Patents-Review.com
ClassID:

177153 ⎘

G03F7/70208 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure apparatus for microlithography; Mask illumination systems Multiple illumination paths, e.g. radiation distribution device, multiplexer, demultiplexer for single or multiple projection systems

Recent Application in this class:
#1
20250355353
2025-11-20

PHOTOHARDENABLE COMPOSITIONS AND METHODS OF FORMING AN OBJECT

 #2
20250321497
2025-10-16

ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

 #3
20250306470
2025-10-02

PATTERN EXPOSURE DEVICE AND DEVICE MANUFACTURING METHOD

 #4
20250164893
2025-05-22

APPARATUS AND METHOD FOR PROVIDING SENSOR DATA OF AN OPTICAL SYSTEM, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS HAVING AN OPTICAL SYSTEM

 #5
20250130506
2025-04-24

DEVICE FOR REPLICATING A MASTER HOLOGRAPHIC OPTICAL ELEMENT WITH VARIABLE ILLUMINATION

 #6
20250068083
2025-02-27

CATADIOPTRIC PROJECTION OBJECTIVE, PROJECTION ILLUMINATION SYSTEM AND PROJECTION ILLUMINATION METHOD

 #7
20250068081
2025-02-27

ILLUMINATION SYSTEM, PROJECTION ILLUMINATION FACILITY AND PROJECTION ILLUMINATION METHOD

 #8
20250068071
2025-02-27

PHOTOHARDENABLE COMPOSITIONS AND METHODS OF FORMING AN OBJECT

 #9
20250028250
2025-01-23

ARRANGEMENT, METHOD AND COMPUTER PROGRAM PRODUCT FOR CALIBRATING FACET MIRRORS

 #10
20240077803
2024-03-07

MULTI-CHANNEL LIGHT SOURCE FOR PROJECTION OPTICS HEATING

 #11
20240025003
2024-01-25

METHOD OF PRODUCING AN OPTICAL ELEMENT FOR A LITHOGRAPHY APPARATUS

 #12
20230280658
2023-09-07

DEVICE AND METHOD FOR REGULATING AND CONTROLLING INCIDENT ANGLE OF LIGHT BEAM IN LASER INTERFERENCE LITHOGRAPHY

 #13
20220390853
2022-12-08

ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND ARTICLE MANUFACTURING METHOD

 #14
20220373897
2022-11-24

Lithography apparatus, patterning system, and method of patterning a layered structure

 #15
20220082954
2022-03-17

Imprint method, imprint apparatus, and film formation apparatus

 #16
20210240086
2021-08-05

Scattering lithography

 #17
20210124272
2021-04-29

Apparatus and related method to control radiation transmission through mask pattern

 #18
20210011388
2021-01-14

Exposure equipment and exposure method

 #19
20200249580
2020-08-06

Illumination optical system, exposure apparatus, and article manufacturing method

 #20
20190384187
2019-12-19

Projection lighting system for semiconductor lithography with an improved heat transfer

 #21
20190163074
2019-05-30

Exposure system, exposure device and exposure method

 #22
20180284622
2018-10-04

Illumination system of a microlithographic projection device and method for operating such a system

 #23
20180252930
2018-09-06

Beam splitting apparatus

 #24
20180196350
2018-07-12

Projection exposure apparatus and method for measuring an imaging aberration

 #25
20180136567
2018-05-17

Exposure apparatus, exposure apparatus adjustment method and storage medium

 #26
20180088471
2018-03-29

Pattern manufacturing apparatus, pattern manufacturing method, and pattern manufacturing program

 #27
20180059551
2018-03-01

Illumination system of a microlithographic projection exposure apparatus

 #28
20170293154
2017-10-12

Optical component for use in a radiation source module of a projection exposure system

 #29
20170261862
2017-09-14

Maskless lithographic apparatus measuring accumulated amount of light

 #30
20170082926
2017-03-23

Systems and methods for high-throughput and small-footprint scanning exposure for lithography

 #31
20160357114
2016-12-08

Beam distributing optical device and associated unit, system and apparatus

 #32
20160209758
2016-07-21

Illumination optical device, illumination method, and exposure method and device

 #33
20160209755
2016-07-21

Method and apparatuses for optical pupil symmetrization

 #34
20160091795
2016-03-31

Systems and methods for high-throughput and small-footprint scanning exposure for lithography

 #35
20160004167
2016-01-07

Microlithographic projection exposure apparatus illumination optics

 #36
20150253672
2015-09-10

Method of forming patterned layer, method of forming patterned photoresist layer, and active device array substrate

 #37
20150077731
2015-03-19

Systems and methods for high-throughput and small-footprint scanning exposure for lithography

 #38
20150015859
2015-01-15

Digital exposure device using digital micro-mirror device and a method for controlling the same

 #39
20140268078
2014-09-18

Electron beam lithography systems and methods including time division multiplex loading

 #40
20140233001
2014-08-21

APPARATUS AND METHOD FOR PERFORMING MULTI-BEAM BASED LITHOGRAPHY

 #41
20140176925
2014-06-26

Interference exposure device and method

 #42
20140118711
2014-05-01

Exposure device for the structured exposure of a surface

 #43
20130308111
2013-11-21

Exposure device

 #44
20130258305
2013-10-03

Scanned-spot-array EUV lithography system

 #45
20130235316
2013-09-12

Exposure apparatus, method of forming patterned layer, method of forming patterned photoresist layer, active device array substrate and patterned layer

 #46
20130083307
2013-04-04

Photo-alingment apparatus, and method for fabricating liquid crystal display

 #47
20120249989
2012-10-04

Illumination optical device, illumination method, and exposure method and device

 #48
20120212724
2012-08-23

Illumination optical system, exposure apparatus, and method of manufacturing device

 #49
20120082943
2012-04-05

DIFFRACTIVE PHOTO MASKS AND METHODS OF USING AND FABRICATING THE SAME

 #50
20120081687
2012-04-05

Interference projection exposure system and method of using same

 #51
20120081686
2012-04-05

Microlithographic projection exposure apparatus illumination optics

 #52
20120081685
2012-04-05

Microlithographic projection exposure apparatus illumination optics

 #53
20120013880
2012-01-19

Optical device and exposure apparatus including the same

 #54
20110223393
2011-09-15

Exposure apparatus, method of forming patterned layer, method of forming patterned photoresist layer, active device array substrate and patterned layer

 #55
20110216301
2011-09-08

LITHOGRAPHIC APPARATUS AND SCANNING METHOD

 #56
20110216297
2011-09-08

Lithographic apparatus and method

 #57
20110141443
2011-06-16

Imaging methods in scanning photolithography and a scanning photolithography device used in printing an image of a reticle onto a photosensitive substrate

 #58
20100321657
2010-12-23

Lithographic projection apparatus and method of compensating perturbation factors

 #59
20100283983
2010-11-11

Illumination apparatus for efficiently gathering illumination light

 #60
20100277708
2010-11-04

Illumination system of a microlithographic projection exposure apparatus

 #61
20100231879
2010-09-16

Exposure apparatus, exposure method, and device manufacturing method

 #62
20100183984
2010-07-22

MULTIPLEXING OF PULSED SOURCES

 #63
20100173250
2010-07-08

Method for a multiple exposure, microlithography projection exposure installation and a projection system

 #64
20100157268
2010-06-24

Illumination system of a microlithographic projection exposure apparatus

 #65
20100149669
2010-06-17

Method and Apparatus for Combining EUV Sources

 #66
20100149505
2010-06-17

EUV mask inspection system

 #67
20100091257
2010-04-15

Optical Imaging System and Method for Imaging Up to Four Reticles to a Single Imaging Location

 #68
20100079743
2010-04-01

Exposure apparatus, exposure method, and method for producing device

 #69
20100053583
2010-03-04

Exposure apparatus with an illumination system generating multiple illumination beams

 #70
20090257044
2009-10-15

Lithographic apparatus and device manufacturing method

 #71
20090251786
2009-10-08

Optical system for transforming numerical aperture

 #72
20090219498
2009-09-03

Illumination optical system, exposure apparatus, and device fabrication method

 #73
20090161224
2009-06-25

Device for illuminating an area and device for applying light to a work area

 #74
20090135396
2009-05-28

ILLUMINATING OPTICAL APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

 #75
20090092926
2009-04-09

Lithography systems and methods of manufacturing using thereof

 #76
20090091729
2009-04-09

Lithography Systems and Methods of Manufacturing Using Thereof

 #77
20090040490
2009-02-12

Illuminating optical apparatus, exposure apparatus and device manufacturing method

 #78
20090039292
2009-02-12

Exposure device

 #79
20080311526
2008-12-18

Method for a multiple exposure, microlithography projection exposure installation and a projection system

 #80
20080309906
2008-12-18

Illumination of a patterning device based on interference for use in a maskless lithography system

 #81
20080299499
2008-12-04

EXPOSURE METHOD, METHOD OF MANUFACTURING PLATE FOR FLAT PANEL DISPLAY, AND EXPOSURE APPARATUS

 #82
20080267248
2008-10-30

Exposure device

 #83
20080246932
2008-10-09

Exposure apparatus, device manufacturing method and exposure method

 #84
20080094600
2008-04-24

ILLUMINATION DEVICE AND MASK FOR MICROLITHOGRAPHY PROJECTION EXPOSURE SYSTEM, AND RELATED METHODS

 #85
20080070353
2008-03-20

Lithographic apparatus and device manufacturing method

 #86
20080013065
2008-01-17

Microlithographic projection exposure apparatus illumination optics

 #87
20080013062
2008-01-17

Exposure apparatus, exposure method, and device manufacturing method

 #88
20070279606
2007-12-06

Exposure apparatus, exposure method, and method for producing device

 #89
20070273858
2007-11-29

Exposure apparatus, exposure method, and device manufacturing method

 #90
20070273854
2007-11-29

Exposure apparatus, exposure method, and method for producing device

 #91
20070258077
2007-11-08

Illumination optical apparatus, exposure apparatus, and device manufacturing method

 #92
20070252968
2007-11-01

Exposure apparatus

 #93
20070242363
2007-10-18

Illumination optical apparatus, projection exposure apparatus, projection optical system, and device manufacturing method

 #94
20070242255
2007-10-18

Exposure apparatus, exposure method, and method for producing device

 #95
20070206172
2007-09-06

Lithographic apparatus and device manufacturing method

 #96
20070183054
2007-08-09

Optical system for transforming numerical aperture

 #97
20070181834
2007-08-09

ARRANGEMENT AND METHOD FOR THE GENERATION OF EUV RADIATION OF HIGH AVERAGE OUTPUT

 #98
20070139757
2007-06-21

SLM direct writer

 #99
20070013890
2007-01-18

Stage apparatus, lithographic apparatus and device manufacturing method having switch device for two illumination channels

 #100
20070013885
2007-01-18

Lithographic apparatus having masking parts and device manufacturing method

 #101
20060197931
2006-09-07

Printer and a method for recording a multi-level image

 #102
20060139603
2006-06-29

Mask superposition for multiple exposures

 #103
20060119824
2006-06-08

Lithographic apparatus and device manufacturing method

 #104
20060119819
2006-06-08

Projection exposure mask, projection exposure apparatus, and projection exposure method

 #105
20060114546
2006-06-01

Using time and/or power modulation to achieve dose gray-scale in optical maskless lithography

 #106
20060091327
2006-05-04

Radiation system, lithographic apparatus, device manufacturing method, and device manufactured thereby

 #107
20060017904
2006-01-26

Method and apparatus for photolithographic exposure using a redirected light path for secondary shot regions

 #108
20050213070
2005-09-29

Method for a multiple exposure, microlithography projection exposure installation and a projection system

 #109
20050195380
2005-09-08

Lithographic apparatus and device manufacturing method

 #110
20050179884
2005-08-18

Lithographic apparatus and device manufacturing method

 #111
20050094245
2005-05-05

Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography