ClassID:

177193

G03F7/70541 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure apparatus for microlithography; Information management, control, testing, and wafer monitoring, e.g. pattern monitoring; Information management and control, including software Tagging, i.e. hardware or software tagging of features or components

Recent Application in this class:
#1
20230378085
2023-11-23

METHOD FOR PRODUCING AN ELECTRONIC COMPONENT ASSEMBLY ON THE FRONT FACE OF A SEMI-CONDUCTOR WAFER

#2
20230350309
2023-11-02

IDENTIFICATION CODES ON SEMICONDUCTOR CHIPS

#3
20220342320
2022-10-27

Method for the tracking and identification of components of lithography systems, and lithography system

#4
20220146927
2022-05-12

Tag coordinate determination method and apparatus, computer-readable medium and electronic device

#5
20210181642
2021-06-17

Method and apparatus for pattern fidelity control

#6
20200379357
2020-12-03

Apparatus and method for monitoring reflectivity of the collector for extreme ultraviolet radiation source

#7
20200103746
2020-04-02

Apparatus and method for monitoring reflectivity of the collector for extreme ultraviolet radiation source

#8
20200026204
2020-01-23

Cleaning apparatus, imprint apparatus, lithography apparatus, and cleaning method

#9
20200019069
2020-01-16

Method and apparatus for pattern fidelity control

#10
20190259710
2019-08-22

Apparatus for lithographically forming wafer identification marks and alignment marks

#11
20190146358
2019-05-16

Displacement based overlay or alignment

#12
20180366415
2018-12-20

Method for lithographically forming wafer identification marks and alignment marks

#13
20180364597
2018-12-20

EXPOSURE APPARATUS, EXPOSURE METHOD, EXPOSURE APPARATUS MAINTENANCE METHOD, EXPOSURE APPARATUS ADJUSTMENT METHOD AND DEVICE MANUFACTURING METHOD

#14
20180173984
2018-06-21

Substrate handling and identification mechanism

#15
20180164700
2018-06-14

SUBSTRATE TREATMENT SYSTEM, SUBSTRATE TRANSFER METHOD, AND COMPUTER STORAGE MEDIUM

#16
20180088471
2018-03-29

Pattern manufacturing apparatus, pattern manufacturing method, and pattern manufacturing program

#17
20170117227
2017-04-27

Lithography engraving machine for forming water identification marks and aligment marks

#18
20150015861
2015-01-15

Calibration method, measurement apparatus, exposure apparatus, and method of manufacturing article

#19
20140170566
2014-06-19

Method and apparatus for merging multiple geometrical pixel images and generating a single modulator pixel image

#20
20140137055
2014-05-15

Method and apparatus for merging multiple geometrical pixel images and generating a single modulator pixel image

#21
20130308111
2013-11-21

Exposure device

#22
20120314193
2012-12-13

Exposure apparatus, exposure method, exposure apparatus maintenance method, exposure apparatus adjustment method and device manufacturing method

#23
20120133028
2012-05-31

METHOD OF PRODUCING A THIN LAYER OF SEMICONDUCTOR MATERIAL

#24
20120089245
2012-04-12

Method and apparatus for routing dispatching and routing reticles

#25
20120060131
2012-03-08

Method and apparatus for merging multiple geometrical pixel images and generating a single modulator pixel image

#26
20120015294
2012-01-19

Process of using an imaging element having a photoluminescent tag

#27
20110205508
2011-08-25

Digital exposure method and digital exposure device for performing the method

#28
20110095183
2011-04-28

Electron beam measurement apparatus

#29
20100279231
2010-11-04

Method for marking objects

#30
20100136483
2010-06-03

IMAGING ELEMENT HAVING A PHOTOLUMINESCENT TAG AND PROCESS OF USING THE IMAGING ELEMENT TO FORM A RECORDING ELEMENT

#31
20090191723
2009-07-30

METHOD OF PERFORMING LITHOGRAPHIC PROCESSES

#32
20090146057
2009-06-11

Electron beam measurement apparatus

#33
20090130392
2009-05-21

Method of producing a thin layer of semiconductor material

#34
20090100392
2009-04-16

Securing authenticity of integrated circuit chip

#35
20090098487
2009-04-16

Method of forming variable patterns using a reticle

#36
20080269945
2008-10-30

AUTOMATIC PHOTOMASK TRACKING SYSTEM AND METHOD

#37
20080106716
2008-05-08

Photomask, exposure method and apparatus that use the same, and semiconductor device

#38
20080100814
2008-05-01

Reticle management systems and methods

#39
20080063980
2008-03-13

Imaging element having a photoluminescent tag and process of using the imaging element to form a recording element

#40
20080062389
2008-03-13

Method and apparatus for personalization of semiconductor

#41
20080030701
2008-02-07

Individual wafer history storage for overlay corrections

#42
20070288113
2007-12-13

Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device

#43
20070152167
2007-07-05

Reticle discerning device, exposure equipment comprising the same and exposure method

#44
20070089086
2007-04-19

Information management and tracking system (IMTS)

#45
20060269851
2006-11-30

Photomask and method for conveying information associated with a photomask substrate

#46
20060228865
2006-10-12

System and method for photolithography in semiconductor manufacturing

#47
20060228651
2006-10-12

Method of writing identifying information on wafer

#48
20060216869
2006-09-28

Lithographic apparatus, device manufacturing method, code reading device and substrate

#49
20060161254
2006-07-20

Method and apparatus for personalization of semiconductor

#50
20060142967
2006-06-29

System and method for fault indication on a substrate in maskless applications

#51
20060126042
2006-06-15

Reticle-processing system

#52
20060115961
2006-06-01

Method of producing a thin layer of semiconductor material

#53
20060022049
2006-02-02

Mask management method and bar code reading apparatus thereof

#54
20050195378
2005-09-08

Lithographic apparatus, method of substrate identification, device manufacturing method, substrate, and computer program

#55
20050090925
2005-04-28

Method and device for control of the data flow on application of reticles in a semiconductor component production

#56
20050048678
2005-03-03

Radiation damage reduction

#57
20050047543
2005-03-03

Method and apparatus for personalization of semiconductor

#58
20050042780
2005-02-24

Integrated circuit identification