206421 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Means for deflecting or directing discharge; Electrostatic means Prisms
MULTIPOLE ELEMENTS AND CHARGED PARTICLE MICROSCOPE SYSTEMS INCLUDING THE SAME
#2ABERRATION CORRECTION SYSTEMS AND CHARGED PARTICLE MICROSCOPE SYSTEMS INCLUDING THE SAME
#3TECHNIQUES FOR ELECTRON ENERGY LOSS SPECTROSCOPY AT HIGH ENERGY
#4Electron microscope for magnetic field measurement and magnetic field measurement method
#5Interference optical system unit, charged particle beam interference apparatus, and method for observing charged particle beam interference image
#6Electron Beam Biprism Device and Electron Beam Device
#7Twin beam charged particle column and method of operating thereof
#8Transmission electron microscope and method for observing specimen image with the same
#9COMPONENT FOR MANIPULATING A STREAM OF CHARGED PARTICLES
#10Method, device and system for measuring nanoscale deformations
#11Transmission electron microscope
#12Interferometer
#13Electron beam device
#14Phase plate for electron microscope and method for manufacturing same
#15Magnetic electron microscope
#16Charged particle beam equipment
#17Electron interferometer or electron microscope
#18Interferometer having three electron biprisms
#19Transmission electron microscope
#20Electron microscope and combined illumination lens
#21Electron holography system
#22Interferometer
#23Substrate inspection method, manufacturing method of semiconductor device and substrate inspection apparatus
#24Scanning interference electron microscope
#25System and method for improving spatial resolution of electron holography
#26Electron microscope equipped with magnetic microprobe