ClassID:

204964

H01J27/20 - CPC Classification

Classification description:

Ion beam tubes; Ion sources; Ion guns using particle beam bombardment, e.g. ionisers

Sub-classes:
Recent Application in this class:
#1
20220130636
2022-04-28

Ion implanter, ion implantation method, and semiconductor device manufacturing method

#2
20210249212
2021-08-12

Controllable electrostatic ion and fluid flow generator

#3
20210066059
2021-03-04

Ion source

#4
20200306792
2020-10-01

Paint hardening device and paint hardening method

#5
20200227227
2020-07-16

CHARGED PARTICLE CANCER THERAPY AND PATIENT POSITIONING METHOD AND APPARATUS

#6
20200027711
2020-01-23

PLANAR ION SOURCES FOR SPECTROMETERS

#7
20180375301
2018-12-27

ION-GENERATING DEVICE

#8
20180254175
2018-09-06

MEMS device for generating an ion beam

#9
20180211807
2018-07-26

Collision ionization source

#10
20170338075
2017-11-23

Ion implantation processes and apparatus

#11
20170294285
2017-10-12

Charged particle beam system

#12
20160199670
2016-07-14

Charged particle translation slide control apparatus and method of use thereof

#13
20160155597
2016-06-02

Tandem charged particle accelerator including carbon ion beam injector and carbon stripping foil

#14
20160086759
2016-03-24

Plasma generator with at least one non-metallic component

#15
20150155126
2015-06-04

Carbon ion beam injector apparatus and method of use thereof

#16
20140284474
2014-09-25

Focused ion beam system

#17
20130313971
2013-11-28

Gallium ION source and materials therefore

#18
20130161539
2013-06-27

All-optical method and system for generating ultrashort charged particle beam

#19
20120280139
2012-11-08

Method of Anion Production from Atoms and Molecules

#20
20120175526
2012-07-12

IONIZATION GENERATING TUBE AND AN IONIZATION GENERATING DEVICE COMPRISING THE SAME

#21
20120076475
2012-03-29

Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions

#22
20120056101
2012-03-08

ION DOPING APPARATUS AND ION DOPING METHOD

#23
20110226969
2011-09-22

Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions

#24
20090283694
2009-11-19

Double-faced ion source

#25
20090194680
2009-08-06

Method and apparatus for normalizing performance of an electron source

#26
20090090872
2009-04-09

Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions

#27
20070181830
2007-08-09

Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions

#28
20070023678
2007-02-01

Method and apparatus for ionization by cluster-ion impact

#29
20060118405
2006-06-08

Method and apparatus for the generation of anionic and neutral particulate beams and a system using same

#30
15405139
2018-02-20

Collision ionization ion source