ClassID:

177098

G03F7/3021 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Processing photosensitive materials; Apparatus therefor; Imagewise removal using liquid means from a wafer supported on a rotating chuck

Sub-classes:
Recent Application in this class:
#1
20260072352
2026-03-12

SUBSTRATE TREATING METHOD

#2
20260064004
2026-03-05

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD

#3
20250379069
2025-12-11

LIQUID PROCESSING APPARATUS

#4
20250314959
2025-10-09

DEVELOPING APPARATUS, DEVELOPING METHOD, AND COMPUTER PROGRAM

#5
20250138428
2025-05-01

Lithography Process and Material for Negative Tone Development

#6
20250085638
2025-03-13

Integrated Processing Equipment

#7
20240342745
2024-10-17

METHOD OF OPERATING DRIPPAGE PREVENTION SYSTEM

#8
20240339334
2024-10-10

SUBSTRATE PROCESSING APPARATUS

#9
20240079251
2024-03-07

SUBSTRATE PROCESSING APPARATUS

#10
20230350304
2023-11-02

APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

#11
20230333467
2023-10-19

SPIN COATER

#12
20230185199
2023-06-15

Nozzle, substrate processing apparatus, and substrate processing method

#13
20230046060
2023-02-16

SUBSTRATE ROTATING APPARATUS, SUBSTRATE PROCESSING SYSTEM INCLUDING THE SAME, AND SUBSTRATE PROCESSING METHOD USING THE SAME

#14
20230008351
2023-01-12

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE

#15
20220390859
2022-12-08

SUBSTRATE TREATING APPARATUS

#16
20220288627
2022-09-15

Spin dispenser module substrate surface protection system

#17
20220208558
2022-06-30

Substrate processing method, micropattern forming method, and substrate processing apparatus

#18
20220146942
2022-05-12

Developing method and apparatus

#19
20220091511
2022-03-24

Method and apparatus to develop lithographically defined high aspect ratio interconnects

#20
20220084812
2022-03-17

Wafer cleaning apparatus and wafer cleaning method using the same

#21
20210389674
2021-12-16

Lithography process and material for negative tone development

#22
20210349393
2021-11-11

METHOD FOR IMPROVING UNIFORMITY OF PHOTORESIST DEVELOPMENT

#23
20210233784
2021-07-29

Film processing method

#24
20210134617
2021-05-06

SUBSTRATE TREATMENT APPARATUS

#25
20210063885
2021-03-04

Developing treatment method and developing treatment apparatus

#26
20210016316
2021-01-21

Method of operating drippage prevention system

#27
20210001357
2021-01-07

Nozzle apparatus, apparatus and method for treating substrate

#28
20200341390
2020-10-29

Processing apparatus and method thereof

#29
20200326626
2020-10-15

Apparatus for dispensing liquid material and method for fabricating semiconductor device

#30
20200241421
2020-07-30

Developing method

#31
20200218156
2020-07-09

Implanting method and apparatus

#32
20200150539
2020-05-14

Chemical supply structure and a developing apparatus having the same

#33
20200133130
2020-04-30

Apparatus for dispensing liquid material and method for fabricating semiconductor device

#34
20200089188
2020-03-19

Developer critical dimension control with pulse development

#35
20200064741
2020-02-27

Substrate processing apparatus

#36
20200050111
2020-02-13

Substrate processing method and recording medium capable of suppressing non-uniformity in degree of progression of processing depending on position on substrate

#37
20190391496
2019-12-26

Developing method, computer-readable storage medium and developing apparatus

#38
20190332013
2019-10-31

Coating and developing method and coating and developing apparatus

#39
20190295862
2019-09-26

Substrate processing method and substrate processing apparatus

#40
20190294049
2019-09-26

Developing method

#41
20190258168
2019-08-22

Treatment liquid and pattern forming method

#42
20190204744
2019-07-04

Method and apparatus to develop lithographically defined high aspect ratio interconnects

#43
20190121316
2019-04-25

Developer critical dimension control with pulse development

#44
20190107780
2019-04-11

Developing method

#45
20190076763
2019-03-14

Treatment solution supply apparatus and substrate treatment system

#46
20190056666
2019-02-21

Developing method, developing apparatus, and computer-readable recording medium

#47
20190049848
2019-02-14

Developing method

#48
20190049845
2019-02-14

Liquid processing apparatus

#49
20190041754
2019-02-07

Substrate processing apparatus and substrate processing method

#50
20180350633
2018-12-06

Chemical liquid discharge mechanism, liquid processing apparatus, chemical liquid discharge method, and storage medium

#51
20180333738
2018-11-22

Drippage prevention system and method of operating same

#52
20180315625
2018-11-01

Film processing unit and substrate processing apparatus

#53
20180315623
2018-11-01

Film processing unit, substrate processing apparatus and substrate processing method

#54
20180314158
2018-11-01

Unit for supplying liquid, apparatus for treating a substrate, and method for treating a substrate

#55
20180284616
2018-10-04

Substrate processing apparatus, substrate processing method and recording medium

#56
20180239257
2018-08-23

Process recipe evaluation method, storage medium, assisting device for process recipe evaluation, and liquid processing apparatus

#57
20180157178
2018-06-07

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND RECORDING MEDIUM

#58
20180117621
2018-05-03

Spin dispenser module substrate surface protection system

#59
20180088466
2018-03-29

Coating and developing method and coating and developing apparatus

#60
20180065065
2018-03-08

Treatment solution supply apparatus

#61
20180052394
2018-02-22

Substrate treating method

#62
20180047592
2018-02-15

Liquid processing apparatus and liquid processing method

#63
20180044795
2018-02-15

Substrate processing apparatus and substrate processing method

#64
20180025921
2018-01-25

Substrate treating apparatus

#65
20180019112
2018-01-18

Liquid processing method, memory medium and liquid processing apparatus

#66
20180012780
2018-01-11

Substrate processing apparatus

#67
20170343899
2017-11-30

Developing method

#68
20170285481
2017-10-05

Development method, development device, and non-transitory computer-readable storage medium

#69
20170222147
2017-08-03

Photolithographic patterning of organic electronic devices

#70
20170200638
2017-07-13

Methods for providing lithography features on a substrate by self-assembly of block copolymers

#71
20170199455
2017-07-13

METHOD FOR FORMING NEGATIVE TONE PATTERN, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION

#72
20170102616
2017-04-13

Substrate processing method, substrate processing apparatus, and non-transitory computer-readable medium

#73
20170090292
2017-03-30

Developing treatment method, non-transitory computer storage medium and developing treatment apparatus

#74
20170090291
2017-03-30

Developing method, developing apparatus and storage medium

#75
20170045821
2017-02-16

Developing apparatus, developing method and storage medium

#76
20170023858
2017-01-26

Coloring composition, film, color filter, pattern forming method, method of manufacturing color filter, solid image pickup element, and infrared sensor

#77
20160289839
2016-10-06

Substrate processing apparatus and substrate processing method

#78
20160282722
2016-09-29

Negative developing method and negative developing apparatus

#79
20160195811
2016-07-07

Developing method

#80
20160161867
2016-06-09

Liquid treatment apparatus and method and non-transitory storage medium

#81
20160154311
2016-06-02

Developing method, computer-readable storage medium and developing apparatus

#82
20160070171
2016-03-10

Developing method, developing apparatus and storage medium

#83
20160062240
2016-03-03

Developing method, developing apparatus, and recording medium

#84
20160054653
2016-02-25

Liquid processing method and storage medium

#85
20160026087
2016-01-28

Developing method, developing apparatus, and computer-readable recording medium

#86
20160008840
2016-01-14

Chemical liquid discharge mechanism, liquid processing apparatus, chemical liquid discharge method, and storage medium

#87
20150375170
2015-12-31

Treatment solution supply method, treatment solution supply apparatus, and non-transitory computer-readable recording medium

#88
20150294862
2015-10-15

Developing unit with multi-switch exhaust control for defect reduction

#89
20150241787
2015-08-27

Substrate processing method, program, computer-readable storage medium, and substrate processing system

#90
20150241786
2015-08-27

Tool and method of developing

#91
20150234285
2015-08-20

Developing apparatus and developing method

#92
20150234277
2015-08-20

Liquid treatment method, substrate processing apparatus and non-transitory storage medium

#93
20150224532
2015-08-13

Spin dispenser module substrate surface protection system

#94
20150187627
2015-07-02

Device for machining a substrate and a method for this purpose

#95
20150140485
2015-05-21

Processing liquid supplying apparatus, processing liquid supplying method and storage medium

#96
20150104747
2015-04-16

Developing apparatus

#97
20150083038
2015-03-26

Spin treatment apparatus

#98
20150059642
2015-03-05

Spin treatment apparatus

#99
20150036110
2015-02-05

Developing apparatus, developing method and storage medium

#100
20150036109
2015-02-05

Developing method, developing apparatus and storage medium

#101
20140370445
2014-12-18

Method for manufacturing semiconductor device

#102
20140347639
2014-11-27

Developing method for developing apparatus

#103
20140327890
2014-11-06

Coating and developing apparatus and method, and storage medium

#104
20140299161
2014-10-09

Substrate processing method, substrate processing apparatus and non-transitory storage medium

#105
20140261162
2014-09-18

Substrate processing apparatus

#106
20140192383
2014-07-10

Single motor-driven gravure cylinder chuck mechanism

#107
20140190634
2014-07-10

Method and apparatus for drying a wafer

#108
20140158791
2014-06-12

Treatment solution supply apparatus, treatment solution supply method, and computer storage medium

#109
20140152966
2014-06-05

Facility and method for treating substrate

#110
20140071411
2014-03-13

Developing treatment apparatus and developing treatment method

#111
20140060424
2014-03-06

Processing cup and substrate processing apparatus

#112
20140022521
2014-01-23

Substrate processing apparatus and substrate processing method

#113
20140017616
2014-01-16

Apparatus and method for developing process

#114
20130280425
2013-10-24

Liquid treatment apparatus and method and non-transitory storage medium

#115
20130239883
2013-09-19

Arrangement for the production of structured substrates

#116
20130186439
2013-07-25

Semiconductor development apparatus and method using same

#117
20130164685
2013-06-27

Method and apparatus for drying a wafer

#118
20130156948
2013-06-20

Substrate processing apparatus

#119
20130040246
2013-02-14

MULTIPLE CHEMICAL TREATMENT PROCESS FOR REDUCING PATTERN DEFECT

#120
20130040062
2013-02-14

Liquid processing method

#121
20120301612
2012-11-29

Coating method

#122
20120257176
2012-10-11

Substrate transport method, substrate transport apparatus, and coating and developing system

#123
20120234362
2012-09-20

Substrate cleaning method and substrate cleaning apparatus

#124
20120218531
2012-08-30

DEVELOPING METHOD AND APPARATUS USING ORGANIC-SOLVENT CONTAINING DEVELOPER

#125
20120183909
2012-07-19

Developing treatment method

#126
20120162618
2012-06-28

SUBSTRATE PROCESSING DEVICE AND METHOD

#127
20120122038
2012-05-17

Developing method

#128
20120115090
2012-05-10

Substrate treatment method, computer storage medium and substrate treatment apparatus

#129
20120077128
2012-03-29

SUBSTRATE EDGE TREATMENT FOR COATER/DEVELOPER

#130
20120063765
2012-03-15

Coating and developing apparatus, coating and developing method and non-transitory tangible medium

#131
20120057862
2012-03-08

Coating and developing apparatus, coating and developing method and non-transitory tangible medium

#132
20120057861
2012-03-08

Coating and developing apparatus and method, and storage medium

#133
20120052190
2012-03-01

Liquid processing apparatus, liquid processing method and storage medium

#134
20120033191
2012-02-09

Developer spraying device for reducing usage quantity of developer

#135
20120015307
2012-01-19

Coating and developing apparatus and method, and storage medium

#136
20110229120
2011-09-22

Non-transitory storage medium for rinsing or developing sequence

#137
20110200953
2011-08-18

Developing apparatus, developing method and storage medium

#138
20110200952
2011-08-18

Developing apparatus, developing method and storage medium

#139
20110200321
2011-08-18

Coating and developing apparatus, developing method and non-transitory medium

#140
20110183073
2011-07-28

Developing treatment method, program, computer storage medium and developing treatment system

#141
20110171583
2011-07-14

Process Solutions Containing Surfactants

#142
20110170855
2011-07-14

Developing apparatus and developing method

#143
20110143290
2011-06-16

DEVELOPING TREATMENT METHOD AND COMPUTER-READABLE STORAGE MEDIUM

#144
20110127236
2011-06-02

Developing device and developing method

#145
20110096304
2011-04-28

Developing apparatus, developing method and storage medium

#146
20110086316
2011-04-14

Coating and developing apparatus and coating and developing method

#147
20110027727
2011-02-03

Substrate developing method, substrate processing method and developing solution supply nozzle

#148
20110014379
2011-01-20

Developing apparatus, resist pattern forming method and storage medium

#149
20100330508
2010-12-30

Developing apparatus and developing method

#150
20100304313
2010-12-02

Process solutions containing surfactants

#151
20100255204
2010-10-07

Substrate heating apparatus and method and coating and developing system

#152
20100233637
2010-09-16

Developing apparatus, developing method, and storage medium

#153
20100227069
2010-09-09

APPARATUS FOR REDUCING COST OF DEVELOPER AND THE METHOD THEREOF

#154
20100224217
2010-09-09

SEMICONDUCTOR CLEANING METHOD AND APPARATUS AND CONTROLLING METHOD OF THE SAME

#155
20100216078
2010-08-26

Developing method

#156
20100216077
2010-08-26

Developing apparatus and developing method

#157
20100104988
2010-04-29

SUBSTRATE TREATING METHOD, SUBSTRATE-PROCESSING APPARATUS, DEVELOPING METHOD, METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE, AND METHOD OF CLEANING A DEVELOPING SOLUTION NOZZLE

#158
20100098869
2010-04-22

Liquid processing apparatus and liquid processing method

#159
20100047702
2010-02-25

Substrate processing method and apparatus

#160
20100040779
2010-02-18

Liquid processing apparatus, liquid processing method and storage medium

#161
20090320885
2009-12-31

SUBSTRATE TREATMENT APPARATUS

#162
20090311632
2009-12-17

Developing method and developing apparatus

#163
20090311419
2009-12-17

METHOD AND APPARATUS FOR RESIST DEVELOPMENT

#164
20090291399
2009-11-26

Coating/developing apparatus and method

#165
20090285991
2009-11-19

Coating apparatus and method

#166
20090272407
2009-11-05

Substrate cleaning method and developing apparatus

#167
20090250079
2009-10-08

Substrate cleaning method and substrate cleaning apparatus

#168
20090246710
2009-10-01

Pattern forming method and a semiconductor device manufacturing method

#169
20090246705
2009-10-01

DI water rinse of photoresists with insoluble dye content

#170
20090166319
2009-07-02

System and Method for Performing High Flow Rate Dispensation of a Chemical onto a Photolithographic Component

#171
20090130614
2009-05-21

Development device and development method

#172
20090103960
2009-04-23

DEVELOPING APPARATUS

#173
20090060493
2009-03-05

Method of developing a substrate and apparatus for performing the same

#174
20090035021
2009-02-05

Developing method, developing apparatus and storage medium

#175
20090033898
2009-02-05

Developing apparatus, developing method and storage medium

#176
20080305434
2008-12-11

Developing apparatus and developing method

#177
20080274433
2008-11-06

Rinse treatment method and development process method

#178
20080266532
2008-10-30

Coater/developer, coating/developing method, and storage medium

#179
20080220340
2008-09-11

Method for heating a chemically amplified resist layer carried on a rotating substrate

#180
20080215275
2008-09-04

Registration detection system

#181
20080204675
2008-08-28

Coating/developing apparatus and pattern forming method

#182
20080203058
2008-08-28

Substrate developing method and developing apparatus

#183
20080182211
2008-07-31

Resist pattern forming method

#184
20080176172
2008-07-24

Development processing device

#185
20080149272
2008-06-26

Surface Microstructuring Device

#186
20080145799
2008-06-19

Substrate developing method, substrate processing method and developing solution supply nozzle

#187
20080129968
2008-06-05

Coating and developing system, coating and developing method and storage medium

#188
20080090185
2008-04-17

Method and apparatus for rinsing a substrate during lithographic development processing

#189
20080063984
2008-03-13

Process Solutions Containing Surfactants

#190
20080008973
2008-01-10

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

#191
20070292806
2007-12-20

Dynamic Puddle Developing Process

#192
20070289527
2007-12-20

Liquid processing apparatus

#193
20070269749
2007-11-22

Methods to reduce the minimum pitch in a pattern

#194
20070264007
2007-11-15

Developing method and method for fabricating semiconductor device using the developing method

#195
20070196566
2007-08-23

Substrate edge treatment for coater/developer

#196
20070187037
2007-08-16

Semiconductor development apparatus and method using same

#197
20070184178
2007-08-09

Developing device and developing method

#198
20070183775
2007-08-09

Developing apparatus and developing method

#199
20070177869
2007-08-02

Coater/developer and coating/developing method

#200
20070122559
2007-05-31

Processing liquid coating apparatus and a processing liquid coating method

#201
20070122551
2007-05-31

Coater/developer and coating/developing method

#202
20070098401
2007-05-03

Substrate processing method and apparatus thereof

#203
20070089671
2007-04-26

Yield and line width performance for liquid polymers and other materials

#204
20070088450
2007-04-19

Method of controlling substrate processing apparatus and substrate processing apparatus

#205
20070065760
2007-03-22

Substrate processing apparatus and substrate processing method

#206
20070065145
2007-03-22

Development apparatus and development method

#207
20070059651
2007-03-15

Yield and line width performance for liquid polymers and other materials

#208
20070037099
2007-02-15

Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method

#209
20070031145
2007-02-08

Developing treatment apparatus and developing treatment method

#210
20070010412
2007-01-11

Process solutions containing surfactants

#211
20070010409
2007-01-11

Process solutions containing surfactants

#212
20060252000
2006-11-09

Substrate heating apparatus and method and coating and developing system

#213
20060201616
2006-09-14

Coating and developing system

#214
20060120717
2006-06-08

Developing method and apparatus for performing development processing properly and a solution processing method enabling enhanced uniformity in the processing

#215
20060110687
2006-05-25

Pattern forming method and a semiconductor device manufacturing method

#216
20060102614
2006-05-18

Apparatus for processing substrate and method of processing the same

#217
20060102069
2006-05-18

Substrate rotation type treatment apparatus

#218
20060088791
2006-04-27

Apparatus for and method of processing substrate

#219
20060086460
2006-04-27

Developing treatment apparatus

#220
20060068337
2006-03-30

Substrate processing method

#221
20060048792
2006-03-09

Substrate cleaning method and developing apparatus

#222
20060003270
2006-01-05

Developing method of photoresist and developing device

#223
20050287821
2005-12-29

Substrate processing system, coating/developing apparatus, and substrate processing apparatus

#224
20050271382
2005-12-08

Resist pattern forming apparatus and method thereof

#225
20050223980
2005-10-13

Substrate processing device, substrate processing method, and developing device

#226
20050176605
2005-08-11

Acetylenic diol ethylene oxide/propylene oxide adducts and processes for their manufacture

#227
20050175472
2005-08-11

Chemical liquid apparatus and deaerating method

#228
20050158672
2005-07-21

Pattern formation method

#229
20050158670
2005-07-21

Apparatus for processing substrate and method of processing the same

#230
20050147930
2005-07-07

Developing solution supply nozzle with stirrer

#231
20050145168
2005-07-07

Substrate treatment apparatus

#232
20050118536
2005-06-02

Apparatus for processing substrate and method of processing the same

#233
20050095368
2005-05-05

Yield and line width performance for liquid polymers and other materials

#234
20050087217
2005-04-28

Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle

#235
20050058944
2005-03-17

Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method

#236
20050053874
2005-03-10

Method for developing processing and apparatus for supplying developing solution

#237
20050051196
2005-03-10

Developer dispensing apparatus with adjustable knife ring

#238
20050032004
2005-02-10

Method of controlling removal of photoresist in openings of a photoresist mask

#239
15873944
2019-02-12

Apparatus and method for dispensing developer onto semiconductor substrate