G03F7/70083 - CPC Classification Index

#1

20250321493

2025-10-16

METHOD FOR MANUFACTURING A MICRO-NANOMETRIC HIERARCHICAL STRUCTURE AND MICRO-NANOMETRIC HIERARCHICAL STRUCTURE OBTAINED BY SUCH A METHOD

#2

20220390832

2022-12-08

OPTIMIZATION USING A NON-UNIFORM ILLUMINATION INTENSITY PROFILE

#3

20220214622

2022-07-07

Lithographic apparatus and illumination uniformity correction system

#4

20200218850

2020-07-09

Fast freeform source and mask co-optimization method

#5

20200098486

2020-03-26

Method and apparatus for determining a radiation beam intensity profile

#6

20190258170

2019-08-22

Method for determining an imaging aberration contribution of an imaging optical unit for measuring lithography masks

#7

20190113850

2019-04-18

Light intensity modulation method

#8

20190056669

2019-02-21

Lithographic apparatus and associated method

#9

20180335702

2018-11-22

Illumination system for illuminating a mask in a microlithographic exposure apparatus

#10

20180314162

2018-11-01

ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

#11

20180239861

2018-08-23

Fast freeform source and mask co-optimization method

#12

20180196351

2018-07-12

Lithographic apparatus and method

#13

20180164691

2018-06-14

PROJECTION EXPOSURE METHODS AND SYSTEMS

#14

20180136565

2018-05-17

PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY

#15

20170351183

2017-12-07

Illumination system for illuminating a mask in a microlithographic exposure apparatus

#16

20170329231

2017-11-16

METHOD AND APPARATUS FOR USING PATTERNING DEVICE TOPOGRAPHY INDUCED PHASE

#17

20170315451

2017-11-02

Divisional exposure apparatus and method of manufacturing liquid crystal display using the same

#18

20170192361

2017-07-06

Illumination system for microlithography

#19

20160209754

2016-07-21

Projection exposure method and projection exposure apparatus for microlithography

#20

20160187789

2016-06-30

Illumination system for illuminating a mask in a microlithographic exposure apparatus

#21

20160181133

2016-06-23

Substrate processing apparatus and substrate processing method

#22

20160161858

2016-06-09

Illumination system for microlithography

#23

20160154316

2016-06-02

Illumination optical unit for EUV projection lithography

#24

20160109809

2016-04-21

Maskless exposure device and method for compensating cumulative illumination using the same

#25

20160077446

2016-03-17

Illumination system for a microlithographic projection exposure apparatus

#26

20150356234

2015-12-10

Fast freeform source and mask co-optimization method

#27

20150331328

2015-11-19

Method for compensating slit illumination uniformity

#28

20150261096

2015-09-17

Illumination optical apparatus, exposure apparatus, and device manufacturing method

#29

20150168849

2015-06-18

Method of operating a microlithographic apparatus

#30

20150160565

2015-06-11

Projection exposure methods and systems

#31

20150160561

2015-06-11

Mirror

#32

20150116682

2015-04-30

Programmable imaging assembly for manufacturing biotest post arrays

#33

20150092174

2015-04-02

Illumination optical unit

#34

20150062549

2015-03-05

Assembly for a projection exposure apparatus for EUV projection lithography

#35

20150036115

2015-02-05

Illumination optical unit for EUV projection lithography

#36

20150022798

2015-01-22

Illumination system for microlithography

#37

20150015865

2015-01-15

Illumination intensity correction device for predefining an illumination intensity over an illumination field of a lithographic projection exposure apparatus

#38

20140362361

2014-12-11

Illumination optical unit for EUV projection lithography

#39

20140218709

2014-08-07

Field facet mirror for an illumination optics of a projection exposure apparatus for EUV microlithography

#40

20140211186

2014-07-31

Fast illumination simulator based on a calibrated flexible point-spread function

#41

20140176930

2014-06-26

Microlithographic illumination system

#42

20140168621

2014-06-19

Fly eye lens and proximity exposure machine optical system

#43

20140068530

2014-03-06

Fast freeform source and mask co-optimization method

#44

20130293861

2013-11-07

Illumination system of a microlithographic projection exposure apparatus

#45

20130148092

2013-06-13

Illumination system for a microlithographic projection exposure apparatus

#46

20130077076

2013-03-28

Microlithography illumination optical system and microlithography projection exposure apparatus including same

#47

20120300185

2012-11-29

Catoptric illumination system for microlithography tool

#48

20120287414

2012-11-15

FACET MIRROR FOR USE IN MICROLITHOGRAPHY

#49

20120262685

2012-10-18

Double EUV illumination uniformity correction system and method

#50

20120242968

2012-09-27

Method for adjusting an illumination system of a projection exposure apparatus for projection lithography

#51

20120212722

2012-08-23

Fast Illumination Simulator Based on a Calibrated Flexible Point Spread Function

#52

20120069313

2012-03-22

EUV microlithography illumination optical system and EUV attenuator for same

#53

20120019796

2012-01-26

Illumination system for microlithography

#54

20110255067

2011-10-20

Microlithography illumination systems, components and methods

#55

20110230999

2011-09-22

Fast freeform source and mask co-optimization method

#56

20110177463

2011-07-21

Illumination system for EUV microlithography

#57

20110164233

2011-07-07

Field facet mirror for an illumination optics of a projection exposure apparatus for EUV microlithography

#58

20110122394

2011-05-26

Computer readable storage medium including effective light source calculation program, and exposure method

#59

20110096317

2011-04-28

Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus

#60

20110096313

2011-04-28

Constrained optimization of lithographic source intensities under contingent requirements

#61

20110068494

2011-03-24

FABRICATION OF MICROSCALE TOOLING

#62

20110063598

2011-03-17

Illumination optics for EUV microlithography and related system and apparatus

#63

20110007293

2011-01-13

Microlithographic projection exposure apparatus

#64

20100265482

2010-10-21

Illumination system for illuminating a mask in a microlithographic exposure apparatus

#65

20100259743

2010-10-14

Optical system for increasing illumination efficiency of a patterning device by producing a plurality of beams

#66

20100253926

2010-10-07

Illumination optics for microlithography

#67

20100231882

2010-09-16

Bundle-guiding optical collector for collecting the emission of a radiation source

#68

20100231880

2010-09-16

Optical integrator, illumination optical system, exposure apparatus, and device manufacturing method

#69

20100073651

2010-03-25

Lithography apparatus

#70

20100033699

2010-02-11

Illumination optical system, exposure apparatus, and exposure method

#71

20090323044

2009-12-31

Catoptric illumination system for microlithography tool

#72

20090316128

2009-12-24

Illumination system particularly for microlithography

#73

20090310116

2009-12-17

Recording medium storing program for determining exposure parameter, exposure method, and method of manufacturing device

#74

20090280437

2009-11-12

Projection exposure methods and systems

#75

20090257043

2009-10-15

ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND EXPOSURE OPTICAL SYSTEM

#76

20090257041

2009-10-15

Illuminator for a photolithography device

#77

20090233189

2009-09-17

DEVICE AND METHOD FOR OBTAINING EXPOSURE CORRECTION INFORMATION, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

#78

20090201481

2009-08-13

Optical element and illumination optics for microlithography

#79

20090170042

2009-07-02

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

#80

20090161224

2009-06-25

Device for illuminating an area and device for applying light to a work area

#81

20090135394

2009-05-28

Lithographic apparatus and method

#82

20090128886

2009-05-21

Illumination optical apparatus, exposure apparatus, and device manufacturing method

#83

20090101850

2009-04-23

Arrangement for generating EUV radiation

#84

20090091731

2009-04-09

Illumination optical system for microlithography

#85

20090073410

2009-03-19

Illumination system particularly for microlithography

#86

20090027647

2009-01-29

EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD

#87

20090021719

2009-01-22

Microlithographic projection exposure apparatus

#88

20090021716

2009-01-22

Illumination system for a microlithographic projection exposure apparatus

#89

20090021715

2009-01-22

Microlithographic illumination system

#90

20090015812

2009-01-15

ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY

#91

20080259304

2008-10-23

Lithographic apparatus and method

#92

20080227299

2008-09-18

Tapered edge exposure for removal of material from a semiconductor wafer

#93

20080225259

2008-09-18

ILLUMINATION SYSTEM WITH VARIABLE ADJUSTMENT OF THE ILLUMINATION

#94

20080225258

2008-09-18

EUV illumination system having a folding geometry

#95

20080212059

2008-09-04

Microlithography illumination systems, components and methods

#96

20080204692

2008-08-28

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND METHOD FOR PRODUCING MICROSTRUCTURED COMPONENTS

#97

20080165925

2008-07-10

DOUBLE-FACETTED ILLUMINATION SYSTEM WITH ATTENUATOR ELEMENTS ON THE PUPIL FACET MIRROR

#98

20080151206

2008-06-26

Lithographic apparatus and method

#99

20080143993

2008-06-19

Illumination optical system and exposure apparatus

#100

20080143992

2008-06-19

Polarized radiation in lithographic apparatus and device manufacturing method

#101

20080137217

2008-06-12

Uniformity correction system having light leak and shadow compensation

#102

20080130076

2008-06-05

Illumination system particularly for microlithography

#103

20080123068

2008-05-29

Exposure apparatus, exposure method, and device fabrication method

#104

20080111983

2008-05-15

Illumination System for a Microlithographic Projection Exposure Apparatus

#105

20070284547

2007-12-13

Method for enabling transmission of substantially equal amounts of energy

#106

20070268473

2007-11-22

Light blocking device and exposure apparatus

#107

20070242799

2007-10-18

Illumination system

#108

20070241292

2007-10-18

Optical system for increasing illumination efficiency of a patterning device

#109

20070206168

2007-09-06

Systems and methods for determination of focus and telecentricity, amelioration of metrology induced effects and application to determination of precision bossung curves

#110

20070170376

2007-07-26

Lithographic apparatus and device manufacturing method

#111

20070120072

2007-05-31

Illumination system particularly for microlithography

#112

20070059614

2007-03-15

Method of determining an illumination profile and device manufacturing method

#113

20070058150

2007-03-15

Lithographic apparatus and device manufacturing method

#114

20070057201

2007-03-15

Lithographic apparatus and device manufacturing method

#115

20070041004

2007-02-22

Optical systems that correct optical irregularities, and projection-exposure systems and methods comprising same

#116

20070030948

2007-02-08

Illumination system with field mirrors for producing uniform scanning energy

#117

20060262426

2006-11-23

Uniformity correction system having light leak and shadow compensation

#118

20060245540

2006-11-02

Illumination system particularly for microlithography

#119

20060233300

2006-10-19

Illumination system particularly for microlithography

#120

20060208206

2006-09-21

Illumination system particularly for microlithography

#121

20060192947

2006-08-31

Optimizing light path uniformity in inspection systems

#122

20060181692

2006-08-17

Method and apparatus for controlling radiation beam intensity directed to microlithographic substrates

#123

20060152810

2006-07-13

Variable illuminator and speckle buster apparatus

#124

20060139769

2006-06-29

Uniformity correction system having light leak and shadow compensation

#125

20060139612

2006-06-29

Polarized radiation in lithographic apparatus and device manufacturing method

#126

20060126036

2006-06-15

Uniformity correction for lithographic apparatus

#127

20060119949

2006-06-08

Laser irradiation apparatus, laser irradiation method, and method for manufacturing semiconductor device

#128

20060119947

2006-06-08

Efficiently illuminating a modulating device

#129

20060119812

2006-06-08

Lithographic apparatus, device manufacturing method and device manufactured therewith

#130

20060012770

2006-01-19

Diffuser unit, lithographic apparatus, method for homogenizing a beam of radiation, a device manufacturing method and device manufactured thereby

#131

20050270608

2005-12-08

Illumination optical system and exposure apparatus

#132

20050162628

2005-07-28

Scanning exposure apparatus, and device manufacturing method

#133

20050088760

2005-04-28

Illumination system particularly for microlithography

#134

20050083503

2005-04-21

Multi mirror system for an illumination system

#135

20050002090

2005-01-06

EUV illumination system having a folding geometry

#136

14493073

2017-06-13

Horizontal development bias in negative tone development of photoresist