Patents-Review.com
ClassID:

177141 ⎘

G03F7/70108 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure apparatus for microlithography; Mask illumination systems; Illumination settings, i.e. intensity distribution in the pupil plane, angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole, quadrupole; Partial coherence control, i.e. sigma or numerical aperture [NA] Off-axis setting using a light-guiding element

Recent Application in this class:
#1
20250258438
2025-08-14

LASER PROCESSING SYSTEM, LASER PROCESSING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

 #2
20230168588
2023-06-01

MASKLESS PHOTOLITHOGRAPHY DEVICES, METHODS, AND SYSTEMS

 #3
20210124271
2021-04-29

Maskless photolithography devices, methods, and systems

 #4
20200033734
2020-01-30

Mirror array

 #5
20190137886
2019-05-09

EXPOSURE METHOD AND APPARATUS, AND METHOD FOR FABRICATING DEVICE WITH LIGHT AMOUNT DISTRIBUTION HAVING LIGHT LARGER IN FOUR AREAS

 #6
20190107782
2019-04-11

Exposure apparatus, exposure method, and device manufacturing method

 #7
20190086811
2019-03-21

Illumination optical system, exposure apparatus and device manufacturing method

 #8
20190064504
2019-02-28

Exposure apparatus, adjusting method, and article manufacturing method

 #9
20180203363
2018-07-19

Controller for optical device, exposure method and apparatus, and method for manufacturing device

 #10
20180164692
2018-06-14

Exposure apparatus, exposure method, and device manufacturing method

 #11
20180164691
2018-06-14

PROJECTION EXPOSURE METHODS AND SYSTEMS

 #12
20180059407
2018-03-01

Optical apparatus, machining apparatus, and article manufacturing method

 #13
20170336719
2017-11-23

Illumination optics for EUV projection lithography

 #14
20170285485
2017-10-05

Exposure apparatus, exposure method, and device manufacturing method

 #15
20170255005
2017-09-07

ILLUMINATION APPARATUS, ILLUMINATION METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

 #16
20170205714
2017-07-20

Lithographic apparatus and device manufacturing method

 #17
20170160075
2017-06-08

Position measurement with illumination profile having two diametrically opposed off-axis radiation

 #18
20170146913
2017-05-25

EXPOSURE METHOD AND APPARATUS, AND METHOD FOR FABRICATING DEVICE WITH LIGHT AMOUNT DISTRIBUTION HAVING LIGHT LARGER IN FOUR AREAS

 #19
20170108782
2017-04-20

Illumination optical system, exposure apparatus and device manufacturing method

 #20
20170090300
2017-03-30

Controller for optical device, exposure method and apparatus, and method for manufacturing device

 #21
20170082928
2017-03-23

Optical system of a microlithographic projection exposure apparatus

 #22
20160291484
2016-10-06

Exposure apparatus, exposure method, and device manufacturing method

 #23
20160238950
2016-08-18

Source optimization for image fidelity and throughput

 #24
20160161866
2016-06-09

Exposure apparatus, exposure method, and device manufacturing method

 #25
20160124314
2016-05-05

Controller for optical device, exposure method and apparatus, and method for manufacturing device

 #26
20160026095
2016-01-28

Lithographic apparatus and device manufacturing method

 #27
20160004167
2016-01-07

Microlithographic projection exposure apparatus illumination optics

 #28
20160004164
2016-01-07

Illumination system for an EUV lithography device and facet mirror therefor

 #29
20150248066
2015-09-03

Illumination optical apparatus and projection exposure apparatus

 #30
20150248065
2015-09-03

Illumination optical apparatus and projection exposure apparatus

 #31
20150212424
2015-07-30

Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method

 #32
20150192863
2015-07-09

Exposure apparatus, exposure method, and device manufacturing method

 #33
20150192862
2015-07-09

Exposure apparatus, exposure method, and device manufacturing method

 #34
20150160565
2015-06-11

Projection exposure methods and systems

 #35
20150092173
2015-04-02

Illumination optical system, exposure apparatus and device manufacturing method

 #36
20150085272
2015-03-26

Optical system of a microlithographic projection exposure apparatus

 #37
20150015862
2015-01-15

Illumination optical unit for projection lithography

 #38
20140347645
2014-11-27

Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method

 #39
20140340667
2014-11-20

Exposure apparatus, exposure method, and device manufacturing method

 #40
20140285788
2014-09-25

Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method

 #41
20140218709
2014-08-07

Field facet mirror for an illumination optics of a projection exposure apparatus for EUV microlithography

 #42
20140176930
2014-06-26

Microlithographic illumination system

 #43
20140132952
2014-05-15

Device and method for detecting optical performance of beam shaping element

 #44
20140132942
2014-05-15

Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure

 #45
20140111785
2014-04-24

Illumination optical unit for projection lithography

 #46
20140071419
2014-03-13

Fly's eye optical mirror with a plurality of optical elements rotationally aligned along two axes

 #47
20130329206
2013-12-12

Exposure apparatus, exposure method, and device manufacturing method

 #48
20130308114
2013-11-21

Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator

 #49
20130308113
2013-11-21

Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction

 #50
20130250268
2013-09-26

Illumination optical apparatus and projection exposure apparatus

 #51
20130242280
2013-09-19

Illumination optical apparatus and projection exposure apparatus

 #52
20130238296
2013-09-12

Calculating method of structural data of diffractive optical element, program, and manufacturing method

 #53
20130229639
2013-09-05

Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method

 #54
20120327385
2012-12-27

Optical system for semiconductor lithography

 #55
20120249988
2012-10-04

Optical beam deflecting element, illumination system including same, and related method

 #56
20120236284
2012-09-20

Illumination optical system, exposure apparatus, and device manufacturing method

 #57
20120170013
2012-07-05

Illumination optical system, exposure apparatus, and method of manufacturing device

 #58
20120081686
2012-04-05

Microlithographic projection exposure apparatus illumination optics

 #59
20120081685
2012-04-05

Microlithographic projection exposure apparatus illumination optics

 #60
20120002184
2012-01-05

Illumination system of a microlithographic projection exposure apparatus

 #61
20110318696
2011-12-29

Illumination optical system and optical systems for microlithography

 #62
20110310375
2011-12-22

Illumination optical system, exposure apparatus and device manufacturing method

 #63
20110299055
2011-12-08

Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction

 #64
20110285978
2011-11-24

Illumination system for a microlithographic projection exposure apparatus

 #65
20110273698
2011-11-10

Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses

 #66
20110273693
2011-11-10

Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power having different thicknesses to rotate linear polarization direction

 #67
20110273692
2011-11-10

Beam transforming optical system, illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power having different thicknesses to rotate linear polarization direction

 #68
20110261342
2011-10-27

OPTICAL UNIT, ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARTUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

 #69
20110216296
2011-09-08

Hologram with cells to control phase in two polarization directions and exposure apparatus

 #70
20110212403
2011-09-01

METHOD AND APPARATUS FOR ENHANCED DIPOLE LITHOGRAPHY

 #71
20110211183
2011-09-01

Illumination optical system, aligner, and process for fabricating device

 #72
20110164233
2011-07-07

Field facet mirror for an illumination optics of a projection exposure apparatus for EUV microlithography

 #73
20110141567
2011-06-16

Selective diffractive optical element and a system including the same

 #74
20110122391
2011-05-26

Optical system of a microlithographic projection exposure apparatus and microlithographic exposure method

 #75
20110109893
2011-05-12

Microlithographic projection exposure apparatus

 #76
20110096316
2011-04-28

Illumination system for microlithography

 #77
20110069296
2011-03-24

Microlithographic exposure method as well as a projection exposure system for carrying out the method

 #78
20110053061
2011-03-03

Exposure apparatus, exposure method, and device manufacturing method

 #79
20110037958
2011-02-17

Lithographic apparatus and device manufacturing method

 #80
20110014799
2011-01-20

Projection illumination system for EUV microlithography

 #81
20110001948
2011-01-06

ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS

 #82
20100328742
2010-12-30

Hologram, hologram data generation method, and exposure apparatus

 #83
20100277707
2010-11-04

ILLUMINATION OPTICS FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

 #84
20100248155
2010-09-30

Illumination Control Module, and Diffraction Illumination System and Photolithography System Including the Same, and Methods of Fabricating Semiconductors Using the Same

 #85
20100245796
2010-09-30

Optical integrator, illumination optical device, aligner, and method for fabricating device

 #86
20100208315
2010-08-19

Computer generated hologram including plural isotropic and anisotropic cells for forming combined intensity distribution, generation method, and exposure apparatus

 #87
20100183956
2010-07-22

Computer generated hologram, exposure apparatus and device fabrication method

 #88
20100141918
2010-06-10

Lithographic apparatus and device manufacturing method

 #89
20100110405
2010-05-06

Radiation source and lithographic apparatus

 #90
20100039636
2010-02-18

Illumination optics for a microlithographic projection exposure apparatus

 #91
20100039633
2010-02-18

Source optimization by assigning pixel intensities for diffractive optical element using mathematical relationship

 #92
20090323041
2009-12-31

Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses

 #93
20090316128
2009-12-24

Illumination system particularly for microlithography

 #94
20090284729
2009-11-19

Illumination optical apparatus and projection exposure apparatus

 #95
20090280437
2009-11-12

Projection exposure methods and systems

 #96
20090279066
2009-11-12

Lithographic apparatus and method involving a pockels cell

 #97
20090262328
2009-10-22

ILLUMINATION SYSTEM AND LITHOGRAPHIC METHOD

 #98
20090244507
2009-10-01

OPTICAL MEMBER, LIGHT ROUTING UNIT, AND EXPOSURE APPARATUS

 #99
20090231562
2009-09-17

Effective light source shape database generation method, optical image calculation method, recording medium, exposure method, and device fabrication method

 #100
20090213466
2009-08-27

Beam splitter apparatus and system

 #101
20090207396
2009-08-20

Optical system for semiconductor lithography

 #102
20090185156
2009-07-23

Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger and different linear polarization states in an on-axis area and a plurality of off-axis areas

 #103
20090185154
2009-07-23

OPTICAL UNIT, ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARTUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

 #104
20090168159
2009-07-02

Optical system for illumination of an evanescent field

 #105
20090168040
2009-07-02

Diffractive optical device, and aligner comprising that device

 #106
20090147235
2009-06-11

Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses

 #107
20090147234
2009-06-11

Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses

 #108
20090147233
2009-06-11

Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses

 #109
20090135397
2009-05-28

Illumination system of a microlithographic projection exposure apparatus

 #110
20090135396
2009-05-28

ILLUMINATING OPTICAL APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

 #111
20090135395
2009-05-28

OPTICAL SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY

 #112
20090135393
2009-05-28

Illumination optical apparatus, exposure apparatus, and device manufacturing method

 #113
20090122292
2009-05-14

Illumination optical apparatus and projection exposure apparatus

 #114
20090117494
2009-05-07

Controller for optical device, exposure method and apparatus, and method for manufacturing device

 #115
20090116093
2009-05-07

Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method

 #116
20090109415
2009-04-30

Lithographic apparatus and method

 #117
20090097094
2009-04-16

Illumination optical system, exposure apparatus, and device manufacturing method

 #118
20090097007
2009-04-16

Illumination optical system, exposure apparatus, and device manufacturing method

 #119
20090086186
2009-04-02

Illuminating optical apparatus, exposure apparatus and device manufacturing method

 #120
20090073411
2009-03-19

Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method

 #121
20090073410
2009-03-19

Illumination system particularly for microlithography

 #122
20090040496
2009-02-12

Microlithographic exposure method as well as a projection exposure system for carrying out the method

 #123
20090040490
2009-02-12

Illuminating optical apparatus, exposure apparatus and device manufacturing method

 #124
20090034036
2009-02-05

Computer generated hologram, exposure apparatus, and device fabrication method

 #125
20090021715
2009-01-22

Microlithographic illumination system

 #126
20090015812
2009-01-15

ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY

 #127
20090002671
2009-01-01

Illumination optical apparatus, exposure apparatus, and device manufacturing method

 #128
20090002664
2009-01-01

OPTICAL INTEGRATOR, ILLUMINATION OPTICAL DEVICE, ALIGNER, AND METHOD FOR FABRICATING DEVICE

 #129
20080278704
2008-11-13

ILLUMINATION SYSTEM FOR A PROJECTION EXPOSURE APPARATUS WITH WAVELENGTHS LESS THAN OR EQUAL TO 193 nm

 #130
20080273186
2008-11-06

Illumination System, In Particular For A Projection Exposure Machine In Semiconductor Lithography

 #131
20080259300
2008-10-23

Lithographic apparatus and device manufacturing method

 #132
20080225259
2008-09-18

ILLUMINATION SYSTEM WITH VARIABLE ADJUSTMENT OF THE ILLUMINATION

 #133
20080212327
2008-09-04

Illumination system of a microlithographic exposure apparatus

 #134
20080212052
2008-09-04

OPTICAL ARRANGEMENT AND PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH PASSIVE THERMAL COMPENSATION

 #135
20080192224
2008-08-14

Microlithographic Projection Exposure Apparatus

 #136
20080192223
2008-08-14

Method of producing a diffractive optical element and diffractive optical element produced by such a method

 #137
20080174756
2008-07-24

Source optimization for image fidelity and throughput

 #138
20080173789
2008-07-24

Methods for adjusting and evaluating light intensity distribution of illumination apparatus, illumination apparatus, exposure apparatus, and device manufacturing method

 #139
20080158528
2008-07-03

Lithographic apparatus, device manufacturing method and computer program product

 #140
20080143993
2008-06-19

Illumination optical system and exposure apparatus

 #141
20080130076
2008-06-05

Illumination system particularly for microlithography

 #142
20080074630
2008-03-27

Lithographic apparatus and device manufacturing method

 #143
20080068721
2008-03-20

Beam splitter apparatus and system

 #144
20080068572
2008-03-20

Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in four areas

 #145
20080062541
2008-03-13

Illumination optical system, exposure apparatus, and device manufacturing method

 #146
20080062509
2008-03-13

DIFFRACTIVE OPTICAL ELEMENT, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

 #147
20080049206
2008-02-28

ILLUMINATION SYSTEM WITH A DETECTOR FOR REGISTERING A LIGHT INTENSITY

 #148
20080030852
2008-02-07

Lighting optical device, exposure system, and exposure method

 #149
20080030707
2008-02-07

Lighting optical device, regulation method for lighting optical device, exposure system, and exposure method

 #150
20080024747
2008-01-31

Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas

 #151
20080013680
2008-01-17

Collector configured of mirror shells

 #152
20080013066
2008-01-17

Illumination system for microlithography

 #153
20080013065
2008-01-17

Microlithographic projection exposure apparatus illumination optics

 #154
20070279535
2007-12-06

Illumination system for a microlithography projection exposure installation

 #155
20070258077
2007-11-08

Illumination optical apparatus, exposure apparatus, and device manufacturing method

 #156
20070242363
2007-10-18

Illumination optical apparatus, projection exposure apparatus, projection optical system, and device manufacturing method

 #157
20070242251
2007-10-18

Lithographic apparatus and device manufacturing method

 #158
20070236784
2007-10-11

Illumination system with zoom objective

 #159
20070211231
2007-09-13

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

 #160
20070206171
2007-09-06

Illumination system for a microlithographic projection exposure apparatus

 #161
20070195394
2007-08-23

Method for decomposition of a customized DOE for use with a single exposure into a set of multiple exposures using standard DOEs with optimized exposure settings

 #162
20070194254
2007-08-23

Photon sieve for optical systems in micro-lithography

 #163
20070188730
2007-08-16

Exposure apparatus and device manufacturing method

 #164
20070146677
2007-06-28

ILLUMINATION OPTICAL SYSTEM AND EXPOSURE APPARATUS USING THE SAME

 #165
20070146676
2007-06-28

Method of adjusting lighting optical device, lighting optical device, exposure system, and exposure method

 #166
20070146671
2007-06-28

Off-axis illumination apparatus, exposure apparatus and off-axis illumination method

 #167
20070134940
2007-06-14

Substrate processing method, photomask manufacturing method, photomask, and device manufacturing method

 #168
20070120072
2007-05-31

Illumination system particularly for microlithography

 #169
20070115449
2007-05-24

Lithographic apparatus and device manufacturing method

 #170
20070092840
2007-04-26

System and method for photolithography in semiconductor manufacturing

 #171
20070076185
2007-04-05

Photolithographic method using exposure system for controlling vertical CD difference

 #172
20070024836
2007-02-01

ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

 #173
20070002311
2007-01-04

Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems

 #174
20070002300
2007-01-04

Lithographic apparatus and device manufacturing method

 #175
20060245540
2006-11-02

Illumination system particularly for microlithography

 #176
20060216844
2006-09-28

Optimized optical lithography illumination source for use during the manufacture of a semiconductor device

 #177
20060203214
2006-09-14

Illumination optical apparatus and projection exposure apparatus

 #178
20060197927
2006-09-07

Lithographic apparatus and device manufacturing method

 #179
20060192935
2006-08-31

Correction of optical proximity effects by intensity modulation of an illumination arrangement

 #180
20060181692
2006-08-17

Method and apparatus for controlling radiation beam intensity directed to microlithographic substrates

 #181
20060181691
2006-08-17

Apparatus for projecting a pattern into an image plane

 #182
20060175557
2006-08-10

Apparatus for projecting a reduced image of a photomask using a schwarzschild objective

 #183
20060158624
2006-07-20

Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method

 #184
20060146384
2006-07-06

Optical beam transformation system and illumination system comprising an optical beam transformation system

 #185
20060146302
2006-07-06

Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly

 #186
20060141375
2006-06-29

Exposure apparatus, a tilting device method for performing a tilted focus test, and a device manufactured accordingly

 #187
20060139599
2006-06-29

Lithographic apparatus and device manufacturing method

 #188
20060132747
2006-06-22

Optical element for an illumination system

 #189
20060126053
2006-06-15

Apparatus for characterization of photoresist resolution, and method of use

 #190
20060126046
2006-06-15

Lithographic apparatus and method for optimizing illumination using a photolithographic simulation

 #191
20060097202
2006-05-11

Collector having unused region for illumination systems using a wavelength ≦193 nm

 #192
20060072095
2006-04-06

Exposure method and apparatus, and method for fabricating device

 #193
20060050261
2006-03-09

Illumination system for microlithography

 #194
20060044542
2006-03-02

Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems

 #195
20060028706
2006-02-09

Polarizer device for generating a defined spatial distribution of polarization states

 #196
20060012769
2006-01-19

Illumination optical system and exposure apparatus using the same

 #197
20050280796
2005-12-22

Illumination optical system and method, and exposure apparatus

 #198
20050270608
2005-12-08

Illumination optical system and exposure apparatus

 #199
20050270513
2005-12-08

Lithographic apparatus and device manufacturing method

 #200
20050254033
2005-11-17

Illumination optical device, photolithography machine, and exposure method

 #201
20050219495
2005-10-06

Beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus

 #202
20050219494
2005-10-06

Lithographic apparatus, illumination system, and optical element for rotating an intensity distribution

 #203
20050195379
2005-09-08

Optimized optical lithography illumination source for use during the manufacture of a semiconductor device

 #204
20050190350
2005-09-01

Exposure apparatus and method

 #205
20050179881
2005-08-18

Exposure apparatus and method

 #206
20050168717
2005-08-04

Apparatus for characterization of photoresist resolution, and method of use

 #207
20050168498
2005-08-04

Source optimization for image fidelity and throughput

 #208
20050146704
2005-07-07

Microlithographic exposure method as well as a projection exposure system for carrying out the method

 #209
20050105072
2005-05-19

Optical system for providing a hexapole illumination and method of forming a photoresist pattern on a substrate using the same

 #210
20050094121
2005-05-05

Illuminator controlled tone reversal printing

 #211
20050093041
2005-05-05

Illumination system having a nested collector for annular illumination of an exit pupil

 #212
20050088760
2005-04-28

Illumination system particularly for microlithography

 #213
20050083503
2005-04-21

Multi mirror system for an illumination system

 #214
20050030653
2005-02-10

Facet mirror having a number of mirror facets

 #215
20050018164
2005-01-27

Exposure with intensity balancing to mimic complex illuminator shape

 #216
20050008870
2005-01-13

EUV condenser with non-imaging optics