ClassID:

205271

H01J37/315 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Electron-beam or ion-beam tubes for localised treatment of objects for welding

Recent Application in this class:
#1
20240153739
2024-05-09

ELECTRON BEAM WELDING SYSTEMS EMPLOYING A PLASMA CATHODE

#2
20220384138
2022-12-01

ELECTRON BEAM WELDING SYSTEMS EMPLOYING A PLASMA CATHODE

#3
20220208506
2022-06-30

ELECTRON BEAM EMITTING ASSEMBLY

#4
20190262931
2019-08-29

Shaped welding head for electron or laser beam welding

#5
20190202000
2019-07-04

Electron beam 3D printing machine

#6
20190139738
2019-05-09

Electronic beam machining system

#7
20180169784
2018-06-21

Additive manufacturing of three-dimensional articles

#8
20170358424
2017-12-14

Electronic beam machining system

#9
20150083928
2015-03-26

Method for determining beam parameters of a charge carrier beam, measuring device, and charge carrier beam device

#10
20150001416
2015-01-01

Electron beam diagnostic system using computed tomography and an annular sensor

#11
20140367571
2014-12-18

Method of welding a frozen aqueous sample to a microprobe

#12
20110121180
2011-05-26

Electron beam diagnostic system using computed tomography and an annular sensor

#13
20100012860
2010-01-21

Electron beam processing device

#14
20080143278
2008-06-19

Electron beam systems

#15
20070210041
2007-09-13

Automatic focusing of electron beams using a modified Faraday cup diagnostic

#16
20070181832
2007-08-09

Controlling the characteristics of implanter ion-beams

#17
20070023697
2007-02-01

Controlling the characteristics of implanter ion-beams

#18
20060192144
2006-08-31

Electron beam welding method and apparatus

#19
20060169924
2006-08-03

Controlling the characteristics of implanter ion-beams

#20
20050242299
2005-11-03

Diagnostic system for profiling micro-beams

#21
20050242294
2005-11-03

Controlling the characteristics of implanter ion-beams

#22
20050173650
2005-08-11

Method for measuring the intensity profile of an electron beam, in particular a beam of an electron-beam machining device, and/or for measuring an optical system for an electron beam and/or for adjusting an optical system for an electron beam, measuring structure for such a method and electron-beam machining device