206423 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Means for deflecting or directing discharge; Electrostatic means for X-Y scanning
COMPACT 2D SCANNER MAGNET WITH TRAPEZOIDAL COILS
#2DISTORTION OPTIMIZED MULTI-BEAM SCANNING SYSTEM
#3Semiconductor wafer
#4Method of influencing a charged particle beam, multipole device, and charged particle beam apparatus
#5Multi-charged particle beam irradiation apparatus and multi-charged particle beam inspection apparatus
#6Method and device for implanting ions in wafers
#7Charged particle beam device
#8Method and device for implanting ions in wafers
#9Focused ion beam low kV enhancement
#10High-energy ion implanter
#11Sample observing device and sample observing method
#12Pattern modification schemes for improved FIB patterning
#13Methods and systems for testing digital-to-analog converter/amplifier circuits
#14Deflector array, exposure apparatus, and device manufacturing method
#15APPARATUS AND METHODS FOR TREATING A WORKPIECE USING A GAS CLUSTER ION BEAM
#16Charged particle beam writing apparatus and method thereof
#17Deflector array, exposure apparatus, and device manufacturing method
#18Electrostatic deflection system with low aberrations and vertical beam incidence
#19Wafer-scale microcolumn array using low temperature co-fired ceramic substrate
#20System, apparatus and method for bunched ribbon ion beam