H01J2237/32 - CPC Classification Index

ClassID:

206667 ⎘

H01J2237/32 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging Processing objects by plasma generation

Sub-classes:

H01J2237/327 » Arrangements for generating the plasma 447
H01J2237/33 » characterised by the type of processing 27

Recent Application in this class:

20230386790

2023-11-30

Impedance-matching method, impedance-matching device, and semiconductor process apparatus

20230207248

2023-06-29

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

20210210308

2021-07-08

Method and device for a carrier proximity mask

20210090858

2021-03-25

Method and device for a carrier proximity mask

20200328063

2020-10-15

Electrostatic chucking process

20190295894

2019-09-26

Method for cutting element chip by laser scribing

20180197796

2018-07-12

Critical dimensions variance compensation

20180133680

2018-05-17

Photoluminescent carbon nanoparticles and method of preparing the same

20180053628

2018-02-22

Separation Grid for Plasma Chamber

#10

20170278737

2017-09-28

Processing apparatus for thermally processing a workpiece in a chamber

#11

20170200695

2017-07-13

APPARATUS AND METHOD FOR PROCESSING A SUBSTRATE

#12

20170092472

2017-03-30

Mounting table and plasma processing apparatus

#13

20170076913

2017-03-16

METHOD FOR TREATING AN OUTER SURFACE OF A HEAT TRANSFER FLUID TUBE

#14

20160300699

2016-10-13

Apparatus for optical emission spectroscopy and plasma treatment apparatus

#15

20160244868

2016-08-25

Thermal spray powder

#16

20160093470

2016-03-31

Chicane blanker assemblies for charged particle beam systems and methods of using the same

#17

20160035545

2016-02-04

Methods and systems for managing semiconductor manufacturing equipment

#18

20150206718

2015-07-23

Device and process for preventing substrate damages in a DBD plasma installation

#19

20150179418

2015-06-25

MINIATURE PHYSICAL VAPOUR DEPOSITION STATION

#20

20140220261

2014-08-07

Microwave plasma reactors

#21

20110117702

2011-05-19

Apparatus and method for processing a substrate

#22

20060137822

2006-06-29

Lateral temperature equalizing system for large area surfaces during processing

#23

20060075972

2006-04-13

Substrate processing apparatus and substrate processing method