177179 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure apparatus for microlithography Imaging strategies, e.g. for increasing throughput, printing product fields larger than the image field, compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching, double patterning
Method of determining movement sequence, alignment apparatus, method and apparatus of designing optical system, and medium in which program realizing the designing method
#302Method of manufacturing semiconductor device
#303METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE
#304Methods for reducing spherical aberration effects in photolithography
#305Layout modification to eliminate line bending caused by line material shrinkage
#306Photomask, method of making a photomask and photolithography method and system using the same
#307Manufacturing aware design of integrated circuit layouts
#308Lithography method and system with correction of overlay offset errors caused by wafer processing
#309Reticles
#310Optical error minimization in a semiconductor manufacturing apparatus
#311Semiconductor integrated circuit device manufacturing method
#312Lithographic apparatus, device manufacturing method, code reading device and substrate
#313Exposure method
#314Substrate edge focus compensation
#315Process for fabricating semiconductor device and method for generating mask pattern data
#316Method for producing semiconductor patterns on a wafer
#317Plane waves to control critical dimension
#318Pattern writing system and pattern writing method
#319Methods and systems for controlling variation in dimensions of patterned features across a wafer
#320Lithographic apparatus and device manufacturing method that limits a portion of a patterning device used to pattern a beam
#321Optimization to avoid sidelobe printing
#322Lithographic apparatus and device manufacturing method
#323Reticles and methods of forming reticles
#324Pattern forming method and a semiconductor device manufacturing method
#325Exposure apparatus
#326Optimization of multiple feature lithography
#327Method for forming a lithography mask
#328Mask repeater and mask manufacturing method
#329Lithographic apparatus and device manufacturing method
#330Optical position assessment apparatus and method
#331Projection optical system, exposure apparatus, and exposure method
#332Lithographic apparatus and device manufacturing method
#333Compensation of reflective mask effects in lithography systems
#334System and method for exposure of partial edge die
#335Exposure method and apparatus
#336Method and apparatus for recording images on deformed image-recordable object
#337Lithographic apparatus, device manufacturing method, and device manufactured thereby
#338Method for optimizing wafer edge patterning
#339Exposure method and exposure apparatus
#340Method for correcting structure-size-dependent positioning errors in photolithography
#341Method to selectively correct critical dimension errors in the semiconductor industry
#342Wafer carrier
#343Exposure method, mask fabrication method, fabrication method of semiconductor device, and exposure apparatus
#344Exposure mask, method of designing and manufacturing the same, exposure method and apparatus, pattern forming method, and device manufacturing method
#345Method for adapting structure dimensions during the photolithographic projection of a pattern of structure elements onto a semiconductor wafer
#346Lithographic apparatus and device manufacturing method
#347Method and device for producing exposed structures
#348Method and system for designing manufacturable patterns that account for the pattern- and position-dependent nature of patterning processes
#349Lithographic apparatus and method utilizing dose control
#350Lithographic apparatus and device manufacturing method
#351Lithographic apparatus for imaging a front side or a back side of a substrate, method of substrate identification, device manufacturing method, substrate, and computer program
#352Device manufacturing method
#353Lithographic apparatus, device manufacturing method and device manufactured thereby
#354System and method for fabricating contact holes
#355Method for alleviating tolerance restrictions for feature sizes during fabrication of photomasks
#356Spatial light modulator and method for interleaving data
#357Semiconductor device having a plurality of photoelectric conversion elements, a transfer transistor, an amplifying transistor, a reset transistor, and a plurality of wirings defining an aperture of the photoelectric conversion elements
#358Method of manufacturing reliability checking and verification for lithography process using a calibrated eigen decomposition model
#359Method for performing transmission tuning of a mask pattern to improve process latitude
#360Lithographic apparatus and device manufacturing method
#361Handling of flat data for phase processing including growing shapes within bins to identify clusters
#362System and method for processing masks with oblique features
#363Method of forming contact hole and method of manufacturing semiconductor device
#364System and method for multi-project wafer shuttle service
#365Lithographic apparatus and device manufacturing method
#366User-friendly rule-based system and method for automatically generating photomask orders
#367Method of exposing a wafer to a light, and reticle, reticle assembly and exposing apparatus for performing the same
#368Contactless flash memory array
#369Method for exposing a substrate, patterning device, and lithographic apparatus
#370Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography
#371Immersion lithography process and mask layer structure applied in the same
#372Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light
#373Method involving a mask or a reticle
#374Lithographic processing optimization based on hypersampled correlations
#375Method of exposing wafer using scan-type exposure apparatus
#376Orientation dependent shielding for use with dipole illumination techniques
#377Method for exposing a substrate and lithographic projection apparatus
#378Method of defining forbidden pitches for a lithography exposure tool
#379Dual sided lithographic substrate imaging
#380Device and method of correcting exposure defects in photolithography
#381Frequency division multiplexing (FDM) lithography
#382Imaging apparatus
#383Methods for reducing spherical aberration effects in photolithography
#384Design and layout of phase shifting photolithographic masks
#385Design and layout of phase shifting photolithographic masks
#386Method, program product and apparatus of simultaneous optimization for NA-Sigma exposure settings and scattering bars OPC using a device layout
#387Exposure apparatus and stage device, and device manufacturing method
#388Lithographic apparatus and device manufacturing method
#389Lithographic apparatus and device manufacturing method
#390Constructing colorable wiring layouts with wide wires and sandwich rules
#391Methods, systems, and computer program product for implementing DRC clean multi-patterning process nodes with lateral fills in electronic designs