206431 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Correcting image defects, e.g. stigmators Space charge (Boersch) effect compensation
Fill pattern to enhance ebeam process margin
#2Charged particle beam inspection of ungrounded samples
#3Fill pattern to enhance e-beam process margin
#4Methods and devices for examining an electrically charged specimen surface
#5System and method for use in electron microscopy
#6Ion beam irradiation device and method for suppressing ion beam divergence
#7Ion implantation with diminished scanning field effects
#8Ion implantation apparatus and method of correcting deviation angle of ion beam
#9Charged-particle beam lithography apparatus and device manufacturing method
#10Monochromator and radiation source with monochromator
#11Ion implantation apparatus
#12Projection electronic microscope for reducing geometric aberration and space charge effect
#13Double stage charged particle beam energy width reduction system for charged particle beam system
#14Projection electron microscope, electron microscope, specimen surface observing method and micro device producing method
#15Substrate inspection method, method of manufacturing semiconductor device, and substrate inspection apparatus