177148 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure apparatus for microlithography; Mask illumination systems; Details of optical elements Capillary or channel elements, e.g. nested EUV mirrors
ILLUMINATION LIGHT GUIDE, ILLUMINATION OPTICS UNIT AND INSPECTION APPARATUS
#2PHOTOETCHING MACHINE WITH OPTICAL FIBER ARRAYS
#3RADIATION CONDUIT
#4EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM
#5EUV ILLUMINATION DEVICE AND METHOD FOR OPERATING A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS DESIGNED FOR OPERATION IN THE EUV
#6PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
#7HOLLOW-CORE OPTICAL FIBER BASED RADIATION SOURCE
#8MULTI-CHANNEL LIGHT SOURCE FOR PROJECTION OPTICS HEATING
#9METHOD FOR PRODUCING A MULTI-PART MIRROR OF A PROJECTION ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY
#10System and method for performing extreme ultraviolet photolithography processes
#11MIRROR, OPTICAL SYSTEM AND METHOD FOR OPERATING AN OPTICAL SYSTEM
#12WELDING METHOD FOR CREATING AN UPSCALED MASTER
#13Task completion in a tracking device environment
#14PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE, METHOD OF MANUFACTURING PELLICLE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#15EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD
#16EUV COLLECTOR
#17SEMICONDUCTOR SYSTEM INSPECTION TOOL AND METHODS OF OPERATION
#18Radiation conduit
#19System and method for performing extreme ultraviolet photolithography processes
#20Prolonging optical element lifetime in an EUV lithography system
#21Task completion in a tracking device environment
#22MIRROR ASSEMBLY AND OPTICAL ASSEMBLY COMPRISING SAME
#23High-brightness laser produced plasma source and method of generation and collection radiation
#24Extreme ultraviolet light source systems
#25Apparatus for generating extreme ultraviolet light and lithography apparatus including the same
#26Extreme ultraviolet lithography system
#27System and method for performing extreme ultraviolet photolithography processes
#28Thermal controlling method in lithography system
#29Optical diffraction component for suppressing at least one target wavelength by destructive interference
#30Mirror for an illumination optical unit of a projection exposure apparatus comprising a spectral filter in the form of a grating structure and method for producing a spectral filter in the form of a grating structure on a mirror
#31Tunable illuminator for lithography systems
#32Prolonging optical element lifetime in an EUV lithography system
#33Extreme ultraviolet lithography system
#34Method, measuring system and lithography apparatus
#35Method and apparatus for fabrication of very large scale integration pattern features via electroless deposition on extreme ultraviolet lithography photomasks
#36Task completion in a tracking device environment
#37EUV vessel inspection method and related system
#38Extreme ultraviolet chamber apparatus, extreme ultraviolet light generation system, and method for manufacturing electronic device
#39Extreme ultraviolet light generation device and electronic device manufacturing method
#40Optical diffraction component for suppressing at least one target wavelength by destructive interference
#41METHOD FOR CHARACTERISING AT LEAST ONE OPTICAL COMPONENT OF A PROJECTION EXPOSURE APPARATUS
#42Reflective optical element for EUV lithography and method for adapting a geometry of a component
#43Extreme ultraviolet light generation apparatus and maintenance method
#44Optical objective for operation in EUV spectral region
#45System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector
#46EUV vessel inspection method and related system
#47Target supply apparatus
#48EUV vessel inspection method and related system
#49Optical device for a lithography apparatus, and lithography apparatus
#50EUV cleaning systems and methods thereof for an extreme ultraviolet light source
#51Lithography apparatus
#52EUV MULTILAYER MIRROR
#53Illumination optics for EUV projection lithography
#54EUV-mirror, optical system with EUV-mirror and associated operating method
#55METHOD FOR CORRECTING THE SURFACE FORM OF A MIRROR
#56Linear light source generating device, exposure having linear light source generating device, and lenticular system used for linear light source generating device
#57Radiation collector, radiation source and lithographic apparatus
#58Systems and methods for synchronous operation of debris-mitigation devices
#59Source-collector device, lithographic apparatus, and device manufacturing method
#60EUV-mirror arrangement, optical system with EUV-mirror arrangement and associated operating method
#61Collector
#62Method of manufacturing mirror shells of a nested shells grazing incidence mirror
#63EUV collector system with enhanced EUV radiation collection
#64EUV collector
#65Extreme ultraviolet light source and positioning method of light focusing optical means
#66Collector mirror assembly and extreme ultraviolet light source device using said collector mirror assembly
#67Evaporative thermal management of grazing incidence collectors for EUV lithography
#68Method and arrangement for the adjustment of characteristics of a beam bundle of high-energy radiation emitted from a plasma
#69Foil trap device with improved heat resistance
#70Thermal management systems, assemblies and methods for grazing incidence collectors for EUV lithography
#71SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER
#72Source-collector module with GIC mirror and tin rod EUV LPP target system
#73Source-collector module with GIC mirror and tin wire EUV LPP target system
#74Source-collector module with GIC mirror and xenon ice EUV LPP target system
#75Source-collector module with GIC mirror and xenon liquid EUV LPP target system
#76Projection Exposure System, Beam Delivery System and Method of Generating a Beam of Light
#77Source-collector module with GIC mirror and tin vapor LPP target system
#78EUV collector system with enhanced EUV radiation collection
#79Adjustable clips for grazing-incidence collectors
#80OPTICAL COMPONENT HAVING AN IMPROVED TRANSIENT THERMAL BEHAVIOR AND METHOD FOR IMPROVING THE TRANSIENT THERMAL BEHAVIOR OF AN OPTICAL COMPONENT
#81Stress-decoupling devices and methods for cooled mirror systems
#82Cooled spider and method for grazing-incidence collectors
#83Source-collector module with GIC mirror and LPP EUV light source
#84Radiation Collector
#85Method and device for cleaning at least one optical component
#86Grazing incidence collector optical systems for EUV and X-ray applications
#87Grazing incidence collector for laser produced plasma sources
#88Radiation system with contamination barrier
#89METHOD FOR PRODUCING AN OPTICAL ELEMENT THROUGH A MOLDING PROCESS, OPTICAL ELEMENT PRODUCED ACCORDING TO THE METHOD, COLLECTOR, AND LIGHTING SYSTEM
#90Extreme ultraviolet light source
#91EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE
#92Collector optical system
#93MULTI-REFLECTION OPTICAL SYSTEMS AND THEIR FABRICATION
#94Method of cleaning optical surfaces of an irradiation unit in a two-step process
#95Coated mirrors and their fabrication
#96Illumination system particularly for microlithography
#97Faceted mirror apparatus
#98Illumination system particularly for microlithography
#99Lithographic apparatus with rotation filter device
#100Debris prevention system and lithographic apparatus
#101Optical component having an improved transient thermal behavior and method for improving the transient thermal behavior of an optical component
#102ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY
#103Projection exposure system, beam delivery system and method of generating a beam of light
#104COLLECTOR FOR ILLUMINATION SYSTEMS WITH A WAVELENGTH LESS THAN OR EQUAL TO 193 nm
#105ILLUMINATION SYSTEM WITH VARIABLE ADJUSTMENT OF THE ILLUMINATION
#106EUV illumination system having a folding geometry
#107Illumination system particularly for microlithography
#108Extreme UV radiation focusing mirror and extreme UV radiation source device
#109High-Precision Optical Surface Prepared by Sagging from a Masterpiece
#110Extreme ultraviolet radiation source device
#111Reflective optical illumination collector
#112Contamination barrier and lithographic apparatus
#113Collector with fastening devices for fastening mirror shells
#114Extreme ultraviolet light source
#115Collector for an illumination system
#116Collector configured of mirror shells
#117Plasma-based debris mitigation for extreme ultraviolet (EUV) light source
#118Contamination barrier with expandable lamellas
#119FACETED MIRROR APPARATUS
#120ARRANGEMENT AND METHOD FOR THE GENERATION OF EUV RADIATION OF HIGH AVERAGE OUTPUT
#121Lithographic apparatus and device manufacturing method
#122Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement
#123Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement
#124Controlling the flow through the collector during cleaning
#125Illumination system particularly for microlithography
#126Optical systems that correct optical irregularities, and projection-exposure systems and methods comprising same
#127Systems for protecting internal components of a EUV light source from plasma-generated debris
#128Discharge produced plasma EUV light source
#129Lithographic apparatus, contaminant trap, and device manufacturing method
#130Systems for protecting internal components of an EUV light source from plasma-generated debris
#131Lithographic apparatus, contaminant trap, and device manufacturing method
#132Collector with fastening devices for fastening mirror shells
#133Lithographic apparatus and cleaning method therefor
#134Lithographic apparatus and cleaning method therefor
#135Radiation system and lithographic apparatus
#136Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method
#137Illumination system particularly for microlithography
#138Filter for retaining a substance originating from a radiation source and method for the manufacture of the same
#139Collector mirror for plasma-based, short-wavelength radiation sources
#140Systems for protecting internal components of an EUV light source from plasma-generated debris
#141Collector having unused region for illumination systems using a wavelength ≦193 nm
#142Optical component having an improved transient thermal behavior and method for improving the transient thermal behavior of an optical component
#143Optical device
#144Apparatus for generating light in the extreme ultraviolet and use in a light source for extreme ultraviolet lithography
#145Illumination system having a more efficient collector optic
#146Lithographic projection apparatus and reflector assembly for use therein
#147Radiation source, lithographic apparatus, and device manufacturing method
#148Extreme ultraviolet light source
#149Extreme ultraviolet exposure apparatus and vacuum chamber
#150Grazing incidence relays
#151Lithographic apparatus, device manufacturing method, and device manufactured thereby
#152Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method
#153Lithographic apparatus with contamination suppression, device manufacturing method, and device manufactured thereby
#154Mirror for use in a lithographic apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby
#155Method for the production of a facetted mirror
#156Lithographic projection apparatus, particle barrier for use therein, integrated structure manufacturing method, and device manufactured thereby
#157Collector unit with a reflective element for illumination systems with a wavelength of smaller than 193 nm
#158Illumination system having a nested collector for annular illumination of an exit pupil
#159Illumination system particularly for microlithography
#160Plasma-based debris mitigation for extreme ultraviolet (EUV) light source
#161Curved honeycomb article, EUV apparatus having a curved honeycomb article, and method of making a curved honeycomb article
#162EUV illumination system having a folding geometry