206443 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated Maintaining constant desired temperature
Device for spot size measurement at wafer level using a knife edge and a method for manufacturing such a device
#302Electron beam-induced etching
#303Apparatus and method for producing specimens for electron microscopy
#304Charged particle beam irradiation apparatus
#305Drawing apparatus, and method of manufacturing article
#306Rotary flex union
#307Wafer platen thermosyphon cooling system
#308Plasma processing apparatus and method
#309Etching apparatus and method
#310In-vacuum high speed pre-chill and post-heat stations
#311Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support
#312Electron microscope sample holder and sample observation method
#313Inert atmospheric pressure pre-chill and post-heat
#314Method and apparatus for clamping and cooling a substrate for ion implantation
#315Ion milling device and ion milling processing method
#316Non-contact substrate processing
#317Holder assembly for cooperating with an environmental cell and an electron microscope
#318Charged particle beam device
#319Methods and apparatus for rapidly responsive heat control in plasma processing devices
#320SCANNING ELECTRON MICROSCOPE
#321CAPACITIVE CVD REACTOR AND METHODS FOR PLASMA CVD PROCESS
#322Method of studying a sample in an ETEM
#323Devices and methods for cryo lift-out with in situ probe
#324Cryogenic specimen holder
#325Transmission electron microscope micro-grid
#326APPARATUS FOR THERMAL AND PLASMA ENHANCED VAPOR DEPOSITION AND METHOD OF OPERATING
#327Methods of using temperature control devices in electron microscopy
#328Support assembly
#329Method for removing oxides
#330HEAT LIP SEAL FOR CRYOGENIC PROCESSING
#331Microfluidic blotless cryo TEM device and method
#332PLASMA DOPING METHOD AND APPARATUS
#333Apparatus for cooling samples during ion beam preparation
#334Temperature control in plasma processing apparatus using pulsed heat transfer fluid flow
#335Method of measuring the temperature of a sample carrier in a charged particle-optical apparatus
#336Charged particle beam device
#337Sample holder, method for use of the sample holder, and charged particle device
#338Environmental cell for charged particle beam system
#339Power loading substrates to reduce particle contamination
#340Apparatus and method of temperature control during cleaving processes of thick materials
#341PROCESS CHAMBER FOR DIELECTRIC GAPFILL
#342Apparatus and methods for vacuum-compatible substrate thermal management
#343MOUNTING TABLE STRUCTURE AND PROCESSING APPARATUS
#344Cryogenic specimen holder
#345Semiconductor fabrication apparatus and temperature adjustment method
#346Plasma etching apparatus and plasma etching method
#347HEATING AND COOLING OF SUBSTRATE SUPPORT
#348METHOD FOR FORMING SILICON OXIDE FILM AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#349Substrate processing apparatus
#350Thermal Control of a Proximity Mask and Wafer During Ion Implantation
#351Exposure apparatus and article manufacturing method
#352Effective algorithm for warming a twist axis for cold ion implantations
#353ACTIVE DEW POINT SENSING AND LOAD LOCK VENTING TO PREVENT CONDENSATION ON WORKPIECES
#354Heated rotary seal and bearing for chilled ion implantation system
#355Post Implant Wafer Heating Using Light
#356Plasma processing apparatus and method
#357Substrate support having dynamic temperature control
#358Specimen holder and specimen holder movement device
#359Method and system for automating sample preparation for microfluidic cryo TEM
#360Substrate cleaning chamber and components
#361Method for low temperature ion implantation
#362METHOD FOR REMOVING OXIDES
#363TEMPERATURE CONTROL SYSTEM, TEMPERATURE CONTROL METHOD, PLASMA PROCESSING APPARATUS AND COMPUTER STORAGE MEDIUM
#364Device and method for producing dielectric layers in microwave plasma
#365Plasma processing apparatus and plasma processing method
#366TABLE FOR PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING APPARATUS
#367ARRANGEMENT FOR COATING TAPE-SHAPED FILM SUBSTRATES
#368Gas charge container, atom probe apparatus, and method for analyzing hydrogen position in material
#369Hot edge ring with sloped upper surface
#370Microscopy support structures
#371LOWER CHAMBER HEATERS FOR IMPROVED ETCH PROCESSES
#372Ion implantation apparatus
#373Optical heater for cryogenic ion implanter surface regeneration
#374Ion implantation apparatus
#375Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control
#376Method of processing a workpiece in a plasma reactor using feed forward thermal control
#377DIAMOND-LIKE CARBON FILM FORMING APPARATUS AND METHOD OF FORMING DIAMOND-LIKE CARBON FILM
#378COLD IMPLANT FOR OPTIMIZED SILICIDE FORMATION
#379Vacuum processing chambers incorporating a moveable flow equalizer
#380WORKPIECE HANDLING SYSTEM
#381Ion implantation apparatus and a method
#382Ion implantation apparatus and a method for fluid cooling
#383Ion implantation apparatus
#384PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
#385Plasma processing apparatus and maintenance method therefor
#386Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes
#387Substrate processing apparatus and manufacturing method of semiconductor device using plasma generation
#388SPUTTER-COATING APPARATUS HAVING HEATING UNIT
#389Plasma reactor with a multiple zone thermal control feed forward control apparatus
#390Shorten Temperature Recovery Time of Low Temperature Ion Implantation
#391Rapid thermal processing systems and methods for treating microelectronic substrates
#392Charged particle beam apparatus
#393BIASABLE COOLING PEDESTAL
#394PLASMA PROCESSING APPARATUS
#395DEPOSITION APPARATUS WITH HIGH TEMPERATURE ROTATABLE TARGET AND METHOD OF OPERATING THEREOF
#396Charged particle beam processing
#397ETCHING METHOD AND ETCHING APPARATUS
#398Plasma processing apparatus and temperature measuring method and apparatus used therein
#399Non-contact substrate processing
#400APPARATUS FOR SUB-ZERO DEGREE C ION IMPLANTATION
#401Transmission electron microscope micro-grid
#402Vapor compression refrigeration chuck for ion implanters
#403SUBSTRATE TREATMENT APPARATUS, SUBSTRATE TREATMENT METHOD AND STORAGE MEDIUM
#404Substrate Processing Apparatus and Substrate Mount Table Used in the Apparatus
#405CONDENSIBLE GAS COOLING SYSTEM
#406Substrate processing method and substrate processing apparatus
#407ICE LAYERS IN CHARGED PARTICLE SYSTEMS AND METHODS
#408Capacitive CVD reactor and methods for plasma CVD process
#409PLASMA PROCESSING APPARATUS
#410SUBSTRATE MOUNTING TABLE AND SUBSTRATE PROCESSING APPARATUS HAVING SAME
#411THIN FILM SEMICONDUCTOR ALLOY MATERIAL PREPARED BY A VHF ENERGIZED PLASMA DEPOSITION PROCESS
#412Substrate temperature control by using liquid controlled multizone substrate support
#413VHF ENERGIZED PLASMA DEPOSITION PROCESS FOR THE PREPARATION OF THIN FILM MATERIALS
#414Charged-particle optical system with dual loading options
#415Plasma doping method and apparatus
#416Methods and apparatus for rapidly responsive heat control in plasma processing devices
#417Method for manufacturing semiconductor device
#418Low temperature device with low-vibration sample holding device
#419Fluid delivery mechanism for vacuum wafer processing system
#420Adjustable thermal contact between an electrostatic chuck and a hot edge ring by clocking a coupling ring
#421Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing system
#422Vacuum treatment method
#423SPUTTER-COATING APPARATUS
#424MOUNTING TABLE STRUCTURE AND PROCESSING APPARATUS USING THE SAME
#425Plasma processing apparatus
#426WORKPIECE SUPPORT FOR A PLASMA REACTOR WITH CONTROLLED APPORTIONMENT OF RF POWER TO A PROCESS KIT RING
#427METHOD AND DEVICE FOR ETCHING A SUBSTRATE BY MEANS OF PLASMA
#428METAL FILM PRODUCTION APPARATUS
#429Integrated Circuit Cooling Apparatus for Focused Beam Processes
#430Plasma Processing Apparatus and Plasma Processing Method
#431Platen ground pin for connecting substrate to ground
#432Substrate temperature regulation fixed apparatus
#433Techniques for changing temperature of a platen
#434Plasma processing apparatus and plasma processing method
#435Semiconductor producing device and semiconductor device producing method
#436Semiconductor device and method of manufacturing the semiconductor device
#437Apparatus and method for partial ion implantation using atom vibration
#438METHOD FOR MANUFACTURING CARBON FILM
#439Cryo-charging specimen holder for electron microscope
#440SYSTEMS AND METHODS FOR DEPOSITION
#441SUBSTRATE MOUNTING TABLE, SUBSTRATE PROCESSING APPARATUS AND TEMPERATURE CONTROL METHOD
#442Plasma Doping Method and Apparatus
#443Cooled cleaving implant
#444Specimen stage-moving device for charged-particle beam system
#445Apparatus for detecting defect by examining electric characteristics of a semiconductor device
#446Specimen stage
#447Manufacturing method in plasma processing apparatus
#448Method for controlling spatial temperature distribution across a semiconductor wafer
#449TECHNIQUES FOR COLD IMPLANTATION OF CARBON-CONTAINING SPECIES
#450Systems and Methods of Identifying Biomarkers for Subsequent Screening and Monitoring of Diseases
#451Systems and Methods of Identifying Biomarkers for Subsequent Screening and Monitoring of Diseases
#452Deposition apparatus and deposition method
#453TECHNIQUES FOR LOW-TEMPERATURE ION IMPLANTATION
#454Method and apparatus for producing photocatalyst
#455APPARATUS FOR PLASMA TREATMENT
#456METHOD FOR REMOVING OXIDES
#457Table for plasma processing apparatus and plasma processing apparatus
#458SUPPORT ASSEMBLY
#459Showerhead assembly
#460SINGLE WAFER IMPLANTER FOR SILICON-ON-INSULATOR WAFER FABRICATION
#461Plasma Processing Apparatus And Method Capable of Adjusting Temperature Within Sample Table
#462Apparatus and Methods for Growing Nanofibres and Nanotips
#463PLASMA TREATMENT APPARATUS, AND SUBSTRATE HEATING MECHANISM TO BE USED IN THE APPARATUS
#464Plasma Processing Apparatus And Method Capable Of Adjusting Temperature Within Sample Table
#465TECHNIQUES FOR TERMINAL INSULATION IN AN ION IMPLANTER
#466Insulated conducting device with multiple insulation segments
#467SUBSTRATE PROCESSING APPARATUS AND SEMICONDUCTOR MANUFACTURING METHOD THEREOF
#468HIGH TEMPERATURE CATHODE FOR PLASMA ETCHING
#469Method of manufacturing semiconductor device
#470Vacuum prcessing apparatus and vacuum processing method of sample
#471Method for attaching a sample to a manipulator by melting and then freezing part of said sample
#472Charged particle beam apparatus and specimen holder
#473Plasma processing apparatus
#474Substrate cleaning chamber and components
#475SOLID SAMPLE, SOLID SAMPLE FABRICATING METHOD, AND SOLID SAMPLE FABRICATING APPARATUS
#476Heating stage for a micro-sample
#477Plasma processing apparatus
#478Electron microscope
#479Plasma processing method and plasma processing apparatus
#480Temperature Controlling Method for Substrate Processing System and Substrate Processing System
#481Method for front end of line fabrication
#482Power supply apparatus and deposition method using the power supply apparatus
#483SUBSTRATE PROCESSING APPARATUS
#484Thermally conductive sheet and substrate mounting device including same
#485METHOD AND APPARATUS FOR PLASMA PROCESSING
#486PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
#487PLASMA PROCESSING APPARATUS
#488Ashing method and apparatus therefor
#489Semiconductor producing device and semiconductor device producing method
#490Plasma processing apparatus
#491Plasma processing apparatus with filter circuit
#492APPARATUS FOR PLASMA CHEMICAL VAPOR DEPOSITION AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING THE SAME
#493APPARATUS AND METHOD OF TEMPERATURE CONROL DURING CLEAVING PROCESSES OF THICK FILM MATERIALS
#494Multi-zone gas distribution system for a treatment system
#495PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
#496Plasma Processing Apparatus And Method Of Producing Semiconductor Thin Film Using The Same
#497Temperature control method for photolithographic substrate
#498Probe-holding apparatus, sample-obtaining apparatus, sample-processing apparatus, sample-processing method and sample-evaluating method
#499Techniques for low-temperature ion implantation
#500TECHNIQUES FOR LOW-TEMPERATURE ION IMPLANTATION
#501PLASMA PROCESSING APPARATUS
#502Processing apparatus and processing method
#503Techniques for forming shallow junctions
#504PLASMA PROCESSING METHOD AND APPARATUS, AND STORAGE MEDIUM
#505Low Temperature Cryostat
#506Charged particle beam system and its specimen holder
#507Technique for Improved Damage Control in a Plasma Doping (PLAD) Ion Implantation
#508Wafer holder and semiconductor manufacturing apparatus equipped with wafer holder
#509Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing system
#510Techniques for temperature controlled ion implantation
#511Deposition reduction system for an ion implanter
#512Plasma processing method and apparatus
#513Processing apparatus and processing method
#514Substrate supporting mechanism and substrate processing apparatus
#515PLASMA PROCESSING APPARATUS
#516Techniques for temperature-controlled ion implantation
#517Techniques for temperature-controlled ion implantation
#518SUBSTRATE TREATMENT APPARATUS AND CLEANING METHOD
#519HEATING AND COOLING OF SUBSTRATE SUPPORT
#520Chuck assembly and method for controlling a temperature of a chuck
#521METHOD OF REDUCING TRANSIENT WAFER TEMPERATURE DURING IMPLANTATION
#522Plasma processing apparatus capable of adjusting temperature of sample stand
#523Plasma processing apparatus
#524Plasma processing apparatus and plasma processing method
#525Plasma processing apparatus
#526Electro-Static Chucking Mechanism and Surface Processing Apparatus
#527Plasma reactor with inductively coupled source power applicator and a high temperature heated workpiece support
#528Heat-transfer structure and substrate processing apparatus
#529Power loading substrates to reduce particle contamination
#530Plasma etching method, plasma processing apparatus, control program and computer readable storage medium
#531PROCESS CHAMBER FOR DIELECTRIC GAPFILL
#532Sample table and plasma processing apparatus provided with the same
#533Particle-optical apparatus with temperature switch
#534Method for depositing a barrier layer on a low dielectric constant material
#535Wafer processing apparatus capable of controlling wafer temperature
#536Plasma etching chamber and method for manufacturing photomask using the same
#537Low temperature CVD process with selected stress of the CVD layer on CMOS devices
#538Sample holding electrode and a plasma processing apparatus using the same
#539ANISOTROPIC ETCHING METHOD
#540Apparatus and method for plasma processing
#541Method of etching treatment
#542Electrode for generating plasma and plasma processing apparatus using same
#543Vacuum processing apparatus and vacuum processing method of sample
#544Equipment innovations for nano-technology aquipment, especially for plasma growth chambers of carbon nanotube and nanowire
#545Method of forming organosilicon oxide film and multilayer resist structure
#546Method for etching photolithographic substrates
#547Charged particle beam apparatus
#548Apparatus for thermal and plasma enhanced vapor deposition and method of operating
#549Method of processing a workpiece in a plasma reactor using feed forward thermal control
#550Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control
#551Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes
#552Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops
#553Method for agile workpiece temperature control in a plasma reactor using a thermal model
#554TEMPERATURE CONTROLLED SEMICONDUCTOR PROCESSING CHAMBER LINER
#555Plasma reactor with a multiple zone thermal control feed forward control apparatus
#556Processing apparatus
#557Plasma CVD apparatus and plasma surface treatment method
#558Vacuum processing system
#559Plasma rapid thermal process apparatus in which supply part of radical source is improved
#560Methods and systems for increasing substrate temperature in plasma reactors
#561Plasma processing apparatus
#562Substrate processing apparatus
#563VACUUM REACTION CHAMBER WITH X-LAMP HEATER
#564Plasma processing apparatus and method capable of adjusting temperature within sample table
#565Substrate processing device
#566Vacuum reaction chamber with x-lamp heater
#567Gas introduction system for temperature adjustment of object to be processed
#568Sample inspection apparatus
#569Vacuum processing apparatus and vacuum processing method of sample
#570Temperature control of pallet in sputtering system
#571Information acquisition apparatus, cross section evaluating apparatus, cross section evaluating method, and cross section working apparatus
#572Apparatus and method for processing wafer
#573Positioning board for positioning heater lines during plasma enhanced CVD (PECVD)
#574Ion implantation cooling system
#575Semiconductor producing device and semiconductor producing method
#576Appartus and method for forming pattern
#577Cooling device for vacuum treatment device
#578Scanning electron microscope
#579Lateral temperature equalizing system for large area surfaces during processing
#580Probe-holding apparatus, sample-obtaining apparatus, sample-processing apparatus, sample-processing method and sample-evaluating method
#581Metal film production apparatus
#582Apparatus for plasma chemical vapor deposition and method for fabricating semiconductor device by using the same
#583Capacitive coupling plasma processing apparatus
#584Heat transfer system for improved semiconductor processing uniformity
#585Systems and methods of identifying biomarkers for subsequent screening and monitoring of diseases
#586Plasma processing apparatus and method
#587APPARATUS AND METHOD FOR MANIPULATING SAMPLE TEMPERATURE FOR FOCUSED ION BEAM PROCESSING
#588Plasma processing method and apparatus, and storage medium
#589Apparatus and method for evaluating cross section of specimen
#590In-situ chamber clean process to remove by-product deposits from chemical vapor etch chamber
#591Wafer processing apparatus capable of controlling wafer temperature
#592Apparatus and method for forming pattern
#593High Vacuum Plasma-Assisted Chemical Vapor Deposition System
#594Substrate supporting structure for semiconductor processing, and plasma processing device
#595Plasma processing method
#596System and method for electron-beam lithography
#597Charged particle beam apparatus and specimen holder
#598In-situ dry clean chamber for front end of line fabrication
#599Substrate support for in-situ dry clean chamber for front end of line fabrication
#600Lid assembly for front end of line fabrication