ClassID:

206305

H01J2237/004 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging Charge control of objects or beams

Sub-classes:
Recent Application in this class:
#1
20250239430
2025-07-24

CHARGED PARTICLE BEAM DEVICE

#2
20250166965
2025-05-22

SURFACE CHARGE AND POWER FEEDBACK AND CONTROL USING A SWITCH MODE BIAS SYSTEM

#3
20240412889
2024-12-12

Low-voltage electron beam control of conductive state at a complex-oxide interface

#4
20230154639
2023-05-18

Low-voltage electron beam control of conductive state at a complex-oxide interface

#5
20210351007
2021-11-11

Surface charge and power feedback and control using a switch mode bias system

#6
20210265170
2021-08-26

Substrate processing method and substrate processing apparatus

#7
20210175047
2021-06-10

Charged particle beam device

#8
20210172891
2021-06-10

Method and system for inspecting an EUV mask

#9
20200088657
2020-03-19

Charged particle beam inspection of ungrounded samples

#10
20190277782
2019-09-12

Electron beam inspection apparatus and electron beam inspection method

#11
20190189402
2019-06-20

Methods and assemblies using fluorine containing and inert gases for plasma flood gun operation

#12
20190170671
2019-06-06

Method and system for inspecting an EUV mask

#13
20190096640
2019-03-28

Plasma processing apparatus

#14
20190051490
2019-02-14

Charged particle beam device with distance setting between irradiation regions in a scan line

#15
20190035601
2019-01-31

Methods and devices for examining an electrically charged specimen surface

#16
20180102195
2018-04-12

Charge stripping film for charge stripping device of ion beam

#17
20180090298
2018-03-29

Electron beam apparatus and positional displacement correcting method of electron beam

#18
20180012730
2018-01-11

Charged-particle beam exposure method and charged-particle beam correction method

#19
20180012727
2018-01-11

Continuous ion beam kinetic energy dissipater apparatus and method of use thereof

#20
20170309438
2017-10-26

ELECTROSTATIC LENS STRUCTURE

#21
20170178870
2017-06-22

Method of extracting and accelerating ions

#22
20170062180
2017-03-02

Methods and devices for examining an electrically charged specimen surface

#23
20170053774
2017-02-23

Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask

#24
20170052129
2017-02-23

Method and system for inspecting an EUV mask

#25
20170011883
2017-01-12

System and method for scanning an object with an electron beam using overlapping scans and electron beam counter-deflection

#26
20160365222
2016-12-15

Method for imaging wafer with focused charged particle beam in semiconductor fabrication

#27
20160260576
2016-09-08

Method and system for reducing charging artifacts in scanning electron microscopy images

#28
20160189923
2016-06-30

APPARATUS AND METHOD

#29
20160093470
2016-03-31

Chicane blanker assemblies for charged particle beam systems and methods of using the same

#30
20150303030
2015-10-22

Semiconductor inspection device including a counter electrode with adjustable potentials used to obtain images for detection of defects, and inspection method using charged particle beam

#31
20150262857
2015-09-17

Electrostatic chuck mechanism and charged particle beam apparatus

#32
20150214003
2015-07-30

Sample holder and method for observing electron microscopic image

#33
20150102220
2015-04-16

Method and system for inspecting an EUV mask

#34
20150090877
2015-04-02

Enhanced defect detection in electron beam inspection and review

#35
20140302252
2014-10-09

Low energy ion milling or deposition

#36
20140091215
2014-04-03

Electro-optical inspection apparatus and method with dust or particle collection function

#37
20130306866
2013-11-21

Scanning electron microscope with charge density control

#38
20120292507
2012-11-22

Charged particle beam device and sample observation method

#39
20120217393
2012-08-30

Electron microscope

#40
20120126118
2012-05-24

Charged particle beam apparatus and method for stably obtaining charged particle beam image

#41
20120091339
2012-04-19

CHARGED-PARTICLE MICROSCOPE DEVICE, AND METHOD OF CONTROLLING CHARGED-PARTICLE BEAMS

#42
20120085918
2012-04-12

Ion beam irradiation device and method for suppressing ion beam divergence

#43
20120074316
2012-03-29

Electro-optical inspection apparatus and method with dust or particle collection function

#44
20120025741
2012-02-02

Charged particle accelerator

#45
20120021341
2012-01-26

Substrate to be processed having laminated thereon resist film for electron beam and organic conductive film, method for manufacturing the same, and resist patterning process

#46
20110272576
2011-11-10

Charged particle beam applied apparatus

#47
20110216299
2011-09-08

Electrostatic lens structure

#48
20110204250
2011-08-25

Magnet for ion beam irradiation apparatus equipped with protective member that covers plurality of magnetic field concentrating members

#49
20110147586
2011-06-23

Charged particle beam device

#50
20110139605
2011-06-16

Ion beam source

#51
20100294930
2010-11-25

Scanning charged particle beams

#52
20100258722
2010-10-14

Charged particle beam imaging assembly and imaging method thereof

#53
20100237241
2010-09-23

Electrostatic charge measurement method, focus adjustment method, and scanning electron microscope

#54
20100112819
2010-05-06

Plasma processing method and plasma processing apparatus

#55
20100084582
2010-04-08

Method and apparatus for controlling beam current uniformity in an ion implanter

#56
20100026161
2010-02-04

Method of controlling electron beam focusing of pierce-type electron gun and control apparatus therefor

#57
20100019148
2010-01-28

INSPECTION APPARATUS FOR CIRCUIT PATTERN

#58
20100012837
2010-01-21

Multiple current charged particle methods

#59
20090302233
2009-12-10

CHARGED PARTICLE BEAM APPARATUS

#60
20090289185
2009-11-26

Ultra high precision measurement tool

#61
20090261251
2009-10-22

INSPECTION APPARATUS AND INSPECTION METHOD

#62
20090224701
2009-09-10

Charged particle accelerator

#63
20090212017
2009-08-27

Plasma processing method and plasma processing apparatus

#64
20090114154
2009-05-07

PLASMA TREATMENT APPARATUS

#65
20090095916
2009-04-16

Ion beam guide tube

#66
20080296496
2008-12-04

METHOD AND APPARATUS OF WAFER SURFACE POTENTIAL REGULATION

#67
20080277583
2008-11-13

Charged particle beam apparatus

#68
20080251718
2008-10-16

Electron beam apparatus and sample observation method using the same

#69
20080224039
2008-09-18

Scanning electron microscope with length measurement function and dimension length measurement method

#70
20080203298
2008-08-28

Electrostatic charge measurement method, focus adjustment method, and scanning electron microscope

#71
20080182185
2008-07-31

Charged particle beam writing apparatus and method thereof, and method for resizing dimension variation due to loading effect

#72
20080078949
2008-04-03

Technique for improved ion beam transport

#73
20080067436
2008-03-20

System for magnetic scanning and correction of an ion beam

#74
20080035856
2008-02-14

Electric field lens and ion implanter having the same

#75
20070284526
2007-12-13

Inspection apparatus for circuit pattern

#76
20070246651
2007-10-25

Charged particle beam apparatus

#77
20070235646
2007-10-11

Scanning electron microscope

#78
20070221846
2007-09-27

Scanning electron microscope

#79
20070194228
2007-08-23

Charged particle beam device

#80
20070145269
2007-06-28

Electron anti-fogging baffle used as a detector

#81
20060292058
2006-12-28

Ion stripper device made of carbon nanotubes or fullerenes

#82
20060284088
2006-12-21

Focus correction method for inspection of circuit patterns

#83
20060272772
2006-12-07

Vacuum reaction chamber with x-lamp heater

#84
20060192134
2006-08-31

Ion beam measurement apparatus and method

#85
20060113474
2006-06-01

Scanning electron microscope

#86
20050142873
2005-06-30

Plasma processing method and plasma processing apparatus

#87
20050133719
2005-06-23

Scanning electron microscope

#88
20050092940
2005-05-05

Method of controlling implant dosage and pressure compensation factor in-situ

#89
20050092938
2005-05-05

Utilization of an ion gauge in the process chamber of a semiconductor ion implanter

#90
16015772
2020-03-31

Patterned atomic layer etching and deposition using miniature-column charged particle beam arrays

#91
14694710
2016-10-11

Precision substrate material removal using miniature-column charged particle beam arrays