177175 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure apparatus for microlithography; Imaging systems not otherwise provided for, e.g. multiphoton lithography; Imaging systems comprising means for converting one type of radiation into another type of radiation, systems comprising mask with photo-cathode; Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
LITHOGRAPHY SYSTEM AND RELATED METHODS FOR FORMING STRUCTURES OF DIFFERENT DEPTHS AND SHAPES
#2CYCLIC EXPOSURE SCANNING SYSTEM HAVING DISTRIBUTED MULTI-LENS AND METHOD THEREOF
#3CONVEYANCE APPARATUS, CONVEYANCE METHOD, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD
#4METHOD AND APPARATUS FOR CORRECTING PROXIMITY EFFECT OF ELECTRON BEAM
#5Method and apparatus for direct writing photoetching by parallel interpenetrating super-resolution high-speed laser
#6EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DISPLAY DEVICE USING THE SAME
#7Optical maskless
#8Dynamic cooling control for thermal stabilization for lithography system
#9Reserving spatial light modulator sections to address field non-uniformities
#10Dynamic cooling control for thermal stabilization for lithography system
#11Image exposure device
#12Liquid masks for microfabrication processes
#13Systems and methods of using solid state emitter arrays
#14Spatial light modulator with variable intensity diodes
#15Apparatus for direct write maskless lithography
#16Method and apparatus for direct write maskless lithography
#17Method and apparatus for direct write maskless lithography
#18Method and apparatus for direct write maskless lithography
#19Micro LED array illumination source
#20Light source arrangement for a photolithography exposure system and photolithography exposure system
#21Maskless lithographic apparatus measuring accumulated amount of light
#22Exposure head, exposure apparatus and method of operating an exposure head
#23Beam exposure device
#24Method for regulating a light source of a photolithography exposure system and exposure assembly for a photolithography device
#25Maskless exposure device, maskless exposure method and display substrate manufactured by the maskless exposure device and the maskless exposure method
#26Maskless exposure method and a maskless exposure device for performing the exposure method
#27Lithographic apparatus and device manufacturing method
#28Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program
#29Method for optical transmission of a structure into a recording medium
#30Lithography apparatus, a device manufacturing method, a method of manufacturing an attenuator
#31Lithographic apparatus and device manufacturing method
#32Device, lithographic apparatus, method for guiding radiation and device manufacturing method
#33Lithographic apparatus and device manufacturing method
#34Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method of calculating setpoint data and a computer program
#35Lithographic apparatus, device manufacturing method and computer program
#36Lithographic apparatus and device manufacturing method
#37Gantry apparatus
#38Lithographic apparatus, programmable patterning device and lithographic method
#39LED-based photolithographic illuminator with high collection efficiency
#40Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method
#41Measurement of the position of a radiation beam spot in lithography
#42Lithographic apparatus and device manufacturing method
#43Lithographic apparatus and device manufacturing method
#44Substrate handling apparatus and lithographic apparatus
#45LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
#46Lithographic apparatus and device manufacturing method
#47Lithographic apparatus and device manufacturing method
#48Lithographic apparatus and device manufacturing method
#49Maskless Exposure Apparatus
#50Gantry apparatus
#51Illumination system for use in a stereolithography apparatus
#52Illumination system for use in a stereolithography apparatus
#53Mask-less method and structure for patterning photosensitive material using optical fibers
#54System and method for manufacturing three dimensional integrated circuits
#55Laser driving device, optical scanning device, and image forming apparatus
#56EXPOSURE APPARATUS AND EXPOSING METHOD USING THE APPARATUS
#57Lithographic apparatus, programmable patterning device and lithographic method
#58EXPOSURE DEVICE
#59Writing apparatuses and methods
#60Method for marking objects
#61Device and method for producing a three-dimensional object by means of mask exposure
#62BIDIRECTIONAL IMAGING WITH VARYING INTENSITIES
#63Solid-state array for lithography illumination
#64MULTIPLEXING OF PULSED SOURCES
#65Method and device using rotating printing arm to project or view image across a workpiece
#66Controllable radiation lithographic apparatus and method
#67Photocathode lighting device, method for manufacturing the same and exposure apparatus using photocathode lighting device
#68Optical element with multiple primary light sources
#69PROCESS AND APPARATUS FOR THE PRODUCTION OF COLLIMATED UV RAYS FOR PHOTOLITHOGRAPHIC TRANSFER
#70Image recording apparatus and image recording method
#71Exposure method and exposure apparatus for photosensitive film
#72ULTRAVIOLET LIGHT-EMITTING DIODE EXPOSURE APPARATUS FOR MICROFABRICATION
#73Image Producing Methods and Image Producing Devices
#74Method For Producing an Image on a Material Sensitive to a Used Radiation, Method For Obtaining a Binary Hologram (Variants) and Methods For Producing an Image by Using Said Hologram
#75Mask-less method and structure for patterning photosensitive material using optical fibers
#76PATTERN EXPOSURE METHOD AND PATTERN EXPOSURE APPARATUS
#77Exposure method, method for manufacturing flat panel display substrate, and exposure apparatus
#78MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND METHOD FOR PRODUCING MICROSTRUCTURED COMPONENTS
#79Synchronous raster scanning lithographic system
#80POSITION DETECTING METHOD AND DEVICE, PATTERNING DEVICE, AND SUBJECT TO BE DETECTED
#81Device and method for producing a three-dimensional object by means of mask exposure
#82Platforms, apparatuses, systems and methods for processing and analyzing substrates
#83Device for changing pitch between light beam axes, and substrate exposure apparatus
#84Method and apparatus for patterning micro and nano structures using a mask-less process
#85Writing apparatuses and methods
#86Writing apparatuses and methods
#87Near-field photo-lithography using nano light emitting diodes
#88Plasmonic array for maskless lithography
#89Exposure system
#90Method and apparatus for producing color filter with a line-scan exposure technology by high-speed shutter control
#91Lensed fiber array for sub-micron optical lithography patterning
#92Multi-axis projection imaging system
#93Bi-wavelength optical intensity modulators using materials with saturable absorptions
#94Pattern exposure method and pattern exposure apparatus
#95System and method for maskless lithography using an array of sources and an array of focusing elements
#96System and method for manufacturing multiple light emitting diodes in parallel