ClassID:

201845

H01F41/183 - CPC Classification

Classification description:

Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering Sputtering targets therefor

Recent Application in this class:
#1
20250182963
2025-06-05

Boron-Based and High-Entropy Magnetic Materials

#2
20240186064
2024-06-06

SOFT MAGNETIC MULTILAYER DESPOSITION APPARATUS, METHODS OF MANUFACTURING AND MAGNETIC MULTILAYER

#3
20230220539
2023-07-13

METHOD OF DEPOSITING A MATERIAL

#4
20230125486
2023-04-27

Nonmagnetic material-dispersed Fe-Pt based sputtering target

#5
20230076444
2023-03-09

Sputtering Target Material and Method of Producing the Same

#6
20220005505
2022-01-06

Sputtering Target, Method for Producing Laminated Film, Laminated Film and Magnetic Recording Medium

#7
20210172056
2021-06-10

Sputtering target and method of producing sputtering target

#8
20200362451
2020-11-19

Sputtering target material

#9
20200357438
2020-11-12

Sputtering target and magnetic film

#10
20200357433
2020-11-12

Fe—Pt based magnetic material sintered compact

#11
20200203071
2020-06-25

SOFT MAGNETIC MULTILAYER DESPOSITION APPARATUS, METHODS OF MANUFACTURING AND MAGNETIC MULTILAYER

#12
20200131625
2020-04-30

Stage device and processing apparatus

#13
20200051589
2020-02-13

Sputtering Target, Method for Producing Laminated Film, Laminated Film and Magnetic Recording Medium

#14
20190244754
2019-08-08

Magnetic thin film deposition chamber and thin film deposition apparatus

#15
20180245211
2018-08-30

Sputtering target material

#16
20180019389
2018-01-18

Magnetic material sputtering target and method for producing same

#17
20170294203
2017-10-12

Sputtering target for forming magnetic recording film and method for producing same

#18
20170169946
2017-06-15

Method of engineering single phase magnetoelectric hexaferrite films

#19
20160284987
2016-09-29

Method of forming a stack of layers using a sacrificial layer

#20
20160237552
2016-08-18

Magnetic material sputtering target and method for producing same

#21
20160141158
2016-05-19

Fe-Co-based alloy sputtering target material, and method of producing same

#22
20150262752
2015-09-17

Sputtering Target for Rare-Earth Magnet and Production Method Therefor

#23
20150213822
2015-07-30

Fe-Pt based magnetic material sintered compact

#24
20140346039
2014-11-27

Sputtering target for magnetic recording film

#25
20140311901
2014-10-23

Magnetron sputtering target and method for manufacturing the same

#26
20140306144
2014-10-16

Magnetron sputtering target and process for producing the same

#27
20130248362
2013-09-26

Sputtering target for magnetic recording film and process for production thereof

#28
20130240352
2013-09-19

Sputtering target

#29
20130175166
2013-07-11

Magnetron sputtering target and process for producing the same

#30
20130168240
2013-07-04

Fe—Pt-based ferromagnetic material sputtering target

#31
20130015061
2013-01-17

Sputtering target of nonmagnetic-particle-dispersed ferromagnetic material

#32
20130001079
2013-01-03

Sputtering target of nonmagnetic-particle-dispersed ferromagnetic material

#33
20120318669
2012-12-20

SPUTTERING TARGET-BACKING PLATE ASSEMBLY

#34
20120241317
2012-09-27

Sputtering Target Comprising Oxide Phase Dispersed in Co or Co Alloy Phase, Magnetic Thin Film Made of Co or Co Alloy Phase and Oxide Phase, and Magnetic Recording Medium Using the Said Thin Film

#35
20120241316
2012-09-27

Sputtering target of magnetic material

#36
20120118734
2012-05-17

Ferromagnetic material sputtering target

#37
20120097535
2012-04-26

Sputtering target of ferromagnetic material with low generation of particles

#38
20110253926
2011-10-20

Sputtering Target and Method of Forming Film

#39
20110247930
2011-10-13

Nonmagnetic material particle-dispersed ferromagnetic material sputtering target

#40
20100320084
2010-12-23

Sputtering target of nonmagnetic-particle-dispersed ferromagnetic material

#41
20100243435
2010-09-30

Sputtering Target for Magnetic Recording Film and Method for Manufacturing the Same

#42
20100239890
2010-09-23

FePtP-alloy magnetic thin film

#43
20090242393
2009-10-01

Nonmagnetic material particle dispersed ferromagnetic material sputtering target

#44
20090071822
2009-03-19

Alloy and Sputtering Target Material for Soft-Magnetic Film Layer in Perpendicular Magnetic Recording Medium, and Method for Producing the Same

#45
20080181810
2008-07-31

Magnetic Film of Oxide-Containing Cobalt Base Alloy, Oxide-Containing Cobalt Base Alloy Target, and Manufacturing Method Thereof

#46
20080063555
2008-03-13

Cr-doped FeCoB based target material and method for producing the same

#47
20080052896
2008-03-06

Fabrication process for magneto-resistive effect devices of the CPP structure

#48
20070297103
2007-12-27

Heusler alloy with insertion layer to reduce the ordering temperature for CPP, TMR, MRAM, and other spintronics applications

#49
20070187236
2007-08-16

Co-Cr-Pt-B alloy sputtering target

#50
20060137782
2006-06-29

Target of high-purity nickel or nickel alloy and its producing method

#51
20060110626
2006-05-25

Carbon containing sputter target alloy compositions

#52
20050271901
2005-12-08

Magnetic film for magnetic device

#53
20050223848
2005-10-13

Co alloy target and its production method, soft magnetic film for perpendicular magnetic recording and perpendicular magnetic recording medium