G03F7/70675 - CPC Classification Index

ClassID:

177209 ⎘

G03F7/70675 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure apparatus for microlithography; Information management, control, testing, and wafer monitoring, e.g. pattern monitoring; Wafer pattern monitoring, i.e. measuring printed patterns or the aerial image at the wafer plane using latent image

Recent Application in this class:

20240152060

2024-05-09

METHOD AND SYSTEM FOR PREDICTING PROCESS INFORMATION WITH A PARAMETERIZED MODEL

20230341762

2023-10-26

PRINT ELEMENT SUBSTRATE AND METHOD FOR MANUFACTURING PRINT ELEMENT SUBSTRATE

20230244151

2023-08-03

Method for adjusting a target feature in a model of a patterning process based on local electric fields

20230236512

2023-07-27

Determining pattern ranking based on measurement feedback from printed substrate

20230032146

2023-02-02

SIMULTANEOUS IN PROCESS METROLOGY FOR CLUSTER TOOL ARCHITECTURE

20230004096

2023-01-05

METHOD AND SYSTEM FOR PREDICTING PROCESS INFORMATION WITH A PARAMETERIZED MODEL

20220057720

2022-02-24

LITHOGRAPHIC PATTERNING METHOD AND SYSTEM THEREFORE

20220050387

2022-02-17

Method for adjusting a target feature in a model of a patterning process based on local electric fields

20220043356

2022-02-10

Determining pattern ranking based on measurement feedback from printed substrate

#10

20200409256

2020-12-31

Methods of detecting printing defects on photoresist patterns

#11

20200142297

2020-05-07

Methods of detecting printing defects on photoresist patterns

#12

20190171116

2019-06-06

Substrate measurement recipe design of, or for, a target including a latent image

#13

20180364592

2018-12-20

PATTERN FORMING APPARATUS AND PATTERN FORMING METHOD, MOVABLE BODY DRIVE SYSTEM AND MOVABLE BODY DRIVE METHOD, EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

#14

20180011407

2018-01-11

Image log slope (ILS) optimization

#15

20170371252

2017-12-28

Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method

#16

20170371251

2017-12-28

Projection exposure tool for microlithography and method for microlithographic imaging

#17

20170363971

2017-12-21

Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method

#18

20170261865

2017-09-14

Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method

#19

20170082931

2017-03-23

Projection exposure tool for microlithography and method for microlithographic imaging

#20

20150241793

2015-08-27

Metrology for measurement of photosensitizer concentration within photo-sensitized chemically-amplified resist (PS-CAR)

#21

20150042975

2015-02-12

Projection exposure tool for microlithography and method for microlithographic imaging

#22

20150036118

2015-02-05

Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method

#23

20140320837

2014-10-30

Monitoring apparatus and method particularly useful in photolithographically processing substrates

#24

20140247434

2014-09-04

Lithographic focus and dose measurement using a 2-D target

#25

20140198972

2014-07-17

Harmonic resist model for use in a lithographic apparatus and a device manufacturing method

#26

20130252146

2013-09-26

Projection exposure tool for microlithography and method for microlithographic imaging

#27

20120109607

2012-05-03

Method, program product and apparatus for predicting line width roughness and resist pattern failure and the use thereof in a lithography simulation process

#28

20110249244

2011-10-13

Lithographic focus and dose measurement using a 2-D target

#29

20110037957

2011-02-17

Monitoring apparatus and method particularly useful in photolithographically processing substrates

#30

20100279213

2010-11-04

METHODS AND SYSTEMS FOR CONTROLLING VARIATION IN DIMENSIONS OF PATTERNED FEATURES ACROSS A WAFER

#31

20100239319

2010-09-23

Method and device for measuring surface potential distribution, method and device for measuring insulation resistance, electrostatic latent image measurement device, and charging device

#32

20100218160

2010-08-26

Method and apparatus for determining a process model that models the impact of a CAR/PEB on the resist profile

#33

20100146476

2010-06-10

Modeling mask corner rounding effects using multiple mask layers

#34

20100128969

2010-05-27

Harmonic resist model for use in a lithographic apparatus and a device manufacturing method

#35

20100115489

2010-05-06

Method and system for performing lithography verification for a double-patterning process

#36

20100008562

2010-01-14

LATENT IMAGE INTENSITY DISTRIBUTION EVALUATION METHOD, METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE AND LATENT IMAGE INTENSITY DISTRIBUTION EVALUATION PROGRAM

#37

20090231558

2009-09-17

Monitoring apparatus and method particularly useful in photolithographically processing substrates

#38

20090089736

2009-04-02

Facilitating process model accuracy by modeling mask corner rounding effects

#39

20080253792

2008-10-16

Method and device for measuring surface potential distribution, method and device for measuring insulation resistance, electrostatic latent image measurement device, and charging device

#40

20080233487

2008-09-25

Method and System for Optimizing Lithography Focus and/or Energy Using a Specially-Designed Optical Critical Dimension Pattern

#41

20080220376

2008-09-11

Lithography simulation method, method of manufacturing a semiconductor device and program

#42

20080204690

2008-08-28

Method, program product and apparatus for generating a calibrated pupil kernel and method of using the same in a lithography simulation process

#43

20080183446

2008-07-31

Method, program product and apparatus for predicting line width roughness and resist pattern failure and the use thereof in a lithography simulation process

#44

20080043229

2008-02-21

Monitoring apparatus and method particularly useful in photolithographically

#45

20080018891

2008-01-24

Method of producing spatial fine structures

#46

20070282574

2007-12-06

Method and apparatus for determining a process model that models the impact of CAR/PEB on the resist profile

#47

20070263191

2007-11-15

Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method

#48

20070217800

2007-09-20

Method and device for measuring surface potential distribution, method and device for measuring insulation resistance, electrostatic latent image measurement device, and charging device

#49