177176 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure apparatus for microlithography; Imaging systems not otherwise provided for, e.g. multiphoton lithography; Imaging systems comprising means for converting one type of radiation into another type of radiation, systems comprising mask with photo-cathode; Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams Scanned exposure beam, e.g. raster-, rotary- and vector scanning
MULTIBEAM WRITING METHOD AND MULTIBEAM WRITING APPARATUS
#2SQUARE PIXEL PATTERNS FOR HIGH RESOLUTION DIGITAL LITHOGRAPHY
#3APERTURE CORRECTION AMOUNT CALCULATION METHOD FOR APERTURE ARRAY SUBSTRATE, APERTURE ARRAY SUBSTRATE, BLANKING APERTURE ARRAY SUBSTRATE, MULTIPLE CHARGED-PARTICLE BEAM WRITING APPARATUS, AND MULTIPLE CHARGED-PARTICLE BEAM WRITING METHOD
#4DIRECT IMAGING SYSTEM AND DIRECT IMAGING METHOD
#5METHODS AND SYSTEMS FOR GENERATING LINEWIDTH-OPTIMISED PATTERNS
#6SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS
#7ELECTRON PROBE POSITIONING PATTERN, DISPLACEMENT MEASUREMENT METHOD, AND POSITIONING CONTROL METHOD
#8METHOD FOR IMAGING A MASK LAYER WITH TWO IMAGING SETTINGS AND ASSOCIATED IMAGING SYSTEM
#9SCANNING ELECTRON MICROSCOPIC DIRECT-WRITE LITHOGRAPHY SYSTEM BASED ON A COMPLIANT NANO SERVO MOTION SYSTEM
#10MULTI HEAD SCANNING LITHOGRAPHIC LASER WRITER
#11METHOD FOR NON-INVASIVE PRODUCTION OF DEFINED STRUCTURES INSIDE COMPARTMENTS AND COMPARTMENT
#12CYCLIC EXPOSURE SCANNING SYSTEM HAVING DISTRIBUTED MULTI-LENS AND METHOD THEREOF
#13Digital lithography scan sequencing
#14Fabrication of Microscale Structures
#15Method and apparatus for direct writing photoetching by parallel interpenetrating super-resolution high-speed laser
#16Data inspection for digital lithography for HVM using offline and inline approach
#17NANO-SCALE LITHOGRAPHY METHOD
#18Adjustable Permanent Magnetic Lens Having Shunting Device
#19FREEFORM METROLOGY INFORMATION ACQUISITION SYSTEM
#20DRAWING METHOD, DRAWING DEVICE, AND PROGRAM
#21Method and device for pattern generation
#22Data inspection for digital lithography for HVM using offline and inline approach
#23SCANNING ELECTRON MICROSCOPIC DIRECT-WRITE LITHOGRAPHY SYSTEM BASED ON A COMPLIANT NANO SERVO MOTION SYSTEM
#24Method and device for processing print data and for printing according to such print data
#25REDUCING IMPACT OF CROSS-TALK BETWEEN MODULATORS THAT DRIVE A MULTI-CHANNEL AOM
#26Optical patterning systems and methods
#27Method and apparatus for illuminating image points
#28PATTERN FORMING SHEET, PATTERN MANUFACTURING APPARATUS, PATTERN MANUFACTURING METHOD, AND PATTERN MANUFACTURING PROGRAM
#29Reducing impact of cross-talk between modulators that drive a multi-channel AOM
#30Method for producing a 3D structure by means of laser lithography, and corresponding computer program product
#31Substrate processing apparatus, substrate processing method, and storage medium
#32Spatial light modulator with variable intensity diodes
#33Fluid flow device and method for making the same
#34Geometry vectorization for mask process correction
#35Method and apparatus for direct write maskless lithography
#36Stitchless direct imaging for high resolution electronic patterning
#37Drawing apparatus and drawing method
#38Photonic activation of reactants for sub-micron feature formation using depleted beams
#39Charged particle beam irradiation apparatus and device manufacturing method
#40Pattern forming sheet, pattern manufacturing apparatus, pattern manufacturing method, and pattern manufacturing program
#41Maskless lithographic apparatus measuring accumulated amount of light
#42Exposure head, exposure apparatus and method of operating an exposure head
#43Beam exposure device
#44Method and device for calibrating multiple energy rays for the additive manufacturing of an object
#45Exposure device and exposure method
#46Scanned-spot-array DUV lithography system
#47Scanning device
#48Lithographic apparatus and device manufacturing method
#49Lithography apparatus, stage apparatus, and method of manufacturing articles
#50Support for a movable element and lithography apparatus
#51Method of operating a microlithographic apparatus
#52Lithography apparatus, a device manufacturing method, a method of manufacturing an attenuator
#53Photonic activation of reactants for sub-micron feature formation using depleted beams
#54Adaptive pattern generation
#55Lithographic apparatus and device manufacturing method
#56Device, lithographic apparatus, method for guiding radiation and device manufacturing method
#57Lithographic apparatus and device manufacturing method
#58Lithographic apparatus and device manufacturing method
#59Method and device for writing photomasks with reduced mura errors
#60Method of generating patterns on doubly-curved surfaces
#61Z-axis focusing beam brush device and associated methods
#62Pixel blending for multiple charged-particle beam lithography
#63Lithographic apparatus, programmable patterning device and lithographic method
#64Lithographic apparatus, programmable patterning device and lithographic method
#65Lithographic apparatus, and patterning device for use in a lithographic process
#66Measurement of the position of a radiation beam spot in lithography
#67Lithographic apparatus and device manufacturing method
#68Large area nanopatterning method and apparatus
#69Multiple-grid exposure method
#70Lithographic apparatus and device manufacturing method
#71Method and system for charged particle beam lithography
#72LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
#73Lithographic apparatus and device manufacturing method
#74Lithographic apparatus and device manufacturing method
#75Lithographic apparatus and device manufacturing method
#76Criss-cross writing strategy
#77LARGE AREA NANOPATTERNING METHOD AND APPARATUS
#78Large area nanopatterning method and apparatus
#79Laser driving device, optical scanning device, and image forming apparatus
#80Lithographic apparatus, programmable patterning device and lithographic method
#81Exposure device and exposure method
#82LASER EXPOSURE METHOD, PHOTORESIST LAYER PROCESSING METHOD AND METHOD FOR MANUFACTURING PATTERNED CASTING
#83SYSTEM FOR COLLISION DETECTION BETWEEN OBJECTS
#84Writing apparatuses and methods
#85Pattern generator
#86Lithographic apparatus, and patterning device for use in a lithographic process
#87Method and device using rotating printing arm to project or view image across a workpiece
#88Large area nanopatterning method and apparatus
#89Exposure apparatus
#90Pattern generator
#91Pattern generator
#92Method for error reduction in lithography
#93METHOD OF AND SYSTEM FOR DRAWING
#94Photolithography system
#95Method and Device for Structuring a Substrate
#96Exposure system
#97Scanning probe microscopy inspection and modification system
#98Superresolution in microlithography and fluorescence microscopy
#99Synchronous raster scanning lithographic system
#100Scanning probe microscopy inspection and modification system
#101Pattern generator
#102Platforms, apparatuses, systems and methods for processing and analyzing substrates
#103Resonant scanning mirror
#104Lithographic Process
#105Device for changing pitch between light beam axes, and substrate exposure apparatus
#106Writing apparatuses and methods
#107Writing apparatuses and methods
#108Lithographic process
#109Scanning probe microscopy inspection and modification system
#110Compositions and methods involving direct write optical lithography
#111Exposure system
#112Scanning probe microscope assembly and method for making spectrophotometric, near-field, and scanning probe measurements
#113Laser beam pattern generator with a two-axis scan mirror
#114Pattern generator diffractive mirror methods and systems
#115Lithography exposure device having a plurality of radiation sources
#116Pattern generator
#117Pulse light pattern writer
#118Lithographic process
#119Compact AOM transducer array for use with phase shift imaging
#120Method and apparatus for printing large data flows
#121Pupil improvement of incoherent imaging systems for enhanced CD linearity
#122Method and device for producing exposed structures
#123Compositions and methods involving direct write optical lithography
#124Pattern generator mirror configurations
#125Scanning probe microscopy inspection and modification system
#126Superresolving microscopy apparatus
#127Compositions and methods involving direct write optical lithography
#128Apparatus for multiple beam deflection and intensity stabilization
#129Lithographic process