177226 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure apparatus for microlithography; Construction of apparatus, e.g. environment, hygiene aspects or materials; Construction details, e.g. housing, load-lock, seals, windows for passing light in- and out of apparatus Bearings
ACTUATABLE MIRROR ASSEMBLY
#2EXPOSURE DEVICE / TOOL FOR CIRCUITS ON CURVED SURFACES AND METHOD FOR PREPARING CURVED CIRCUITS
#3INDIVIDUAL MIRROR OF A PUPIL FACET MIRROR AND PUPIL FACET MIRROR FOR AN ILLUMINATION OPTICAL UNIT OF A PROJECTION EXPOSURE APPARATUS
#4STAGE AND ERROR COMPENSATION SYSTEM USING THE SAME
#5ACTUATOR DEVICE FOR USE IN A POSITIONING SYSTEM AS WELL AS SUCH POSITIONING SYSTEM
#6Stage system, lithographic apparatus, method for positioning and device manufacturing method
#7Actuator device for use in a positioning system as well as such positioning system
#8HYDROPHOBIC MEMBRANE STRUCTURES, HYDROPHOBIC MEMBRANE STRUCTURE DETECTION METHODS, HYDROPHOBIC MEMBRANE STRUCTURE DETECTION SYSTEMS, AND WAFER CARRIERS
#9Magnetic levitation gravity compensation device
#10Vibration isolation system and lithographic apparatus
#11Support of an optical unit
#12EXPOSURE APPARATUS, MOVABLE BODY APPARATUS, FLAT-PANEL DISPLAY MANUFACTURING METHOD, AND DEVICE MANUFACTURING METHOD
#13Object stage bearing for lithographic apparatus
#14Bearing device, magnetic gravity compensator, vibration isolation system, lithographic apparatus, and method to control a gravity compensator having a negative stiffness
#15Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method
#16Stage system, lithographic apparatus, method for positioning and device manufacturing method
#17Bearing assembly for a lithography system, and lithography system
#18Movable body apparatus, exposure apparatus, and device manufacturing method
#19Vibration isolation device, lithographic apparatus and method to tune a vibration isolation device
#20Exposure apparatus, and device manufacturing method
#21ENVIRONMENTAL SYSTEM INCLUDING VACUUM SCAVENGE FOR AN IMMERSION LITHOGRAPHY APPARATUS
#22Substrate coating apparatus for floating substrate and method
#23Displacement device
#24Thermal conditioning unit, lithographic apparatus and device manufacturing method
#25Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method
#26Optical apparatus with adjustable action of force on an optical module
#27Exposure apparatus and device manufacturing method
#28Adjustable magnetic buoyancy gravity compensator
#29Vibration-assisted positioning stage
#30Environmental system including vacuum scavenge for an immersion lithography apparatus
#31Exposure apparatus and device manufacturing method
#32Table device and conveyance device
#33Method for fabricating pattern using supporting assembly with rolling member disposed below supporting rods and semiconductor fabrication apparatus having the supporting assembly
#34Arrangement and lithography apparatus with arrangement
#35Exposure apparatus and device manufacturing method
#36Table device and conveyance device
#37Table device and conveyance device
#38Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method
#39Mask-mounting apparatus for exposure machine
#40Environmental system including vacuum scavenge for an immersion lithography apparatus
#41Drive for an XY-table and XY-table
#42Movable body apparatus, exposure apparatus, and device manufacturing method
#43Balance mass system shared by workpiece table and mask table, and lithography machine
#44Lithography apparatus, stage apparatus, and method of manufacturing articles
#45Optical apparatus with adjustable action of force on an optical module
#46Magnetic device and lithographic apparatus
#47Support for a movable element and lithography apparatus
#48Exposure apparatus and device manufacturing method
#49Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method
#50Lithographic apparatus and device manufacturing method
#51Environmental system including vacuum scavenge for an immersion lithography apparatus
#52Exposure apparatus, and device manufacturing method
#53Exposure apparatus and device manufacturing method
#54Exposure apparatus and device manufacturing method
#55Optical writer for flexible foils
#56Cylindrical magnetic levitation stage and lithography
#57Guidance for target processing tool
#58Substrate handling apparatus and lithographic apparatus
#59Stage apparatus
#60Environmental system including vacuum scavenge for an immersion lithography apparatus
#61Exposure apparatus, and device manufacturing method
#62Stage device and stage cleaning method
#63Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method
#64Holding unit, assembly system, sputtering unit, and processing method and processing unit
#65Exposure apparatus, and device manufacturing method
#66Driving apparatus and exposure apparatus and device fabrication method
#67Cylindrical magnetic levitation stage
#68Wafer holding apparatus and method
#69Device of Producing Wafer Lens and Method of Producing Wafer Lens
#70Stage device
#71Magnetic supporting mechanism having a movable magnet with a varying width, exposure apparatus with the magnetic supporting mechanism, and device manufacturing method thereof
#72Optical apparatus with adjustable action of force on an optical module
#73Object moving apparatus, object processing apparatus, exposure apparatus, object inspecting apparatus and device manufacturing method
#74OBJECT PROCESSING APPARATUS, EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
#75Environmental system including vacuum scavenge for an immersion lithography apparatus
#76Exposure apparatus, and device manufacturing method
#77Exposure apparatus, and device manufacturing method
#78BEARING DEVICE, STAGE DEVICE, AND EXPOSURE APPARATUS
#79Stage device and stage cleaning method
#80Projection objective for microlithography
#81Lithographic apparatus with gas pressure means for controlling a planar position of a patterning device contactless
#82Magnetic levitation wafer stage, and method of using the stage in an exposure apparatus
#83Object support positioning device and lithographic apparatus
#84LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
#85Table guided by aerostatic bearing elements for vacuum application
#86Six-degree-of-freedom precision positioning system
#87Holding apparatus, position detection apparatus and exposure apparatus, moving method, position detection method, exposure method, adjustment method of detection system and device manufacturing method
#88Stage apparatus and exposure apparatus
#89Exposure apparatus, and device manufacturing method
#90Environmental system including vacuum scavenge for an immersion lithography apparatus
#91Driving apparatus and exposure apparatus, and device fabrication method
#92Movable body apparatus, exposure apparatus and optical system unit, and device manufacturing method
#93Monolithic, Non-Contact Six Degree-of-Freedom Stage Apparatus
#94Bearing Device, Stage Device, and Exposure Apparatus
#95Fine Stage Z Support Apparatus
#96Magnetic levitation wafer stage, and method of using the stage in an exposure apparatus
#97Supporting apparatus, exposure apparatus, and device manufacturing method
#98Magnetic Guide Apparatus, Stage Apparatus, Exposure Apparatus, and Device Manufacturing Method
#99Lithographic apparatus with gas bearing supply mechanism and device manufacturing method
#100Fine stage "Z" support apparatus
#101Support Apparatus, Stage Apparatus, Exposure Apparatus, And Device Manufacturing Method
#102Exposure apparatus, and device manufacturing method
#103Gas bearing, and lithographic apparatus provided with such a bearing
#104Environmental system including vacuum scavenge for an immersion lithography apparatus
#105Exposure apparatus, and device manufacturing method
#106Environmental system including vacuum scavenge for an immersion lithography apparatus
#107Environmental system including vacuum scavenge for an immersion lithography apparatus
#108Exposure apparatus, and device manufacturing method
#109Holding unit, assembly system, sputtering unit, and processing method and processing unit
#110Seal assembly for an exposure apparatus
#111Lithographic apparatus and device manufacturing method
#112Supporting unit, and moving table device and linear-motion guiding device that use the supporting unit
#113Optical imaging device
#114Lorentz motor control system for a payload
#115Exposure apparatus and device fabricating method
#116Alignment apparatus and exposure apparatus
#117Lithographic apparatus and actuator
#118Lithographic apparatus, reticle masking device for a lithographic apparatus, gas bearing and apparatus comprising such gas bearing
#119Exposure apparatus, and device manufacturing method
#120Exposure apparatus, and device manufacturing method
#121Air bearing compatible with operation in a vacuum
#122Positioning system, magnetic bearing, and method of controlling the same
#123Exposure apparatus, and device manufacturing method
#124Environmental system including vacuum scavenge for an immersion lithography apparatus
#125Stage device, exposure apparatus using the unit, and device manufacturing method
#126Hydrostatic gas bearing, hydrostatic gas bearing device for use in vacuum environment, and gas recovering method for hydrostatic gas bearing device
#127Stage system, exposure apparatus, and device manufacturing method
#128Z actuator with anti-gravity
#129Dual force wafer table
#130Positioning apparatus
#131Moving vacuum chamber stage with air bearing and differentially pumped grooves
#132Environmental system including vacuum scavenge for an immersion lithography apparatus
#133Environmental system including vacuum scavenge for an immersion lithography apparatus
#134Levitated reticle-masking blade stage
#135Lithographic apparatus and device manufacturing method
#136Drive for reticle-masking blade stage
#137Lithographic apparatus and device manufacturing method
#138Wafer stage operable in a vacuum environment
#139Static gas bearing system, stage mechanism, exposure apparatus, and device manufacturing method
#140Stage with isolated actuators for low vacuum environment
#141Hydrodynamic bearing apparatus and stage apparatus using the same
#142Lithographic apparatus, device manufacturing method, and slide assembly
#143Stage system, exposure apparatus, and device manufacturing method
#144Positioning method, and positioning apparatus
#145Hydrostatic bearing, alignment apparatus, exposure apparatus, and device manufacturing method
#146Stage apparatus, static pressure bearing apparatus, positioning method, exposure apparatus and method for manufacturing device