Patents-Review.com
ClassID:

177150 ⎘

G03F7/70183 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure apparatus for microlithography; Mask illumination systems; Details of optical elements Zoom systems

Recent Application in this class:
#1
20250321508
2025-10-16

LENS REBUILDING SYSTEM AND METHOD OF REBUILDING DAMAGED LENS IN LITHOGRAPHY TOOL

 #2
20240377753
2024-11-14

DYNAMIC FREEFORM OPTICS FOR LITHOGRAPHY ILLUMINATION BEAM SHAPING

 #3
20230137707
2023-05-04

MAGNIFICATION ADJUSTABLE PROJECTION SYSTEM USING MOVABLE LENS PLATES

 #4
20180224750
2018-08-09

Illumination system for EUV projection lithography

 #5
20160252823
2016-09-01

Illumination system for EUV projection lithography

 #6
20150334813
2015-11-19

Beam delivery for EUV lithography

 #7
20140055764
2014-02-27

Lithographic apparatus, programmable patterning device and lithographic method

 #8
20110188016
2011-08-04

Lithographic apparatus, programmable patterning device and lithographic method

 #9
20090091735
2009-04-09

Illumination optical system and exposure apparatus having the same

 #10
20090002671
2009-01-01

Illumination optical apparatus, exposure apparatus, and device manufacturing method

 #11
20080218719
2008-09-11

Exposure apparatus

 #12
20080212327
2008-09-04

Illumination system of a microlithographic exposure apparatus

 #13
20080212061
2008-09-04

Illumination optical system, exposure apparatus, and device manufacturing method

 #14
20070296974
2007-12-27

Correction of off-axis translation of optical elements in an optical zoom assembly

 #15
20070236784
2007-10-11

Illumination system with zoom objective

 #16
20070146674
2007-06-28

Advanced Illumination System for Use in Microlithography

 #17
20070076185
2007-04-05

Photolithographic method using exposure system for controlling vertical CD difference

 #18
20070053033
2007-03-08

Exposure apparatus

 #19
20060289412
2006-12-28

Laser beam irradiation apparatus and pattern drawing method

 #20
20060146384
2006-07-06

Optical beam transformation system and illumination system comprising an optical beam transformation system

 #21
20060132742
2006-06-22

Lithographic apparatus and device manufacturing method

 #22
20060119947
2006-06-08

Efficiently illuminating a modulating device

 #23
20060050259
2006-03-09

Exposure apparatus and method, and device fabricating method using the same

 #24
20050280796
2005-12-22

Illumination optical system and method, and exposure apparatus

 #25
20050219495
2005-10-06

Beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus

 #26
20050100072
2005-05-12

High power laser output beam energy density reduction

 #27
20050094997
2005-05-05

Illumination optical system and exposure apparatus having the same

 #28
20050073666
2005-04-07

Illumination optical system and exposure apparatus having the same

 #29
20050007677
2005-01-13

Illumination system and method allowing for varying of both field height and pupil