G03F7/428 - CPC Classification Index

ClassID:

177127 ⎘

G03F7/428 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Processing photosensitive materials; Apparatus therefor; Stripping or agents therefor using ultrasonic means only

Recent Application in this class:

20220317573

Photoresist removal method and photoresist removal system

20170247662

Cancer cell-trapping metal filter, cancer cell-trapping metal filter sheet, cancer cell-trapping device, and manufacturing methods therefor

20120052687

Enhanced stripping of implanted resists

20090288689

ULTRASONIC CLEANING SYSTEM FOR REMOVING HIGH DOSE ION IMPLANTED PHOTORESIST IN SUPERCRITICAL CARBON DIOXIDE

20080085480

Method to remove resist layers from a substrate

20070269990

Method of removing ion implanted photoresist

20070123052

Process sequence for photoresist stripping and cleaning of photomasks for integrated circuit manufacturing

20060138399

Removing solution

20050087209

Megasonic processing system with gasified fluid

20050045590

FRAM capacitor stack clean

20050026435

Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing