Patents-Review.com
ClassID:

177240 ⎘

G03F7/70933 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure apparatus for microlithography; Construction of apparatus, e.g. environment, hygiene aspects or materials; Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution, removing pollutants from apparatus; electromagnetic and electrostatic-charge pollution Purge

Recent Application in this class:
#1
20260147284
2026-05-28

EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD

 #2
20260044091
2026-02-12

AIRFLOW ADJUST SYSTEM FOR WORKPIECE TOOL AND METHOD OF OPERATING THE SAME

 #3
20260029723
2026-01-29

ILLUMINATION LIGHT GUIDE, ILLUMINATION OPTICS UNIT AND INSPECTION APPARATUS

 #4
20260010078
2026-01-08

LIGHT SOURCE APPARATUS

 #5
20250383611
2025-12-18

FLUSHING SYSTEM AND METHOD FOR A LITHOGRAPHIC APPARATUS

 #6
20250370358
2025-12-04

CONTAMINATION CONTROL

 #7
20250355374
2025-11-20

SYSTEMS AND METHODS FOR VENTING A RETICLE POD

 #8
20250329541
2025-10-23

METHOD AND SYSTEM FOR MANUFACTURING A SEMICONDUCTOR DEVICE

 #9
20250328089
2025-10-23

RADIATION SOURCE APPARATUS AND METHOD FOR OPERATING THE SAME

 #10
20250321504
2025-10-16

SUBSTRATE PROCESSING APPARATUS AND GAS SUPPLY METHOD

 #11
20250284214
2025-09-11

LITHOGRAPHY SYSTEM AND METHODS

 #12
20250234445
2025-07-17

EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD

 #13
20250208526
2025-06-26

PHOTOLITHOGRAPHY SUBSTRATE WITH PURGE FLOW DIRECTION

 #14
20250201586
2025-06-19

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD

 #15
20250189905
2025-06-12

GAS PURGE SYSTEMS FOR A LASER SOURCE

 #16
20250181000
2025-06-05

HIGH-CLEANLINESS RETICLE CLAMPING MODULE

 #17
20250175589
2025-05-29

TEST SYSTEM FOR A CAMERA, MASK INSPECTIONS SYSTEM AND METHOD FOR TESTING A CAMERA

 #18
20250155817
2025-05-15

SUBSTRATE TREATING APPARATUS

 #19
20250126699
2025-04-17

CHAMBER, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, AND ELECTRONIC DEVICE MANUFACTURING METHOD

 #20
20250076776
2025-03-06

EXTREME ULTRAVIOLET (EUV) SOURCE AND A SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

 #21
20250021027
2025-01-16

EDGE EXPOSURE APPARATUS AND EDGE EXPOSURE METHOD

 #22
20250004389
2025-01-02

EXHAUST DISCHARGING DEVICE WITH TEMPERATURE CONTROL AND HEAT RETENTION MECHANISM FOR PREVENTING PHOTORESIST FROM CRYSTALLIZATION AND ADHERING TO PIPES, AND EXHAUST DISCHARGING METHOD USING THE SAME

 #23
20240411235
2024-12-12

SEMICONDUCTOR MANUFACTURING APPARATUS

 #24
20240385540
2024-11-21

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

 #25
20240355644
2024-10-24

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD

 #26
20240337442
2024-10-10

METHOD AND DRYING DEVICE

 #27
20240329547
2024-10-03

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

 #28
20240319621
2024-09-26

APPARATUS AND METHOD FOR AVOIDING A DEGRADATION OF AN OPTICAL USED SURFACE OF A MIRROR MODULE, PROJECTION SYSTEM, ILLUMINATION SYSTEM AND PROJECTION EXPOSURE APPARATUS

 #29
20240302756
2024-09-12

METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPTICAL ELEMENT

 #30
20240302748
2024-09-12

METHODS FOR DEPOSITING LAYERS OF MATERIALS ON SUBSTRATES AND STRUCTURES FORMED ACCORDINGLY

 #31
20240295810
2024-09-05

METHOD AND SYSTEM FOR MANUFACTURING A SEMICONDUCTOR DEVICE

 #32
20240248390
2024-07-25

APPARATUS FOR FABRICATING BLANK MASK AND METHOD OF FABRICATING THE SAME

 #33
20240201602
2024-06-20

SUBSTRATE PROCESSING APPARATUS

 #34
20240103371
2024-03-28

PHOTO TREATMENT DEVICE

 #35
20240094647
2024-03-21

PATTERNING DEVICE CONDITIONING SYSTEM AND METHOD

 #36
20230418169
2023-12-28

EUV RETICLE STOCKER AND METHOD OF OPERATING THE SAME

 #37
20230369060
2023-11-16

METHOD AND SYSTEM FOR MANUFACTURING A SEMICONDUCTOR DEVICE

 #38
20230367225
2023-11-16

System and method for performing extreme ultraviolet photolithography processes

 #39
20230333487
2023-10-19

SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD

 #40
20230314964
2023-10-05

FLUID PURGING SYSTEM

 #41
20230205102
2023-06-29

Fluid purging system, projection system, illumination system, lithographic apparatus, and method

 #42
20230205101
2023-06-29

APPARATUS FOR USE IN A METROLOGY PROCESS OR LITHOGRAPHIC PROCESS

 #43
20230075744
2023-03-09

Reticle pod having latch including ramped surface

 #44
20230062148
2023-03-02

Method and system for manufacturing a semiconductor device

 #45
20230012970
2023-01-19

Exposure apparatus and method of manufacturing article

 #46
20230006409
2023-01-05

DIRECTED GAS PURGE TO REDUCE DUSTING OF EXCIMER DISCHARGE CHAMBER WINDOWS

 #47
20220413402
2022-12-29

Gas purge systems for a laser source

 #48
20220382046
2022-12-01

Counterflow gas nozzle for contamination mitigation in extreme ultraviolet inspection systems

 #49
20220350264
2022-11-03

Semiconductor processing tool and methods of operation

 #50
20220350257
2022-11-03

System and method for performing extreme ultraviolet photolithography processes

 #51
20220344136
2022-10-27

DRY CHAMBER CLEAN OF PHOTORESIST FILMS

 #52
20220334504
2022-10-20

System and method for optical-path coupling of light for in-situ photochemical cleaning in projection imaging systems

 #53
20220260359
2022-08-18

Device for measuring a substrate and method for correcting cyclic error components of an interferometer

 #54
20220171298
2022-06-02

Lithographic apparatus and related methods

 #55
20220102120
2022-03-31

Operating method of etching device

 #56
20220075270
2022-03-10

Bake unit and apparatus for treating substrate

 #57
20210405546
2021-12-30

Exposure apparatus and method of manufacturing article

 #58
20210397102
2021-12-23

Lithography apparatus and method using the same

 #59
20210349396
2021-11-11

System and method for performing extreme ultraviolet photolithography processes

 #60
20210289611
2021-09-16

Chamber device, extreme ultraviolet light generation apparatus, and electronic device manufacturing method

 #61
20210223708
2021-07-22

EUV lithography system and method for decreasing debris in EUV lithography system

 #62
20210208517
2021-07-08

Load port unit, storage apparatus including the same, and exhaust method

 #63
20210173315
2021-06-10

Particle suppression systems and methods

 #64
20210149315
2021-05-20

System and method for protecting optics from vacuum ultraviolet light

 #65
20210132506
2021-05-06

Ionic Liquids as Lubricants in Optical Systems

 #66
20210088911
2021-03-25

Exposure device

 #67
20210033988
2021-02-04

Apparatus and method for removing particles in semiconductor manufacturing

 #68
20200393769
2020-12-17

Lithographic apparatus with improved patterning performance

 #69
20200350194
2020-11-05

Method and apparatus for lithography in semiconductor fabrication

 #70
20200348607
2020-11-05

Radiation source apparatus and method for decreasing debris in radiation source apparatus

 #71
20200233314
2020-07-23

Method and device for the correction of imaging defects

 #72
20200176232
2020-06-04

ETCHING DEVICE AND OPERATING METHOD THEREOF

 #73
20200166856
2020-05-28

Objective lens protection device, objective lens system and lithographic device

 #74
20200073261
2020-03-05

Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system

 #75
20200064748
2020-02-27

Process for cleaning optical elements for the ultraviolet wavelength range

 #76
20200047225
2020-02-13

Vacuum pumping system

 #77
20200037428
2020-01-30

System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector

 #78
20200019075
2020-01-16

Photomask purging system and method

 #79
20190361351
2019-11-28

Substrate processing apparatus

 #80
20190302627
2019-10-03

Method and device for the correction of imaging defects

 #81
20190289704
2019-09-19

System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector

 #82
20190243258
2019-08-08

Projection exposure system for semiconductor lithography, comprising elements for plasma conditioning

 #83
20190196345
2019-06-27

Patterning device cooling apparatus

 #84
20190187561
2019-06-20

Lens contamination prevention device and method

 #85
20190148203
2019-05-16

Method and apparatus for lithography in semiconductor fabrication

 #86
20190137895
2019-05-09

Exposure apparatus and article manufacturing method

 #87
20190094719
2019-03-28

Apparatus and a method of forming a particle shield

 #88
20190094718
2019-03-28

Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system

 #89
20190064682
2019-02-28

Lithography apparatus and method of manufacturing article

 #90
20190041761
2019-02-07

Lithographic apparatus and device manufacturing method

 #91
20180299789
2018-10-18

LIQUID RECOVERY APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

 #92
20180253012
2018-09-06

Exposure device, substrate processing apparatus, exposure method of substrate and substrate processing method

 #93
20180246422
2018-08-30

EUV source chamber and gas flow regime for lithographic apparatus, multi-layer mirror and lithographic apparatus

 #94
20180173117
2018-06-21

Extreme ultraviolet lithography system with debris trapper on exhaust line

 #95
20180160517
2018-06-07

System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector

 #96
20180031827
2018-02-01

LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENT

 #97
20170363975
2017-12-21

Lithographic apparatus with a patterning device environment

 #98
20170361359
2017-12-21

Controlled fluid flow for cleaning an optical element

 #99
20170343390
2017-11-30

Encoder, position measurement system and lithographic apparatus involving an enclosing device

 #100
20170261864
2017-09-14

Lithographic apparatus and device manufacturing method

 #101
20170176877
2017-06-22

Lithographic apparatus and device manufacturing method

 #102
20170168403
2017-06-15

Environmental control of systems for photolithography process

 #103
20170160653
2017-06-08

Lithographic apparatus and device manufacturing method

 #104
20170131638
2017-05-11

Reticle and exposure apparatus including the same

 #105
20170102539
2017-04-13

Optical assembly, projection system, metrology system and EUV lithography apparatus

 #106
20170097579
2017-04-06

Lithographic apparatus, a projection system and a device manufacturing method

 #107
20170097572
2017-04-06

Faceted EUV optical element

 #108
20170068175
2017-03-09

Lithographic apparatus

 #109
20170068167
2017-03-09

Laser direct imaging system and method for solder mask exposure

 #110
20170038695
2017-02-09

Lithographic apparatus and device manufacturing method involving a barrier structure to handle liquid

 #111
20170036252
2017-02-09

Controlled fluid flow for cleaning an optical element

 #112
20160357012
2016-12-08

Lens module comprising at least one exchangeable optical element

 #113
20160282723
2016-09-29

Apparatus, a device and a device manufacturing method

 #114
20160252821
2016-09-01

Radiation source device, lithographic apparatus and device manufacturing method

 #115
20160128171
2016-05-05

Apparatus and methods for optics protection from debris in plasma-based light source

 #116
20160091801
2016-03-31

Exposure apparatus and device manufacturing method

 #117
20160033399
2016-02-04

Optical metrology with purged reference chip

 #118
20160004169
2016-01-07

Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method

 #119
20160004166
2016-01-07

Exposure apparatus, exposure method, and device manufacturing method

 #120
20150355557
2015-12-10

Gas flow optimization in reticle stage environment

 #121
20150253675
2015-09-10

System and method for cleaning EUV optical elements

 #122
20150234282
2015-08-20

Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method

 #123
20150227060
2015-08-13

Stage system and lithographic apparatus comprising such stage system

 #124
20150168854
2015-06-18

Lithographic apparatus

 #125
20150168846
2015-06-18

Optical element unit for exposure processes

 #126
20150138521
2015-05-21

Lens module comprising at least one exchangeable optical element

 #127
20150049323
2015-02-19

Lithographic apparatus

 #128
20150015856
2015-01-15

Lithographic apparatus and device manufacturing method

 #129
20140362366
2014-12-11

Method and system for gas flow mitigation of molecular contamination of optics

 #130
20140306115
2014-10-16

Debris protection system for reflective optic utilizing gas flow

 #131
20140300880
2014-10-09

Flow through MEMS package

 #132
20140261568
2014-09-18

System and method for cleaning optical surfaces of an extreme ultraviolet optical system

 #133
20140231659
2014-08-21

Methods and apparatus for use with extreme ultraviolet light having contamination protection

 #134
20140186755
2014-07-03

Exposure apparatus and method of device fabrication

 #135
20140185026
2014-07-03

Exposure apparatus and device fabrication method

 #136
20140111781
2014-04-24

Method and apparatus for ultraviolet (UV) patterning with reduced outgassing

 #137
20140085618
2014-03-27

Particle control near reticle and optics using showerhead

 #138
20130155509
2013-06-20

Lens module comprising at least one exchangeable optical element

 #139
20130088697
2013-04-11

Collector mirror assembly and method for producing extreme ultraviolet radiation

 #140
20130010270
2013-01-10

Lithographic apparatus and device manufacturing method

 #141
20120327381
2012-12-27

Radiation Source, Lithographic Apparatus and Device Manufacturing Method

 #142
20120307215
2012-12-06

Flow through MEMS package

 #143
20120281193
2012-11-08

Lithographic apparatus and method

 #144
20120229783
2012-09-13

Lithographic apparatus and device manufacturing method

 #145
20120229782
2012-09-13

Lithographic apparatus and device manufacturing method

 #146
20120224153
2012-09-06

Optical arrangement, in particular in a projection exposure apparatus for EUV lithography

 #147
20120182536
2012-07-19

Source collector, lithographic apparatus and device manufacturing method

 #148
20120176591
2012-07-12

METHOD AND DEVICE FOR THE CORRECTION OF IMAGING DEFECTS

 #149
20120147348
2012-06-14

Lithographic apparatus and device manufacturing method

 #150
20120105958
2012-05-03

Lens module comprising at least one exchangeable optical element

 #151
20120086925
2012-04-12

METHOD FOR AVOIDING CONTAMINATION AND EUV-LITHOGRAPHY-SYSTEM

 #152
20110317256
2011-12-29

Master oscillator-power amplifier drive laser with pre-pulse for EUV light source

 #153
20110317139
2011-12-29

EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

 #154
20110261333
2011-10-27

Exposure apparatus, device manufacturing method using same, and gas supply device

 #155
20110216298
2011-09-08

Protection module for EUV lithography apparatus, and EUV lithography apparatus

 #156
20110188049
2011-08-04

Assembly comprising a conditioning system and at least one object, a conditioning system, a lithographic apparatus and methods

 #157
20110164236
2011-07-07

Radiation source and lithographic apparatus

 #158
20110102754
2011-05-05

Exposure apparatus and device manufacturing method

 #159
20110074053
2011-03-31

Humidifying apparatus, lithographic apparatus and humidifying method

 #160
20110037961
2011-02-17

Lithographic apparatus comprising an internal sensor and a mini-reactor, and method for treating a sensing surface of the internal sensor

 #161
20110032496
2011-02-10

Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method

 #162
20110032495
2011-02-10

EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

 #163
20110013161
2011-01-20

Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method

 #164
20110013157
2011-01-20

Lithographic apparatus comprising a magnet, method for the protection of a magnet in a lithographic apparatus and device manufacturing method

 #165
20100309447
2010-12-09

LITHOGRAPHIC APPARATUS, A PROJECTION SYSTEM AND A DEVICE MANUFACTURING METHOD

 #166
20100294397
2010-11-25

System for purging reticle storage

 #167
20100282278
2010-11-11

EXPOSURE APPARATUS, CLEANING METHOD, AND DEVICE MANUFACTURING METHOD

 #168
20100259737
2010-10-14

Exposure apparatus preventing gas from moving from exposure region to measurement region

 #169
20100141909
2010-06-10

RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS

 #170
20090309045
2009-12-17

Method of cleaning a surface region covered with contaminant or undesirable material

 #171
20090279088
2009-11-12

Systems and methods for measurement of a specimen with vacuum ultraviolet light

 #172
20090237636
2009-09-24

Projection exposure method and projection exposure system therefor

 #173
20090231559
2009-09-17

Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system

 #174
20090224179
2009-09-10

Connection device

 #175
20090128793
2009-05-21

Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method

 #176
20090073396
2009-03-19

Lithographic apparatus and device manufacturing method

 #177
20090072168
2009-03-19

Radical cleaning arrangement for a lithographic apparatus

 #178
20090066928
2009-03-12

ALIGNMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD USING EXPOSURE APPARATUS

 #179
20090027638
2009-01-29

Lithographic appararus and method

 #180
20090014666
2009-01-15

Optical system having a cleaning arrangement

 #181
20090014027
2009-01-15

Method and arrangement for cleaning optical surfaces in plasma-based radiation sources

 #182
20080316444
2008-12-25

Method and device for the correction of imaging defects

 #183
20080259293
2008-10-23

Exposure apparatus, temperature regulating system, and device manufacturing method

 #184
20080226332
2008-09-18

Exposure apparatus and exposure method, and device manufacturing method

 #185
20080225247
2008-09-18

Optical element unit for exposure processes having sealing element

 #186
20080212044
2008-09-04

Debris mitigation system with improved gas distribution

 #187
20080192215
2008-08-14

Optical element unit for exposure processes

 #188
20080179765
2008-07-31

Humidifying apparatus, lithographic apparatus and humidifying method

 #189
20080174750
2008-07-24

Apparatus configured to position a workpiece

 #190
20080170210
2008-07-17

Device manufacturing method and lithographic apparatus

 #191
20080163892
2008-07-10

CLEANING WAFER INCLUDING DETERGENT LAYER FOR EXPOSURE APPARATUS OF IMMERSION LITHOGRAPHY SYSTEM, COMPOSITION OF DETERGENT LAYER, METHOD OF USING CLEANING WAFER AND APPLICATION SYSTEM

 #192
20080160895
2008-07-03

Atmosphere control apparatus, device-manufacturing apparatus, device-manufacturing method, and exposure apparatus

 #193
20080151200
2008-06-26

Exposure Apparatus and Device Manufacturing Method

 #194
20080142736
2008-06-19

Radiation system and lithographic apparatus

 #195
20080137192
2008-06-12

Lens module comprising at least one exchangeable optical element

 #196
20080130145
2008-06-05

Closing module for an optical arrangement

 #197
20080129971
2008-06-05

Exposure apparatus and method for manufacturing device

 #198
20080088808
2008-04-17

Process for forming resist pattern, and resist coating and developing apparatus

 #199
20080079953
2008-04-03

Alignment apparatus, exposure apparatus, and device manufacturing method using exposure apparatus

 #200
20070268467
2007-11-22

Exposure apparatus and semiconductor device manufacturing method

 #201
20070242243
2007-10-18

Lithographic apparatus and device manufacturing method

 #202
20070236673
2007-10-11

Exposure method and apparatus, and device manufacturing method

 #203
20070222906
2007-09-27

Assembly comprising a conditioning system and at least one object, a conditioning system, a lithographic apparatus and methods

 #204
20070209226
2007-09-13

Apparatus for and method of thermophoretic protection of an object in a high-vacuum environment

 #205
20070187272
2007-08-16

Device for the storage and use of at least one photomask for lithographic projection and method for using the device in an exposure installation

 #206
20070177122
2007-08-02

Lithographic apparatus, device manufacturing method and exchangeable optical element

 #207
20070160103
2007-07-12

Gas discharge laser light source beam delivery unit

 #208
20070159608
2007-07-12

Exposure apparatus and device manufacturing method

 #209
20070146660
2007-06-28

Lithographic apparatus, system and device manufacturing method

 #210
20070145295
2007-06-28

Radical cleaning arrangement for a lithographic apparatus

 #211
20070131878
2007-06-14

Controlling the flow through the collector during cleaning

 #212
20070121091
2007-05-31

Extreme ultraviolet reticle protection using gas flow thermophoresis

 #213
20070114467
2007-05-24

Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system

 #214
20070097342
2007-05-03

Exposure apparatus and method, and device manufacturing method

 #215
20070085984
2007-04-19

Lithographic projection apparatus, device manufacturing method and device manufactured thereby

 #216
20070080307
2007-04-12

Arrangement for the suppression of unwanted spectral components in a plasma-based EUV radiation source

 #217
20070076183
2007-04-05

Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method

 #218
20070071889
2007-03-29

Lithographic apparatus and method for conditioning an interior space of a device manufacturing apparatus

 #219
20070062557
2007-03-22

Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus

 #220
20070035715
2007-02-15

Exposure apparatus for manufacturing semiconductors and method for inspecting pellicles

 #221
20070030466
2007-02-08

Exposure apparatus control method, exposure method and apparatus using the control method, and device manufacturing method

 #222
20070030463
2007-02-08

Lithographic projection apparatus, purge gas supply system and gas purging method

 #223
20070024982
2007-02-01

IMAGING SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM

 #224
20060285091
2006-12-21

Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application

 #225
20060274292
2006-12-07

Exposure apparatus and device manufacturing method

 #226
20060274291
2006-12-07

Atmosphere control apparatus, device-manufacturing apparatus, device-manufacturing method, and exposure apparatus

 #227
20060268246
2006-11-30

Lithographic device, device manufacturing method and device manufactured thereby

 #228
20060246234
2006-11-02

Photomask assembly incorporating a metal/scavenger pellicle frame

 #229
20060232754
2006-10-19

Lithographic apparatus and device manufacturing method

 #230
20060221314
2006-10-05

Lithographic apparatus, device manufacturing method, and device manufactured thereby

 #231
20060219950
2006-10-05

Lithographic apparatus and device manufacturing method

 #232
20060215137
2006-09-28

Exposure apparatus and device manufacturing method

 #233
20060215132
2006-09-28

Lithographic apparatus and device manufacturing method

 #234
20060209279
2006-09-21

Exposure apparatus and device fabricating method

 #235
20060199274
2006-09-07

Atmosphere conditioning method, exposure apparatus, and device manufacturing method

 #236
20060197932
2006-09-07

Optical apparatus and method of manufacturing device

 #237
20060176465
2006-08-10

Alignment apparatus, exposure apparatus, and device manufacturing method using exposure apparatus

 #238
20060176463
2006-08-10

Lithographic apparatus, device manufacturing method, and device manufactured thereby

 #239
20060156927
2006-07-20

Filter apparatus, exposure apparatus, and device-producing method

 #240
20060152695
2006-07-13

Exposure apparatus

 #241
20060146300
2006-07-06

Radiation exposure apparatus comprising a gas flushing system

 #242
20060138362
2006-06-29

Lithographic apparatus, illumination system and debris trapping system

 #243
20060131682
2006-06-22

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Radiation exposure apparatus comprising a gas flushing system

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Exposure apparatus and device manufacturing method

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System for setting and maintaining a gas atmosphere in an optical system

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Exposure apparatus, and device manufacturing method

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Lithographic apparatus and device manufacturing method

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Extreme ultraviolet reticle protection using gas flow thermophoresis

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Method for purging an optical lens

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Method and apparatus for recycling gases used in a lithography tool

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Lithographic apparatus and device manufacturing method

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Systems and methods for measurement of a specimen with vacuum ultraviolet light

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Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method

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Exposure apparatus and device manufacturing method including gas purging of a space containing optical components

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Method for purification of lens gases used in photolithography

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Exposure apparatus and device manufacturing method

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Lithographic optical system

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Device for sealing a projection exposure apparatus

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System for purifying purge gases

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Exposure apparatus and air-conditioning apparatus for use with exposure apparatus

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Temperature control method and apparatus and exposure method and apparatus

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Projection objective having adjacently mounted aspheric lens surfaces

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Exposure apparatus and exposure method

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Method and apparatus for a reticle with purged pellicle-to-reticle gap

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Lithographic projection apparatus and device manufacturing method

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Lithographic apparatus and device manufacturing method

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Inert-gas purge method, exposure apparatus, device fabrication method and devices

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Support unit, optical unit and exposure apparatus, and device manufacturing method

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Exposure apparatus and device manufacturing method

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Exposure method, exposure apparatus, and method for manufacturing device

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Exposure apparatus and device manufacturing method

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Exposure apparatus, and device manufacturing method using the same

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Exposure apparatus and device manufacturing method

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Device for cleaning reticle box

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Lithographic apparatus and device manufacturing method

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Method and system for active purging of pellicle volumes

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Technique of suppressing influence of contamination of exposure atmosphere

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Laser spectral engineering for lithographic process