Patents-Review.com
ClassID:

177139 ⎘

G03F7/70091 - page 2 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure apparatus for microlithography; Mask illumination systems Illumination settings, i.e. intensity distribution in the pupil plane, angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole, quadrupole; Partial coherence control, i.e. sigma or numerical aperture [NA]

Recent Application in this class:
#301
20060055834
2006-03-16

Illumination optical system, exposure apparatus, and exposure method with polarized switching device

 #302
20060054781
2006-03-16

Pupil improvement of incoherent imaging systems for enhanced CD linearity

 #303
20060050259
2006-03-09

Exposure apparatus and method, and device fabricating method using the same

 #304
20060033900
2006-02-16

Exposure method and apparatus

 #305
20060023309
2006-02-02

Projection aligner, aberration estimating mask pattern, aberration quantity estimating method, aberration eliminating filter and semiconductor manufacturing method

 #306
20060017906
2006-01-26

Lithographic apparatus and device manufacturing method

 #307
20060012764
2006-01-19

Exposure apparatus and method

 #308
20050270513
2005-12-08

Lithographic apparatus and device manufacturing method

 #309
20050264783
2005-12-01

In-situ interferometer arrangement

 #310
20050243440
2005-11-03

Aperture plate for lithography systems

 #311
20050237541
2005-10-27

In-situ interferometer arrangement

 #312
20050237512
2005-10-27

Method and apparatus for measurement of exit pupil transmittance

 #313
20050231705
2005-10-20

Apparatus and method for high resolution in-situ illumination source measurement in projection imaging systems

 #314
20050221233
2005-10-06

System and method for fabricating contact holes

 #315
20050219713
2005-10-06

Aperture stop assembly for high power laser beams

 #316
20050214651
2005-09-29

APERTURE PLATE FOR OPTICAL LITHOGRAPHY SYSTEMS

 #317
20050200824
2005-09-15

Methods and systems for controlling radiation beam characteristics for microlithographic processing

 #318
20050195379
2005-09-08

Optimized optical lithography illumination source for use during the manufacture of a semiconductor device

 #319
20050186491
2005-08-25

Method for improved lithographic patterning utilizing optimized illumination conditions and high transmission attenuated PSM

 #320
20050170267
2005-08-04

Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region

 #321
20050151946
2005-07-14

Modulated lithographic beam to reduce sensitivity to fluctuating scanning speed

 #322
20050117135
2005-06-02

Method and imaging apparatus for imaging a structure onto a semiconductor wafer by means of immersion lithography

 #323
20050110972
2005-05-26

Illumination system and exposure apparatus

 #324
20050099614
2005-05-12

Multiple exposure method

 #325
20050078293
2005-04-14

Methods and systems for controlling radiation beam characteristics for microlithographic processing

 #326
20050068514
2005-03-31

METHODS AND SYSTEMS TO COMPENSATE FOR A STITCHING DISTURBANCE OF A PRINTED PATTERN IN A MASKLESS LITHOGRAPHY SYSTEM UTILIZING OVERLAP OF EXPOSURE ZONES WITH ATTENUATION OF THE AERIAL IMAGE IN THE OVERLAP REGION

 #327
20050046945
2005-03-03

Diffractive optical element, illumination system comprising the same, and method of manufacturing semiconductor device using illumination system

 #328
20050007573
2005-01-13

Device manufacturing method

 #329
16238444
2020-05-19

Lithographic mask functions to model the incident angles of a partially coherent illumination