206345 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Means for controlling the discharge Changing particle velocity
Sub-classes:CHARGED PARTICLE APPARATUS AND METHOD
#2ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN THE PRODUCTION OF WAFERS
#3THIN FILM FORMING APPARATUS AND METHOD
#4Energy filter element for ion implantation systems for the use in the production of wafers
#5Blended energy ion implantation
#6Distributed ground single antenna ion source
#7Energy filter element for ion implantation systems for the use in the production of wafers
#8Energy filter element for ion implantation systems for the use in the production of wafers
#9Particle beam system and method for operating a particle beam system
#10Ion beam irradiation apparatus
#11Energy filter element for ion implantation systems for the use in the production of wafers
#12Ion implantation method, ion implantation apparatus and semiconductor device
#13Charged particle beam system and method of operating the same
#14Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
#15Parallelizing electrostatic acceleration/deceleration optical element
#16Controlling an ion beam in a wide beam current operation range
#17TRIPLE MODE ELECTROSTATIC COLLIMATOR
#18Systems and methods for particle pulse modulation
#19Charged particle beam system and method of operating the same
#20Charged particle-beam device and specimen observation method
#21Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
#22ELECTRODE ASSEMBLY HAVING PIERCE ELECTRODES FOR CONTROLLING SPACE CHARGE EFFECTS
#23Systems and methods for particle pulse modulation
#24Ion beam line
#25Ion implantation system and method with variable energy control
#26Ion source and method for making same
#27Ion implantation apparatus, beam parallelizing apparatus, and ion implantation method
#28Ion beam line
#29Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
#30Multi-energy ion implantation
#31Ion implantation apparatus and ion implantation method
#32Charged particle beam apparatus for removing charges developed on a region of a sample
#33Focused charged particle column for operation at different beam energies at a target
#34Charging-free electron beam cure of dielectric material
#35Apparatus and method for controlled particle beam manufacturing
#36Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
#37Microscope system, method for operating a charged-particle microscope
#38UNIFORMITY CONTROL USING ION BEAM BLOCKERS
#39In-vacuum beam defining aperture cleaning for particle reduction
#40Ion beam apparatus and method employing magnetic scanning
#41Charged particle beam system
#42Ion implantation systems
#43Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
#44Ion implantation ion source, system and method
#45APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
#46REDUCED IMPLANT VOLTAGE DURING ION IMPLANTATION
#47Method and apparatus for controlling beam current uniformity in an ion implanter
#48Implant uniformity control
#49APPARATUS
#50CHARGED PARTICLE BEAM APPARATUS
#51Electron microscope and observation method
#52Ion beam apparatus and method employing magnetic scanning
#53Ion beam apparatus and method for ion implantation
#54Inspection Method And Inspection System Using Charged Particle Beam
#55Charging-free electron beam cure of dielectric material
#56Techniques for reducing an electrical stress in an acceleration/deceleraion system
#57Charged-particle beam lithography apparatus and device manufacturing method
#58Ion implanter
#59SAMPLE ANALYZING APPARATUS
#60Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
#61Apparatus and method for controlled particle beam manufacturing
#62Apparatus and method for controlled particle beam manufacturing
#63Apparatus and method for controlled particle beam manufacturing
#64Apparatus and method for controlled particle beam manufacturing
#65Apparatus and method for controlled particle beam manufacturing
#66Apparatus and method for controlled particle beam manufacturing
#67Apparatus and method for controlled particle beam manufacturing
#68Ion implantation ion source, system and method
#69Inspection apparatus and inspection method
#70Charged particle beam system
#71Method and device for distance measurement
#72Inspection method and inspection system using charged particle beam
#73Dual mode ion source for ion implantation
#74Apparatus and method for controlled particle beam manufacturing
#75Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
#76Imaging system with multi source array
#77Charged particle beam device for high spatial resolution and multiple perspective imaging
#78Electron beam exposure method and system therefor
#79Irradiation system ion beam and method to enhance accuracy of irradiation
#80Irradiation system with ion beam
#81Method to increase low-energy beam current in irradiation system with ion beam
#82Weakening focusing effect of acceleration-deceleration column of ion implanter
#83Ion implantation ion source, system and method
#84Inspection method and inspection system using charged particle beam
#85Device for measuring the emission of X-rays produced by an object exposed to an electron beam
#86Ion implantation ion source, system and method
#87Ion irradiation of a target at very high and very low kinetic ion energies