206464 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated; Movement; Motorised movement computer-controlled
PARTICLE BEAM APPARATUS WITH MOVEABLE OBJECT STAGE
#2ELECTRON MICROSCOPE SAMPLE INSERTION AND REMOVAL TOOL
#3SYSTEMS AND METHODS FOR FOCUSING CHARGED-PARTICLE BEAMS
#4METHOD, APPARATUS, AND SYSTEM FOR DYNAMICALLY CONTROLLING AN ELECTROSTATIC CHUCK DURING AN INSPECTION OF WAFER
#5MULTI-CHAMBER PROCESSING TOOL WITH ENHANCED THROUGHPUT
#6Charged Particle Microscope and Stage
#7Electron Microscope and Specimen Orientation Alignment Method
#8PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
#9MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD AND MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS
#10SYSTEM FOR DEPOSITING PIEZOELECTRIC MATERIALS, METHODS FOR USING THE SAME, AND MATERIALS DEPOSITED WITH THE SAME
#11METHOD, APPARATUS, AND SYSTEM FOR DYNAMICALLY CONTROLLING AN ELECTROSTATIC CHUCK DURING AN INSPECTION OF WAFER
#12EMITTER FOR EMITTING CHARGED PARTICLES
#13Systems and methods of hysteresis compensation
#14Semiconductor manufacturing apparatus, semiconductor device and manufacturing method of semiconductor device
#15Temperature-controlled surface with a cryo-nanomanipulator for improved deposition rate
#16SUBSTRATE PROCESSING SYSTEM
#17CONTAINER AND SUBSTRATE TREATING SYSTEM
#18System, Semiconductor Device and Method
#19SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM
#20SYSTEMS AND METHODS FOR FOCUSING CHARGED -PARTICLE BEAMS
#21Vacuum processing apparatus and method for controlling vacuum processing apparatus
#22Charged particle beam device
#23Alignment system and seal for positional alignment
#24Charged particle beam inspection apparatus and charged particle beam inspection method
#25E-beam apparatus
#26Systems and methods of hysteresis compensation
#27Multibeamlet charged particle device and method
#28Substrate processing system
#29SUBSTRATE SUPPORT SYSTEM
#30Actuator-assisted positioning systems and methods
#31Charged particle beam system and method of measuring sample using scanning electron microscope
#32High-precision linear actuator
#33Substrate support, substrate processing apparatus, substrate processing system, and method of detecting erosion of adhesive in substrate support
#34Substrate processing apparatus and substrate processing method
#35System, semiconductor device and method
#36Tomography-assisted TEM prep with requested intervention automation workflow
#37Charged-particle beam device
#38E-beam apparatus
#39Sample manipulation for nondestructive sample imaging
#40Charged particle beam device
#41System for dynamically compensating position errors of a sample
#42Spatial atomic layer deposition chamber with plasma pulsing to prevent charge damage
#43Cross section processing observation method and charged particle beam apparatus
#44Charged particle beam apparatus
#45Tomography-assisted TEM prep with requested intervention automation workflow
#46Specimen preparation and inspection in a dual-beam charged particle microscope
#47Ion Implantation Apparatus and Method of Manufacturing Semiconductor Devices
#48Charged particle beam apparatus
#49Control method and control program for focused ion beam device
#50Planetary gear assembly for sputtering multiple balloon catheter distal ends
#51Charged particle beam apparatus and sample elevating apparatus
#52Measurement of overlay and edge placement errors with an electron beam column array
#53Observation method and specimen observation apparatus
#54Multicolumn charged particle beam exposure apparatus
#55Method and system for charge control for imaging floating metal structures on non-conducting substrates
#56Inspection apparatus and inspection method
#57Exposure apparatus and method of manufacturing semiconductor device
#58Multi charged particle beam writing apparatus and multi charged particle beam writing method
#59Workpiece transport and positioning apparatus
#60CHARGED PARTICLE BEAM APPARATUS AND METHOD OF CALIBRATING SAMPLE POSITION
#61Exposure apparatus and exposure method
#62Stage apparatus with braking system for lens, beam, or vibration compensation
#63Ion milling device
#64Apparatus and method for calculating drawing speeds of a charged particle beam
#65Method for correcting drift of charged particle beam, and charged particle beam writing apparatus
#66Sample introduction device and charged particle beam instrument
#67Specimen sample holder for workpiece transport apparatus
#68Workpiece holder for workpiece transport apparatus
#69LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING ARTICLE
#70Method for electron tomography
#71Scan head and scan arm using the same
#72Stage device and control method for stage device
#73Sample stage device
#74Target positioning device, method for driving a target positioning device, and a lithography system comprising such a target positioning device
#75Composite charged particle beam apparatus
#76Roller mold manufacturing device and manufacturing method
#77Particle beam device having a sample holder
#78Ion implanting system
#79Handling beam glitches during ion implantation of workpieces
#80SPECIMEN HOLDER ASSEMBLY
#81Apparatus and methods for controlling electron microscope stages
#82Charged particle beam device for scanning a sample using a charged particle beam to inspect the sample
#83Frequency adjusting apparatus
#84SCANNING EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
#85Sample stage apparatus and method of controlling the same
#86Electric charged particle beam microscope and microscopy
#87SOLID SAMPLE, SOLID SAMPLE FABRICATING METHOD, AND SOLID SAMPLE FABRICATING APPARATUS
#88Mechanical scanner
#89Multi-directional mechanical scanning in an ion implanter
#90Substrate scanner apparatus
#91Method of implanting a substrate and an ion implanter for performing the method
#92Optimization of a utilization of an ion beam in a two-dimensional mechanical scan ion implantation system
#93Method of implanting a substrate and an ion implanter for performing the method
#94Optimization of beam utilization
#95Charged-particle beam system