177184 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure apparatus for microlithography; Imaging strategies, e.g. for increasing throughput, printing product fields larger than the image field, compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching, double patterning Multiple exposures, e.g. combination of fine and coarse exposures, double patterning, multiple exposures for printing a single feature, mix-and-match
MASK, EXPOSURE METHOD AND TOUCH PANEL
#2SELF-EXCITATION LITHOGRAPHY METHOD WITH SELF-ALIGNMENT EFFECT
#3LAYOUT OF CIRCUIT STRUCTURE AND METHOD FOR FORMING CIRCUIT STRUCTURE
#4MASK, MASK STITCHING METHOD AND EXPOSURE METHOD
#5LITHOGRAPHIC SEAM IMPLEMENTATION FOR ACTIVE INTERCONNECT ROUTING ACROSS MULTIPLE RETICLE FIELDS
#6PROJECTION SYSTEM CONTROL
#7METHOD OF MANUFACTURING ISOLATION STRUCTURE
#8Lithography Using Spin Isolated Monochromatic Electromagnetic Radiation
#9OPTICAL ALIGNMENT SYSTEM AND METHOD
#10PREPARATION METHOD FOR GRID LINE, PREPARATION METHOD FOR CELL SHEET, AND PHOTOVOLTAIC CELL
#11WAFER EXPOSURE LAYOUT METHOD
#12SEMICONDUCTOR LITHOGRAPHY SYSTEM AND/OR METHOD
#13RESIST COMPOSITION FOR PHOTOLITHOGRAPHY AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICES USING THE SAME
#14METHOD FOR SELECTIVE EXPOSURE OF WAFER TO CORRECTIVE IRRADIATION AT A PER-DIE LEVEL
#15WAFER HOLDER APPARATUS, SYSTEM AND METHOD OF FORMING SAME
#16APPARATUS AND METHOD FOR CALIBRATING A FLUID DISPENSER
#17METHOD FOR PRODUCING OPTICAL ELEMENT
#18Exposure method of semiconductor pattern
#19EDGE PLACEMENT WITH SPATIAL LIGHT MODULATOR WRITING
#20METHOD OF FORMING ACTIVE REGION OF SEMICONDUCTOR DEVICE
#21METHOD OF FORMING ACTIVE REGION OF SEMICONDUCTOR DEVICE
#22LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD, INFORMATION PROCESSING METHOD, COMPUTER READABLE MEDIUM, AND INFORMATION PROCESSING APPARATUS
#23LITHOGRAPHY SYSTEM AND RELATED METHODS FOR FORMING STRUCTURES OF DIFFERENT DEPTHS AND SHAPES
#24UVC LED LIGHT FINISHER FOR DETACKING FLEXOGRAPHIC PRINTING PLATES
#25Material for Enhancing the Effects of Exercise
#26EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, EXPOSURE DEVICE, AND EXPOSURE SYSTEM
#27LOCAL SHADOW MASKING FOR MULTI-COLOR EXPOSURES
#28MASK, EXPOSURE METHOD AND TOUCH PANEL
#29Semiconductor lithography system and/or method
#30CRITICAL DIMENSION INSPECTION METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME
#31PHOTOMASK AND METHOD OF MANUFACTURING DISPLAY PANEL USING THE SAME
#32METHOD OF PROCESSING A SUBSTRATE
#33Method for coloring circuit layout and system for performing the same
#34Printed circuit board and method for manufacturing the same
#35LITHOGRAPHIC APPARATUS AND METHODS FOR MULTI-EXPOSURE OF A SUBSTRATE
#36METHODS TO IMPROVE PROCESS WINDOW AND RESOLUTION FOR DIGITAL LITHOGRAPHY WITH TWO EXPOSURES
#37METHOD AND DEVICE FOR THE EXPOSURE OF A PHOTOSENSITIVE COATING
#38METHOD OF MANUFACTURING PHOTO MASKS
#39INCREASING OVERLAY MARGINS FOR LINES THAT SPAN RETICLE BOUNDARIES IN DIE-TO-DIE RETICLE STITCHING
#40Fabrication technique for forming ultra-high density integrated circuit components
#41METHOD FOR MANUFACTURING RESIN ASYMMETRICAL STRUCTURES
#42Pattern decomposition method
#43Semiconductor lithography system and/or method
#44Method to achieve non-crystalline evenly distributed shot pattern for digital lithography
#45WET-DRY BILAYER RESIST DUAL TONE EXPOSURE
#46Method for manufacturing a plurality of resonators in a wafer
#47WET-DRY BILAYER RESIST
#48Selective patterning with wet-dry bilayer resist
#49Mask, exposure method and touch panel
#50Method for coloring circuit layout and system for performing the same
#51Method for manufacturing semiconductor structure
#52PHOTOMASK ASSEMBLY, PATTERNED MASK AND METHOD FOR FORMING THE SAME, AND METHOD FOR FORMING ACTIVE REGION
#53SYSTEM AND METHOD FOR DOUBLE-SIDED DIGITAL LITHOGRAPHY OR EXPOSURE
#54System and method for overlay error reduction
#55Semiconductor device manufacturing system
#56Method for producing overlay results with absolute reference for semiconductor manufacturing
#57Method of pattern alignment for field stitching
#58Coaxial see-through alignment imaging system
#59COAXIAL SEE-THROUGH INSPECTION SYSTEM
#60Tunable wavelength see-through layer stack
#61Method for producing overlay results with absolute reference for semiconductor manufacturing
#62Semiconductor lithography system and/or method
#63Method of manufacturing photo masks
#64Method for extreme ultraviolet lithography mask treatment
#65Overlay-shift measurement system
#66Method and apparatus for illuminating image points
#67Method for performing a manufacturing process and associated apparatuses
#68Lithography Method With Reduced Impacts of Mask Defects
#69SYSTEMS AND METHODS FOR HIERARCHICAL EXPOSURE OF AN INTEGRATED CIRCUIT HAVING MULTIPLE INTERCONNECTED DIE
#70Method for Manufacturing a Sensor Device
#71Digital exposure machine and exposure control method thereof
#72Mask and method for manufacturing the same, lithography method, display panel, display device and exposure device
#73Picometer optical comb, and device and method for generating the same
#74Method for coloring circuit layout and system for performing the same
#75Lithographic apparatus and method
#76Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing method
#77Dense line extreme ultraviolet lithography system with distortion matching
#78Method to mitigate defect printability for ID pattern
#79Substrate, metrology apparatus and associated methods for a lithographic process
#80Systems and methods for hierarchical exposure of an integrated circuit having multiple interconnected die
#81Compositions containing an etheramine
#82Method of decomposing a layout for multiple-patterning lithography
#83Line break repairing layer for extreme ultraviolet patterning stacks
#84Method and apparatus for determining positions of a plurality of pixels to be introduced in a substrate of a photolithographic mask
#85Projection exposure method and projection exposure apparatus for microlithography
#86Method to enhance the resolution of maskless lithography while maintaining a high image contrast
#87Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
#88Method for coloring circuit layout and system for performing the same
#89Substrate processing apparatus, substrate processing method, and storage medium
#90Integrated circuit for multiple patterning lithography, a computing system and a computer-implemented method for designing an integrated circuit
#91Proximity exposure method
#92Pattern formation method using a photo mask for manufacturing a semiconductor device
#93Systems and methods for patterning color assignment
#94Method for extreme ultraviolet lithography mask treatment
#95Method of predicting patterning defects caused by overlay error
#96PHOTOLITHOGRAPHY SYSTEM AND METHOD USING A RETICLE WITH MULTIPLE DIFFERENT SETS OF REDUNDANT FRAMED MASK PATTERNS
#97Apparatus for lithographically forming wafer identification marks and alignment marks
#98Mark structure for aligning layers of integrated circuit structure and methods of forming same
#99Hybrid evolutionary algorithm for triple-patterning
#100Mechanisms for forming patterns using multiple lithography processes
#101Method of decomposing a layout for multiple-patterning lithography
#102Method for the microlithographic production of microstructured components
#103Mask, related display device, and related exposure method for manufacturing display device
#104Method for monitoring nanometric structures
#105Dense line extreme ultraviolet lithography system with distortion matching
#106Projection exposure method and projection exposure apparatus for microlithography
#107Method for exposing transparent substrate
#108Methods of fabricating integrated circuit devices
#109Method for producing a pattern of features by lithography and etching
#110Method of forming semiconductor structure
#111Overlay-shift measurement system and method for manufacturing semiconductor structure and measuring alignment mark of semiconductor structure
#112Displacement based overlay or alignment
#113Method of manufacturing photo masks
#114Mask and fabrication method thereof, display panel and touch panel
#115Method for coloring circuit layout and system for performing the same
#116Semiconductor device and method for manufacturing same
#117Method of determining a parameter of a pattern transfer process, device manufacturing method
#118Substrate, metrology apparatus and associated methods for a lithographic process
#119Critical dimension control by use of a photo agent
#120Lithography method with reduced impacts of mask defects
#121Mask assembly and lithography method using the same
#122Stitchless direct imaging for high resolution electronic patterning
#123Dynamic patterning method that removes phase conflicts and improves pattern fidelity and CDU on a two phase-pixelated digital scanner
#124Coloring aware optimization
#125Method to mitigate defect printability for ID pattern
#126Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing method
#127Method for forming pattern and method for producing device
#128Maskless photolithographic system in cooperative working mode for cross-scale structure
#129Method and structures for personalizing lithography
#130Method for use in process control of manufacture of patterned sample
#131Integrated circuit and method of designing layout of integrated circuit
#132Integrated circuit, and computing system and computer-implemented method for designing integrated circuit
#133Computing system for performing colorless routing for quadruple patterning lithography
#134Integrated circuit for multiple patterning lithography, a computing system and a computer-implemented method for designing an integrated circuit
#135Multiple patterning decomposition and manufacturing methods for IC
#136Method of decomposing a layout for multiple-patterning lithography
#137Method for transferring a mark pattern to a substrate, a calibration method, and a lithographic apparatus
#138Reproduction of a stem cell niche of an organism and method for the generation thereof
#139Method and system for generating programmed defects for use in metrology measurements
#140Overlay alignment detection apparatus for display device and exposure process system
#141Extreme ultraviolet (EUV) exposure system and method of manufacturing semiconductor device using the same
#142Device manufacturing method and patterning devices for use in device manufacturing method
#143Mechanisms for forming patterns using multiple lithography processes
#144Test structure for use in metrology measurements of patterns
#145Method for printing colour images
#146Critical dimension control by use of a photo agent
#147Critical dimension control by use of photo-sensitized chemicals or photo-sensitized chemically amplified resist
#148Mask, manufacturing method thereof, patterning method employing mask, optical filter
#149Multi-pass patterning using nonreflecting radiation lithography on an underlying grating
#150Layer class relative density for technology modeling in IC technology
#151Light irradiation device and method for patterning self assembled monolayer
#152Multicolor photolithography materials and methods
#153Multiple patterning layout decomposition considering complex coloring rules
#154Exposure apparatus and article manufacturing method
#155Constructing fill shapes for double-patterning technology
#156Pattern data generation method, pattern data generation device, and mask
#157Systems and methods for group constraints in an integrated circuit layout
#158Hybrid coloring methodology for multi-pattern technology
#159Method and apparatus for correcting errors on a wafer processed by a photolithographic mask
#160Inspection methods, substrates having metrology targets, lithographic system and device manufacturing method
#161Layout design system, system and method for fabricating mask pattern using the same
#162Method and device for calibrating multiple energy rays for the additive manufacturing of an object
#163Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing method
#164Electron-beam (E-beam) based semiconductor device features
#165Method for patterning incorporating misalignment error protection
#166Image processing-based lithography system and method of coating target object
#167Generalization of shot definitions for mask and wafer writing tools
#168Method of decomposing layout design for preparing photomask set printed onto wafer by photolithography, method of forming photomask set and method of fabricating integrated circuit
#169Cut-mask patterning process for FIN-like field effect transistor (FINFET) device
#170Sub-diffraction-limited patterning and imaging
#171Resistive capacitance determination method for multiple-patterning-multiple spacer integrated circuit layout
#172Conflict detection for self-aligned multiple patterning compliance
#173Matrix reduction for lithography simulation
#174Integrated circuit and method of designing layout of integrated circuit
#175Method of decomposing layout of semiconductor device for quadruple patterning technology process and method of manufacturing semiconductor device using the same
#176Layout pattern decomposition method
#177Extreme ultraviolet lithography process and mask
#178Method for producing a structure
#179Inspection for multiple process steps in a single inspection process
#180Microlithographic projection exposure apparatus illumination optics
#181Mechanisms for forming patterns using multiple lithography processes
#182Apparatus and method of direct writing with photons beyond the diffraction limit
#183Method for forming pattern and method for producing device
#184Simultaneous measurement of multiple overlay errors using diffraction based overlay
#185Overlay measurement of pitch walk in multiply patterned targets
#186Lithographic method and apparatus
#187Multiple-patterning photolithographic mask and method
#188Methods of patterning wafers using self-aligned double patterning processes
#189Method for integrated circuit fabrication
#190Merging lithography processes for gate patterning
#191Test macro for use with a multi-patterning lithography process
#192Pattern forming method, and, electronic device producing method and electronic device, each using the same
#193Legalizing a multi-patterning integrated circuit layout
#194Methods of dividing layouts and methods of manufacturing semiconductor devices using the same
#195Integration of lithography apparatus and mask optimization process with multiple patterning process
#196Exposure photolithography methods
#197Combining cut mask lithography and conventional lithography to achieve sub-threshold pattern features
#198Method for manufacturing micro-structure
#199Cell boundaries for self aligned multiple patterning abutments
#200Method and device for writing photomasks with reduced mura errors
#201Mask set for double exposure process and method of using the mask set
#202Reticle defect correction by second exposure
#203Hybrid evolutionary algorithm for triple-patterning
#204Method for determining mask pattern, non-transitory recording medium, and information processing apparatus
#205Double-mask photolithography method minimizing the impact of substrate defects
#206Patterning process and resist composition
#207Method of forming tight-pitched pattern
#208Pixel blending for multiple charged-particle beam lithography
#209Alignment target contrast in a lithographic double patterning process
#210Metal density distribution for double pattern lithography
#211Lithography process
#212Lithography masks, systems, and manufacturing methods
#213Pitch-aware multi-patterning lithography
#214Method of forming tight-pitched pattern
#215Method of preparing a pattern, method of forming a mask set, device manufacturing method and computer program
#216SYSTEM AND METHOD FOR GENERATING PHYSICAL DETERMINISTIC BOUNDARY INTERCONNECT FEATURES FOR DUAL PATTERNING TECHNOLOGIES
#217Automatic misalignment balancing scheme for multi-patterning technology
#218Method and apparatus for correcting errors on a wafer processed by a photolithographic mask
#219Integrated circuits and methods for fabricating integrated circuits using double patterning processes
#220Mask plate and exposing method
#221Mask set for double exposure process and method of using the mask set
#222Cut-mask patterning process for fin-like field effect transistor (FinFET) device
#223Reticle defect correction by second exposure
#224Optical system of a microlithographic projection exposure apparatus and method of reducing image placement errors
#225Simulation device and simulation program for simulating process using first and second masks
#226Mandrel modification for achieving single fin fin-like field effect transistor (FinFET) device
#227Overlay measurement for a double patterning
#228Photolithographic method
#229PHOTO-RESIST AND METHOD OF PHOTOLITHOGRAPHY
#230Photolithographic apparatus
#231Reticle defect correction by second exposure
#232Lithographic CD correction by second exposure
#233Lithographic CD correction by second exposure
#234Patterning process and resist composition
#235Generalization of shot definitions for mask and wafer writing tools
#236Mask assignment for multiple patterning lithography
#237Exposure method and exposure mask
#238Method, program product and apparatus for performing double exposure lithography
#239Optical proximity correction method
#240Method for forming pattern and method for manufacturing display device by using the same
#241Apparatus and Method for Providing Resist Alignment Marks in a Double Patterning Lithographic Process
#242Frequency domain layout decomposition in double patterning lithography
#243Patterning process and resist composition
#244Patterning process and resist composition
#245Criss-cross writing strategy
#246Exposure method for color filter substrate
#247Pattern measuring apparatus
#248Exposure method and exposure device
#249Integration of lithography apparatus and mask optimization process with multiple patterning process
#250RESIST PATTERN FORMATION METHOD
#251Image processing-based lithography system and method of coating target object
#252Method and apparatus of patterning semiconductor device
#253Two-track cross-connects in double-patterned metal layers using a forbidden zone
#254Pattern-split decomposition strategy for double-patterned lithography process
#255Hybrid pitch-split pattern-split lithography process
#256Pattern forming method and method for producing device
#257MULTIPLE PATTERNING CONSISTENCY PROCESSING
#258Photoresist compositions
#259Decomposition and marking of semiconductor device design layout in double patterning lithography
#260Lithographic processing method, and device manufactured thereby
#261Lithographic apparatus and device manufacturing method
#262Multiple exposure photolithography methods
#263Exposure Method, Exposure Apparatus, Light Converging Pattern Formation Member, Mask, and Device Manufacturing Method
#264Cell layout for multiple patterning technology
#265Simultaneous measurement of multiple overlay errors using diffraction based overlay
#266Method for fabricating fine pattern
#267Method for patterning trenches with varying dimension
#268MULTI-EXPOSURE LITHOGRAPHY EMPLOYING DIFFERENTIALLY SENSITIVE PHOTORESIST LAYERS
#269Lithography masks, systems, and manufacturing methods
#270METHOD AND APPARATUS FOR CORRECTING ERRORS ON A WAFER PROCESSED BY A PHOTOLITHOGRAPHIC MASK
#271IMMERSION MULTIPLE-EXPOSURE METHOD AND IMMERSION EXPOSURE SYSTEM FOR SEPARATELY PERFORMING MULTIPLE EXPOSURE OF MICROPATTERNS AND NON-MICROPATTERNS
#272Method for metal correlated via split for double patterning
#273Method and apparatus for achieving multiple patterning technology compliant design layout
#274Method and system for automatic generation of solutions for circuit design rule violations
#275Method and apparatus for performing model-based OPC for pattern decomposed features
#276System and method for model based multi-patterning optimization
#277Stitching methods using multiple microlithographic expose tools
#278Stitching methods using multiple microlithographic expose tools
#279Microlithographic projection exposure apparatus illumination optics
#280Microlithographic projection exposure apparatus illumination optics
#281Method for generating a plurality of optimized wavefronts for a multiple exposure lithographic process
#282Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process
#283CD metrology system and method of classifying similar structural elements
#284Mask-shift-aware RC extraction for double patterning design
#285Layout decomposition based on partial intensity distribution
#286Simultaneous optical proximity correction and decomposition for double exposure lithography
#287Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask
#288Correction of errors of a photolithographic mask using a joint optimization process
#289Multiple patterning lithography using spacer and self-aligned assist patterns
#290Methods of forming a pattern in a material and methods of forming openings in a material to be patterned
#291Beam pen lithography
#292Method for manufacturing micro-structure
#293Exposure apparatus, mask plate and exposing method
#294Method and device for imaging a radiation-sensitive substrate
#295Decomposition with multiple exposures in a process window based OPC flow using tolerance bands
#296Selective shielding for multiple exposure masks
#297Semiconductor lithography process
#298Selective shielding for multiple exposure masks
#299Method and apparatus of patterning semiconductor device
#300REDUCED PITCH MULTIPLE EXPOSURE PROCESS