medium
#149Developing apparatus and developing method
#150Process solutions containing surfactants
#151Substrate heating apparatus and method and coating and developing system
#152Developing apparatus, developing method, and storage medium
#153APPARATUS FOR REDUCING COST OF DEVELOPER AND THE METHOD THEREOF
#154SEMICONDUCTOR CLEANING METHOD AND APPARATUS AND CONTROLLING METHOD OF THE SAME
#155Developing method
#156Developing apparatus and developing method
#157SUBSTRATE TREATING METHOD, SUBSTRATE-PROCESSING APPARATUS, DEVELOPING METHOD, METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE, AND METHOD OF CLEANING A DEVELOPING SOLUTION NOZZLE
#158Liquid processing apparatus and liquid processing method
#159Substrate processing method and apparatus
#160Liquid processing apparatus, liquid processing method and storage medium
#161SUBSTRATE TREATMENT APPARATUS
#162Developing method and developing apparatus
#163METHOD AND APPARATUS FOR RESIST DEVELOPMENT
#164Coating/developing apparatus and method
#165Coating apparatus and method
#166Substrate cleaning method and developing apparatus
#167Substrate cleaning method and substrate cleaning apparatus
#168Pattern forming method and a semiconductor device manufacturing method
#169DI water rinse of photoresists with insoluble dye content
#170System and Method for Performing High Flow Rate Dispensation of a Chemical onto a Photolithographic Component
#171Development device and development method
#172DEVELOPING APPARATUS
#173Method of developing a substrate and apparatus for performing the same
#174Developing method, developing apparatus and storage medium
#175Developing apparatus, developing method and storage medium
#176Developing apparatus and developing method
#177Rinse treatment method and development process method
#178Coater/developer, coating/developing method, and storage medium
#179Method for heating a chemically amplified resist layer carried on a rotating substrate
#180Registration detection system
#181Coating/developing apparatus and pattern forming method
#182Substrate developing method and developing apparatus
#183Resist pattern forming method
#184Development processing device
#185Surface Microstructuring Device
#186Substrate developing method, substrate processing method and developing solution supply nozzle
#187Coating and developing system, coating and developing method and storage medium
#188Method and apparatus for rinsing a substrate during lithographic development processing
#189Process Solutions Containing Surfactants
#190SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#191Dynamic Puddle Developing Process
#192Liquid processing apparatus
#193Methods to reduce the minimum pitch in a pattern
#194Developing method and method for fabricating semiconductor device using the developing method
#195Substrate edge treatment for coater/developer
#196Semiconductor development apparatus and method using same
#197Developing device and developing method
#198Developing apparatus and developing method
#199Coater/developer and coating/developing method
#200Processing liquid coating apparatus and a processing liquid coating method
#201Coater/developer and coating/developing method
#202Substrate processing method and apparatus thereof
#203Yield and line width performance for liquid polymers and other materials
#204Method of controlling substrate processing apparatus and substrate processing apparatus
#205Substrate processing apparatus and substrate processing method
#206Development apparatus and development method
#207Yield and line width performance for liquid polymers and other materials
#208Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method
#209Developing treatment apparatus and developing treatment method
#210Process solutions containing surfactants
#211Process solutions containing surfactants
#212Substrate heating apparatus and method and coating and developing system
#213Coating and developing system
#214Developing method and apparatus for performing development processing properly and a solution processing method enabling enhanced uniformity in the processing
#215Pattern forming method and a semiconductor device manufacturing method
#216Apparatus for processing substrate and method of processing the same
#217Substrate rotation type treatment apparatus
#218Apparatus for and method of processing substrate
#219Developing treatment apparatus
#220Substrate processing method
#221Substrate cleaning method and developing apparatus
#222Developing method of photoresist and developing device
#223Substrate processing system, coating/developing apparatus, and substrate processing apparatus
#224Resist pattern forming apparatus and method thereof
#225Substrate processing device, substrate processing method, and developing device
#226Acetylenic diol ethylene oxide/propylene oxide adducts and processes for their manufacture
#227Chemical liquid apparatus and deaerating method
#228Pattern formation method
#229Apparatus for processing substrate and method of processing the same
#230Developing solution supply nozzle with stirrer
#231Substrate treatment apparatus
#232Apparatus for processing substrate and method of processing the same
#233Yield and line width performance for liquid polymers and other materials
#234Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle
#235Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method
#236Method for developing processing and apparatus for supplying developing solution
#237Developer dispensing apparatus with adjustable knife ring
#238Method of controlling removal of photoresist in openings of a photoresist mask
#239Apparatus and method for dispensing developer onto semiconductor substrate