204507 ⎘
Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps Electron guns
Sub-classes:Substrate processing apparatus
#2Tunable charged particle vortex beam generator and method
#3Coupling cancellation in electron acceleration systems
#4Marking paper products
#5Additive manufacturing of three-dimensional articles
#6Electron gun and radiation generating apparatus
#7Charged particle source
#8Electron gun, method of controlling same, and electron beam additive manufacturing machine
#9Ion implantation with charge and direction control
#10Charged particle vortex wave generation
#11Marking paper products
#12Marking paper products
#13Marking paper products
#14Marking paper products
#15Marking paper products
#16Enclosure and method for handling electron gun or ion gun
#17Systems and methods for generating coherent matterwave beams
#18Ion implantation with charge and direction control
#19Charged particle beam radiation apparatus
#20Marking paper products
#21Electron beam source and method of manufacturing the same
#22Electron source for linear accelerators
#23Electron beam generating apparatus
#24Electron gun, electron beam exposure apparatus, and exposure method
#25Non-axisymmetric charged-particle beam system
#26Electron gun
#27Electron beam directed energy device and methods of using same
#28Multi-radiation source-ferroelectric-based source of plurality of radiation types
#29Non-axisymmetric charged-particle beam system
#30Sample dimension measuring method and scanning electron microscope
#31Electron beam exposure system
#32Electron emission device including dummy electrodes
#33Electron emission device
#34Focusing structure for electron source