205262 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Electron-beam or ion-beam tubes for localised treatment of objects Controlling tubes by external information, e.g. programme control
Sub-classes:MODULAR MINIATURE CHARGED PARTICLE BEAM COLUMN
#2DUAL SCAN TYPE ION IMPLANT SYSTEM
#3BLANKING APERTURE ARRAY SYSTEM, CHARGED PARTICLE BEAM WRITING APPARATUS, AND METHOD FOR INSPECTING BLANKING APERTURE ARRAY SYSTEM
#4Focused Ion Beam Apparatus
#5Ion milling device
#6Temperature Control For Insertable Target Holder For Solid Dopant Materials
#7Data generation method, charged particle beam irradiation device, and computer-readable recording medium
#8Analyzing a buried layer of a sample
#9Automatic adjustment method and automatic adjustment device of beam of semiconductor apparatus, and training method of parameter adjustment model
#10Multi charged particle beam writing apparatus and method of adjusting same
#11Waveform generating device, waveform generating method, and charged particle beam irradiation apparatus
#12Temperature control for insertable target holder for solid dopant materials
#13Charged particle beam device
#14Devices and methods for examining and/or processing an element for photolithography
#15Temperature control for insertable target holder for solid dopant materials
#16System and method of preparing integrated circuits for backside probing using charged particle beams
#17Methods for directed irradiation synthesis with ion and thermal beams
#18Apparatus and method for repairing a photolithographic mask
#19Multiple electron beam irradiation apparatus, multiple electron beam inspection apparatus, and multiple electron beam irradiation method
#20Device and method for the controlled processing of a workpiece with processing radiation
#21Data processing method, data processing apparatus, and multiple charged-particle beam writing apparatus
#22Intelligent pre-scan in scanning transmission charged particle microscopy
#23Methods for directed irradiation synthesis with ion and thermal beams
#24System and method of preparing integrated circuits for backside probing using charged particle beams
#25Charged particle beam steering arrangement
#26Deflection sensitivity calculation method and deflection sensitivity calculation system
#27Electronic beam machining system
#28CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRITING METHOD, AND PATTERN FORMING METHOD
#29Distortion correction method and electron microscope
#30ALTERNATING BETWEEN DEPOSITION AND TREATMENT OF DIAMOND-LIKE CARBON
#31Deposition or treatment of diamond-like carbon in a plasma reactor
#32Methods for directed irradiation synthesis with ion and thermal beams
#33Optical fiber feedthrough device and fiber path arrangement
#34Additive manufacturing of three-dimensional articles
#35Multi charged particle beam writing apparatus and multi charged particle beam writing method
#36Ion milling apparatus and ion milling method
#37Electronic beam machining system
#38High voltage shielding and cooling in a charged particle beam generator
#39Diagnosis method, charged particle beam lithography apparatus, and recording medium
#40Ion milling device and ion milling method
#41Systems including a beam projection device providing variable exposure duration resolution
#42Ebeam staggered beam aperture array
#43Laser induced plasma micromachining (LIPMM)
#44Apparatus and method for processing substrate using ion beam
#45Method for processing and/or for observing an object, and particle beam device for carrying out the method
#46Etching apparatus and etching method
#47Charged particle radiation device and specimen preparation method using said device
#48Multi charged particle beam writing method, and multi charged particle beam writing apparatus
#49User interface for an electron microscope
#50Laser induced plasma micromachining (LIPMM)
#51Methods for directed irradiation synthesis with ion and thermal beams
#52Ion implantation system and method with variable energy control
#53Method for processing and/or for observing an object, and particle beam device for carrying out the method
#54Multi charged particle beam writing method, and multi charged particle beam writing apparatus
#55Multi charged particle beam writing apparatus and multi charged particle beam writing method
#56Multi-energy ion implantation
#57Ion implantation apparatus and ion implantation method
#58X-ray imaging apparatus and method for controlling X-ray imaging apparatus
#59Method and apparatus for scanning a surface of an object using a particle beam
#60Automated ion beam idle
#61Method and apparatus for generating high current negative hydrogen ion beam
#62Ion beam apparatus
#63Multi charged particle beam writing apparatus and multi charged particle beam writing method
#64System and method of dosage profile control
#65Drawing apparatus and method of manufacturing article
#66Method of protecting a radiation detector in a charged particle instrument
#67Uniformity of a scanned ion beam
#68Method and apparatus for improved uniformity control with dynamic beam shaping
#69Apparatus and method for forming a solid immersion lens using a binary bitmap milling pattern
#70Charged particle beam device, position specification method used for charged particle beam device, and program
#71Apparatus and method for processing substrate using ion beam
#72Method and apparatus for specimen fabrication
#73METHOD AND SYSTEM FOR PREPARING A LAMELA
#74System and method of dosage profile control
#75METHOD AND SYSTEM FOR PREPARING A SAMPLE
#76Defect analyzer
#77Method and apparatus for specimen fabrication
#78Compact scanning electron microscope
#79Manufacturing method of semiconductor device
#80Dual beam system
#81High-density FIB-SEM tomography via real-time imaging
#82Method for maskless particle-beam exposure
#83Compact Scanning Electron Microscope
#84Charged particle beam processing
#85User interface for an electron microscope
#86Compact scanning electron microscope
#87Arrangement for the illumination of a substrate with a plurality of individually shaped particle beams for high-resolution lithography of structure patterns
#88Method for controlling electron beam in multi-microcolumn and multi-microcolumn using the same
#89Multiple current charged particle methods
#90Ion implanter having combined hybrid and double mechanical scan architecture
#91Deflection signal compensation for charged particle beam
#92INSPECTION APPARATUS AND INSPECTION METHOD
#93Valve module
#94Method and apparatus for film thickness adjustment
#95Defect analyzer
#96ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, AND MANUFACTURING METHOD OF UNEVEN PATTERN CARRYING SUBSTRATE
#97Ion gun system, vapor deposition apparatus, and method for producing lens
#98Method and apparatus for surface processing of a substrate using an energetic particle beam
#99Charged-particle beam writing apparatus and charged-particle beam writing method
#100Methods for modifying features of a workpiece using a gas cluster ion beam
#101AREA BASED OPTICAL PROXIMITY CORRECTION IN RASTER SCAN PRINTING
#102Ion implanter having combined hybrid and double mechanical scan architecture
#103Method and apparatus for specimen fabrication
#104Electron beam apparatus with aberration corrector
#105METHOD AND APPARATUS FOR SPECIMEN FABRICATION
#106Method and apparatus for specimen fabrication
#107CHARGED PARTICLE BEAM APPARATUS
#108Method for maskless particle-beam exposure
#109Ion implantation device with a dual pumping mode and method thereof
#110High-density FIB-SEM tomography via real-time imaging
#111Technique for improving ion implantation throughput and dose uniformity
#112Implanting with improved uniformity and angle control on tilted wafers
#113Sputtering coating of protective layer for charged particle beam processing
#114Automated faraday sensor test system
#115Charged particle beam lithography system and method for evaluating the same
#116Ion beams in an ion implanter
#117Writing error verification method of pattern writing apparatus and generation apparatus of writing error verification data for pattern writing apparatus
#118Electron beam irradiating method, magnetic recording medium manufactured by using the method and method for manufacturing the medium
#119METHOD OF REDUCING TRANSIENT WAFER TEMPERATURE DURING IMPLANTATION
#120Ultra precise polishing method and ultra precise polishing apparatus
#121Ion implanter with variable scan frequency
#122Method and apparatus for specimen fabrication
#123Method and apparatus for specimen fabrication
#124Method and apparatus for specimen fabrication
#125Focused ion beam apparatus for specimen fabrication
#126Techniques for reducing effects of photoresist outgassing
#127Techniques for preventing parasitic beamlets from affecting ion implantation
#128Multi-pixel electron microbeam irradiator systems and methods for selectively irradiating predetermined locations
#129Electron beam apparatus with aberration corrector
#130Writing a circuit design pattern with shaped particle beam flashes
#131Technique for improving performance and extending lifetime of indirectly heated cathode ion source
#132Defect analyzer
#133Manufacturing method of semiconductor device
#134Nonuniform ion implantation apparatus and method using a wide beam
#135Charged beam dump and particle attractor
#136Particulate prevention in ion implantation
#137Beam stop and beam tuning methods
#138Deflection signal compensation for charged particle beam
#139Method and apparatus for specimen fabrication
#140Method and apparatus for quantitative three-dimensional reconstruction in scanning electron microscopy
#141Method and apparatus for specimen fabrication
#142Method and apparatus for the automated process of in-situ lift-out
#143Method and apparatus for arc suppression in scanned ion beam processing equipment
#144Electron beam apparatus with aberration corrector
#145Measurement method of electron beam current, electron beam lithography method and system
#146Area based optical proximity correction in raster scan printing
#147Ion implanter and method of preventing undesirable ions from implanting a target wafer
#148Method and apparatus for a formatter following electron beam substrate processing system
#149Method and apparatus for specimen fabrication
#150Beam current density distribution adjustment device and ion implanter