G03F7/70966 - CPC Classification Index

ClassID:

177244 ⎘

G03F7/70966 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure apparatus for microlithography; Construction of apparatus, e.g. environment, hygiene aspects or materials; Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient; Optical materials and coatings, e.g. with particular transmittance, reflectance Birefringence

Recent Application in this class:

20250362623

2025-11-27

PHOTOLITHOGRAPHY APPARATUS AND METHOD OF OPERATING THE SAME

20250362622

2025-11-27

PHOTOLITHOGRAPHY APPARATUS AND METHOD OF OPERATING THE SAME

20190137656

2019-05-09

Hydroxide-catalysis bonding of optical components used in DUV optical systems

20190094704

2019-03-28

POLARIZATION-MODULATING OPTICAL ELEMENT

20180329308

2018-11-15

Reflective optical element and optical system for EUV lithography having proportions of substances which differ across a surface

20160195815

2016-07-07

Illumination system of a microlithographic projection exposure apparatus with a birefringent element

20150248066

2015-09-03

Illumination optical apparatus and projection exposure apparatus

20150248065

2015-09-03

Illumination optical apparatus and projection exposure apparatus

20150062551

2015-03-05

Optical system, in particular of a microlithographic projection exposure apparatus

#10

20150029480

2015-01-29

Optical system of a microlithographic projection exposure apparatus

#11

20140313498

2014-10-23

Polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatus

#12

20140111787

2014-04-24

Immersion catadioptric projection objective having two intermediate images

#13

20130293862

2013-11-07

Polarization-modulating optical element

#14

20130250268

2013-09-26

Illumination optical apparatus and projection exposure apparatus

#15

20130242280

2013-09-19

Illumination optical apparatus and projection exposure apparatus

#16

20120250147

2012-10-04

Catadioptric projection objective

#17

20120182622

2012-07-19

Synthesized silica glass for optical component

#18

20110228246

2011-09-22

PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

#19

20110211252

2011-09-01

Catadioptric projection objective

#20

20110188019

2011-08-04

POLARIZATION-MODULATING OPTICAL ELEMENT

#21

20110109894

2011-05-12

Polarization-modulating optical element and method for manufacturing thereof

#22

20100265572

2010-10-21

Catadioptric projection objective

#23

20100231888

2010-09-16

Optical system

#24

20100165318

2010-07-01

Illumination system of a microlithographic projection exposure apparatus with a birefringent element

#25

20100142051

2010-06-10

Optical system, exposure system, and exposure method

#26

20100141926

2010-06-10

Optical system,exposure system, and exposure method

#27

20100141921

2010-06-10

Optical system, exposure system, and exposure method

#28

20100026978

2010-02-04

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

#29

20100014153

2010-01-21

Catadioptric projection objective

#30

20090284729

2009-11-19

Illumination optical apparatus and projection exposure apparatus

#31

20090239732

2009-09-24

Optical component quartz glass

#32

20090225298

2009-09-10

Optical element, projection optical system, exposure apparatus, and device fabrication method

#33

20090203512

2009-08-13

Halide free glasses having low OH, OD concentrations

#34

20090195876

2009-08-06

METHOD FOR DESCRIBING A RETARDATION DISTRIBUTION IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

#35

20090190208

2009-07-30

Catadioptric projection objective

#36

20090122292

2009-05-14

Illumination optical apparatus and projection exposure apparatus

#37

20090103180

2009-04-23

Structures and methods for reducing aberration in optical systems

#38

20090097134

2009-04-16

Projection optical system, exposure apparatus, and method of manufacturing device

#39

20090027781

2009-01-29

Projection optical system, exposure apparatus, and device fabrication method

#40

20090027646

2009-01-29

Illumination system of a microlithographic projection exposure apparatus

#41

20090021830

2009-01-22

PROJECTION LENS OF A MICROLITHOGRAPHIC EXPOSURE SYSTEM

#42

20080316459

2008-12-25

Polarization-modulating optical element

#43

20080316456

2008-12-25

CATADIOPTRIC PROJECTION OBJECTIVE WITH GEOMETRIC BEAM SPLITTING

#44

20080304037

2008-12-11

Lithographic apparatus and device manufacturing method

#45

20080304033

2008-12-11

PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

#46

20080284998

2008-11-20

LITHOGRAPHIC APPARATUS AND METHOD OF CONTROLLING

#47

20080278799

2008-11-13

Projection objective of a microlithographic projection exposure apparatus

#48

20080266540

2008-10-30

Illumination system of a microlithographic projection exposure apparatus

#49

20080226844

2008-09-18

Space-Variant Liquid Crystal Waveplate

#50

20080218725

2008-09-11

Device and method for influencing the polarization distribution in an optical system

#51

20080212058

2008-09-04

Projection optical system, exposure apparatus, and device fabrication method

#52

20080204877

2008-08-28

Illumination system or projection lens of a microlithographic exposure system

#53

20080203326

2008-08-28

Method of reducing radiation-induced damage in fused silica and articles having such reduction

#54

20080198455

2008-08-21

Optical System, In Particular Objective Or Illumination System For A Microlithographic Projection Exposure Apparatus

#55

20080186469

2008-08-07

Polarization rotator and a crystalline-quartz plate for use in an optical imaging system

#56

20080186466

2008-08-07

ELEMENT FOR DEFOCUSING TM MODE FOR LITHOGRAPHY

#57

20080182210

2008-07-31

Image-projecting system, such as a projection objective of a microlithographic projection exposure apparatus

#58

20080174759

2008-07-24

Microlithographic projection exposure apparatus

#59

20080151381

2008-06-26

Imaging system, in particular a projection objective of a microlithographic projection exposure apparatus

#60

20080094701

2008-04-24

Arrangement and method for preventing the depolarization of linear-polarized light during the transmission of light through crystals

#61

20080088816

2008-04-17

Microlithograph system

#62

20080043331

2008-02-21

Projection objective of a microlithographic projection exposure apparatus

#63

20080030869

2008-02-07

Objectives as a microlithography projection objective with at least one liquid lens

#64

20080019013

2008-01-24

Lens made of a crystalline material

#65

20080013165

2008-01-17

Deep UV telecentric imaging system with axisymmetric birefringent element and polar-orthogonal polarization

#66

20070296941

2007-12-27

Optical system, exposure system, and exposure method

#67

20070285637

2007-12-13

Imaging system for a microlithographical projection light system

#68

20070242250

2007-10-18

Objective with crystal lenses

#69

20070236674

2007-10-11

Catadioptric projection objective

#70

20070217013

2007-09-20

Optical system of an illumination device of a projection exposure apparatus

#71

20070211246

2007-09-13

Polarization-modulating optical element and method for manufacturing thereof

#72

20070195423

2007-08-23

Projection exposure apparatus

#73

20070195411

2007-08-23

Microlithography optical system

#74

20070183017

2007-08-09

Correcting device to compensate for polarization distribution perturbations

#75

20070171432

2007-07-26

Lithographic and measurement techniques using the optical properties of biaxial crystals

#76

20070165198

2007-07-19

Projection objective for a microlithographic projection exposure apparatus

#77

20070139636

2007-06-21

Polarization rotator and a crystalline-quartz plate for use in an optical imaging system

#78

20070091440

2007-04-26

Method and System for Correction of Intrinsic Birefringence in UV Microlithography

#79

20070039543

2007-02-22

PHASE DELAY ELEMENT AND METHOD FOR PRODUCING A PHASE DELAY ELEMENT

#80

20070035848

2007-02-15

Imaging system, in particular a projection objective of a microlithographic projection exposure apparatus

#81

20070019179

2007-01-25

Polarization-modulating optical element

#82

20070007491

2007-01-11

Optical element, in particular for an objective or an illumination system of a microlithographic projection exposure apparatus

#83

20060279856

2006-12-14

Optical apparatus comprising an optical component and an adjustment device and method for influencing a polarization state of the optical component

#84

20060246363

2006-11-02

Photomask substrate made of synthetic quartz glass and photomask

#85

20060238895

2006-10-26

Projection objective of a microlithographic projection exposure apparatus and method for its production

#86

20060238735

2006-10-26

Optical system of a projection exposure apparatus

#87

20060221456

2006-10-05

Objectives as a microlithography projection objective with at least one liquid lens

#88

20060203214

2006-09-14

Illumination optical apparatus and projection exposure apparatus

#89

20060171020

2006-08-03

Objective with fluoride crystal lenses

#90

20060164621

2006-07-27

Lithographic apparatus and device manufacturing method

#91

20060146427

2006-07-06

Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method

#92

20060146411

2006-07-06

Imaging systems

#93

20060119826

2006-06-08

Polarization rotator and a crystalline-quartz plate for use in an optical imaging system

#94

20060109560

2006-05-25

Method of determining lens materials for a projection exposure apparatus

#95

20060087725

2006-04-27

High resolution objective lens assembly

#96

20060077373

2006-04-13

Lithographic apparatus, device manufacturing method

#97

20060077370

2006-04-13

Lithographic apparatus, device manufacturing method

#98

20060077366

2006-04-13

Catadioptric projection objective with geometric beam splitting

#99

20060066962

2006-03-30

Arrangement of optical elements in a microlithographic projection exposure apparatus

#100

20060066764

2006-03-30

Optical system and photolithography tool comprising same

#101

20060055909

2006-03-16

Illumination system for a microlithographic projection exposure apparatus

#102

20060050400

2006-03-09

Correction of birefringence in cubic crystalline optical systems

#103

20060037362

2006-02-23

Photolithography methods and systems

#104

20050270659

2005-12-08

Catadioptric projection lens and method for compensating the intrinsic birefringence in such a lens

#105

20050264786

2005-12-01

Projection lens and microlithographic projection exposure apparatus

#106

20050254773

2005-11-17

Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method

#107

20050243222

2005-11-03

Optical system of a microlithographic projection exposure apparatus

#108

20050237527

2005-10-27

Illumination optical system, exposure apparatus, and device fabrication method with a polarizing element and an optical element with low birefringence

#109