206456 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated; Movement; Translation Mechanical X-Y scanning
SCANNED BEAM DOSE RATE MEASUREMENT FOR ION BEAM OPTIMIZATION
#2COLLATION SYSTEM
#3CHARGED-PARTICLE IRRADIATION UNIT FOR A CHARGED-PARTICLE DIFFRACTOMETER
#4Atmospheric Plasma Activation for Hybrid Bonding
#5BEAM TUNING FOR NON-UNIFORM ION IMPLANTATION
#6Stage Device and Charged Particle Beam Device Using Same
#7Observation Instrument and Control Method for Sample Stage
#8SYSTEM AND METHOD FOR PLASMA TREATMENT WITH INDEPENDENT CONTROL OF NEUTRAL PARTICLE AND ION FLUXES
#9SUBSTRATE STRESS MANAGEMENT USING DIRECT SELECTIVE AREA PROCESSING
#10CONCURRENT OR CYCLICAL ETCH AND DIRECTIONAL DEPOSITION
#11AUTOFOCUS METHOD FOR SINGLE BEAM AND MULTI-BEAM SYSTEMS
#12METHOD OF DETERMINING AN ENERGY SPECTRUM OR ENERGY WIDTH OF A CHARGED PARTICLE BEAM, AND CHARGED PARTICLE BEAM IMAGING DEVICE
#13METHOD OF PROCESSING A SAMPLE, AND CHARGED PARTICLE ASSESSMENT SYSTEM
#14SAMPLE HOLDER FOR TRANSMISSION ELECTRON MICROSCOPE, SAMPLE ANALYSIS SYSTEM INCLUDING THE SAME, AND METHOD FOR ANALYZING SAMPLE USING THE SAME
#15Scanned angled etching apparatus and techniques providing separate co-linear radicals and ions
#16ION IMPLANTER AND ION IMPLANTATION METHOD
#17METHOD OF IMAGING A SAMPLE WITH A CHARGED PARTICLE BEAM DEVICE, METHOD OF CALIBRATING A CHARGED PARTICLE BEAM DEVICE, AND CHARGED PARTICLE BEAM DEVICE
#18Real time photoresist outgassing control system and method
#19Wafer scanning apparatus and method for focused beam processing
#20UNIFORM PLASMA LINEAR ION SOURCE
#21Pattern enhancement using a gas cluster ion beam
#22PROCESS MODULE, SUBSTRATE PROCESSING SYSTEM, AND PROCESSING METHOD
#23Scanning ion beam deposition and etch
#24Scanning ion beam etch
#25Atomic layer deposition using a substrate scanning system
#26Method and apparatus for poling polymer thin films
#27Fill pattern to enhance ebeam process margin
#28Wafer scanning apparatus and method for focused beam processing
#29Pattern enhancement using a gas cluster ion beam
#30In situ angle measurement using channeling
#31Charged particle beam writing apparatus and charged particle beam writing method
#32Multi-beam blanking device and multi-charged-particle-beam writing apparatus
#33Substrate positioning device with remote temperature sensor
#34Charged particle beam writing apparatus, charged particle beam writing method, and a non-transitory computer-readable storage medium
#35Ion implanter and beam profiler
#36Device for depositing nanometric sized particles onto a substrate
#37Focused ion beam apparatus
#38A Device for Extracting and Placing a Lamella
#39PLASMA ETCHING APPARATUS
#40Ion implanter and ion implantation method
#41Multi-beam writing method and multi-beam writing apparatus
#42Substrate positioning device and electron beam inspection tool
#43Method and apparatus for poling polymer thin films
#44OPTICAL SYSTEM ADJUSTMENT METHOD OF IMAGE ACQUISITION APPARATUS
#45Electron beam inspection apparatus stage positioning
#46Charged particle beam device, interchangeable multi-aperture arrangement for a charged particle beam device, and method for operating a charged particle beam device
#47Scanned angled etching apparatus and techniques providing separate co-linear radicals and ions
#48Portion of layer removal at substrate edge
#49Multi-electron-beam imaging apparatus with improved performance
#50Methods for controlling an end-to-end distance in semiconductor device
#51Semiconductor apparatus and charged particle ray exposure apparatus
#52Compensated location specific processing apparatus and method
#53Film-forming apparatus, film-forming system, and film-forming method
#54Writing data generation method, computer-readable recording medium on which program is recorded, and multi-charged particle beam writing apparatus
#55Sample carrier and electron microscope
#56Sputtering device
#57Charged particle beam image acquisition apparatus
#58Method and apparatus for the planarization of surfaces
#59Charged particle beam device
#60Scanning ion beam etch
#61Sample stage
#62Methods for controlling an end-to-end distance in semiconductor device
#63Multiple charged particle beam writing apparatus, and multiple charged particle beam writing method
#64Methods for controlling an end-to-end distance in semiconductor device
#65Fill pattern to enhance e-beam process margin
#66Cross section processing observation method and charged particle beam apparatus
#67Multi-charged-particle beam writing apparatus
#68Optical system adjustment method of image acquisition apparatus
#69Techniques and structure for forming thin silicon-on-insulator materials
#70Imaging system and imaging method
#71Electron beam irradiation apparatus and electron beam dynamic focus adjustment method
#72Electron beam inspection apparatus and electron beam inspection method
#73Compensated location specific processing apparatus and method
#74Charged particle beam device and control method of charged particle beam device
#75Sample Stage
#76Scanning an object using multiple mechanical stages
#77Gas injection system for ion beam device
#78Inspection of regions of interest using an electron beam system
#79Device, manufacturing method, and exposure apparatus
#80Imaging apparatus having a plurality of movable beam columns, and method of inspecting a plurality of regions of a substrate intended to be substantially identical
#81Wafer stage for symmetric wafer processing
#82Driving apparatus, lithography apparatus, and method of manufacturing an article
#83Methods for Discretized Processing and Process Sequence Integration of Regions of a Substrate
#84Ion beam dimension control for ion implantation process and apparatus, and advanced process control
#85Ion sources, systems and methods
#86Inspection of regions of interest using an electron beam system
#87LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING ARTICLE
#88Method for electron tomography
#89Inspection system and inspection image data generation method
#90Scan head and scan arm using the same
#91Low contamination scanner for GCIB system
#92Inspection system by charged particle beam and method of manufacturing devices using the system
#93Ion sources, systems and methods
#94Multi-platen ion implanter and method for implanting multiple substrates simultaneously
#95Workpiece support structure with four degree of freedom air bearing for high vacuum systems
#96Ion beam dimension control for ion implantation process and apparatus, and advanced process control
#97Ion implantation method and ion implantation apparatus
#98Ion implanter and ion implant method thereof
#99Methods for discretized processing and process sequence integration of regions of a substrate
#100Ion implantation apparatus and ion implantation method
#101Linear motor, movable stage and electron microscope
#102Scanner for GCIB system
#103Stage device
#104Ion sources, systems and methods
#105Methods for discretized processing and process sequence integration of regions of a substrate
#106Methods for discretized processing and process sequence integration of regions of a substrate
#107Method and apparatus for charged particle beam inspection
#108Methods for discretized processing and process sequence integration of regions of a substrate
#109Inspection system by charged particle beam and method of manufacturing devices using the system
#110Methods for discretized processing and process sequence integration of regions of a substrate
#111Masked ion implant with fast-slow scan
#112Scan device for microscope measurement instrument
#113Substrate processing system, substrate surface processing apparatus, substrate surface inspecting apparatus, substrate surface inspecting method, and storage medium storing program for implementing the method
#114ION DOPING APPARATUS AND DOPING METHOD THEREOF
#115Scanning method and system using 2-D ion implanter
#116Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former
#117ION IMPLANTER AND ION IMPLANT METHOD THEREOF
#118Masked ion implant with fast-slow scan
#119Method and apparatus for uniformly implanting a wafer with an ion beam
#120Use of beam scanning to improve uniformity and productivity of a 2D mechanical scan implantation system
#121Method and system for moving wafer during scanning the wafer
#122ION IMPLANTING DEVICE AND METHOD
#123Ion implanter having combined hybrid and double mechanical scan architecture
#124Sample stage apparatus and method of controlling the same
#125Method and apparatus for charged particle beam inspection
#126Specimen stage
#127FOCUSSING MASK
#128Ion implantation method and apparatus
#129Ion implantation method and apparatus
#130Ion sources, systems and methods
#131Installation and method of nanofabrication
#132Implant beam utilization in an ion implanter
#133Method and system for multi-pass correction of substrate defects
#134Method and apparatus for a high-resolution three dimensional confocal scanning transmission electron microscope
#135Compound sliding seal unit suitable for atmosphere to vacuum applications
#136Electron beam apparatus and method of manufacturing semiconductor device using the apparatus
#137Electron beam apparatus and method of manufacturing semiconductor device using the apparatus
#138Ion implanter having combined hybrid and double mechanical scan architecture
#139APPARATUS AND METHODS FOR TREATING A WORKPIECE USING A GAS CLUSTER ION BEAM
#140Inspection system by charged particle beam and method of manufacturing devices using the system
#141Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former
#142Sheet beam-type testing apparatus
#143Electron beam apparatus and device production method using the electron beam apparatus
#144Ion beam monitoring arrangement
#145Mechanical scanner
#146Multi-directional mechanical scanning in an ion implanter
#147Substrate scanner apparatus
#148Methods for discretized processing and process sequence integration of regions of a substrate
#149Methods for discretized processing and process sequence integration of regions of a substrate
#150Method for inspecting substrate, substrate inspecting system and electron
#151Method and device for ion beam processing of surfaces
#152Technique for improving ion implantation throughput and dose uniformity
#153Semiconductor wafer defect inspection method and apparatus
#154Dose uniformity correction technique
#155Inspection system by charged particle beam and method of manufacturing devices using the system
#156Electron beam irradiating method, magnetic recording medium manufactured by using the method and method for manufacturing the medium
#157Beam processing system and beam processing method
#158Electron beam apparatus and device production method using the electron beam apparatus
#159Method and apparatus for scanning a workpiece through an ion beam
#160Method of implanting a substrate and an ion implanter for performing the method
#161Method for writing a large-area closed curvilinear pattern with a cartesian electron beam writing system
#162Inspection system by charged particle beam and method of manufacturing devices using the system
#163Method and apparatus for patterning micro and nano structures using a mask-less process
#164Technique for isocentric ion beam scanning
#165Ion sources, systems and methods
#166Ion sources, systems and methods
#167Ion sources, systems and methods
#168Substrate processing system, substrate surface processing apparatus, substrate surface inspecting apparatus, substrate surface inspecting method, and storage medium storing program for implementing the method
#169Ion sources, systems and methods
#170Ion sources, systems and methods
#171Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former
#172Ion sources, systems and methods
#173Ion sources, systems and methods
#174Ion sources, systems and methods
#175Ion sources, systems and methods
#176Ion sources, systems and methods
#177Ion sources, systems and methods
#178Ion sources, systems and methods
#179Ion sources, systems and methods
#180Ion sources, systems and methods
#181Ion sources, systems and methods
#182Ion implanter and ion implantation control method thereof
#183Method of implanting a substrate and an ion implanter for performing the method
#184Methods for discretized processing and process sequence integration of regions of a substrate
#185Inspection system by charged particle beam and method of manufacturing devices using the system
#186Method for inspecting substrate, substrate inspecting system and electron beam apparatus
#187Nonuniform ion implantation apparatus and method using a wide beam
#188Electron beam apparatus and method of manufacturing semiconductor device using the apparatus
#189Method and apparatus for scanning a workpiece in a vacuum chamber of an ion beam implanter
#190Optimization of a utilization of an ion beam in a two-dimensional mechanical scan ion implantation system
#191Semiconductor device tester
#192Method of implanting a substrate and an ion implanter for performing the method
#193Sheet beam-type testing apparatus
#194Optimization of beam utilization
#195Patterned wafer inspection method and apparatus therefor
#196Scanning mechanism of an ion implanter
#197Method of implanting a substrate and an ion implanter for performing the method
#198Wafer scanning system with reciprocating rotary motion utilizing springs and counterweights
#199Ion implanting apparatus
#200Mechanical oscillator for wafer scan with spot beam
#201Method for reciprocating a workpiece through an ion beam
#202Reciprocating drive for scanning a workpiece
#203Reciprocating drive for scanning a workpiece through an ion beam
#204Ion implantation method and apparatus
#205Wafer 2D scan mechanism
#206Ion implantation
#207Radial scan arm and collimator for serial processing of semiconductor wafers with ribbon beams
#208Multi directional mechanical scanning in an ion implanter
#209Pattern drawing method, method of manufacturing a master disk for manufacturing information recording media, and method of manufacturing an information recording medium
#210Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former
#211Sheet beam-type inspection apparatus