H01J27/16 - CPC Classification Index

#1

20190394866

2019-12-26

Plasma source

#2

20190279835

2019-09-12

High reliability, long lifetime, negative ion source

#3

20190198281

2019-06-27

Metallic ion source

#4

20190131108

2019-05-02

Plasma processing apparatus

#5

20180330909

2018-11-15

Inductively coupled plasma ion source with tunable radio frequency power

#6

20180138020

2018-05-17

RF ion source with dynamic volume control

#7

20180122615

2018-05-03

High reliability, long lifetime, negative ion source

#8

20170338075

2017-11-23

Ion implantation processes and apparatus

#9

20170309454

2017-10-26

Negative ribbon ion beams from pulsed plasmas

#10

20170252580

2017-09-07

Charged particle translation slide control apparatus and method of use thereof

#11

20170198683

2017-07-13

MPD thruster that accelerates electrodeless plasma and electrodeless plasma accelerating method using MPD thruster

#12

20170162358

2017-06-08

Means of introducing an analyte into liquid sampling atmospheric pressure glow discharge

#13

20170084419

2017-03-23

Grid, method of manufacturing the same, and ion beam processing apparatus

#14

20170036785

2017-02-09

Device for forming a quasi-neutral beam of oppositely charged particles

#15

20170032937

2017-02-02

Negative ribbon ion beams from pulsed plasmas

#16

20160254133

2016-09-01

Ambient desorption, ionization, and excitation for spectrometry

#17

20160240354

2016-08-18

Plasma ion source and charged particle beam apparatus

#18

20160172156

2016-06-16

Source for selectively providing positively or negatively charged particles for a focusing column

#19

20160163495

2016-06-09

High reliability, long lifetime, negative ion source

#20

20160111241

2016-04-21

Ion beam uniformity control

#21

20150357166

2015-12-10

Method for attachment of an electrode into an inductively-coupled plasma

#22

20150318140

2015-11-05

Multi-source plasma focused ion beam system

#23

20150287567

2015-10-08

Grid assembly and ion beam etching apparatus

#24

20150221492

2015-08-06

Radio-frequency ionization of chemicals

#25

20150130348

2015-05-14

Plasma source for a focused ion beam system

#26

20150102230

2015-04-16

High voltage isolation of an inductively coupled plasma ion source with a liquid that is not actively pumped

#27

20140326877

2014-11-06

Source for selectively providing positively or negatively charged particles for a focusing column

#28

20140312245

2014-10-23

Multi-source plasma focused ion beam system

#29

20140263993

2014-09-18

Ion source having negatively biased extractor

#30

20140231669

2014-08-21

MICROWAVE ION SOURCE AND METHOD FOR STARTING SAME

#31

20140218729

2014-08-07

Means of introducing an analyte into liquid sampling atmospheric pressure glow discharge

#32

20140097752

2014-04-10

Inductively Coupled Plasma ION Source Chamber with Dopant Material Shield

#33

20140077699

2014-03-20

RF system, magnetic filter, and high voltage isolation for an inductively coupled plasma ion source

#34

20140042337

2014-02-13

Inductively coupled plasma ion source with multiple antennas for wide ion beam

#35

20130300288

2013-11-14

Method and device for forming a plasma beam

#36

20130134855

2013-05-30

System for attachment of an electrode into a plasma source

#37

20130134307

2013-05-30

Inductively coupled plasma source as an electron beam source for spectroscopic analysis

#38

20120319000

2012-12-20

Magnetically enhanced, inductively coupled plasma source for a focused ion beam system

#39

20120292501

2012-11-22

Mass spectrometer

#40

20120280136

2012-11-08

Plasma source for charged particle beam system

#41

20120261587

2012-10-18

Encapsulation of electrodes in solid media

#42

20120104274

2012-05-03

ION BEAM GENERATING APPARATUS, SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING ELECTRONIC DEVICE

#43

20120080407

2012-04-05

Multi-source plasma focused ion beam system

#44

20110277444

2011-11-17

Ion drive for a spacecraft

#45

20110272592

2011-11-10

Encapsulation of electrodes in solid media for use in conjunction with fluid high voltage isolation

#46

20110260621

2011-10-27

Low-power gaseous plasma source

#47

20110259269

2011-10-27

Small form factor plasma source for high density wide ribbon ion beam generation

#48

20110240876

2011-10-06

Apparatus for controlling the temperature of an RF ion source window

#49

20110226422

2011-09-22

RF-driven ion source with a back-streaming electron dump

#50

20110163674

2011-07-07

Mitigation of plasma-inductor termination

#51

20110097517

2011-04-28

DYNAMIC VERTICAL MICROWAVE DEPOSITION OF DIELECTRIC LAYERS

#52

20110076422

2011-03-31

CURVED MICROWAVE PLASMA LINE SOURCE FOR COATING OF THREE-DIMENSIONAL SUBSTRATES

#53

20110076420

2011-03-31

HIGH EFFICIENCY LOW ENERGY MICROWAVE ION/ELECTRON SOURCE

#54

20110068691

2011-03-24

Method for producing a plasma beam and plasma source

#55

20100294648

2010-11-25

Magnetically enhanced, inductively coupled plasma source for a focused ion beam system

#56

20100264825

2010-10-21

ION SOURCE FOR GENERATING A PARTICLE BEAM

#57

20100148088

2010-06-17

Techniques for providing a multimode ion source

#58

20100126964

2010-05-27

High voltage isolation and cooling for an inductively coupled plasma ion source

#59

20100066252

2010-03-18

SPIRAL RF-INDUCTION ANTENNA BASED ION SOURCE FOR NEUTRON GENERATORS

#60

20100019139

2010-01-28

Micro discharge device ionizer and method of fabricating the same

#61

20090309041

2009-12-17

Techniques for providing a multimode ion source

#62

20090309018

2009-12-17

Multi-source plasma focused ion beam system

#63

20090166554

2009-07-02

Techniques for providing a multimode ion source

#64

20090114841

2009-05-07

Double plasma ion source

#65

20090058303

2009-03-05

High frequency generator for ion and electron sources

#66

20080111490

2008-05-15

System and method for generating ions and radicals

#67

20080017319

2008-01-24

Magnetically enhanced, inductively coupled plasma source for a focused ion beam system

#68

20070075267

2007-04-05

Monatomic dopant ion source and method

#69

20070029501

2007-02-08

Ion source with uniformity of radial distribution of ion beam intensity

#70

20070013284

2007-01-18

Plasma accelerating apparatus and plasma processing system including secondary electron amplification coating layer formed at inner wall of channel

#71

20060286492

2006-12-21

Boost devices and methods of using them

#72

20060284562

2006-12-21

Combined radio frequency and hall effect ion source and plasma accelerator system

#73

20050183667

2005-08-25

Magnetically enhanced, inductively coupled plasma source for a focused ion beam system

#74

20050016838

2005-01-27

Ion source apparatus and cleaning optimized method thereof

#75

17497013

2023-02-07

Ion source having a magnetic field translatable along an axis of the source

#76

14516032

2016-01-05

Ion beam uniformity control