187597 ⎘
Program-control systems; Nc systems; Nc machine tool, till multiple CMP end point analysis, measure parameters on points to detect end of polishing process
Filtering during in-situ monitoring of polishing
#2Filtering during in-situ monitoring of polishing
#3Filtering during in-situ monitoring of polishing
#4Adaptive endpoint method for pad life effect on chemical mechanical polishing
#5Adaptive endpoint method for pad life effect on chemical mechanical polishing
#6EXTENDED KALMAN FILTER INCORPORATING OFFLINE METROLOGY
#7Algorithm for real-time process control of electro-polishing
#8EXTENDED KALMAN FILTER INCORPORATING OFFLINE METROLOGY
#9Algorithm for real-time process control of electro-polishing
#10Extended Kalman filter incorporating offline metrology