177207 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure apparatus for microlithography; Information management, control, testing, and wafer monitoring, e.g. pattern monitoring; Wafer pattern monitoring, i.e. measuring printed patterns or the aerial image at the wafer plane Electrical
METHOD FOR MANUFACTURING SILICON BALANCE SPRINGS
#2A METHOD FOR CHARACTERIZING A MANUFACTURING PROCESS OF SEMICONDUCTOR DEVICES
#3Efficient Semiconductor Metrology Using Machine Learning
#4SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME
#5Method for characterizing a manufacturing process of semiconductor devices
#6Method to predict yield of a device manufacturing process
#7Method to predict yield of a device manufacturing process
#8Test key layout and method of monitoring pattern misalignments using test keys
#9System and method for defect classification based on electrical design intent
#10Method for detecting pattern offset amount of exposed regions and detecting mark
#11Methods and systems for determining a critical dimension and overlay of a specimen
#12Method for determining exposure condition and computer-readable storage media storing program for determining exposure condition
#13Detecting dose and focus variations during photolithography
#14Method of selecting a set of illumination conditions of a lithographic apparatus for optimizing an integrated circuit physical layout
#15Method and apparatus for verifying stitching accuracy of stitched chips on a wafer
#16Method for detecting pattern offset amount of exposed regions and detecting mark
#17ALIGNMENT MARK
#18LITHOGRAPHY ROBUSTNESS MONITOR
#19Method for inspecting photoresist pattern
#20Methods and systems for determining a critical dimension and overlay of a specimen
#21Integrated circuits on a wafer and methods for manufacturing integrated circuits
#22Alignment mark and defect inspection method
#23Method and apparatus for determining the effect of process variations
#24Resistor structures to electrically measure unidirectional misalignment of stitched masks
#25Exposure method
#26Flexible and elastic dielectric integrated circuit
#27Proportional variable resistor structures to electrically measure mask misalignment
#28Method for determining exposure condition and computer-readable storage media storing program for determining exposure condition
#29Semiconductor device for measuring an overlay error, method for measuring an overlay error, lithographic apparatus and device manufacturing method
#30Semiconductor device for measuring an overlay error, method for measuring an overlay error, lithographic apparatus and device manufacturing method
#31Methods of quantifying variations resulting from manufacturing-induced corner rounding of various features, and structures for testing same
#32System and method for characterizing lithography effects on a wafer
#33Systems And Methods For Forming Integrated Circuit Components Having Precise Characteristics
#34EXPOSURE METHOD
#35Method of manufacturing semiconductor device
#36Misalignment test structure and method thereof
#37Methods and systems for determining a presence of macro and micro defects on a specimen
#38Resistor structures to electrically measure unidirectional misalignment of stitched masks
#39Method of making an integrated circuit
#40Lithography device for semiconductor circuit pattern generation
#41Methods for maskless lithography
#42Method and system for increasing product yield by controlling lithography on the basis of electrical speed data
#43Flexible and elastic dielectric integrated circuit
#44Membrane 3D IC fabrication
#45Stress-controlled dielectric integrated circuit