177182 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure apparatus for microlithography; Imaging strategies, e.g. for increasing throughput, printing product fields larger than the image field, compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching, double patterning Hybrid exposure, i.e. combining different types of exposure, e.g. projection, proximity, direct write, interferometric, uv, x-ray, particle beam
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME
#2METHOD OF FORMING PATTERNS, SEMICONDUCTOR MEMORY DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR MEMORY DEVICE
#3Bottom-Up Main Pole Electroplating For A Magnetic Recording Write Head
#4METHOD OF FABRICATING SEMICONDUCTOR DEVICE
#5MICROLITHOGRAPHIC FABRICATION OF STRUCTURES
#6MEDICAL DIAGNOSTIC CHIP AND METHOD FOR MANUFACTURING THE MEDICAL DIAGNOSTIC CHIP
#7Microlithographic fabrication of structures
#8MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
#9Microlithographic fabrication of structures
#10Method to enhance the resolution of maskless lithography while maintaining a high image contrast
#11Method of manufacturing pattern and article manufacturing method
#12Electron-beam lithography process adapted for a sample comprising at least one fragile nanostructure
#13Projection lighting system for semiconductor lithography with an improved heat transfer
#14Apparatus for lithographically forming wafer identification marks and alignment marks
#15Microlithographic illumination unit
#16Maskless photolithographic system in cooperative working mode for cross-scale structure
#17Reproduction of a stem cell niche of an organism and method for the generation thereof
#18Pattern manufacturing apparatus, pattern manufacturing method, and pattern manufacturing program
#19Pattern forming sheet, pattern manufacturing apparatus, pattern manufacturing method, and pattern manufacturing program
#20Microlithographic fabrication of structures
#21HEAT ACTUATED AND PROJECTED LITHOGRAPHY SYSTEMS AND METHODS
#22Real-time variable parameter micro-nano optical field modulation system and interference lithography system
#23Extreme ultraviolet (EUV) exposure system and method of manufacturing semiconductor device using the same
#24Method for printing colour images
#25Lithography method, determination method, information processing apparatus, storage medium, and method of manufacturing article
#26Pattern forming method and method of manufacturing article
#27Pattern formation method and article manufacturing method
#28Multiscale patterning of a sample with apparatus having both thermo-optical lithography capability and thermal scanning probe lithography capability
#29Electron-beam (E-beam) based semiconductor device features
#30Apparatus and method of direct writing with photons beyond the diffraction limit
#31Heat actuated and projected lithography systems and methods
#32Lithographic method and apparatus
#33Combining cut mask lithography and conventional lithography to achieve sub-threshold pattern features
#34Reticle defect correction by second exposure
#35Sub-diffraction-limited patterning and imaging via multi-step photoswitching
#36Transverse electric-field type liquid crystal display device, process of manufacturing the same, and scan-exposing device
#37Exposure device
#38Method and system for modifying photoresist using electromagnetic radiation and ion implantation
#39Reticle defect correction by second exposure
#40Reticle defect correction by second exposure
#41Lithographic CD correction by second exposure
#42Method and system for modifying photoresist using electromagnetic radiation and ion implantation
#43Exposure method and method of making a semiconductor device
#44Method to fabricate a redirecting mirror in optical waveguide devices
#45Dual wavelength exposure method and system for semiconductor device manufacturing
#46CLUSTER E-BEAM LITHOGRAPHY SYSTEM
#47INTEGRATED INTERFERENCE-ASSISTED LITHOGRAPHY
#48WAFER EXPOSING METHOD, EUV EXPOSING APPARATUS, AND EB EXPOSING APPARATUS
#49PATTERNING RESOLUTION ENHANCEMENT COMBINING INTERFERENCE LITHOGRAPHY AND SELF-ALIGNED DOUBLE PATTERNING TECHNIQUES
#50High-Z structure and method for co-alignment of mixed optical and electron beam lithographic fabrication levels
#51Semiconductor device, method for manufacturing semiconductor device, and computer readable medium
#52CLUSTER E-BEAM LITHOGRAPHY SYSTEM
#53RESOLUTION ENHANCEMENT TECHNIQUES COMBINING INTERFERENCE-ASSISTED LITHOGRAPHY WITH OTHER PHOTOLITHOGRAPHY TECHNIQUES
#54RESOLUTION ENHANCEMENT TECHNIQUES COMBINING FOUR BEAM INTERFERENCE-ASSISTED LITHOGRAPHY WITH OTHER PHOTOLITHOGRAPHY TECHNIQUES
#55Lithographic apparatus and device manufacturing method
#56Method to fabricate a redirecting mirror in optical waveguide devices
#57Transverse electric-field type liquid crystal display device, process of manufacturing the same, and scan-exposing device
#58Exposure method, method for manufacturing flat panel display substrate, and exposure apparatus
#59Trench structure and method for co-alignment of mixed optical and electron beam lithographic fabrication levels
#60Method for co-alignment of mixed optical and electron beam lithographic fabrication levels
#61Method and apparatus for personalization of semiconductor
#62Method and apparatus for manufacturing band stop filter
#63Lithographic apparatus and device manufacturing method using interferometric and maskless exposure units
#64Lithographic method
#65Semiconductor manufacturing apparatus and method thereof
#66Resist pattern forming method and semiconductor device manufacturing method
#67Method and apparatus for personalization of semiconductor
#68Transverse electric-field type liquid crystal display device, process of manufacturing the same, and scan-exposing device
#69Transverse electric-field type liquid crystal display device, process of manufacturing the same, and scan-exposing device
#70Method to selectively correct critical dimension errors in the semiconductor industry
#71Combined e-beam and optical exposure semiconductor lithography
#72Composite optical lithography method for patterning lines of unequal width
#73Composite optical lithography method for patterning lines of significantly different widths
#74Optically addressed extreme ultraviolet modulator and lithography system incorporating modulator
#75Method and apparatus for personalization of semiconductor
#76Multiple exposure method for forming a patterned photoresist layer
#77Method and system for controlled ultraviolet light exposure