Patents-Review.com
ClassID:

177144 ⎘

G03F7/70133 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure apparatus for microlithography; Mask illumination systems Measurement of illumination distribution, in pupil plane or field plane

Recent Application in this class:
#1
20260104648
2026-04-16

FAST UNIFORMITY DRIFT CORRECTION

 #2
20250237962
2025-07-24

APPARATUS AND METHOD FOR DETERMINING AN ANGULAR REFLECTIVITY PROFILE

 #3
20250216793
2025-07-03

METHOD OF CONFIGURING EXTREME ULTRAVIOLET ILLUMINATION SYSTEM AND EXTREME ULTRAVIOLET EXPOSURE METHOD USING THE ILLUMINATION SYSTEM

 #4
20250116939
2025-04-10

METHOD FOR OPERATING A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, MICROLITHOGRAPHIC MASK AND PROJECTION EXPOSURE APPARATUS

 #5
20250060677
2025-02-20

METHOD FOR MEASURING AN EFFECT OF A WAVELENGTH-DEPENDENT MEASURING LIGHT REFLECTIVITY AND AN EFFECT OF A POLARIZATION OF MEASURING LIGHT ON A MEASURING LIGHT IMPINGEMENT ON A LITHOGRAPHY MASK

 #6
20250044705
2025-02-06

METHOD FOR MEASURING THE ILLUMINATION PUPIL IN A SCANNER TAKING INTO ACCOUNT A MEASUREMENT RETICLE

 #7
20240419083
2024-12-19

LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SOURCE

 #8
20240402613
2024-12-05

METHOD FOR SIMULATING ILLUMINATION AND IMAGING PROPERTIES OF AN OPTICAL PRODUCTION SYSTEM WHEN ILLUMINATING AND IMAGING AN OBJECT BY MEANS OF AN OPTICAL MEASUREMENT SYSTEM

 #9
20240377723
2024-11-14

COMPUTER IMPLEMENTED METHOD AND SYSTEM FOR SIMULATING AN AERIAL IMAGE OF A PHOTOLITHOGRAPHY MASK

 #10
20240319608
2024-09-26

FAST UNIFORMITY DRIFT CORRECTION

 #11
20240295824
2024-09-05

EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD

 #12
20240272058
2024-08-15

INSPECTION SYSTEM FOR RETICLE PARTICLE DETECTION USING A STRUCTURAL ILLUMINATION WITH APERTURE APODIZATION

 #13
20240219699
2024-07-04

High-performance EUV microscope device with free-form illumination system structure

 #14
20230408927
2023-12-21

APPARATUS AND METHOD OF LASER INTERFERENCE LITHOGRAPHY

 #15
20230280662
2023-09-07

METHOD OF PERFORMING METROLOGY, METHOD OF TRAINING A MACHINE LEARNING MODEL, METHOD OF PROVIDING A LAYER COMPRISING A TWO-DIMENSIONAL MATERIAL, METROLOGY APPARATUS

 #16
20230221571
2023-07-13

OPTICAL SYSTEM, IN PARTICULAR FOR CHARACTERIZING A MICROLITHOGRAPHY MASK

 #17
20230143407
2023-05-11

Exposure apparatus and exposure method, and device manufacturing method

 #18
20230035511
2023-02-02

LITHOGRAPHIC APPARATUS AND METHOD FOR DRIFT COMPENSATION

 #19
20220397832
2022-12-15

Metrology method and lithographic apparatuses

 #20
20220350258
2022-11-03

Method for measuring an effect of a wavelength-dependent measuring light reflectivity and an effect of a polarization of measuring light on a measuring light impingement on a lithography mask

 #21
20220342317
2022-10-27

Pupil stop for an illumination optical unit of a metrology system

 #22
20220276566
2022-09-01

Real time registration in lithography system

 #23
20220236648
2022-07-28

METHOD FOR MEASURING A REFLECTIVITY OF AN OBJECT FOR MEASUREMENT LIGHT AND METROLOGY SYSTEM FOR CARRYING OUT THE METHOD

 #24
20220236645
2022-07-28

Method and apparatus for photolithographic imaging

 #25
20220214622
2022-07-07

Lithographic apparatus and illumination uniformity correction system

 #26
20220128912
2022-04-28

Frequency broadening apparatus and method

 #27
20220121125
2022-04-21

Exposure apparatus and exposure method, and device manufacturing method

 #28
20220075272
2022-03-10

Method and apparatus for characterizing a microlithographic mask

 #29
20220057717
2022-02-24

Measurement illumination optical unit for guiding illumination light into an object field of a projection exposure system for EUV lithography

 #30
20210405540
2021-12-30

Performance optimized scanning sequence for eBeam metrology and inspection

 #31
20210382398
2021-12-09

System and method of measuring refractive index of EUV mask absorber

 #32
20210263422
2021-08-26

Laser system for target metrology and alteration in an EUV light source

 #33
20210191280
2021-06-24

Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets

 #34
20210132507
2021-05-06

Lithographic method and apparatus

 #35
20210116677
2021-04-22

Exposure apparatus, exposure method, and method of manufacturing article

 #36
20210096466
2021-04-01

Light source device, illuminating apparatus, exposing apparatus, and method for manufacturing article

 #37
20210041789
2021-02-11

Exposure apparatus and exposure method, and device manufacturing method

 #38
20200371443
2020-11-26

Exposure apparatus and method of manufacturing article

 #39
20200363730
2020-11-19

EXPOSURE APPARATUS AND EXPOSURE METHOD, AND FLAT PANEL DISPLAY MANUFACTURING METHOD

 #40
20200310251
2020-10-01

Frequency broadening apparatus and method

 #41
20200232931
2020-07-23

Methods and apparatus for predicting performance of a measurement method, measurement method and apparatus

 #42
20200218160
2020-07-09

METHOD FOR CHARACTERISING AT LEAST ONE OPTICAL COMPONENT OF A PROJECTION EXPOSURE APPARATUS

 #43
20200142319
2020-05-07

Alignment measurement system

 #44
20200117098
2020-04-16

Light irradiation method

 #45
20200103757
2020-04-02

Exposure method, exposure apparatus, and device manufacturing method

 #46
20200098486
2020-03-26

Method and apparatus for determining a radiation beam intensity profile

 #47
20200089125
2020-03-19

Method for of measuring a parameter relating to a structure formed using a lithographic process

 #48
20200064744
2020-02-27

Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method

 #49
20200033734
2020-01-30

Mirror array

 #50
20200012198
2020-01-09

Determination of stack difference and correction using stack difference

 #51
20200003655
2020-01-02

Measurement apparatus for measuring a wavefront aberration of an imaging optical system

 #52
20190369500
2019-12-05

Optical lithography process adapted for a sample comprising at least one fragile light emitter

 #53
20190361355
2019-11-28

Evaluation method, exposure method, and method for manufacturing an article

 #54
20190346771
2019-11-14

Method of measuring a structure, inspection apparatus, lithographic system, device manufacturing method and wavelength-selective filter for use therein

 #55
20190346770
2019-11-14

Exposure apparatus and exposure method, and device manufacturing method

 #56
20190271915
2019-09-05

Determination of stack difference and correction using stack difference

 #57
20190250522
2019-08-15

System and method for performing lithography process in semiconductor device fabrication

 #58
20190155166
2019-05-23

METHOD FOR OPERATING AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

 #59
20190146353
2019-05-16

Method for adjusting a lighting setting

 #60
20190094703
2019-03-28

Method to determine a patterning process parameter

 #61
20190064668
2019-02-28

Exposure method, exposure apparatus, and device manufacturing method

 #62
20190025707
2019-01-24

Determination of stack difference and correction using stack difference

 #63
20190011839
2019-01-10

Method and device for characterizing a mask for microlithography

 #64
20180373152
2018-12-27

Exposure method, exposure apparatus, and device manufacturing method

 #65
20180348638
2018-12-06

Exposure method, exposure apparatus, and device manufacturing method

 #66
20180348145
2018-12-06

Methods and apparatus for predicting performance of a measurement method, measurement method and apparatus

 #67
20180341182
2018-11-29

Method of measuring a parameter of interest, inspection apparatus, lithographic system and device manufacturing method

 #68
20180321598
2018-11-08

Method of measuring a parameter of interest, device manufacturing method, metrology apparatus, and lithographic system

 #69
20180299787
2018-10-18

METHOD FOR MEASURING AN ANGULARLY RESOLVED INTENSITY DISTRIBUTION AND PROJECTION EXPOSURE APPARATUS

 #70
20180284619
2018-10-04

Exposure apparatus and exposure method, and flat panel display manufacturing method

 #71
20180246415
2018-08-30

METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

 #72
20180203362
2018-07-19

Lithographic apparatus and method

 #73
20180196350
2018-07-12

Projection exposure apparatus and method for measuring an imaging aberration

 #74
20180136566
2018-05-17

Exposure apparatus and exposure method, and device manufacturing method

 #75
20180059554
2018-03-01

Carrier method, exposure method, carrier system and exposure apparatus, and device manufacturing method

 #76
20180024439
2018-01-25

Method for operating an illumination system of a microlithographic projection exposure apparatus

 #77
20170371249
2017-12-28

EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

 #78
20170307983
2017-10-26

Determination of stack difference and correction using stack difference

 #79
20170293229
2017-10-12

Illumination system

 #80
20170261862
2017-09-14

Maskless lithographic apparatus measuring accumulated amount of light

 #81
20170261856
2017-09-14

Exposure method, exposure apparatus, and device manufacturing method

 #82
20170248852
2017-08-31

Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method

 #83
20170242343
2017-08-24

Method of measuring a structure, inspection apparatus, lithographic system, device manufacturing method and wavelength-selective filter for use therein

 #84
20170235231
2017-08-17

Exposure apparatus and exposure method, and device manufacturing method

 #85
20170168312
2017-06-15

Flexible illuminator

 #86
20170123323
2017-05-04

Method of operating a patterning device and lithographic apparatus

 #87
20170102620
2017-04-13

Method and apparatus for inspection and metrology

 #88
20170082929
2017-03-23

ILLUMINATION APPARATUS FOR A PROJECTION EXPOSURE SYSTEM

 #89
20170052455
2017-02-23

Reduction of hotspots of dense features

 #90
20170031246
2017-02-02

Inspection Apparatus, Inspection Method and Manufacturing Method

 #91
20170003604
2017-01-05

Exposure method, exposure apparatus, and device manufacturing method

 #92
20170003601
2017-01-05

Exposure method, exposure apparatus, and device manufacturing method

 #93
20160274456
2016-09-22

Method and apparatus for estimating focus and dose of an exposure process

 #94
20160266502
2016-09-15

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

 #95
20160266500
2016-09-15

EXPOSURE APPARATUS, EXPOSURE METHOD, AND MANUFACTURING METHOD OF DEVICE

 #96
20160259254
2016-09-08

Carrier method, exposure method, carrier system and exposure apparatus, and device manufacturing method

 #97
20160246180
2016-08-25

Method for operating an illumination system of a microlithographic projection exposure apparatus

 #98
20160209755
2016-07-21

Method and apparatuses for optical pupil symmetrization

 #99
20160202118
2016-07-14

Apparatus for determining an optical property of an optical imaging system

 #100
20160195819
2016-07-07

Radiation source and lithographic apparatus

 #101
20160124318
2016-05-05

Exposure method, exposure apparatus, and article manufacturing method

 #102
20160116849
2016-04-28

Method of determining critical-dimension-related properties, inspection apparatus and device manufacturing method

 #103
20160077444
2016-03-17

Method for operating an illumination system of a microlithographic projection exposure apparatus

 #104
20160054664
2016-02-25

System and method for performing lithography process in semiconductor device fabrication

 #105
20160011520
2016-01-14

Method for measuring an angularly resolved intensity distribution and projection exposure apparatus

 #106
20160004169
2016-01-07

Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method

 #107
20160004168
2016-01-07

Measuring an optical symmetry property on a projection exposure apparatus

 #108
20150362843
2015-12-17

Illumination device, exposure apparatus, adjusting method, and method for manufacturing object

 #109
20150323786
2015-11-12

Method for evaluating and improving pupil luminance distribution, illumination optical system and adjustment method thereof, exposure apparatus, exposure method, and device manufacturing method

 #110
20150316856
2015-11-05

Position measurement system, grating for a position measurement system and method

 #111
20150308966
2015-10-29

Method and apparatus for determining lithographic quality of a structure

 #112
20150300807
2015-10-22

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

 #113
20150277234
2015-10-01

Method and system for reducing pole imbalance by adjusting exposure intensity

 #114
20150168849
2015-06-18

Method of operating a microlithographic apparatus

 #115
20150085271
2015-03-26

Projection exposure apparatus and method for controlling a projection exposure apparatus

 #116
20150029481
2015-01-29

Method of operating a patterning device and lithographic apparatus

 #117
20150029479
2015-01-29

Projection exposure method and projection exposure apparatus for microlithography

 #118
20140362363
2014-12-11

Methods for monitoring source symmetry of photolithography systems

 #119
20140354971
2014-12-04

Exposure method, exposure apparatus, and device manufacturing method

 #120
20140347644
2014-11-27

SYSTEM AND METHOD FOR PERFORMING LITHOGRAPHY PROCESS IN SEMICONDUCTOR DEVICE FABRICATION

 #121
20140340661
2014-11-20

Exposure apparatus and method of manufacturing article

 #122
20140320836
2014-10-30

LITHOGRAPHY APPARATUS, LITHOGRAPHY METHOD, AND METHOD FOR MANUFACTURING DEVICE

 #123
20140233006
2014-08-21

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

 #124
20140218703
2014-08-07

Illumination method, illumination optical device, and exposure device

 #125
20140186755
2014-07-03

Exposure apparatus and method of device fabrication

 #126
20140132940
2014-05-15

Exposure apparatus and exposure method, and device manufacturing method

 #127
20140063479
2014-03-06

Method for controlling exposure apparatus and exposure apparatus

 #128
20140009764
2014-01-09

Method for measuring an angularly resolved intensity distribution and projection exposure apparatus

 #129
20140009746
2014-01-09

Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method

 #130
20130335721
2013-12-19

Measurement of the position of a radiation beam spot in lithography

 #131
20130293962
2013-11-07

Irradiation module for a measuring apparatus

 #132
20130265559
2013-10-10

Illumination optical system, exposure apparatus, and device manufacturing method

 #133
20130258095
2013-10-03

OPTICAL APPARATUS, MEASURING APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

 #134
20130194562
2013-08-01

Lithographic Apparatus and Device Manufacturing Method

 #135
20130182264
2013-07-18

Projection Exposure Tool for Microlithography and Method for Microlithographic Exposure

 #136
20130177857
2013-07-11

Carrier method, exposure method, carrier system and exposure apparatus, and device manufacturing method

 #137
20130176547
2013-07-11

Lithographic apparatus and a method for determining a polarization property of a projection system using an adjustable polarizer and interferometric sensor

 #138
20130141714
2013-06-06

Method of measuring uniformity of exposing light and exposure system for performing the same

 #139
20130100429
2013-04-25

Optical system and multi facet mirror of a microlithographic projection exposure apparatus

 #140
20130022901
2013-01-24

Radiation source, method of controlling a radiation source, lithographic apparatus, and method for manufacturing a device

 #141
20130009076
2013-01-10

Extreme ultraviolet light source and positioning method of light focusing optical means

 #142
20120327383
2012-12-27

System and method to ensure source and image stability

 #143
20120300195
2012-11-29

Method and apparatus for setting an illumination optical unit

 #144
20120293784
2012-11-22

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

 #145
20120248327
2012-10-04

Method and arrangement for the adjustment of characteristics of a beam bundle of high-energy radiation emitted from a plasma

 #146
20120244476
2012-09-27

Photolithography method including technique of determining distribution of energy of exposure light passing through slit of exposure apparatus

 #147
20120133914
2012-05-31

Method of operating a patterning device and lithographic apparatus

 #148
20120038898
2012-02-16

Lithographic apparatus and alignment method

 #149
20110255067
2011-10-20

Microlithography illumination systems, components and methods

 #150
20110205514
2011-08-25

Measuring method and measuring apparatus of pupil transmittance distribution, exposure method and exposure apparatus, and device manufacturing method

 #151
20110053062
2011-03-03

Exposure method, exposure apparatus, and device manufacturing method

 #152
20110032496
2011-02-10

Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method

 #153
20100321661
2010-12-23

Method for operating an illumination system of a microlithographic projection exposure apparatus

 #154
20100302525
2010-12-02

Lithographic apparatus and method for illumination uniformity correction and uniformity drift compensation

 #155
20100220303
2010-09-02

Optical system and method for characterising an optical system

 #156
20100214547
2010-08-26

Methods of determining quality of a light source

 #157
20100123086
2010-05-20

EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE

 #158
20100110406
2010-05-06

Exposure apparatus, method of controlling the same, and device manufacturing method

 #159
20100079738
2010-04-01

OPTICAL MEASUREMENT APPARATUS FOR A PROJECTION EXPOSURE SYSTEM

 #160
20100039629
2010-02-18

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

 #161
20100020302
2010-01-28

Projection exposure tool for microlithography with a measuring apparatus and method for measuring an irradiation strength distribution

 #162
20090233189
2009-09-17

DEVICE AND METHOD FOR OBTAINING EXPOSURE CORRECTION INFORMATION, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

 #163
20090161088
2009-06-25

Beam characterization monitor for sensing pointing or angle of an optical beam

 #164
20090042145
2009-02-12

Method for Detecting Light Intensity Distribution for Gradient Filter and Method for Improving Line Width Consistency

 #165
20080239258
2008-10-02

Residual pupil asymmetry compensator for a lithography scanner

 #166
20080212059
2008-09-04

Microlithography illumination systems, components and methods

 #167
20080204729
2008-08-28

Method and apparatus for determining at least one optical property of an imaging optical system

 #168
20080173789
2008-07-24

Methods for adjusting and evaluating light intensity distribution of illumination apparatus, illumination apparatus, exposure apparatus, and device manufacturing method

 #169
20080079939
2008-04-03

INSTRUMENT FOR MEASURING THE ANGULAR DISTRIBUTION OF LIGHT PRODUCED BY AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

 #170
20080043236
2008-02-21

Optical property measurement apparatus and optical property measurement method, exposure apparatus and exposure method, and device manufacturing method

 #171
20080030707
2008-02-07

Lighting optical device, regulation method for lighting optical device, exposure system, and exposure method

 #172
20080019586
2008-01-24

Methods of determining quality of a light source

 #173
20080017810
2008-01-24

Correction of spatial instability of an EUV source by laser beam steering

 #174
20070291245
2007-12-20

Wave front sensor with grey filter and lithographic apparatus comprising same

 #175
20070236691
2007-10-11

Exposure apparatus inspection method and exposure apparatus

 #176
20070229803
2007-10-04

Measurement method and apparatus, exposure apparatus, exposure method, and adjusting method

 #177
20070070329
2007-03-29

Illumination beam measurement

 #178
20060238736
2006-10-26

Exposure apparatus and exposure method

 #179
20060203221
2006-09-14

Lithographic apparatus and a method for determining a polarization property

 #180
20060192937
2006-08-31

Lithographic apparatus

 #181
20060175556
2006-08-10

ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

 #182
20060146309
2006-07-06

Method and system for real time uniformity feedback

 #183
20060072097
2006-04-06

Method for characterization of the illuminator in a lithographic system

 #184
20060018018
2006-01-26

Polarizing element, method of manufacturing polarizing element, method of evaluating exposure apparatus, method of manufacturing semiconductor device, and exposure apparatus

 #185
20050286037
2005-12-29

Semiconductor exposure apparatus and method for exposing semiconductor using the same

 #186
20050254122
2005-11-17

Apparatus for viewing and analyzing ultraviolet beams

 #187
20050254024
2005-11-17

Lithographic apparatus and device manufacturing method

 #188
20050243299
2005-11-03

Device and method for determining an illumination intensity profile of an illuminator for a lithography system

 #189
20050231705
2005-10-20

Apparatus and method for high resolution in-situ illumination source measurement in projection imaging systems

 #190
20050231703
2005-10-20

Exposure apparatus, and device manufacturing method

 #191
20050206879
2005-09-22

Lithographic apparatus and methods for use thereof

 #192
20050188341
2005-08-25

Mask data correction method, photomask manufacturing method, computer program, optical image prediction method, resist pattern shape prediction method, and semiconductor device manufacturing method

 #193
20050031974
2005-02-10

Inspection method, processor and method for manufacturing a semiconductor device

 #194
15667613
2018-10-02

Reconfiguring image brightness module and related method