206334 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Means for controlling the discharge Beam polarising means
SUBSTRATE PROCESSING APPARATUS AND A METHOD OF PROCESSING A SUBSTRATE USING THE SAME
#2Charged particle device, charged particle irradiation method, and analysis device
#3Apparatus and method for calculating drawing speeds of a charged particle beam
#4Spin rotation device
#5Phase-shifting element and particle beam device having a phase-shifting element
#6Phase-shifting element and particle beam device having a phase-shifting element
#7Phase-shifting element and particle beam device having a phase-shifting element