206305 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging Charge control of objects or beams
Sub-classes:CHARGED PARTICLE BEAM DEVICE
#2SURFACE CHARGE AND POWER FEEDBACK AND CONTROL USING A SWITCH MODE BIAS SYSTEM
#3Low-voltage electron beam control of conductive state at a complex-oxide interface
#4Low-voltage electron beam control of conductive state at a complex-oxide interface
#5Surface charge and power feedback and control using a switch mode bias system
#6Substrate processing method and substrate processing apparatus
#7Charged particle beam device
#8Method and system for inspecting an EUV mask
#9Charged particle beam inspection of ungrounded samples
#10Electron beam inspection apparatus and electron beam inspection method
#11Methods and assemblies using fluorine containing and inert gases for plasma flood gun operation
#12Method and system for inspecting an EUV mask
#13Plasma processing apparatus
#14Charged particle beam device with distance setting between irradiation regions in a scan line
#15Methods and devices for examining an electrically charged specimen surface
#16Charge stripping film for charge stripping device of ion beam
#17Electron beam apparatus and positional displacement correcting method of electron beam
#18Charged-particle beam exposure method and charged-particle beam correction method
#19Continuous ion beam kinetic energy dissipater apparatus and method of use thereof
#20ELECTROSTATIC LENS STRUCTURE
#21Method of extracting and accelerating ions
#22Methods and devices for examining an electrically charged specimen surface
#23Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask
#24Method and system for inspecting an EUV mask
#25System and method for scanning an object with an electron beam using overlapping scans and electron beam counter-deflection
#26Method for imaging wafer with focused charged particle beam in semiconductor fabrication
#27Method and system for reducing charging artifacts in scanning electron microscopy images
#28APPARATUS AND METHOD
#29Chicane blanker assemblies for charged particle beam systems and methods of using the same
#30Semiconductor inspection device including a counter electrode with adjustable potentials used to obtain images for detection of defects, and inspection method using charged particle beam
#31Electrostatic chuck mechanism and charged particle beam apparatus
#32Sample holder and method for observing electron microscopic image
#33Method and system for inspecting an EUV mask
#34Enhanced defect detection in electron beam inspection and review
#35Low energy ion milling or deposition
#36Electro-optical inspection apparatus and method with dust or particle collection function
#37Scanning electron microscope with charge density control
#38Charged particle beam device and sample observation method
#39Electron microscope
#40Charged particle beam apparatus and method for stably obtaining charged particle beam image
#41CHARGED-PARTICLE MICROSCOPE DEVICE, AND METHOD OF CONTROLLING CHARGED-PARTICLE BEAMS
#42Ion beam irradiation device and method for suppressing ion beam divergence
#43Electro-optical inspection apparatus and method with dust or particle collection function
#44Charged particle accelerator
#45Substrate to be processed having laminated thereon resist film for electron beam and organic conductive film, method for manufacturing the same, and resist patterning process
#46Charged particle beam applied apparatus
#47Electrostatic lens structure
#48Magnet for ion beam irradiation apparatus equipped with protective member that covers plurality of magnetic field concentrating members
#49Charged particle beam device
#50Ion beam source
#51Scanning charged particle beams
#52Charged particle beam imaging assembly and imaging method thereof
#53Electrostatic charge measurement method, focus adjustment method, and scanning electron microscope
#54Plasma processing method and plasma processing apparatus
#55Method and apparatus for controlling beam current uniformity in an ion implanter
#56Method of controlling electron beam focusing of pierce-type electron gun and control apparatus therefor
#57INSPECTION APPARATUS FOR CIRCUIT PATTERN
#58Multiple current charged particle methods
#59CHARGED PARTICLE BEAM APPARATUS
#60Ultra high precision measurement tool
#61INSPECTION APPARATUS AND INSPECTION METHOD
#62Charged particle accelerator
#63Plasma processing method and plasma processing apparatus
#64PLASMA TREATMENT APPARATUS
#65Ion beam guide tube
#66METHOD AND APPARATUS OF WAFER SURFACE POTENTIAL REGULATION
#67Charged particle beam apparatus
#68Electron beam apparatus and sample observation method using the same
#69Scanning electron microscope with length measurement function and dimension length measurement method
#70Electrostatic charge measurement method, focus adjustment method, and scanning electron microscope
#71Charged particle beam writing apparatus and method thereof, and method for resizing dimension variation due to loading effect
#72Technique for improved ion beam transport
#73System for magnetic scanning and correction of an ion beam
#74Electric field lens and ion implanter having the same
#75Inspection apparatus for circuit pattern
#76Charged particle beam apparatus
#77Scanning electron microscope
#78Scanning electron microscope
#79Charged particle beam device
#80Electron anti-fogging baffle used as a detector
#81Ion stripper device made of carbon nanotubes or fullerenes
#82Focus correction method for inspection of circuit patterns
#83Vacuum reaction chamber with x-lamp heater
#84Ion beam measurement apparatus and method
#85Scanning electron microscope
#86Plasma processing method and plasma processing apparatus
#87Scanning electron microscope
#88Method of controlling implant dosage and pressure compensation factor in-situ
#89Utilization of an ion gauge in the process chamber of a semiconductor ion implanter
#90Patterned atomic layer etching and deposition using miniature-column charged particle beam arrays
#91Precision substrate material removal using miniature-column charged particle beam arrays