ClassID:

206443

H01J2237/2001 - page 2 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated Maintaining constant desired temperature

Recent Application in this class:
#301
20150001423
2015-01-01

Device for spot size measurement at wafer level using a knife edge and a method for manufacturing such a device

#302
20140363978
2014-12-11

Electron beam-induced etching

#303
20140360286
2014-12-11

Apparatus and method for producing specimens for electron microscopy

#304
20140353151
2014-12-04

Charged particle beam irradiation apparatus

#305
20140346349
2014-11-27

Drawing apparatus, and method of manufacturing article

#306
20140270905
2014-09-18

Rotary flex union

#307
20140262157
2014-09-18

Wafer platen thermosyphon cooling system

#308
20140124139
2014-05-08

Plasma processing apparatus and method

#309
20140051257
2014-02-20

Etching apparatus and method

#310
20140034846
2014-02-06

In-vacuum high speed pre-chill and post-heat stations

#311
20140034608
2014-02-06

Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support

#312
20140014835
2014-01-16

Electron microscope sample holder and sample observation method

#313
20130320208
2013-12-05

Inert atmospheric pressure pre-chill and post-heat

#314
20130240759
2013-09-19

Method and apparatus for clamping and cooling a substrate for ion implantation

#315
20130240353
2013-09-19

Ion milling device and ion milling processing method

#316
20130224962
2013-08-29

Non-contact substrate processing

#317
20130213439
2013-08-22

Holder assembly for cooperating with an environmental cell and an electron microscope

#318
20130200271
2013-08-08

Charged particle beam device

#319
20130180963
2013-07-18

Methods and apparatus for rapidly responsive heat control in plasma processing devices

#320
20130056636
2013-03-07

SCANNING ELECTRON MICROSCOPE

#321
20130048216
2013-02-28

CAPACITIVE CVD REACTOR AND METHODS FOR PLASMA CVD PROCESS

#322
20130040400
2013-02-14

Method of studying a sample in an ETEM

#323
20130037706
2013-02-14

Devices and methods for cryo lift-out with in situ probe

#324
20130014528
2013-01-17

Cryogenic specimen holder

#325
20130009073
2013-01-10

Transmission electron microscope micro-grid

#326
20120315404
2012-12-13

APPARATUS FOR THERMAL AND PLASMA ENHANCED VAPOR DEPOSITION AND METHOD OF OPERATING

#327
20120292505
2012-11-22

Methods of using temperature control devices in electron microscopy

#328
20120267346
2012-10-25

Support assembly

#329
20120244704
2012-09-27

Method for removing oxides

#330
20120241648
2012-09-27

HEAT LIP SEAL FOR CRYOGENIC PROCESSING

#331
20120241607
2012-09-27

Microfluidic blotless cryo TEM device and method

#332
20120186519
2012-07-26

PLASMA DOPING METHOD AND APPARATUS

#333
20120160471
2012-06-28

Apparatus for cooling samples during ion beam preparation

#334
20120132397
2012-05-31

Temperature control in plasma processing apparatus using pulsed heat transfer fluid flow

#335
20120128028
2012-05-24

Method of measuring the temperature of a sample carrier in a charged particle-optical apparatus

#336
20120112068
2012-05-10

Charged particle beam device

#337
20120112064
2012-05-10

Sample holder, method for use of the sample holder, and charged particle device

#338
20120112062
2012-05-10

Environmental cell for charged particle beam system

#339
20120082802
2012-04-05

Power loading substrates to reduce particle contamination

#340
20120077289
2012-03-29

Apparatus and method of temperature control during cleaving processes of thick materials

#341
20120073501
2012-03-29

PROCESS CHAMBER FOR DIELECTRIC GAPFILL

#342
20120057856
2012-03-08

Apparatus and methods for vacuum-compatible substrate thermal management

#343
20120031889
2012-02-09

MOUNTING TABLE STRUCTURE AND PROCESSING APPARATUS

#344
20120024086
2012-02-02

Cryogenic specimen holder

#345
20120016508
2012-01-19

Semiconductor fabrication apparatus and temperature adjustment method

#346
20120012556
2012-01-19

Plasma etching apparatus and plasma etching method

#347
20120006493
2012-01-12

HEATING AND COOLING OF SUBSTRATE SUPPORT

#348
20120003842
2012-01-05

METHOD FOR FORMING SILICON OXIDE FILM AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

#349
20120000629
2012-01-05

Substrate processing apparatus

#350
20110320030
2011-12-29

Thermal Control of a Proximity Mask and Wafer During Ion Implantation

#351
20110310366
2011-12-22

Exposure apparatus and article manufacturing method

#352
20110297845
2011-12-08

Effective algorithm for warming a twist axis for cold ion implantations

#353
20110291030
2011-12-01

ACTIVE DEW POINT SENSING AND LOAD LOCK VENTING TO PREVENT CONDENSATION ON WORKPIECES

#354
20110291023
2011-12-01

Heated rotary seal and bearing for chilled ion implantation system

#355
20110291022
2011-12-01

Post Implant Wafer Heating Using Light

#356
20110272097
2011-11-10

Plasma processing apparatus and method

#357
20110262315
2011-10-27

Substrate support having dynamic temperature control

#358
20110240881
2011-10-06

Specimen holder and specimen holder movement device

#359
20110238225
2011-09-29

Method and system for automating sample preparation for microfluidic cryo TEM

#360
20110232845
2011-09-29

Substrate cleaning chamber and components

#361
20110229987
2011-09-22

Method for low temperature ion implantation

#362
20110223755
2011-09-15

METHOD FOR REMOVING OXIDES

#363
20110220288
2011-09-15

TEMPERATURE CONTROL SYSTEM, TEMPERATURE CONTROL METHOD, PLASMA PROCESSING APPARATUS AND COMPUTER STORAGE MEDIUM

#364
20110217849
2011-09-08

Device and method for producing dielectric layers in microwave plasma

#365
20110207243
2011-08-25

Plasma processing apparatus and plasma processing method

#366
20110192540
2011-08-11

TABLE FOR PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING APPARATUS

#367
20110139067
2011-06-16

ARRANGEMENT FOR COATING TAPE-SHAPED FILM SUBSTRATES

#368
20110113858
2011-05-19

Gas charge container, atom probe apparatus, and method for analyzing hydrogen position in material

#369
20110104884
2011-05-05

Hot edge ring with sloped upper surface

#370
20110079710
2011-04-07

Microscopy support structures

#371
20110079580
2011-04-07

LOWER CHAMBER HEATERS FOR IMPROVED ETCH PROCESSES

#372
20110073781
2011-03-31

Ion implantation apparatus

#373
20110073780
2011-03-31

Optical heater for cryogenic ion implanter surface regeneration

#374
20110073779
2011-03-31

Ion implantation apparatus

#375
20110068085
2011-03-24

Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control

#376
20110065279
2011-03-17

Method of processing a workpiece in a plasma reactor using feed forward thermal control

#377
20110045208
2011-02-24

DIAMOND-LIKE CARBON FILM FORMING APPARATUS AND METHOD OF FORMING DIAMOND-LIKE CARBON FILM

#378
20110034014
2011-02-10

COLD IMPLANT FOR OPTIMIZED SILICIDE FORMATION

#379
20110031214
2011-02-10

Vacuum processing chambers incorporating a moveable flow equalizer

#380
20110027463
2011-02-03

WORKPIECE HANDLING SYSTEM

#381
20100327190
2010-12-30

Ion implantation apparatus and a method

#382
20100327189
2010-12-30

Ion implantation apparatus and a method for fluid cooling

#383
20100327181
2010-12-30

Ion implantation apparatus

#384
20100326957
2010-12-30

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

#385
20100326094
2010-12-30

Plasma processing apparatus and maintenance method therefor

#386
20100319851
2010-12-23

Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes

#387
20100317199
2010-12-16

Substrate processing apparatus and manufacturing method of semiconductor device using plasma generation

#388
20100314246
2010-12-16

SPUTTER-COATING APPARATUS HAVING HEATING UNIT

#389
20100314046
2010-12-16

Plasma reactor with a multiple zone thermal control feed forward control apparatus

#390
20100301236
2010-12-02

Shorten Temperature Recovery Time of Low Temperature Ion Implantation

#391
20100273277
2010-10-28

Rapid thermal processing systems and methods for treating microelectronic substrates

#392
20100258739
2010-10-14

Charged particle beam apparatus

#393
20100247804
2010-09-30

BIASABLE COOLING PEDESTAL

#394
20100243620
2010-09-30

PLASMA PROCESSING APPARATUS

#395
20100236920
2010-09-23

DEPOSITION APPARATUS WITH HIGH TEMPERATURE ROTATABLE TARGET AND METHOD OF OPERATING THEREOF

#396
20100224592
2010-09-09

Charged particle beam processing

#397
20100213170
2010-08-26

ETCHING METHOD AND ETCHING APPARATUS

#398
20100206482
2010-08-19

Plasma processing apparatus and temperature measuring method and apparatus used therein

#399
20100200545
2010-08-12

Non-contact substrate processing

#400
20100181501
2010-07-22

APPARATUS FOR SUB-ZERO DEGREE C ION IMPLANTATION

#401
20100181482
2010-07-22

Transmission electron microscope micro-grid

#402
20100171044
2010-07-08

Vapor compression refrigeration chuck for ion implanters

#403
20100168889
2010-07-01

SUBSTRATE TREATMENT APPARATUS, SUBSTRATE TREATMENT METHOD AND STORAGE MEDIUM

#404
20100162956
2010-07-01

Substrate Processing Apparatus and Substrate Mount Table Used in the Apparatus

#405
20100155026
2010-06-24

CONDENSIBLE GAS COOLING SYSTEM

#406
20100144159
2010-06-10

Substrate processing method and substrate processing apparatus

#407
20100136255
2010-06-03

ICE LAYERS IN CHARGED PARTICLE SYSTEMS AND METHODS

#408
20100126667
2010-05-27

Capacitive CVD reactor and methods for plasma CVD process

#409
20100126666
2010-05-27

PLASMA PROCESSING APPARATUS

#410
20100122774
2010-05-20

SUBSTRATE MOUNTING TABLE AND SUBSTRATE PROCESSING APPARATUS HAVING SAME

#411
20100117172
2010-05-13

THIN FILM SEMICONDUCTOR ALLOY MATERIAL PREPARED BY A VHF ENERGIZED PLASMA DEPOSITION PROCESS

#412
20100116788
2010-05-13

Substrate temperature control by using liquid controlled multizone substrate support

#413
20100116334
2010-05-13

VHF ENERGIZED PLASMA DEPOSITION PROCESS FOR THE PREPARATION OF THIN FILM MATERIALS

#414
20100108907
2010-05-06

Charged-particle optical system with dual loading options

#415
20100098837
2010-04-22

Plasma doping method and apparatus

#416
20100096109
2010-04-22

Methods and apparatus for rapidly responsive heat control in plasma processing devices

#417
20100093161
2010-04-15

Method for manufacturing semiconductor device

#418
20100089069
2010-04-15

Low temperature device with low-vibration sample holding device

#419
20100084579
2010-04-08

Fluid delivery mechanism for vacuum wafer processing system

#420
20100078899
2010-04-01

Adjustable thermal contact between an electrostatic chuck and a hot edge ring by clocking a coupling ring

#421
20100078424
2010-04-01

Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing system

#422
20100068411
2010-03-18

Vacuum treatment method

#423
20100059367
2010-03-11

SPUTTER-COATING APPARATUS

#424
20100051613
2010-03-04

MOUNTING TABLE STRUCTURE AND PROCESSING APPARATUS USING THE SAME

#425
20100043976
2010-02-25

Plasma processing apparatus

#426
20100018648
2010-01-28

WORKPIECE SUPPORT FOR A PLASMA REACTOR WITH CONTROLLED APPORTIONMENT OF RF POWER TO A PROCESS KIT RING

#427
20100003827
2010-01-07

METHOD AND DEVICE FOR ETCHING A SUBSTRATE BY MEANS OF PLASMA

#428
20090324848
2009-12-31

METAL FILM PRODUCTION APPARATUS

#429
20090323287
2009-12-31

Integrated Circuit Cooling Apparatus for Focused Beam Processes

#430
20090321017
2009-12-31

Plasma Processing Apparatus and Plasma Processing Method

#431
20090317964
2009-12-24

Platen ground pin for connecting substrate to ground

#432
20090308538
2009-12-17

Substrate temperature regulation fixed apparatus

#433
20090303306
2009-12-10

Techniques for changing temperature of a platen

#434
20090277883
2009-11-12

Plasma processing apparatus and plasma processing method

#435
20090277588
2009-11-12

Semiconductor producing device and semiconductor device producing method

#436
20090267122
2009-10-29

Semiconductor device and method of manufacturing the semiconductor device

#437
20090267002
2009-10-29

Apparatus and method for partial ion implantation using atom vibration

#438
20090263593
2009-10-22

METHOD FOR MANUFACTURING CARBON FILM

#439
20090242795
2009-10-01

Cryo-charging specimen holder for electron microscope

#440
20090238985
2009-09-24

SYSTEMS AND METHODS FOR DEPOSITION

#441
20090233443
2009-09-17

SUBSTRATE MOUNTING TABLE, SUBSTRATE PROCESSING APPARATUS AND TEMPERATURE CONTROL METHOD

#442
20090233383
2009-09-17

Plasma Doping Method and Apparatus

#443
20090232981
2009-09-17

Cooled cleaving implant

#444
20090230319
2009-09-17

Specimen stage-moving device for charged-particle beam system

#445
20090224788
2009-09-10

Apparatus for detecting defect by examining electric characteristics of a semiconductor device

#446
20090218510
2009-09-03

Specimen stage

#447
20090218316
2009-09-03

Manufacturing method in plasma processing apparatus

#448
20090215201
2009-08-27

Method for controlling spatial temperature distribution across a semiconductor wafer

#449
20090200494
2009-08-13

TECHNIQUES FOR COLD IMPLANTATION OF CARBON-CONTAINING SPECIES

#450
20090196484
2009-08-06

Systems and Methods of Identifying Biomarkers for Subsequent Screening and Monitoring of Diseases

#451
20090196483
2009-08-06

Systems and Methods of Identifying Biomarkers for Subsequent Screening and Monitoring of Diseases

#452
20090169769
2009-07-02

Deposition apparatus and deposition method

#453
20090140166
2009-06-04

TECHNIQUES FOR LOW-TEMPERATURE ION IMPLANTATION

#454
20090134022
2009-05-28

Method and apparatus for producing photocatalyst

#455
20090114152
2009-05-07

APPARATUS FOR PLASMA TREATMENT

#456
20090111280
2009-04-30

METHOD FOR REMOVING OXIDES

#457
20090101284
2009-04-23

Table for plasma processing apparatus and plasma processing apparatus

#458
20090095621
2009-04-16

SUPPORT ASSEMBLY

#459
20090095334
2009-04-16

Showerhead assembly

#460
20090084988
2009-04-02

SINGLE WAFER IMPLANTER FOR SILICON-ON-INSULATOR WAFER FABRICATION

#461
20090078563
2009-03-26

Plasma Processing Apparatus And Method Capable of Adjusting Temperature Within Sample Table

#462
20090078561
2009-03-26

Apparatus and Methods for Growing Nanofibres and Nanotips

#463
20090065486
2009-03-12

PLASMA TREATMENT APPARATUS, AND SUBSTRATE HEATING MECHANISM TO BE USED IN THE APPARATUS

#464
20090065145
2009-03-12

Plasma Processing Apparatus And Method Capable Of Adjusting Temperature Within Sample Table

#465
20090057573
2009-03-05

TECHNIQUES FOR TERMINAL INSULATION IN AN ION IMPLANTER

#466
20090050347
2009-02-26

Insulated conducting device with multiple insulation segments

#467
20090050056
2009-02-26

SUBSTRATE PROCESSING APPARATUS AND SEMICONDUCTOR MANUFACTURING METHOD THEREOF

#468
20090014323
2009-01-15

HIGH TEMPERATURE CATHODE FOR PLASMA ETCHING

#469
20090011605
2009-01-08

Method of manufacturing semiconductor device

#470
20090000741
2009-01-01

Vacuum prcessing apparatus and vacuum processing method of sample

#471
20090000400
2009-01-01

Method for attaching a sample to a manipulator by melting and then freezing part of said sample

#472
20080315097
2008-12-25

Charged particle beam apparatus and specimen holder

#473
20080308230
2008-12-18

Plasma processing apparatus

#474
20080295872
2008-12-04

Substrate cleaning chamber and components

#475
20080293832
2008-11-27

SOLID SAMPLE, SOLID SAMPLE FABRICATING METHOD, AND SOLID SAMPLE FABRICATING APPARATUS

#476
20080290290
2008-11-27

Heating stage for a micro-sample

#477
20080289767
2008-11-27

Plasma processing apparatus

#478
20080283748
2008-11-20

Electron microscope

#479
20080280451
2008-11-13

Plasma processing method and plasma processing apparatus

#480
20080271471
2008-11-06

Temperature Controlling Method for Substrate Processing System and Substrate Processing System

#481
20080268645
2008-10-30

Method for front end of line fabrication

#482
20080258411
2008-10-23

Power supply apparatus and deposition method using the power supply apparatus

#483
20080257494
2008-10-23

SUBSTRATE PROCESSING APPARATUS

#484
20080239691
2008-10-02

Thermally conductive sheet and substrate mounting device including same

#485
20080237184
2008-10-02

METHOD AND APPARATUS FOR PLASMA PROCESSING

#486
20080236614
2008-10-02

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

#487
20080236493
2008-10-02

PLASMA PROCESSING APPARATUS

#488
20080233766
2008-09-25

Ashing method and apparatus therefor

#489
20080223524
2008-09-18

Semiconductor producing device and semiconductor device producing method

#490
20080203925
2008-08-28

Plasma processing apparatus

#491
20080197780
2008-08-21

Plasma processing apparatus with filter circuit

#492
20080194104
2008-08-14

APPARATUS FOR PLASMA CHEMICAL VAPOR DEPOSITION AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING THE SAME

#493
20080188011
2008-08-07

APPARATUS AND METHOD OF TEMPERATURE CONROL DURING CLEAVING PROCESSES OF THICK FILM MATERIALS

#494
20080185104
2008-08-07

Multi-zone gas distribution system for a treatment system

#495
20080178608
2008-07-31

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

#496
20080164144
2008-07-10

Plasma Processing Apparatus And Method Of Producing Semiconductor Thin Film Using The Same

#497
20080149597
2008-06-26

Temperature control method for photolithographic substrate

#498
20080135752
2008-06-12

Probe-holding apparatus, sample-obtaining apparatus, sample-processing apparatus, sample-processing method and sample-evaluating method

#499
20080124903
2008-05-29

Techniques for low-temperature ion implantation

#500
20080121821
2008-05-29

TECHNIQUES FOR LOW-TEMPERATURE ION IMPLANTATION

#501
20080121344
2008-05-29

PLASMA PROCESSING APPARATUS

#502
20080113104
2008-05-15

Processing apparatus and processing method

#503
20080108208
2008-05-08

Techniques for forming shallow junctions

#504
20080105378
2008-05-08

PLASMA PROCESSING METHOD AND APPARATUS, AND STORAGE MEDIUM

#505
20080098752
2008-05-01

Low Temperature Cryostat

#506
20080093565
2008-04-24

Charged particle beam system and its specimen holder

#507
20080090392
2008-04-17

Technique for Improved Damage Control in a Plasma Doping (PLAD) Ion Implantation

#508
20080083979
2008-04-10

Wafer holder and semiconductor manufacturing apparatus equipped with wafer holder

#509
20080083723
2008-04-10

Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing system

#510
20080076194
2008-03-27

Techniques for temperature controlled ion implantation

#511
20080073576
2008-03-27

Deposition reduction system for an ion implanter

#512
20080068774
2008-03-20

Plasma processing method and apparatus

#513
20080067147
2008-03-20

Processing apparatus and processing method

#514
20080066682
2008-03-20

Substrate supporting mechanism and substrate processing apparatus

#515
20080053958
2008-03-06

PLASMA PROCESSING APPARATUS

#516
20080044257
2008-02-21

Techniques for temperature-controlled ion implantation

#517
20080042078
2008-02-21

Techniques for temperature-controlled ion implantation

#518
20080041308
2008-02-21

SUBSTRATE TREATMENT APPARATUS AND CLEANING METHOD

#519
20080035306
2008-02-14

HEATING AND COOLING OF SUBSTRATE SUPPORT

#520
20080023926
2008-01-31

Chuck assembly and method for controlling a temperature of a chuck

#521
20080023654
2008-01-31

METHOD OF REDUCING TRANSIENT WAFER TEMPERATURE DURING IMPLANTATION

#522
20080023448
2008-01-31

Plasma processing apparatus capable of adjusting temperature of sample stand

#523
20080023147
2008-01-31

Plasma processing apparatus

#524
20080023139
2008-01-31

Plasma processing apparatus and plasma processing method

#525
20080017107
2008-01-24

Plasma processing apparatus

#526
20080014363
2008-01-17

Electro-Static Chucking Mechanism and Surface Processing Apparatus

#527
20080011426
2008-01-17

Plasma reactor with inductively coupled source power applicator and a high temperature heated workpiece support

#528
20080006207
2008-01-10

Heat-transfer structure and substrate processing apparatus

#529
20080003358
2008-01-03

Power loading substrates to reduce particle contamination

#530
20070287297
2007-12-13

Plasma etching method, plasma processing apparatus, control program and computer readable storage medium

#531
20070281106
2007-12-06

PROCESS CHAMBER FOR DIELECTRIC GAPFILL

#532
20070267145
2007-11-22

Sample table and plasma processing apparatus provided with the same

#533
20070252090
2007-11-01

Particle-optical apparatus with temperature switch

#534
20070251445
2007-11-01

Method for depositing a barrier layer on a low dielectric constant material

#535
20070240825
2007-10-18

Wafer processing apparatus capable of controlling wafer temperature

#536
20070231716
2007-10-04

Plasma etching chamber and method for manufacturing photomask using the same

#537
20070212811
2007-09-13

Low temperature CVD process with selected stress of the CVD layer on CMOS devices

#538
20070209933
2007-09-13

Sample holding electrode and a plasma processing apparatus using the same

#539
20070197039
2007-08-23

ANISOTROPIC ETCHING METHOD

#540
20070186854
2007-08-16

Apparatus and method for plasma processing

#541
20070181528
2007-08-09

Method of etching treatment

#542
20070170156
2007-07-26

Electrode for generating plasma and plasma processing apparatus using same

#543
20070170149
2007-07-26

Vacuum processing apparatus and vacuum processing method of sample

#544
20070169702
2007-07-26

Equipment innovations for nano-technology aquipment, especially for plasma growth chambers of carbon nanotube and nanowire

#545
20070141273
2007-06-21

Method of forming organosilicon oxide film and multilayer resist structure

#546
20070138136
2007-06-21

Method for etching photolithographic substrates

#547
20070120068
2007-05-31

Charged particle beam apparatus

#548
20070116872
2007-05-24

Apparatus for thermal and plasma enhanced vapor deposition and method of operating

#549
20070091541
2007-04-26

Method of processing a workpiece in a plasma reactor using feed forward thermal control

#550
20070091540
2007-04-26

Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control

#551
20070091539
2007-04-26

Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes

#552
20070091538
2007-04-26

Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops

#553
20070091537
2007-04-26

Method for agile workpiece temperature control in a plasma reactor using a thermal model

#554
20070091535
2007-04-26

TEMPERATURE CONTROLLED SEMICONDUCTOR PROCESSING CHAMBER LINER

#555
20070089834
2007-04-26

Plasma reactor with a multiple zone thermal control feed forward control apparatus

#556
20070075086
2007-04-05

Processing apparatus

#557
20070074664
2007-04-05

Plasma CVD apparatus and plasma surface treatment method

#558
20070044916
2007-03-01

Vacuum processing system

#559
20070032090
2007-02-08

Plasma rapid thermal process apparatus in which supply part of radical source is improved

#560
20070029046
2007-02-08

Methods and systems for increasing substrate temperature in plasma reactors

#561
20070012401
2007-01-18

Plasma processing apparatus

#562
20070009649
2007-01-11

Substrate processing apparatus

#563
20060289795
2006-12-28

VACUUM REACTION CHAMBER WITH X-LAMP HEATER

#564
20060283549
2006-12-21

Plasma processing apparatus and method capable of adjusting temperature within sample table

#565
20060280875
2006-12-14

Substrate processing device

#566
20060272772
2006-12-07

Vacuum reaction chamber with x-lamp heater

#567
20060260747
2006-11-23

Gas introduction system for temperature adjustment of object to be processed

#568
20060255290
2006-11-16

Sample inspection apparatus

#569
20060237391
2006-10-26

Vacuum processing apparatus and vacuum processing method of sample

#570
20060231390
2006-10-19

Temperature control of pallet in sputtering system

#571
20060197017
2006-09-07

Information acquisition apparatus, cross section evaluating apparatus, cross section evaluating method, and cross section working apparatus

#572
20060191482
2006-08-31

Apparatus and method for processing wafer

#573
20060180083
2006-08-17

Positioning board for positioning heater lines during plasma enhanced CVD (PECVD)

#574
20060163490
2006-07-27

Ion implantation cooling system

#575
20060151117
2006-07-13

Semiconductor producing device and semiconductor producing method

#576
20060147822
2006-07-06

Appartus and method for forming pattern

#577
20060144584
2006-07-06

Cooling device for vacuum treatment device

#578
20060138324
2006-06-29

Scanning electron microscope

#579
20060137822
2006-06-29

Lateral temperature equalizing system for large area surfaces during processing

#580
20060113488
2006-06-01

Probe-holding apparatus, sample-obtaining apparatus, sample-processing apparatus, sample-processing method and sample-evaluating method

#581
20060110535
2006-05-25

Metal film production apparatus

#582
20060094218
2006-05-04

Apparatus for plasma chemical vapor deposition and method for fabricating semiconductor device by using the same

#583
20060081337
2006-04-20

Capacitive coupling plasma processing apparatus

#584
20060075969
2006-04-13

Heat transfer system for improved semiconductor processing uniformity

#585
20060068373
2006-03-30

Systems and methods of identifying biomarkers for subsequent screening and monitoring of diseases

#586
20060066247
2006-03-30

Plasma processing apparatus and method

#587
20060065853
2006-03-30

APPARATUS AND METHOD FOR MANIPULATING SAMPLE TEMPERATURE FOR FOCUSED ION BEAM PROCESSING

#588
20060065630
2006-03-30

Plasma processing method and apparatus, and storage medium

#589
20060060777
2006-03-23

Apparatus and method for evaluating cross section of specimen

#590
20060051966
2006-03-09

In-situ chamber clean process to remove by-product deposits from chemical vapor etch chamber

#591
20060042757
2006-03-02

Wafer processing apparatus capable of controlling wafer temperature

#592
20060034344
2006-02-16

Apparatus and method for forming pattern

#593
20060021572
2006-02-02

High Vacuum Plasma-Assisted Chemical Vapor Deposition System

#594
20060005930
2006-01-12

Substrate supporting structure for semiconductor processing, and plasma processing device

#595
20050242060
2005-11-03

Plasma processing method

#596
20050230637
2005-10-20

System and method for electron-beam lithography

#597
20050230636
2005-10-20

Charged particle beam apparatus and specimen holder

#598
20050230350
2005-10-20

In-situ dry clean chamber for front end of line fabrication

#599
20050221552
2005-10-06

Substrate support for in-situ dry clean chamber for front end of line fabrication

#600
20050218507
2005-10-06

Lid assembly for front end of line fabrication